InGaN/GaN多量子阱LED的电特性研究

针对InGaN/GaN多量子阱LED,分析了占据能态高于势垒的载流子和低于势垒的载流子参与的电流输运机制,从而推导出对应能态电流输运机制下的电流-电压关系,以及理想因子与温度的变化规律.实验结果证实,在低注入强度下,由材料缺陷引入的深能级辅助隧穿输运机制占主导,电流电压特性符合相应的推导结果,随着注入强度的增大,参与扩散-复合输运机制的载流子逐渐增加,温度对输运机制的影响逐渐增大.     

极化效应对氮化镓型LED性能影响分析北大核心

对氮化镓(InGaN/GaN)型MQW(多量子阱)结构的蓝宝石衬底LED(发光二极管)受自发和压电极化效应的影响进行了研究。为了分析LED的输出特性,利用MATLAB软件对传统水平结构的InGaN/GaN型MQW蓝光LED芯片进行了模拟。研究表明,LED各个界面极化电荷同比例增加能稍微改善LED的电学特性,但却显著降低了LED的光输出功率和内量子效率,这主要是由于界面电荷改变了能带结构,阻碍了空穴的扩散与漂移,降低了辐射复合系数。可以通过改变位错密度来降低极化电荷对LED的影响,改善LED的性能。     

宽带隙半导体材料光电性能的测试

主要通过光致发光的实验手段,研究分析了在自支撑GaN衬底上生长的InGaN/GaN多量子阱(InGaN/GaN MQW)有源层中的载流子复合机制,实验中发现多量子阱的光致发光光谱中有一个与有源区中的深能级相关的额外的发光峰。在任何温度大功率激发条件下,自由激子的带边复合占主导地位,并且带边复合的强度随温度或激发功率的下降而减弱;在室温以下小功率激发条件下,局域化能级引入的束缚激子复合占主导地位,其复合强度随温度的下降而单调上升,随激发功率的下降而上升。带边复合在样品温度上升或者激发功率变大时发生蓝移,而局域的束缚激子复合辐射的峰值波长,随样品温度和激发功率的变化没有明显变化。     

纳米柱InGaN/GaN多量子阱的干法刻蚀制备技术

纳米柱GaN基多量子阱(MQW)拥有量子尺寸效应以及应变释放等特性,对于提高GaN基发光二极管(LED)的发光效率具有重要意义.采用快速热退火(RTA)形成的自组装Ni纳米颗粒作为刻蚀掩膜,利用电感耦合等离子体反应离子刻蚀(ICP-RIE)制备纳米柱InGaN/GaN MQW.通过改变RTA温度发现在800℃以上才能有效形成Ni纳米颗粒掩膜.不同的ICP和射频(RF)功率条件下制备的纳米柱MQW光致发光强度相比于相同结构的平面MQW会发生显著变化.通过优化ICP-RIE的刻蚀条件,可以获得发光强度显著提高的纳米柱MQW结构.同时,纳米柱MQW中压电极化场的减弱会形成光致发光峰位蓝移.     

（英）中红外量子级联激光器输运特性的仿真

基于一种非局域化的输运模型,对不同结构不同温度下的中红外量子级联激光器的输运特性进行了仿真。在这个模型中,利用量子隧穿、微带隧穿以及热载流子输运等长程载流子输运模型,对传统的扩散-漂移方程进行了矫正.并将基于上述集成模型的计算结果和实验结果进行了比较,通过拟合参数的合理设置,计算结果和实验结果得到了很好的吻合.     

InGaN/GaN超晶格垒层用于InGaN发光二极管发光增强研究

设计了InGaN/GaN超晶格垒层替代p-GaN和n-GaN附近传统GaN垒层的InGaN/GaN多量子阱(MQW)发光二极管(LEDs)结构。通过数值方法模拟出两种LED结构的光功率-电压(L-V)曲线、电致发光(EL)谱、能带图、电子浓度分布和辐射复合速率。结果表明InGaN/GaN超晶格替代n-GaN附近GaN垒层的LED结构比替代p-GaN附近GaN垒层的LED显示出更高的发光强度。这种发光增强的原因是InGaN/GaN超晶格替代n-GaN附近GaN垒层可以提高电子注入效率和辐射复合速率。     

p型InGaN/GaN超晶格N面GaN基LED的光电特性

随着氮(N)面GaN材料生长技术的发展,基于N面GaN衬底的高亮度发光二极管(LED)的研究具有重要的科学意义.研究了具有高发光功率的N面GaN基蓝光LED的新型结构设计,通过在N面LED的电子阻挡层和多量子阱有源层之间插入p型InGaN/GaN超晶格来提高有源层中的载流子注入效率.为了对比N面GaN基LED优异的器件性能,同时设计了具有相同结构的Ga面LED.通过对两种LED结构的电致发光特性、有源层中能带图、电场和载流子浓度分布进行比较可以发现,N面LED在输出功率和载流子注入效率上比Ga面LED有明显的提升,从而表明N面GaN基LED具有潜在的应用前景.     

AlGaN/GaN和AlGaN SBD的温度特性研究

研究了AlGaN/GaN异质结构上的肖特基接触的基本原理及载流子的高温输运特性.将AlGaN/GaN异质结SBD和AlGaN SBD,在27～250℃进行实验比较.发现随着温度上升,AlGaN SBD的势垒高度下降,理想因子增加,其影响因素包括热电子发射、场发射、隧穿效应及复合电流效应等机制.而AlGaN/GaN异质结SBD由于受到压电极化场和2DEG和的影响,其势垒高度和理想因子随温度的变化趋势与AlGaNSBD相反.实验结果还显示,AlGaN/GaN异质结SBD的反向电流随着温度的上升,呈现先增大后减小的趋势.     

GaN高压LED在极小电流与极低温度下的光电特性

在图形化蓝宝石衬底上制备了串联结构的氮化镓(GaN)高压发光二极管(LED),分别在极小电流与极低温度下研究了其光电特性。结果表明,在极小电流区(I<1×10-8 A),主要输运机制为缺陷辅助隧穿。由于能带热收缩效应和辐射复合中心的热激活效应,随着温度升高,电致发光(EL)峰发生红移,半高宽(FWHM)增加;光输出强度与注入电流呈幂指数关系,表明极小电流下非辐射复合占主导,且载流子通过缺陷辅助隧穿至量子阱。在极低温度下(T~40 K)仍能观测到电致发光现象,表明载流子并未被完全冻析,在强场下可由施主态或受主态通过缺陷辅助隧穿至量子阱;随着注入电流增加,注入电荷的库伦电场对极化电场的屏蔽作用增强,导致发光峰发生明显的蓝移,能带填充效应则导致半高宽增加。     

InGaN/GaN MQW双波长LED的MOCVD生长

利用金属有机物化学气相淀积(MOCVD)系统生长了InGaN/GaN多量子阱双波长发光二极管(LED).发现在20 mA正向注入电流下空穴很难输运过蓝光和绿光量子阱间的垒层,这是混合量子阱有源区获得双波长发光的主要障碍.通过掺入一定量的In来降低蓝光和绿光量子阱之间的垒层的势垒高度,增加注入到离p-GaN层较远的绿光有源区的空穴浓度,从而改变蓝光和绿光发光峰的强度比.研究了蓝光和绿光量子阱间垒层In组分对双波长LED的发光性质的影响.此外,研究了双波长LED发光特性随注入电流的变化.     

InGaN/GaN多量子阱纳米线发光二极管制备及研究

用SiO2纳米图形层作为模板在以蓝宝石为衬底的n-GaN单晶层上制备了InGaN/GaN多量子阱纳米线,并成功实现了其发光二极管器件(LED).场发射扫描电子显微镜(FESEM)的测量结果表明,InGaN/GaN多量子阱纳米线具有光滑的表面形貌和三角形的剖面结构.室温下阴极射线荧光谱(CL)的测试发现了位于461 nm...     

Luminescence properties of blue and green dual wavelength InGaN/GaN multi-quantum well light-emitting diode

Blue and green dual wavelength InGaN/GaN multi-quantum well (MQW) light-emitting diode (LED) has wide applications in full color display, monolithic white LED and solid state lighting, etc. Blue and green dual wavelength LEDs, which consist of InGaN strain-reduction layer, green InGaN/GaN MQW and blue InGaN/ GaN MQW, were grown by metal-organic chemical vapor deposition (MOCVD), and the luminescence properties of dual wavelength LEDs with different well arrangements were studied by photoluminescence and electrolumines-cence. The experimental results indicated that well position played an important role on the luminescence evolvement from photoluminescence to electroluminescence.     

Diffusion and tunneling currents in GaN/InGaN multiple quantum welllight-emitting diodes

We have studied the electrical characteristics and optical properties of GaN/InGaN multiple quantum well (MQW) light-emitting diodes (LEDs) grown by metalorganic chemical vapor deposition. It appears that there is an essential link between material quality and the mechanism of current transport through the wide-bandgap p-n junction. Tunneling behavior dominates throughout all injection regimes in a device with a high density of defects in the space-charge region, which act as deep-level carrier traps. However, in a high-quality LED diode, temperature-dependent diffusion-recombination current has been identified with an ideality factor of 1.6 at moderate biases. Light output has been found to follow a power law, i.e., L ∝ I^m in both devices. In the high-quality LED, nonradiative recombination centers are saturated at current densities as low as 1.4 × 10^-2 A/cm². This low saturation level indicates that the defects in GaN, especially the high density of edge dislocations, are generally optically inactive     

Temperature dependence of performance of InGaN/GaN MQW LEDs with different indium compositions

The temperature dependence of performance of InGaN/GaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) with different indium compositions in the MQWs was investigated. With increasing In composition in the MQWs, the optical performance of the LEDs at room temperature was increased due to an increase in the localized energy states caused by In composition fluctuations in MQWs. As the temperature was increased, however, the decrease in output power for LED with a higher In composition in the MQWs was higher than that of LED with a lower In composition in the MQWs. This could be due to the increased nonradiation recombination through the high defect densities in the MQWs resulted from the increased accumulation of strain between InGaN well and GaN barrier.     

Temperature-dependent light-emitting characteristics of InGaN/GaN diodes

Temperature-dependent light-emitting and current-voltage characteristics of multiple-quantum well (MQW) InGaN/GaN blue LEDs were measured for temperature ranging from 100 to 500 K. The measurement results revealed two kinds of defects that have pronounced impact on the electroluminescent (EL) intensity and device reliability of the LEDs. At low-temperature (<150 K), in addition to the carrier freezing effect, shallow defects such as nitrogen vacancies or oxygen in nitrogen sites can trap the injected carriers and reduces the EL intensity. At high temperature (>300 K), deep traps due to the structure dislocations at the interfaces significantly reduce the efficiency for radiative recombination though they can enhance both forward and reverse currents significantly. In addition, the significant enhancement of trap-assisted tunneling current causes a large heat dissipation and results in a large redshift of the emission peak at high temperature.     

红橙光InGaN/GaN量子阱的结构与光学性质研究

采用金属有机物化学气相沉积(MOCVD)技术生长了具有高In组分InGaN阱层的InGaN/GaN多量子阱(MQW)结构,高分辨X射线衍射(HRXRD)ω-2θ扫描拟合得到阱层In含量28%。比较大的表面粗糙度表明有很大的位错密度。室温下光致荧光(PL)研究发现该量子阱发射可见的红橙光,峰位波长在610 nm附近。变温PL(15～300 K)进一步揭示量子阱在低温下有两个发光机制,对应的发射峰波长分别为538 nm和610 nm。由于In分凝和载流子的局域化导致的载流子动力改变,使得量子阱PL发光峰值随温度增加呈明显的"S"变化趋势。     

预应变InGaN/GaN多量子阱发光特性调控研究

为了减弱InGaN/GaN量子阱内的压电极化场,在蓝紫光InGaN/GaN多量子阱激光器结构中采用了预应变InGaN插入层,通过变温电致发光和高分辨X射线衍射测量研究了预应变插入层对量子阱晶体质量和发光特性的影响。实验结果显示,常温下有预应变层的量子阱电致发光谱积分强度显著提高。模拟计算进一步表明,预应变层对量子阱内压电极化场有调制效果,有利于量子阱中的应力弛豫,可以有效减弱量子限制斯塔克效应,有助于提高量子阱的发光效率。     

Temperature-dependent electroluminescence in InGaN/GaN multiple-quantum-well light-emitting diodes

We present a comparative study on temperature dependence of electroluminescence (EL) of InGaN/GaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) with identical structure but different indium contents in the active region. For the ultraviolet (UV) and blue LEDs, the EL intensity decreases dramatically with decreasing temperature after reaching a maximum at 150 K. The peak energy exhibits a large redshift in the range of 20–50 meV with a decrease of temperature from 200 K to 70 K, accompanying the appearance of longitudinal-optical (LO) phonon replicas broadening the low energy side of the EL spectra. This redshift is explained by carrier relaxation into lower energy states, leading to dominant radiative recombination at localized states. In contrast, the peak energy of the green LED exhibits a minimal temperature-induced shift, and the emission intensity increases monotonically with decreasing temperature down to 5 K. We attribute the different temperature dependences of the EL to different degrees of the localization effects in the MQW regions of the LEDs.     

Frequency and temperature dependences of capacitance-voltage characteristics of InGaN/GaN light-emitting structures with multiple quantum wells

A frequency dependence of capacitance-voltage (C–V) characteristics in multiple quantum well InGaN/GaN heterostructures in the range of 60 Hz-5 MHz is investigated at temperatures from 77 to 300 K. It is found that temperature lowering and test frequency increase lead to the similar changes in obtained apparent carrier distributions. It is shown that commonly used conditions for capacitance-voltage profiling of InGaN/GaN LEDs correspond to an intermediate case between low- and high-frequency capacitance approximations. At all temperatures investigated, the edge low-frequency capacitance-voltage profiles are experimentally reached and found to be identical. The process of attainment of equilibrium of the charges in the active region is most likely determined by tunneling of the carriers through the barriers.     

Enhanced output power in an InGaN-GaN multiquantum-welllight-emitting diode with an InGaN current-spreading layer

InGaN-GaN multiple quantum-well (MQW) light-emitting diodes (LEDs) with InGaN current-spreading layer were grown by metal-organic vapor-phase epitaxy (MOVPE) and their characteristics were evaluated by current-voltage (I-V), as well as output power measurements. Experimental results indicate that the LEDs exhibited a higher output power and a lower operation voltage than that of conventional LEDs. The external quantum efficiency of InGaN-GaN MQW LEDs for bare chips operated at injection current of 20 mA with InGaN current spreading layer near 5%. This is two times higher than that of conventional LEDs. This could be tentatively attributed to the better current-spreading effect resulting from Si-doped In_0.18Ga_0.82N wide potential well in which electron states are not quantized