共查询到20条相似文献,搜索用时 638 毫秒
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高压气体电离室中离子漂移速度的实验测量 总被引:1,自引:1,他引:0
提出了一种在高气压下电离室离子漂移速度的测量方法,进行了理论分析,搭建了实验测量系统。利用DDC112电流积分放大器对充有4MPa氙气的高压气体电离室输出电流脉冲信号分别进行等间隔积分时间和步进积分时间采集测量,根据理论分析对测量数据分别进行二次和三次曲线拟合。通过拟合曲线系数间的比例关系计算出离子漂移时间,根据电离室结构和工作条件计算出4MPa氙气中氙离子迁移率为0.0181~0.0196cm2•V-1•s-1,并外推计算出0.1MPa氙气中氙离子迁移率为0.72~0.78cm2•V-1•s-1,与文献资料中的测量结果一致。 相似文献
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用计算机模拟的方法获得正电子在半导体材料的迁移率,讨论了正电子有效质量,杂质浓度和温度对正电子迁移率的影响。 相似文献
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介绍了中国科学院物理研究所离子束研究室的主要设备、分析方法、离子注入材料改性研究以及近年来在半导体材料、高Tc超导材料、环保等领域中的研究工作。 相似文献
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叙述了100keV金属表面改性离子注入与混合两用机的总体结构及各主要部件的技术参数。该机经过调试各项主要指标已达到设计要求,工作稳定可靠,已开始金属材料表面改性实验。 相似文献
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铬,钽离子束表面冶金合金的抗腐蚀机制 总被引:2,自引:0,他引:2
根据离子束表面冶金的特点,从合金成分、结构、缺陷、元素性质以及表面污染等方面系统地讨论了Cr、Ta元素加入对金属腐蚀行为的影响。在此基础上,提出它们抑制腐蚀的综合模式,较好地解释了这类表面合金抗腐蚀的机制。 相似文献
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Ph. Barberet L. DaudinN. Gordillo S. SorieulM. Simon H. SeznecI. Idarraga S. IncertiA. Balana Ph. Moretto 《Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms》2011,269(20):2163-2167
A high resolution focused beam line has been recently installed on the AIFIRA (“Applications Interdisciplinaires des Faisceaux d’Ions en Région Aquitaine”) facility at CENBG. This nanobeam line, based on a doublet-triplet configuration of Oxford Microbeam Ltd. OM-50™ quadrupoles, offers the opportunity to focus protons, deuterons and alpha particles in the MeV energy range to a sub-micrometer beam spot. The beam optics design has been studied in detail and optimized using detailed ray-tracing simulations and the full mechanical design of the beam line was reported in the Debrecen ICNMTA conference in 2008. During the last two years, the lenses have been carefully aligned and the target chamber has been fully equipped with particle and X-ray detectors, microscopes and precise positioning stages. The beam line is now operational and has been used for its first applications to ion beam analysis. Interestingly, this set-up turned out to be a very versatile tool for a wide range of applications. Indeed, even if it was not intended during the design phase, the ion optics configuration offers the opportunity to work either with a high current microbeam (using the triplet only) or with a lower current beam presenting a sub-micrometer resolution (using the doublet-triplet configuration).The performances of the CENBG nanobeam line are presented for both configurations. Quantitative data concerning the beam lateral resolutions at different beam currents are provided. Finally, the first results obtained for different types of application are shown, including nuclear reaction analysis at the micrometer scale and the first results on biological samples. 相似文献
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