Piezoelectric properties of zinc oxide films on glass substratesdeposited by RF-magnetron-mode electron cyclotron resonance sputteringsystem

There are various types of electron cyclotron resonance (ECR) sputtering systems, DC-mode, RF-mode, etc. We reported that zinc oxide (ZnO) films on glass substrates deposited by DC-mode ECR and RF-mode ECR sputtering systems had shown excellent piezoelectric properties and c-axis orientations. The RF-mode ECR sputtering system was capable of depositing ZnO films on glass substrates without evidence of column and fiber grains in cross section and driving a 1.1 GHz fundamental Rayleigh surface acoustic wave (SAW). In this paper, the properties of ZnO film deposited by an RF-magnetron-mode ECR sputtering system, which has added magnets to the outside of a cylindrical zinc metal (Zn) target of the RF-mode ECR sputtering system, are investigated. It is confirmed that the SAW filters using ZnO films on an interdigital transducer (IDT)/glass substrate deposited by the RF-magnetron-mode ECR sputtering exhibit almost the same effective electromechanical coupling factors (keff) as the theoretical keff values calculated by finite element method (FEM) using the constants of ZnO single crystal (measured keff values are 97% of the theoretical values) and 0.6~3.7 dB lower insertion loss in comparison with the films deposited by the DC-mode ECR and the RF-mode ECR sputtering system     

Fabrication of high frequency ZnO thin film SAW devices on silicon substrate with a diamond-like carbon buffer layer using RF magnetron sputtering

Diamond-like carbon (DLC) film is a promising candidate for surface acoustic wave (SAW) device applications because of its higher acoustic velocity. A zinc oxide (ZnO) thin film has been deposited on DLC film/Si substrate by RF magnetron sputtering; the optimized parameters for the ZnO sputtering are RF power density of 0.55 W/cm², substrate temperature of 380 °C, gas flow ratio (Ar/O₂) of 5/1 and total sputter pressure of 1.33 Pa. The results showed that when the thickness of the ZnO thin films was decreased, the phase velocity of the SAW devices increased significantly.     

Carbon nitride films deposited by reactive sputtering and pulsed laser ablation

Carbon nitride films were deposited by reactive sputtering process and by pulsed laser ablation process with substrate bias. By applying the RF bias, it enables the ion irradiation on to the depositing film surface continuously. ECR plasma source was used for reactive sputtering. Nd:YAG laser (λ=532 nm, 210 mJ) was used to ablate a graphite target in the nitrogen atmosphere. The film properties were examined by XPS, Raman, nanoindentation measurement, and FE-SEM. It was shown that the films deposited by reactive sputtering had smooth surface and its hardness of approximately 30 GPa. However, the films deposited by pulsed laser ablation had uneven surface and low hardness. Both processes, the atomic composition ratio of N/C and sp³ bonding ratio increased with ion bombardment energy up to 100-150 eV, and level off above it. The maximum atomic composition ratio of N/C was 0.35 for reactive sputtering and 0.24 for laser ablation.     

氢化及沉积温度对掺铝ZnO透明导电薄膜性能影响

采用射频磁控溅射方法在玻璃衬底上制备了掺铝ZnO透明导电薄膜(AZO)。为了降低AZO薄膜的电阻率, 采用在溅射气氛中通入一定比例H₂的方法对AZO薄膜进行氢化处理, 并研究了溅射气氛中H₂含量及衬底温度对AZO薄膜氢化效果的影响。结果表明: 在低温条件下, 氢化处理能有效降低AZO薄膜的电阻率; 在衬底温度为100℃的低温条件下, 通过调节溅射气氛中H₂的比例, 制备了电阻率为6.0×10^-4 Ω·cm的高质量氢化AZO薄膜, 该电阻值低于同等条件下未氢化AZO薄膜电阻值的1/3; 但随着衬底温度的升高, 氢化处理对薄膜电学性能的改善效果逐渐减弱。     

Analysis of SAW properties of epitaxial ZnO films grown on R-Al2O3 substrates

ZnO thin films with a high piezoelectric coupling coefficient are widely used for high frequency and low loss surface acoustic wave (SAW) devices when the film is deposited on top of a high acoustic velocity substrate, such as diamond or sapphire. The performance of these devices is critically dependent on the quality of the ZnO films as well as of the interface between ZnO and the substrate. In this paper, we report the studies on piezoelectric properties of epitaxial (112¯0) ZnO thin films grown on R-plane sapphire substrates using metal organic chemical vapor deposition (MOCVD) technique. The c-axis of the ZnO film is in-plane. The ZnO/R-Al₂O₃ interface is atomically sharp. SAW delay lines, aligned parallel to the c-axis, were used to characterize the surface wave velocity, coupling coefficient, and temperature coefficient of frequency as functions of film thickness to wavelength ratio (h/λ). The acoustic wave properties of the material system were calculated using Adler's matrix method, and the devices were simulated using the quasi-static approximation based on Green's function analysis     

Suppression of damage to organic light-emitting layers during deposition of Al-doped ZnO thin films by radio-frequency magnetron sputtering

Conditions for deposition of Al-doped ZnO (AZO) films on an organic light-emitting layer with a radio-frequency magnetron sputtering system were optimized to realize high deposition rate and low resistivity of the films. Damage inflicted on the organic layer by depositing the AZO film under the optimized deposition conditions was studied from photoluminescence, UV-Vis and Fourier transform infrared spectroscopy spectra using tris(8-hydroxyquinolinato)aluminium as a model organic compound. We found that damage to the organic layer was lessened by increasing the magnetic field from a normal intensity of 0.02 T to 0.1 T. The damage to the organic layer was further lessened by inserting a grounded grid electrode between a target and the substrate.     

Effect of Si substrate on ethanol gas sensing properties of ZnO films

We prepared ZnO/n-Si heterojunctions by depositing ZnO films on n-Si substrates with different resistivities by radio-frequency magnetron sputtering. The microstructure of ZnO film was analyzed by X-ray diffraction and scanning electron microscopy. The current-voltage characteristics and ethanol gas sensing properties of the junctions were investigated at room temperature. It is found that optimization of n-Si substrate resistivity is critical to enhance the ethanol gas sensitivity of ZnO/n-Si heterojunction. The ZnO/n-Si heterojunction with n-Si substrate of 2-3 Ω cm exhibits the best ethanol gas sensing property. The junction shows the sensitivity of 29.41% to 0.24 g/L ethanol gas under + 0.52 V forward bias voltage.     

Deposition of ZnO thin films on SiO2/Si substrate with Al2O3 buffer layer by radio frequency magnetron sputtering for high frequency surface acoustic wave devices

ZnO films with c-axis (0002) orientation have been grown on SiO₂/Si substrates with an Al₂O₃ buffer layer by radio frequency magnetron sputtering. Crystalline structures of the films were investigated by X-ray diffraction, atomic force microscopy and scanning electron microscopy. The center frequency of the surface acoustic wave (SAW) device with a 4.8 μm thick Al₂O₃ buffer layer was measured to be about 408 MHz, which was much higher than that (265 MHz) of ZnO/SiO₂/Si structure and approaches that (435 MHz) of ZnO/sapphire. It is a possible way as an alternative for the sapphire substrate for the high frequency SAW device applications, and is also useful to integrate the semiconductor and high frequency SAW devices on the same Si substrate.     

Synthesis and surface acoustic wave properties of AlN films deposited on LiNbO3 substrates

The c-axis-oriented aluminum nitride (AlN) films were deposited on z-cut lithium niobate (LiNbO₃) substrates by reactive RF magnetron sputtering. The crystalline orientation of the AlN film determined by x-ray diffraction (XRD) was found to be dependent on the deposition conditions such as substrate temperature, N₂ concentration, and sputtering pressure. Highly c-axis-oriented AlN films to fabricate the AlN/LiNbO₃-based surface acoustic wave (SAW) devices were obtained under a sputtering pressure of 3.5 mTorr, N₂ concentration of 60%, RF power of 165 W, and substrate temperature of 400°C. A dense pebble-like surface texture of c-axis-oriented AlN film was obtained by scanning electron microscopy (SEM). The phase velocity and the electromechanical coupling coefficient (K²) of SAW were measured to be about 4200 m/s and 1.5%, respectively. The temperature coefficient of frequency (TCF) of SAW was calculated to be about -66 ppm/°C     

Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering

High rate deposition of ITO thin films at a low substrate temperature was attempted by using a facing target sputtering (FTS) system. Deposition rate as high as 53 nm/min was realized on polycarbonate film substrate of 80-μm thickness. When the film was deposited at a deposition rate above 80 nm/min, polycarbonate film substrate was thermally damaged. The film deposited by FTS has much smaller compressive film stress than the film deposited by conventional magnetron sputtering. The film stress was reduced significantly by increasing the sputtering gas pressure and stress-free films can be obtained by adjusting the sputtering gas pressure. This may be mainly caused by the fact that bombardment by high energy negative oxygen ions to substrate surface during deposition can be completely suppressed in the FTS. Film structure and electrical properties changed little with substrate position, and uniform films were obtained by the FTS.     

利用脉冲直流磁控溅射制备ZnO:Al薄膜的研究

利用中频脉冲直流磁控溅射法制备了平面ZnO:Al(AZO)透明导电薄膜,研究了沉积压力、衬底温度和溅射功率对AZO薄膜光电性能、薄膜稳定性的影响.结果表明:在较低沉积压力、衬底温度及溅射功率下,可获得具有低电阻率、高透过率、高稳定性的AZO薄膜.     

Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering

Using mirror-confinement-type electron cyclotron resonance (ECR) plasma sputtering method, strontium titanate (SrTiO₃) thin films have been prepared on Si and Pt/Ti/SiO₂/Si substrates at a low substrate temperature (below 450 K) in a low pressure (2.7×10⁻² Pa) environment of pure Ar and Ar/O₂ mixture. Prepared film surfaces were very smooth regardless of high deposition rate (8.5 nm/min). The composition ratio Sr/Ti of Sr to Ti in the films varied with the distance between the target and the substrate. All as-deposited films on Si substrates were found to be amorphous and were crystallized by post-deposition annealing using an electric furnace at 650 K, i.e. approximately 250 K lower than annealing for films obtained by conventional RF magnetron sputtering. Post-deposition annealing of these films using millimeter-wave radiation decreased the crystallization temperature to a value of 550 K. Furthermore, all as-deposited films on Pt/Ti/SiO₂/Si substrates by a plasma of Ar and O₂ gas mixture were found to be crystallized regardless of no substrate heating.     

Sputtering ZnO films on langasite and its SAW properties

C-axis-oriented ZnO films were sputtered on Langasite substrate (LGS, La(3)Ga(5)SiO(14)). The crystalline structure of the films was determined by grazing incident angle X-ray diffraction, the surface microstructure of films was investigated by scanning electron microscopy and atomic force microscopy, the atom composition ratio O/Zn of films was determined by energy dispersive X-ray spectroscopy, and the resistivity of films was determined by the four-point probe instrument. The measurement results showed those films prepared were all polycrystalline hexagonal ZnO films. By analyzing the microstructure of the ZnO films, those prepared at the oxygen flow rate (O(2)/O(2)+Ar) of 20%, the RF power of 200 W, and the substrate temperature of 200 degrees C had the best performance: highly c-axis-oriented microstructures, dense surface morphology, and the atom composition ratio 1.02. The measured scattering parameters of the SAW device fabricated on the composite substrate (ZnO/LGS) with film thickness 1.76 microm showed an average shifted velocity around 2741 m/s at 57.1 MHz and a electromagnetic coupling coefficient greater than 1%.     

Surface acoustic wave characteristics and electromechanical coupling coefficient of lead zirconate titanate thin films

Lead zirconate titanate (PZT) thin films were created on ST-X quartz using radio frequency magnetron sputtering deposition. PZT films deposited on quartz are used as a new piezoelectric substrate for surface acoustic wave (SAW) devices. Microelectromechanical technique was used to fabricate interdigital transducers on the surface of the substrate to be used as a SAW delay line device. The results show that the PZT film was successfully deposited on ST-X quartz, and that the PZT film on ST-X quartz can enhance the electromechanical coupling coefficients of SAW.     

Radio frequency sputtered zinc oxide thin films with application to metal-semiconductor-metal photodetectors

Zinc oxide (ZnO) films were successfully deposited on silicon, silicon dioxide, and glass substrates by radio frequency magnetron sputtering at different deposition conditions. Field emission scanning electron microscopy, X-ray photoelectron spectroscopy, transmission and photoluminescence measurements were employed to analyze the effect of the deposition conditions and the postdeposition annealing treatment on the surface morphology, structure, chemical deposition and optical properties of ZnO thin films. It was found that the thickness of ZnO films decreased with increased ratio of oxygen/argon and increased temperature. The crystalline and stoichiometric quality of the film was improved by depositing at high temperature and low pressure. Crystals formed more tightly and uniformly with heat treatment under air ambient. The dark current of the ZnO metal-semiconductor-metal photodetector was reduced from 3.06 μA to 96.5 nA at 5 V after postdeposition annealing when compared with that of as-deposited ZnO. Its magnitude was found to be at least two orders lower than that of the as-deposited sample.     

ZnO/SiC/Si异质结构的特性

用MOCVD方法在p型单晶Si（100）基片上外延SiC层,再用直流溅射在SiC层上生长ZnO薄膜,制备出ZnO／SiC／Si异质结构,用XRD和AFM分析了ZnO／SiC／Si和ZnO／Si异质结构中表层ZnO的结构和形貌的差别,研究了这种异质结构的特性．结果表明,在Si（100）基片上外延生长出的是高取向、高结晶质量的SiC（100）层．这个SiC层缓冲层使在Si基片上外延生长出了高质量ZnO薄膜,因为ZnO与SiC的晶格失配比ZnO与Si的晶格失配更低．     

Growth and characterization of high resistivity c-axis oriented ZnO films on different substrates by RF magnetron sputtering for MEMS applications

In the present work, we report the deposition of high resistivity c-axis oriented ZnO films by RF magnetron sputtering. The deposition parameters such as RF power, target-to-substrate spacing, substrate temperature, and sputtering gas composition affect the crystallographic properties of ZnO films, which were evaluated using XRD analysis. The self-heating of the substrate in plasma during film deposition was investigated and we report that highly “c-axis oriented” ZnO thin films can be prepared on different substrates without any external heating under optimized deposition parameters. The post-deposition annealing of the film at 900 °C for 1 h in air ambient increases the intensity of (002) peak corresponding to c-axis orientation in addition with the decrease in full width at half maxima (FWHM). Bond formation of ZnO was confirmed by FTIR analysis. Grains distribution and surface roughness have been analyzed using SEM and AFM. The DC resistivity of the films prepared under different deposition conditions was measured using MIS/MIM structures and was found to be in the range of 10¹¹–10¹² Ω cm at low electric field of 10⁴ V/cm. The ZnO film of 1 μm thickness has transmittance of over 85% in the visible region. Applications of these films in MEMS devices are discussed.     

Effect of ZnO film deposition methods on the photovoltaic properties of ZnO–Cu2O heterojunction devices

The effect of ZnO film depositions using various film deposition methods such as magnetron sputtering (MSP), pulsed laser deposition (PLD) and vacuum arc plasma evaporation (VAPE) on the photovoltaic properties of ZnO–Cu₂O heterojunction solar cells is described in this report. In addition, the relationship between the resulting photovoltaic properties and the film deposition conditions such as supply power and substrate arrangement was investigated in Al-doped ZnO (AZO)–Cu₂O heterojunction devices fabricated using AZO thin films prepared by d.c. magnetron sputtering (d.c.MSP) or r.f. magnetron sputtering (r.f.MSP). The results showed that the measured photovoltaic properties of devices fabricated with films deposited on substrates oriented perpendicular to the target were better than those of devices fabricated with films deposited on substrates oriented parallel to the target. It was also found that ZnO film depositions under conditions where a relatively weaker oxidizing atmosphere was used yield better properties than films derived from MSP, which utilizes a high-density and high-energy plasma. Using VAPE and PLD, for example, high efficiencies of 1.52 and 1.42%, respectively, were obtained under AM2 solar illumination in devices fabricated at a substrate temperature around 200 °C.     

Comparative study of (Ba,Sr)TiO3 films prepared by electron cyclotron resonance plasma sputtering and metal-organic decomposition

(Ba,Sr)TiO₃ films were prepared on Pt/Ti/SiO₂/Si substrates by mirror-confinement-type electron cyclotron resonance (ECR) plasma sputtering as well as by metal-organic decomposition (MOD). The films prepared by ECR plasma sputtering were crystallized at lower temperatures with better crystallinity and a denser structure than those by MOD. As for dielectric constant, films prepared by ECR plasma sputtering exhibited a relatively high value over 500 at a low annealing temperature of 873 K, whereas films by MOD exhibited approximately 350. This is attributed to the better crystallinity and the denser structure of the films by ECR plasma sputtering. The leakage current density of the films was found to be similar in both processes.     

The effects of ZnO films on surface acoustic wave properties of modified lead titanate ceramic substrates

Poly-crystal zinc oxide (ZnO) films with c-axis (002) orientation have been successfully grown on the strontium (Sr) modified lead titanate ceramic substrates with different Sr dopants by r.f. magnetron sputtering technique. Highly oriented ZnO films with c-axis normal to the substrates can be obtained under a total pressure of 10 mTorr containing 50% argon and 50% oxygen and r.f. power of 70 W for 3 hours. Crystalline structures of the films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The phase velocity, electromechanical coupling coefficient and temperature coefficient of frequency of surface acoustic wave (SAW) devices with ZnO/IDT/PT (IDT, inter-digital transducer; PT, PbTiO3 ceramics) structure were investigated. The devices with ZnO/IDT/PT structure shows that the ZnO film effectively raise the electromechanical coupling coefficient (kappa2) from 3.8% to 9.9% of the device with the concentrations of Sr dopants of 0.15. It also improves the temperature coefficient of frequency of SAW devices.