ZnGa2O4 thin films fabricated by Sol-gel spinning coating process

ZnGa₂O₄ thin film phosphors have been synthesized on ITO coated glass and soda-lime glass at a firing temperature of 500^∘C and an annealing temperature of 500^∘C and 600^∘C via a chemical solution method using Zinc acetate dihydrate, Gallium nitrate hydrate and 2-methoxiethanol as a solution. XRD patterns of the film phosphors synthesized showed the peaks of ZnGa₂O₄ crystalline phases. AFM surface morphologies of the ZnGa₂O₄ thin film phosphors revealed marked differences according to an annealing temperature of 500^∘C and 600^∘C under an annealing atmosphere (3% H₂/Ar). On the other hand, the sheet resistance of ZnGa₂O₄ thin film phosphors, which were measured by four-point probe instrument, was approximately 5.76 Ω /square and 7.86 Ω /square with annealing temperature, respectively. The ZnGa₂O₄ thin film phosphors exhibited blue emission spectra with peak wavelength of 434 nm and 436 nm by ultra-violet excitation around 230 nm.     

Characteristics of ZnGa2O4 phosphors synthesized by solution combustion method

ZnGa₂O₄ phosphors were synthesized by both SCM (solution combustion method) and SSRM (solid state reaction method). The characteristics of the both ZnGa₂O₄ phosphors were investigated by TGA (Thermogravimetric analysis), SEM (scanning electron microscope), BET (Brunauer Emmett Teller), PL (photoluminescence) and XRD (X-ray diffraction). The particle size of SCM phosphor was about one-hundredth of SSRM phosphor. The PL intensity of SCM phosphor was about 1.5 fold higher than that of SSRM phosphor. The SCM phosphor was also tried to be doped with Mn⁺² ions. The highest PL peak was observed with Mn⁺² ions of 0.003 mole fraction. The peak was shifted from blue (470 nm) to green (513 nm) color. These results might be very useful for high efficiency phosphors for displays such as field emission displays and plasma display panels.     

Laser ablation preparation and property of bismuth-layer-structured SrBi2Ta2Ta2O9 and Bi4Ti3O12 ferroelectric thin films

Abstract

Bismuth-layer-structured ferroelectric thin films, SrBi₂Ta₂O₉ and Bi₄Ti₃O₁₂, have been prepared by laser ablation method on both Pt sheets and Si wafers at low temperatures of 400 ～ 500°C. These thin films have been characterized by XRD, XPS, AFM, C-V, D-E hysteresis and J-V measurement. SrBi₂Ta₂O₉ thin films have a good (105) preferential orientation, and Bi₄Ti₃O₁₂ thin films have (117) and c-axis orientation on these substrates. Ferroelectric film-SiO₂-Si structures show good C-V hysteresis curve owing to Si surface potential controlled by the D-E hysteresis. D-E hysteresis is obtained in Bi₄Ti₃O₁₂ thin film prepared on Pt sheet, and the remnant polarization and the coercive force are 7.5 μC/cm² and 72 kV/cm, respectively.     

Growth and characterization of non-c-axis-oriented SrBi2Ta2O9 epitaxial thin films on Si(100) substrates with SrRuO3 bottom electrodes

Abstract

We have successfully grown non-c-axis-oriented epitaxial ferroelectric SrBi₂Ta₂O₉ (SBT) films with (116) and (103) orientations on Si(100) substrates using epitaxial (110)- and (111)-oriented SrRuO₃ (SRO) bottom electrodes, respectively. The SRO orientations have been induced by coating the Si(100) substrates with epitaxial YSZ(100) and MgO(111)/ YSZ(100) buffer layers, respectively. All films were sequentially grown by pulsed laser deposition. Specific in-plane orientations of the epitaxial SBT films were found, which are in turn determined by specific in-plane orientations of the epitaxial SRO bottom electrodes. These include a diagonal rectangle-on-cube epitaxy of SRO(110) on YSZ(100) and a triangle-on-triangle epitaxy of SRO(111) on MgO(111).     

Characterization of the CeO2 thin films for insulation layer and Pt/SrBi2Ta2O9/CeO2/Si MFISFET structure

Abstract

CeO₂ and SrBi₂Ta₂O₉ (SBT) thin films for MFISFET (metal-fcrroelectrics-insulator-semiconductor field effect transistor) were deposited by rf sputtering and pulsed laser deposition method, respectively. The effects of oxygen partial pressure during deposition for CeO₂ films were investigated. The oxygen partial pressure significantly affected the preferred orientation, grain size and electrical properties of CeO₂ films. The CeO₂ thin films with a (200) preferred orientation were deposited on Si(100) substrates at 600°C. The films deposited under the oxygen partial pressure of 50 % showed the best C-V characteristics among those under various conditions. The leakage current density of films showed order of the 10^?7～10^?8 A/cm² at 100 kV/cm. The SBT thin films on CeO₂/Si substrate showed dense microstructure of polycrystalline phase. From the C-V characteristics of MFIS structure composed of the SBT film annealed at 800°C, the memory window width was 0.9 V at ±5 V. The leakage current density of Pt/SBT/CeO₂/Si structure annealed at 800°C was 4×10^?7 A/cm² at 5 V.     

Growth and characterization of epitaxial SrBi2Ta2O9 films on (110) SrTiO3 substrates

Abstract

SrBi₂Ta₂O₉ (SBT) is an attractive material for nonvolatile ferroelectric memory applications. In this paper we report on the deposition of highly epitaxial and smooth SrBi₂Ta₂O₉ films on (110) SrTiO₃substrates. The films were grown by pulsed laser deposition at temperatures ranging from 600 to 800°C and at various laser fluences from a Bi-excess SBT target. The background oxygen pressure was maintained at 28 Pa during the film deposition. Structural characterization of the films was performed by x-ray diffraction. Atomic force microscopy was used to investigate morphology and growth of the films. The films grew with preferred (115) or (116) orientation. The roughness was of the order of unit cell height. The films display a growth pattern resulting in corrugated film morphology.     

Epitaxial recrystallization and luminescence of CaAl2O4:Eu2+ thin films prepared on sapphire substrates

Eu²⁺ doped CaAl₂O₄ thin films were prepared on c-, a-, and r-plane sapphire substrates by a sputtering method, and then post-annealed for the recrystallization. Post-annealed films have out-of-plane epitaxial orientations of (010) and (001) CaAl₂O₄ on c- and a-plane sapphire substrates, respectively, whereas the films on r-plane were composed of two epitaxial phases of (210) CaAl₂O₄ and (210) CaAl₄O₇. In-plane relationships between films and substrates were also determined by an X-ray pole figure method, demonstrating that the films were epitaxially recrystallized, but not single crystals. The emission wavelengths were independent of the orientations of epitaxial films, showing a blue emission at 448 nm under 325 nm excitation, but the emission intensity depended on the film structure.     

Phase Formations and Electrical Properties of Various (Bi, La)4Ti3O12 Thin Films by Chemical Solution Deposition

The phase formation and electrical properties of (Bi, La)₄Ti₃O₁₂ (BLT) thin film and V-, Sm-doped BLT thin films prepared by the chemical solution deposition method on Pt/TiO₂/SiO₂/Si substrates have been investigated. It was observed that the microstructure and electrical properties of BLT thin films dramatically varied with V- and Sm-doping. The crystallinity and grain size of BLT thin films were definitely increased by V- and Sm-doping into BLT films, which resulted in the enhancement of remanent polarization in doped BLT films. The remanent polarization (Pr) of Sm-doped BLT films annealed for 3 min by an RTA system was about 9 C/cm². The V- and Sm-doped BLT films also exhibited good fatigue characteristics under bipolar stressing to 10¹⁰ cycles.     

Preparation of BaPbO3 Electrode Thin Films by RF Magnetron Sputtering

For electrode materials of Pb(Zr,Ti)O₃ (PZT) thin films in ferroelectric random access memory (FeRAM), various materials have been studied. As new electrode material with which the polarization and fatigue properties are improved, we take notice of barium metaplumbate BaPbO₃ (BPO). Because the BPO contained lead (Pb) and oxygen is conductor that adopted same perovskite structure as PZT. BPO thin films were prepared by rf magnetron sputtering on various substrates. (SiO₂/Si, MgO, Al₂O₃ and Pt-coated substrates), and influence of growth conditions (sputtering gas, rf power, the substrate-heating temperature and post anneals) on crystallization and conductivity were investigated. In case of post anneal after sputtering at room temperature, perovskite single phase was obtained above 400°C. In case of substrate heating while sputtering, without post anneal, perovskite single phase was obtained at 350–500°C on SiO₂/Si substrates (110) preferred orientation BPO films obtained at low temperature, and resistivity of the films decreased at decreasing sputtering temperature. Resistivity of the film at substrate temperature 350°C was 3 × 10^?3 Ω cm. In the case of single crystal substrate, the BPO films were epitaxially grown. Orientation of the films was varied with the sputtering condition. The epitaxial PZT thin films were also grown on the BPO, revealing that PZT(111)[011] //BPO(111)[011] //Pt(100)[011] //MgO(100)[011] and PZT(111)[011] //BPO(111)[011] //Pt(111)[011] //Al₂O₃(001)[100] structures were obtained, and their ferroelectric properties were also evaluated.     

Low temperature preparation of ferroelectric SrBi2Ta2O9 thin films by a modified RF magnetron sputtering technique

Abstract

Bi–layered ferroelectric SrBi₂Ta₂O₉ (SBT) films were successfully prepared on Pt/Ti/SiO₂/Si substrates at 650°C by a modified rf magnetron sputtering technique. The SBT films annealed for 1 h in O₂ (760 torr) and again for 30 min in O₂ (5 torr) at 650°C show a average grain size of about 49 nm. The SBT films annealed at 65 0°C have a remanent polarization (P_r) of 6.0 μC/cm² and coercive field (E_c) of 36 kV/cm at an excitation voltage of 5 V. The films showed fatigue–free characteristics up to 4.0 × 10¹⁰ switching cycles under 5 V bipolar pulse. The retention characteristics of SBT films looked very promosing up to 1.0 × 10⁵ s.     

Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)

Ga₂O₃ and Ga₂O₃-TiO₂ (GTO) nano-mixed thin films were prepared by plasma enhanced atomic layer deposition with an alternating supply of reactant sources, [(CH₃)₂GaNH₂]₃, Ti(N(CH₃)₂)₄ and oxygen plasma. The uniform and smooth Ga₂O₃ and GTO thin films were successfully deposited. Excellent step coverage of these films was obtained by chemisorbed chemical reactions with oxygen plasma on the surface. The dielectric constant of GTO thin film definitely increased compared to Ga₂O₃ film, and the leakage currents of GTO films were comparable to Ga₂O₃ films. The leakage current density of a 40-nm-GTO film annealed at 600^∘C was approximately 1×10⁻⁷ A/cm² up to about 600 kV/cm.     

Synthesis and properties of ferroelectric Si-doped (Bi, Nd)4Ti3O12 thin films by chemical solution deposition

Ferroelectric Si-doped (Bi,Nd)₄Ti₃O₁₂ thin films have been prepared on Pt/TiO_x/SiO₂/Si substrates through metal-organic compounds by the chemical solution deposition. The Bi_3.25Nd_0.75Ti_2.9Si_0.1O₁₂ (BNTS) precursor films were found to crystallize into the Bi-layered perovskite Bi₄Ti₃O₁₂ single-phase above 600^∘C. The synthesized BNTS films revealed a random orientation having a strong 117 reflection. The BNTS thin films prepared between 600^∘C and 700^∘C showed well-saturated P-E hysteresis loops with P _r of 13–14 μ C/cm² and E _c of 100–110 kV/cm at an applied voltage of 5 V. The surface roughness of the BNTS thin films was improved by Si doping compared with that of undoped Bi_3.35Nd_0.75Ti₃O₁₂ films.     

Preparation of Epitaxial Bi4Ti3O12 Thin Films on LaAlO3(012) Substrates by a Spin Coating-Pyrolysis Process

Bismuth titanate Bi₄Ti₃O₁₂ thin films were prepared on LaAlO₃(012) substrates by a spin coating-pyrolysis process using metal naphthenates as starting materials. The c-axis oriented Bi₄Ti₃O₁₂ thin films, which contained no second phases as –2 scans, were obtained by heat-treatment in air at temperatures of 600°C and above. X-ray diffraction pole-figure analysis showed that the Bi₄Ti₃O₁₂ thin film has an epitaxial relationship with the LaAlO₃ substrate.     

Ferroelectric Properties of (Bi, Sm)4Ti3O12 (BST) Thin Films Fabricated by a Metalorganic Solution Deposition Method

Ferroelectric properties of samarium substituted Bi₄Ti₃O₁₂ films, Bi_3.15Sm_0.85Ti₃O₁₂ (BST), were evaluated for use as lead-free thin film ferroelectrics for FeRAM applications. The BST films were fabricated on the Pt/Ti/SiO₂/Si(100) substrates by a metalorganic solution deposition method. The measured XRD patterns revealed that the BST films showed only a Bi₄Ti₃O₁₂-type phase with a random orientation. The BST film capacitors showed excellent ferroelectric properties. For the film capacitor annealed at 700C, 2P_r of 64.2 C/cm² and 2E_c of 101.7 kV/cm at applied electric field of 150 kV/cm were observed. The capacitor did not show any significant fatigue up to 1.5 × 10⁸ read/write switching cycles at a frequency of 1 MHz, which suggests that the samarium should be considered for a promising lanthanide elements to make a good thin ferroelectric film for memory applications.     

Preparation of SrBi2Ta2O9 ferroelectric thin film by rf magnetron sputtering

Abstract

SrBi₂Ta₂O₉ (SBT) thin films were deposited on 6-inch Pt/Ti/SiO₂/Si substrates by rf magnetron sputtering using a 12-inch ceramic SBT single target. It is found that several sputtering parameters such as argon (Ar) pressure and rf power were very effective to control the Bi content of SBT thin films which is essential for obtaining good ferroelectric properties.     

Microstructural Properties of Ba0.6Sr0.4TiO3/RuO2 Multi-Layers Grown on MgO and YSZ by Pulsed-Laser Deposition

The microstructure of Ba_0.6Sr_0.4TiO₃ (BST)/RuO₂ multi-layers grown on (100) MgO and (100) YSZ substrates, respectively, by pulsed-laser deposition (PLD) has been studied by transmission electron microscopy (TEM) and high-resolution electron microscopy (HREM). The RuO₂ films deposited at 700°C adopt epitaxial relationships with both substrates. The epitaxial films on (100) MgO consist of two variants with an orientation relationship given by (110) RuO₂//(100) MgO and [001] RuO₂//[011] MgO. The epitaxial films on (100) YSZ contain four variants with an orientation relationship given by (200) RuO₂//(100) YSZ and [011] RuO₂//[001] YSZ. The BST films deposited on the RuO₂ electrode are epitaxial on the (200) RuO₂ films deposited on YSZ, and non-epitaxial on the (110) RuO₂ films deposited on MgO. The epitaxial relationship between the BST and (200) RuO₂ films can be described as (111) BST//(200) RuO₂ and [1&1macr;0] BST//[011] RuO₂. The BST films contain at least four variants. The growth and microstructural properties of the multi-layer structures can be understood based on geometrical consideration of the crystal structures.     

YBa2Cu3O7-x/SrTiO3//LaAlO3 heterostructures obtained by injection MOCVD

Abstract

YBa₂Cu₃O_7-x /Ba_xSr_1-xTiO₃ /LaAlO₃ heterostructures can be used as a basis for devices with voltage control in microwave circuits.

Ba_xSr_1-xTiO₃ (x=0–0.1) (BST) thin films have been epitaxially grown on LaAlO₃ substrates using injection MOCVD. The excellent crystalline quality of the obtained BST films can be proven by a FWHM of <0,2° for the rocking curve of the (002) BST reflection. An AFM study revealed flat surfaces, showing a surface roughness R_s as low as 1nm. YBa₂Cu₃O_7-x/Ba_xSr_1-x TiO₃//LaAlO₃ heterostructures were than optimised. The YBa₂Cu₃O_7-x (YBCO) layers obtained on Ba_xSr_1-xTiO₃ films are epitaxial with a FWHM of 0.45° for the (005) YBCO rocking curve and display very promising superconducting properties of T_c=92K.

Finally the microwave properties of the superconducting films were studied. For YBa₂Cu₃O_7-x layers directly deposited on LaAlO₃, surface resistance values of 0,32mΩ were obtained, while for YBa₂Cu₃O_7-x /SrTiO₃//LaAlO₃ heterostructures, higher values of 1mΩ at 8.5GHz were measured.     

The Effect of La-Doped Bi4Ti3O12 Buffer Layer on Crystallinity and Ferroelectric Properties of PbZr0.58Ti0.42O3/Bi3.25La0.75Ti3O12 Multilayered Thin Films

PbZr_0.58Ti_0.42O₃ (PZT) ferroelectric thin films with Bi_3.25La_0.75Ti₃O₁₂ (BLT) buffer layer of various thickness were fabricated on Pt/TiO₂/SiO₂/p-Si(100) substrates by rf-magnetron sputtering method. The pure PZT film showed (111) preferential orientation in the XRD patterns, and the PZT/BLT films showed (110) preferential orientation with increasing thickness of the BLT layer. There were no obvious diffraction peaks for the BLT buffer layer, for its thin thickness in PZT/BLT multilayered films. There were the maximum number of largest-size grains in PZT/BLT(30 nm) film among all the samples from the surface images of FESEM. The growth direction and grain size had significant effects on ferroelectric properties of the multilayered films. The fatigue characteristics suggested that 30-nm-thick BLT was just an effective buffer layer enough to alleviate the accumulation of oxygen vacancies near the PZT/BLT interface. The comparison of these results suggests that the buffer layer with an appropriate thickness can improve the ferroelectric properties of multilayered films greatly.     

Low Temperature Process for Synthesis of (100) Textured Pb(Zr0.48Ti0.52)O3 Thin Films on Si Substrate by Laser Lift-Off Transferring Technique

(100) textured Pb(Zr_0.48Ti_0.52)O₃ (PZT) films were prepared on silicon substrates by MOD process and laser lift-off technique. Textured PZT films were first grown on (001) Sapphire substrate, using Ba(Mg_1/3Ta_2/3)O₃ (BMT) materials as buffer layer. The (100) textured PZT/BMT/Sapphire films were attached to Si substrate using a transient-liquid-phase Pd-In bonding process, and then were separated from Sapphire substrates by a laser lift-off process, in which, a 38 ns pulse from excimer laser (248 nm) at 600 mJ/cm² fluence melted BMT buffer layer, expelling the Sapphire. The crystallinity of the surface of films was further improved by laser annealing. X-ray diffraction analysis of the PZT films showed that the crystallographic structure of films is maintained during laser lift-off process. Electrical testing of the films after laser lift-off process followed by laser annealing demonstrated that the ferroelectric properties are retained for the transferred films (P_r = 9μ C/cm² and E_c = 74 kV/cm).     

Rf Sputtered Na0.5K0.5NbO3 Films on Oxide Substrates as Optical Waveguiding Material

Highly crystalline Na_0.5K_0.5NbO₃ (NKN) thin films of 1–2 μm thickness were deposited by rf-magnetron sputtering of a stoichiometric, ceramic target on single crystal LaAlO₃(001) and Al₂O₃(0112) substrates. X-ray diffraction measurements revealed epitaxial quality of NKN/LaAlO₃ film structures, whereas NKN films on sapphire substrates were found to be preferentially c-axis oriented. A prism-coupling technique was used to characterize optical and waveguiding properties. A bright-line spectrum at λ = 632.8 nm, revealed sharp peaks, corresponding to transverse magnetic (TM) and electric (TE) waveguide propagation modes in NKN/LaAlO₃ and NKN/Al₂O₃ thin films. Using a least mean square fit the refractive index for the films and film thickness were calculated. The extraordinary and ordinary refractive indices were determined to n _e = 2.207 ± 0.002 and n _o = 2.261 ± 0.002, and n _e = 2.216 ± 0.002 and n _o = 2.247 ± 0.002 at λ = 632.8 nm for 2.0 μm thick NKN films on LaAlO₃ and Al₂O₃, respectively. This corresponds to a birefringence Δn = n _e ? n _o = ?0.054 ± 0.003 and Δn = ?0.031 ± 0.003 in the films, where the larger Δn for the NKN/LaAlO₃ structure can be explained by the superior crystalline quality compared to NKN/Al₂O₃. Atomic force microscopy images of the film surfaces revealed rms roughnesses of 2.5 nm and 8.0 nm for 1.0-μm thick NKN/LaAlO₃ and NKN/Al₂O₃ films, respectively. We believe surface scattering is one of the main sources of waveguide losses in the thin films.