Neutralization of keV Ne and Ar ions during grazing scattering from an Al(1 1 1) surface

Charge fractions after scattering of Ne⁺ ions, Ne⁰ atoms and Ar⁺ ions with keV energies under a grazing angle of incidence from an atomically clean and flat Al(1 1 1) surface are studied. For incoming Ne⁺ ions we observe defined ion fractions in the scattered beams, whereas for incident Ne⁰ atoms ion fractions are more than one order of magnitude smaller. This experimental result provides clear evidence for a survival of Ne⁺ ions over the whole scattering event. From the dependence of ion fractions on the perpendicular energy component we derive neutralization rates as function of distance from the surface. These rates compare well with recent theoretical calculations for the system He⁺–Al(1 1 1). For incident Ar⁺ ions no survival of ions is found and upper limits for the survival probability and lower limits for the neutralization rate are determined.     

Light emission from oxygen covered Al and Cu surfaces

Ion beam induced light emission is used to investigate the sputtering yield, S_O, of oxygen atoms on the surfaces of a polycrystalline copper and an Al(1 1 1) target. Under Ar⁺ and Ne⁺ ion bombardment of Al(1 1 1) and polycrystalline copper targets, spectral lines of Cu I and Al I emitting from sputtered excited atoms are measured as a function of the oxygen partial pressure, wavelength and beam energy. The light emission for two Al I lines (3082 and 3962 Å) and Cu I lines (3247 and 3274 Å) are proportional to the oxygen partial pressure (1×10⁻⁴ Torr). Above 2×10⁻⁴ Torr, the light intensities start to decrease which is consistent with other measurements. From saturated-oxygen covered target surfaces, light intensities of Al I and Cu I lines are measured as a function of time and oxygen partial pressures. The sputtering yields could be determined from the curves of spectral lines directly. For 10 and 20 keV Ar⁺ ions bombarding the copper surface, the oxygen sputtering yields are 0.34 and 0.22 (atoms/ion), respectively. The same copper target was bombarded by Ne⁺ ions at 5 and 10 keV, the oxygen sputtering yields are 0.87 and 0.59, respectively. For 10, 15, and 20 keV Ar⁺ bombarding an Al(1 1 1) target, the obtained sputtering yields are 0.44, 0.31, and 0.2 (atoms/ion), respectively.     

Kinetic electron emission yield induced by H and He ions versus stopping power for Al, Cu, Ag and Au

For H⁺ and He²⁺ ions impinging on Al, Cu, Ag and Au targets we measured simultaneously the yield, γ, of emitted electrons and the electronic energy loss, S_e, in the energy range 0.5 to 4.8 MeV. The targets were prepared under high-vacuum conditions before they were transferred to an ultra-high-vacuum chamber without breaking the vacuum. The targets were sputter cleaned and their composition was examined by Auger electron spectrometry. The values of γ were obtained by current integration and S_e was determined from the energy width of Rutherford backscattering spectra. For H⁺ ions impinging on Cu, Ag or Au and He²⁺ on Al and Cu, the expected proportionality between γ and S_e was found within the experimental errors of 2%. For H⁺ ions on Al and He²⁺ ions on Ag and Au targets, significant deviations were observed.     

Resonant ion stimulated desorption of O from the TiO2(1 1 0) surface: Effects of oxygenation and ion bombardment

The O⁺ desorption from reduced, oxygenated, and ion-bombarded TiO₂(1 1 0) surfaces has been investigated during He⁺ irradiation. The O⁺ desorption is initiated by creation of an antibonding O 2s core hole state via quasi-resonant charge exchange with the He⁺ 1s state, followed by the intra-atomic Auger decay of the O 2s hole. Upon oxygenation of the reduced TiO₂(1 1 0) surface, the O⁺ yield increases by one order of magnitude. The O₂ molecule is dissociated at the vacancy site of bridging oxygen and the oxygen atoms either fill a vacancy site or chemisorb at a fivefold-coordinated Ti⁴⁺ site as an adatom. The latter is detected with much higher efficiency than the former. The O⁺ yield is increased during He⁺ bombardment of the reduced TiO₂(1 1 0) surface due to formation of lower coordinated oxygen atoms. The oxygen species thus formed by ion bombardment or oxygenation are unstable on the surface and tend to diffuse into bulk vacancy sites or higher coordination surface sites even at room temperature.     

Electron emission in 10–100 keV H and He grazing ion-surface collisions

We have measured energy distributions of electrons ejected during grazing 10–100 keV H⁺ and He⁺ ions scattering from Si surfaces for a broad range of electron observation angles. The distributions have contributions strongly dependent on the directions of incidence and observation. For observation regions around the specular reflection of the ions we have studied the angular dependence of the electron structure resulting from electron transfer to the continuum of the effective ion potential. Far from the ion scattering plane we have observed the Si Auger electron spectrum. We discuss the differences between the Auger peaks obtained by electron and grazing proton bombardment of Si surfaces partially covered with O₂ and Al.     

Spin effects in the screening and Auger neutralization of He ions in a spin-polarized electron gas

The screening of a He⁺ ion embedded in a free electron gas is studied for different spin-polarizations of the medium. Density functional theory and the local spin density approximation are used to calculate the induced electronic density for each spin orientation, i.e. parallel or antiparallel to the spin of the electron bound to the ion. Since both the He⁺ ion and the electron gas are spin-polarized, we analyze in detail the spin state of the screening cloud for the two different possibilities: the spin of the bound electron can be parallel to either the mayority spin or the minority spin in the medium. Finally, the spin-dependent Kohn–Sham orbitals are used to calculate the Auger neutralization rate of the He⁺ ion. The polarization of the Auger excited electron is influenced by the spin-polarization of the medium. The results are discussed in terms of the spin-dependent screening and the indistinguishability of electrons with the same spin state.     

High ion-beam induced electron yields from polycrystalline diamond

Extraordinarily high ion-beam induced electron yields are seen from polycrystalline diamond surfaces for high energy H⁺, He⁺ and Ar⁺ ions. This is attributed to the negative electron affinity of the diamond surface. However, the yield decays rapidly with dose, limiting the potential applications. The mechanism for decay is suggested to be electron-stimulated desorption of surface hydrogen, which removes the negative electron affinity responsible for high yields.     

Observation of micro-cavities in nickel during He and D irradiation and post-irradiation annealing

Changes in sizes and morphology of small cavities in nickel irradiated by 25 keV helium ions and 20 keV deuterons were investigated during irradiation and on annealing after irradiation by means of transmission electron microscopy. In the early stage of He⁺ irradiations at 600 and 700° C, roundish cubes appeared, gradually changed to octahedra. and, then, by the truncation of apexes, finally reached cubo-octahedra. Nucleation and growth behavior of cubic cavities in D⁺ irradiated nickel was different from the case of He⁺ irradiation. On annealing of the He⁺ irradiated specimen, only octahedral cavities showed marked growth, finally changing to roundish cubes at 750° C. Cavities of roundish cubes and cubo-octahedra did not grow nor change their shapes remarkably by the annealing. The cubic cavities formed by D⁺ irradiation at 360° C showed gradual shrinkage on annealing at 600° C and disappeared at 625° C. The changes of cavities during irradiation and on annealing were interpreted by the effect of the internal gas pressure.     

Low-energy ion scattering and sputtering at grazing ion bombardment of clean and oxygen covered Ag(1 1 0) surface

The ion scattering and sputtering processes at low energy grazing N⁺ and Ne⁺ ion bombardment of clean and oxygen covered Ag(1 1 0) surface have been investigated by computer simulation in the binary collision approximation.

The spatial, angular and energy distributions of scattered, sputtered particles and desorbed molecules of oxygen as well as their yields versus the angle of incidence have been calculated. In these distributions the some characteristic peaks were observed and analysed. It was found that an adsorption layer plays a role of the additional surface barrier, i.e. it reflects leaving target atoms back to crystal. The azimuth angular dependencies of Ag sputtering yield and non-dissociative O₂ desorption yield at grazing incidence have been calculated. It was shown that these dependencies correlate the crystal orientation.     

Effect of Auger neutralization on yields of He ions backscattered and alkali ions sputtered from the surface of alkali halides by keV He ion impact

The yields of ions and neutrals backscattered and alkali ions sputtered from LiF crystals by keV He⁺ ion impact have been measured by means of the coaxial impact collision ion scattering spectroscopy in time of flight analysis mode using the charging-up effect. It is found that as the charging-up potential increases due to continuous irradiation of the pulsed ion beam, the time of flight of the He⁺ ions backscattered shifts toward the shorter time, while that of the neutrals backscattered shifts toward the longer, and that of Li ions sputtered also shifts much more clearly toward the shorter. The charging-up potential has been estimated as a function of irradiation time of the pulsed ion beam from the time of flight data and the ion to neutral ratio in the backscattering yields is estimated to be about 0.15. The mechanisms for ionization on He and sputtering of alkali ions are discussed in terms of charging-up and trion (bihole and electron) produced by Auger neutralization of keV He⁺ ions at the target surface.     

Amorphization and recrystallization of the ABO3 oxides

Single crystals of the ABO₃ phases CaTiO₃, SrTiO₃, BaTiO₃, LiNbO₃, KNbO₃, LiTaO₃, and KTaO₃ were irradiated by 800 keV Kr⁺, Xe⁺, or Ne⁺ ions over the temperature range from 20 to 1100 K. The critical amorphization temperature, T_c, above which radiation-induced amorphization does not occur varied from approximately 450 K for the titanate compositions to more than 850 K for the tantalates. While the absolute ranking of increasing critical amorphization temperatures could not be explained by any simple physical parameter associated with the ABO₃ oxides, within each chemical group defined by the B-site cation (i.e., within the titanates, niobates, and tantalates), T_c tends to increase with increasing mass of the A-site cation. T_c was lower for the Ne⁺ irradiations as compared to Kr⁺, but it was approximately the same for the irradiations with Kr⁺ or Xe⁺. Thermal recrystallization experiments were performed on the ion-beam-amorphized thin sections in situ in the transmission electron microscope (TEM). In the high vacuum environment of the microscope, the titanates recrystallized epitaxially from the thick areas of the TEM specimens at temperatures of 800–850 K. The niobates and tantalates did not recrystallize epitaxially, but instead, new crystals nucleated and grew in the amorphous region in the temperature range 825–925 K. These new crystallites apparently retain some ‘memory' of the original crystal orientation prior to ion-beam amorphization.     

Study of localised radiation damage to PIPS detectors by a scanning ion microprobe: Measured effects and the consequences for STIM analysis

Radiation damage effects in a PIPS particle detector have been studied by direct irradiation with a 4 MeV He⁺ focused ion beam, using the Eindhoven scanning ion microprobe set-up. This set-up enables extreme sensitivity and accuracy in pulse-height measurement. Pulse-height dependence on ion dose and the lateral variations of pulse-height response after damaging were studied, for different bias voltages. Pulse height was found to decrease linearly with ion dose and this could be observed after only a few ions per scan position, corresponding to a dose of 10⁸/cm². Pulse-height loss was found to be restricted to damaged detector areas. Consequences of this pulse-height dependence on ion dose and scan position for the accuracy of STIM analyses are discussed.     

Surface spin polarization in Fe(1 1 0) and Ni(1 1 0)

The magnetism of Ni(1 1 0) and Fe(1 1 0) surfaces was investigated by electron capture spectroscopy. He⁺ and He²⁺ ions impinged on the Fe(1 1 0) and Ni(1 1 0) surfaces under grazing incidence, and the degree of polarization of the light emitted by the neutralized projectiles was analyzed. Our measurements show that in Ni(1 1 0) minority electrons have a higher density of states at the Fermi energy than majority electrons, opposed to the Fe(1 1 0) case. From a comparison of our measurements we estimate the ratio between captured minority and majority electrons in Ni(1 1 0) to be similar as the ratio between captured majority and minority electrons in Fe(1 1 0).     

Influence of water vapor concentration on discharge dynamics and reaction products of underwater discharge within a He/H_2O-filled bubble at atmospheric pressure

In this study, a two-dimensional fluid model is proposed to simulate the underwater discharge in a He/H_2O-filled bubble at atmospheric pressure. The molar fraction of water vapor is varied in the range of 0.01%–1% to investigate the dependence of discharge dynamics and reaction products on water vapor concentration(WVC). The numerical results show that most properties of the discharge sensitively depend on the WVC. The increase of WVC leads to an increase in the electron density and discharge propagation velocity, which is attributed to Penning ionization between He*and H_2O. The main positive ion switches from He+to H_2O~+, while the WVC increases from 0.01% to 1%. The dominant reactive oxygen species is OH, whose peak density is about two orders of magnitude higher than that of O. Besides, the densities of OH and O radicals increase with the increasing WVC. It is shown that the formation mechanism of O radicals is significantly affected by the WVC. The dominant reaction creating O radicals changes from the charge exchange between He+2 and H_2O to the electron impact dissociation of H_2O as the WVC increases from 0.01% to 1%. This study is helpful for better understanding the application of non-thermal plasmas discharges in water, such as biomedical, environmental engineering.     

Electron microscopy and Rutherford backscattering spectrometry characterisation of 6H SiC samples implanted with He

6H SiC single crystals were implanted at room temperature with 1 MeV He⁺ up to a fluence of 2 × 10¹⁷ at./cm². RBS-channeling analysis with a 2 MeV He⁺ beam indicated the formation of extended defects or the generation of point defects at a constant concentration over a depth of about 1 μm. Electron microscopy characterisation revealed the presence of two amorphous buried layers at depths of about 1.75 and 4.8 μm. They are due to the implantation and to the analysing RBS beam, respectively. No extended planar or linear faults were found in the region between the surface and the first amorphous layer. However, at the surface, a 50 nm thick amorphous layer was observed in which crystalline inclusions were embedded. Electron diffraction and HREM data of the inclusions were typical for diamond. These inclusions were even found in the crystalline SiC material below this layer, however at a reduced density.     

Bubbles in SiC crystals formed by helium ion irradiation at high temperatures

Helium bubbles were found to be formed in SiC crystals by irradiation with He⁺ ions at 1000 to 1200° C. The size of bubbles increased with increasing irradiation temperatures.

The density of helium atoms in the bubbles was measured to be about 10²⁸ atoms/m³ by EELS measurement in combination with electron microscopic observation in the same selected areas, and the internal pressure of the bubbles was estimated therefrom to be on the order of 10⁸ Pa at room temperature.     

Ion beam enhanced etching of LiNbO3

Single crystals of z- and x-cut LiNbO₃ were irradiated at room temperature and 15 K using He⁺- and Ar⁺-ions with energies of 40 and 350 keV and ion fluences between 5 × 10¹² and 5 × 10¹⁶ cm⁻². The damage formation investigated with Rutherford backscattering spectrometry (RBS) channeling analysis depends on the irradiation temperature as well as the ion species. For instance, He⁺-irradiation of z-cut material at 300 K provokes complete amorphization at 2.0 dpa (displacements per target atom). In contrast, 0.4 dpa is sufficient to amorphize the LiNbO₃ in the case of Ar⁺-irradiation. Irradiation at 15 K reduces the number of displacements per atom necessary for amorphization. To study the etching behavior, 400 nm thick amorphous layers were generated via multiple irradiation with He⁺- and Ar⁺-ions of different energies and fluences. Etching was performed in a 3.6% hydrofluoric (HF) solution at 40 °C. Although the etching rate of the perfect crystal is negligible, that of the amorphized regions amounts to 80 nm min⁻¹. The influence of the ion species, the fluence, the irradiation temperature and subsequent thermal treatment on damage and etching of LiNbO₃ are discussed.     

PECVD Si nitride and Si oxide layers — Hydrogen analysis and etching after ion implantation

lon-implantation-induced selective etching of dielectric materials is considerably diminished with increasing hydrogen content. Making use of the ¹H(¹⁵N,γ)¹²C resonance reaction, low-temperature PECVD Si oxide and Si nitride layers were observed to contain 12 and 23 at.% H, respectively. For different reagents etch rates were measured regarding the virgin and ion—implanted-He⁺ Ne⁺ at 60, 100 keV — PECVD films.     

Energy loss of H and He in the semiconductors GaAs, ZnSe, InP and SiC

We have theoretically studied the electronic stopping cross section and the energy loss straggling of swift light ions (H⁺ and He⁺) moving through several compound semiconductors (GaAs, ZnSe, InP and SiC) as a function of the incident projectile energy. The calculations have been done using the dielectric formalism, in which the electronic structure of the projectile is described by the modified Brandt–Kitagawa model and the energy loss function (ELF) of the semiconductors is obtained using a linear combination of Mermin-type ELF to describe the outer electron excitations and generalized oscillator strengths to take into account the excitations of the inner-shell electrons. The different charge states that the projectile can acquire during its travel through the solid, as a result of electronic capture and loss processes, has been also considered. The contributions to the projectile energy loss from both the outer- and the inner-shell electron excitations are analyzed. The comparison of our calculated stopping cross sections with available experimental data shows a good agreement in a wide range of incident projectile energies.     

Research of Si and GaAs diode structures by Ion Beam Induced Charge (IBIC) collection

A Si pn junction diode and a GaAs Schottky diode were prepared for studying the basic mechanism of charge collection followed by high energy charged particle incidence in order to improve the resistance against single event upset. A 2 μm wide and 20 μm long rectangular Al electrode attached to a circular Al electrode with a 50 μm diameter was made on a 2.5 μm thick epilayer (minority carrier density 2 × 10¹⁵ /cm³). Both a Schottky electrode of Al (5 μm × 110 μm) and two ohmic electrodes of AuGe/Ni (110 μm × 110 μm) were made on a 2 μm thick epilayer (7.3 × 10¹⁵ /cm³) grown on a semi insulator GaAs substrate (1 × 10⁷ Ω cm). The internal device structure was examined by the IBIC (Ion Beam Induced Charge) method using a 2 MeV He⁺ ion microbeam. IBIC images clearly show an Al electrode, the SiO₂, and an epilayer. These results were then used to improve the qualities of the test diodes.