A Bluetooth radio in 0.18-/spl mu/m CMOS

This paper describes the results of an implementation of a Bluetooth radio in a 0.18-/spl mu/m CMOS process. A low-IF image-reject conversion architecture is used for the receiver. The transmitter uses direct IQ-upconversion. The VCO runs at 4.8-5.0 GHz, thus facilitating the generation of 0/spl deg/ and 90/spl deg/ signals for both the receiver and transmitter. By using an inductor-less LNA and the extensive use of mismatch simulations, the smallest silicon area for a Bluetooth radio implementation so far can be reached: 5.5 mm/sup 2/. The transceiver consumes 30 mA in receive mode and 35 mA in transmit mode from a 2.5 to 3.0-V power supply. As the radio operates on the same die as baseband and SW, the crosstalk-on-silicon is an important issue. This crosstalk problem was taken into consideration from the start of the project. Sensitivity was measured at -82 dBm.     

Optimized retrograde N-well for 1-/spl mu/m CMOS technology

Using experiment and simulation, transistors in a high-energy implanted N-well are designed for optimum device performance suitable for 1-/spl mu/m CMOS technology. The effect of process parameters on device performance is obtained. Superior body effect, junction capacitance, punchthrough voltage, and subthreshold slope are achieved for 1-/spl mu/m n- and p-channel transistors. With shallow P/P+ epitaxial material, this retrograde N-well approach also provides latch-up immunity for high-density CMOS.     

G/sub m/-boosted common-gate LNA and differential colpitts VCO/QVCO in 0.18-/spl mu/m CMOS

The demand for radio frequency (RF) integrated circuits with reduced power consumption is growing owing to the trend toward system-on-a-chip (SoC) implementations in deep-sub-micron CMOS technologies. The concomitant need for high performance imposes additional challenges for circuit designers. In this paper, a g/sub m/-boosted common-gate low-noise amplifier (CGLNA), differential Colpitts voltage-controlled oscillators (VCO), and a quadrature Colpitts voltage-controlled oscillator (QVCO) are presented as alternatives to the conventional common-source LNA and cross-coupled VCO/QVCO topologies. Specifically, a g/sub m/-boosted common-gate LNA loosens the link between noise factor (i.e., noise match) and input matching (i.e., power match ); consequently, both noise factor and bias current are simultaneously reduced. A transformer-coupled CGLNA is described. Suggested by the functional and topological similarities between amplifiers and oscillators, differential Colpitts VCO and QVCO circuits are presented that relax the start-up requirements and improve both close-in and far-out phase noise compared to conventional Colpitts configurations. Experimental results from a 0.18-/spl mu/m CMOS process validate the g/sub m/-boosting design principle.     

1.0-/spl mu/m n-Well CMOS/Bipolar Technology

High-performance 1.0-/spl mu/m n-well CMOS/bipolar on-chip technology was developed. For process simplicity, an n-well and a collector of bipolar transistors were formed simultaneously, and base and NMOS channel regions were also made simultaneously resulting in collector-isolated vertical n-p-n bipolar transistor fabrication without any additional process step to CMOS process. On the other hand, 1.0-/spl mu/m CMOS with a new "hot carrier resistant" seIf-defined Polysilicon sidewall spacer (SEPOS) LDD NMOS was developed. It can operate safely under supply voltage over 5 V without performance degradation of CMOS circuits. By evaluating ring oscillators and differential amplifiers constructed by both CMOS and bipolar transistors. it can be concluded that in a digital and in an analog combined system, CMOS has sufficiently high-speed performance for digital parts, while bipolar is superior for analog parts. In addition, bipolar transistors with an n/sup +/-buried layer were also fabricated to reduce collector resistance. Concerning the bipolar input/output buffers, the patterned n/sup +/-buried layer improves the drivability and high-frequency response. As a result, the applications of n-well CMOS/bipolar technology become clear. This technology was successfully applied to a high-speed 64-kbit CMOS static RAM, and improvement in access time was observed.     

10-13.6 Gbit/s 0.18 /spl mu/m CMOS modulator drivers with 8 V/sub PP/ differential output swing

A novel intrinsic drain-gate capacitance (C/sub DG/) feedback network is incorporated into the conventional cascode circuit configuration to implement a 10-13.6 Gbit/s modulator driver. The driver fabricated in 0.18 /spl mu/m CMOS process could generate an 8 V/sub PP/ differential output swing. The power consumption is as low as 0.6 W. The present work shows that the driving capability is greater than the currently reported CMOS drivers.     

Design methodology of a 1.2-/spl mu/m double-level-metal CMOS technology

An advanced high-performance CMOS process and associated gate array and semicustom design approaches are described. Designed for rapid custom application, the process utilizes an n-well 1.2-/spl mu/m gate length and two layers of metal. The gate array has a density of 10000 2-input gates with typical delays of 1.25 ns, while the semicustom approach offers densities of 30000 gates with typical loaded delays of 1.0 ns.     

A low-voltage folded-switching mixer in 0.18-/spl mu/m CMOS

Scaling of CMOS technologies has a great impact on analog design. The most severe consequence is the reduction of the voltage supply. In this paper, a low voltage, low power, AC-coupled folded-switching mixer with current-reuse is presented. The main advantages of the introduced mixer topology are: high voltage gain, moderate noise figure, moderate linearity, and operation at low supply voltages. Insight into the mixer operation is given by analyzing voltage gain, noise figure (NF), linearity (IIP3), and DC stability. The mixer is designed and implemented in 0.18-/spl mu/m CMOS technology with metal-insulator-metal (MIM) capacitors as an option. The active chip area is 160 /spl mu/m/spl times/200 /spl mu/m. At 2.4 GHz a single side band (SSB) noise figure of 13.9 dB, a voltage gain of 11.9 dB and an IIP3 of -3 dBm are measured at a supply voltage of 1 V and with a power consumption of only 3.2 mW. At a supply voltage of 1.8 V, an SSB noise figure of 12.9 dB, a voltage gain of 16 dB and an IIP3 of 1 dBm are measured at a power consumption of 8.1 mW.     

A 0.18-/spl mu/m CMOS bioluminescence detection lab-on-chip

The paper describes a bioluminescence detection lab-on-chip consisting of a fiber-optic faceplate with immobilized luminescent reporters/probes that is directly coupled to an optical detection and processing CMOS system-on-chip (SoC) fabricated in a 0.18-/spl mu/m process. The lab-on-chip is customized for such applications as determining gene expression using reporter gene assays, determining intracellular ATP, and sequencing DNA. The CMOS detection SoC integrates an 8 /spl times/ 16 pixel array having the same pitch as the assay site array, a 128-channel 13-bit ADC, and column-level DSP, and is fabricated in a 0.18-/spl mu/m image sensor process. The chip is capable of detecting emission rates below 10/sup -6/ lux over 30 s of integration time at room temperature. In addition to directly coupling and matching the assay site array to the photodetector array, this low light detection is achieved by a number of techniques, including the use of very low dark current photodetectors, low-noise differential circuits, high-resolution analog-to-digital conversion, background subtraction, correlated multiple sampling, and multiple digitizations and averaging to reduce read noise. Electrical and optical characterization results as well as preliminary biological testing results are reported.     

A matrix amplifier in 0.18-/spl mu/m SOI CMOS

A fully integrated matrix amplifier with two rows and four columns (2-by-4) fabricated in a three-layer metal 0.18-/spl mu/m silicon-on-insulator (SOI) CMOS process is presented. It exhibits an average pass-band gain of 15 dB and a unity-gain bandwidth of 12.5 GHz. The input and output ports are matched to 50 /spl Omega/ using m-derived half sections; the measured S/sub 11/ and S/sub 22/ values exceed -7 and -12 dB, respectively. Integrated in 2.0/spl times/2.9mm/sup 2/, it dissipates 233.4 mW total from 2.4- and 1.8-V power supplies.     

Millimeter-wave voltage-controlled oscillators in 0.13-/spl mu/m CMOS technology

This paper describes the design of CMOS millimeter-wave voltage controlled oscillators. Varactor, transistor, and inductor designs are optimized to reduce the parasitic capacitances. An investigation of tradeoff between quality factor and tuning range for MOS varactors at 24 GHz has shown that the polysilicon gate lengths between 0.18 and 0.24 /spl mu/m result both good quality factor (>12) and C/sub max//C/sub min/ ratio (/spl sim/3) in the 0.13-/spl mu/m CMOS process used for the study. The components were utilized to realize a VCO operating around 60 GHz with a tuning range of 5.8 GHz. A 99-GHz VCO with a tuning range of 2.5 GHz, phase noise of -102.7 dBc/Hz at 10-MHz offset and power consumption of 7-15mW from a 1.5-V supply and a 105-GHz VCO are also demonstrated. This is the CMOS circuit with the highest fundamental operating frequency. The lumped element approach can be used even for VCOs operating near 100-GHz and it results a smaller circuit area.     

An analog GFSK modulator in 0.35-/spl mu/m CMOS

An analog Gaussian frequency shift keying (GFSK) modulator designed in 0.35-/spl mu/m CMOS consumes 600 /spl mu/A from a 3-V supply and realizes an analog implementation of the FM differential equation. The modulator operates at baseband and is intended for use in a direct-conversion Bluetooth transmitter. It achieves a frequency deviation of 160 kHz with better than /spl plusmn/3% accuracy. The modulator implements an amplitude control loop to achieve a well-defined output swing. The total output harmonic distortion is less than 1%.     

Manufacturing enhancements for CoSi/sub 2/ self-aligned silicide at the 0.12-/spl mu/m CMOS technology node

As integrated circuit manufacturing moves to the 0.12-/spl mu/m and finer-line technologies, a more comprehensive understanding of the manufacturability of the cobalt silicide (CoSi/sub 2/) module is needed. In this paper, a detailed study of the manufacturability of cobalt self-aligned silicide (Salicide) for the 0.12-/spl mu/m and finer technology nodes is discussed. Experimental design for the CoSi/sub 2/ processing steps included cobalt (Co), titanium (Ti), and titanium nitride (TiN) depositions; the first and second rapid thermal anneals (RTA1 and RTA2) and the selective metal etch. Grain structure (by X-ray diffraction), surface roughness (by atomic force microscopy), sheet resistance, thickness uniformity and leakage current measurements were taken to characterize the SAlicide process module. The results show that by using a TiN rather than Ti capping layer: a) the CoSi/sub 2/ sheet resistance nonuniformity has been improved; b) the CoSi/sub 2/ thickness is independent of the capping layer thickness; and c) CoSi/sub 2/ to silicon interface roughness is reduced, thus reducing junction leakage currents. Anneal studies indicate the RTA1 temperature dominates the CoSi/sub 2/ grain structure and grain size with higher annealing temperatures resulting in rougher CoSi/sub 2/ surfaces and higher junction leakage currents.     

RF noise in 0.18-/spl mu/m and 0.13-/spl mu/m MOSFETs

Studied the gate finger number and gate length dependence on minimum noise figure (NF/sub min/) in deep submicrometer MOSFETs. A lowest NF/sub min/ of 0.93 dB is measured in 0.18-/spl mu/m MOSFET at 5.8 GHz as increasing finger number to 50 fingers, but increases abnormally when above 50. The scaling gate length to 0.13 /spl mu/m shows larger NFmin than the 0.18-/spl mu/m case at the same finger number. From the analysis of a well-calibrated device model, the abnormal finger number dependence is due to the combined effect of reducing gate resistance and increasing substrate loss as increasing finger number. The scaling to 0.13-/spl mu/m MOSFET gives higher NF/sub min/ due to the higher gate resistance and a modified T-gate structure proposed to optimize the NF/sub min/ for further scaling down of the MOSFET.     

Design considerations for a high-performance 3-/spl mu/m CMOS analog standard-cell library

Several design aspects of a high-performance analog cell library implemented in 3-/spl mu/m CMOS are described, including an improved central biasing scheme, a circuit for high-swing cascode biasing, an impact ionization shielding technique, and a family of operational transconductance amplifiers including a precision low offset-voltage amplifier utilizing lateral bipolar transistors.     

A low-power oscillator mixer in 0.18-/spl mu/m CMOS technology

A downconversion double-balanced oscillator mixer using 0.18-/spl mu/m CMOS technology is proposed in this paper. This oscillator mixer consists of an individual mixer stacked on a voltage-controlled oscillator (VCO). The stacked structure allows entire mixer current to be reused by the VCO cross-coupled pair to reduce the total current consumption of the individual VCO and mixer. Using individual supply voltages and eliminating the tail current source, the stacked topology requires 1.0-V low supply voltage. The oscillator mixer achieves a voltage conversion gain of 10.9 dB at 4.2-GHz RF frequency. The oscillator mixer exhibits a tuning range of 11.5% and a single-sideband noise figure of 14.5 dB. The dc power consumption is 0.2 mW for the mixer and 2.94 mW for the VCO. This oscillator mixer requires a lower supply voltage and achieves a higher operating frequency among recently reported Si-based self-oscillating mixers and mixer oscillators. The mixer in this oscillator mixer also achieves a low power consumption compared with recently reported low-power mixers.     

Robust sound localization in 0.18 /spl mu/m CMOS

This paper presents a hardware implementation of a sound localization algorithm that localizes a single sound source by using the information gathered by two separated microphones. This is achieved through estimating the time delay of arrival (TDOA) of sound at the two microphones. We have used a TDOA algorithm known as the "phase transform" to minimize the effects of reverberations and noise from the environment. Simplifications to the chosen TDOA algorithm were made in order to replace complex operations, such as the cosine function, with less expensive ones, such as iterative additions. The custom digital signal processor implementing this algorithm was designed in a 0.18-/spl mu/m CMOS process and tested successfully. The test chip is capable of localizing the direction of a sound source within 2.2/spl deg/ of accuracy, utilizing approximately 30 mW of power and 6.25 mm/sup 2/ of silicon area.     

A fully integrated SOC for 802.11b in 0.18-/spl mu/m CMOS

A fully integrated system-on-a-chip (SOC) intended for use in 802.11b applications is built in 0.18-/spl mu/m CMOS. All of the radio building blocks including the power amplifier (PA), the phase-locked loop (PLL) filter, and the antenna switch, as well as the complete baseband physical layer and the medium access control (MAC) sections, have been integrated into a single chip. The radio tuned to 2.4 GHz dissipates 165 mW in the receive mode and 360 mW in the transmit mode from a 1.8-V supply. The receiver achieves a typical noise figure of 6 dB and -88-dBm sensitivity at 11 Mb/s rate. The transmitter delivers a nominal output power of 13 dBm at the antenna. The transmitter 1-dB compression point is 18 dBm and has over 20 dB of gain range.     

An enhanced fully scaled 1.2-/spl mu/m CMOS process for analog

An n-well CMOS technology has been developed for high-speed/precision 10-V analog operation while retaining VLSI packaging densities and performance. Several enhancements to a fully scaled 1.2-/spl mu/m CMOS process were made to attain performance levels necessary for state-of-the-art data-conversion applications. The technology incorporates components essential for analog circuit design such as high-gain/low-noise n-p-n BJTs, laser trimmable Cr-Si resistors, and extremely accurate interpoly oxide capacitors. Inclusion of an optimized LDD structure on n-channel transistors has permitted 10-V CMOS capabilities down to 2.5-/spl mu/m drawn gate lengths.     

A self-testing 2-/spl mu/m CMOS chip set for FFT applications

A chip set for high-speed radix-2 fast Fourier transform (FFT) applications up to 512 points is described. The chip set comprises a (16+16)/spl times/(12+12)-bit complex number multiplier, and a 16-bit butterfly chip for data reordering, twiddle factor generation, and butterfly arithmetic. The chips have been implemented using a standard cell design methodology on a 2-/spl mu/m bulk CMOS process. Three chips implement a complex FFT butterfly with a throughput of 10 MHz, and are cascadable up to 512 points. The chips feature an offline self-testing capability.     

Monolithically integrated boost Converter Based on 0.5-/spl mu/m CMOS Process

Today and in the future, a huge market arises for mobile power . Efficient performance, functionality, small profile and low cost are the most desired features for mobile power management integrated circuits. Compared with the discrete-switching dc-dc converter, monolithic integration offers many benefits and new design challenges. In this paper, a monolithically integrated high-efficiency boost dc-dc converter for nickel metal hydride or alkaline battery-powered applications is designed based on the low-voltage CMOS process. Several novel concepts are proposed for compensator design, low-voltage startup, light-load efficiency and power device optimization.