有机太阳电池活性层薄膜的光电性能研究

采用旋转涂覆方法制备了常用于有机太阳电池活性层的MEH-PPV聚合物薄膜及其单层夹心结构器件,通过透射光谱测量研究了薄膜的折射率、消光系数、介电常数、光导率和禁带宽度等光学常数,结果表明该薄膜具有直接带隙半导体的光学性质,其直接禁带宽度为2.17 eV.另外,通过分析器件的电流一电压特性研究了薄膜的电导率和载流子迁移率等电学性质.这些实验结果对于有机太阳电池的结构设计及其优化具有一定的参考价值.     

使用椭偏光谱研究氮化铝薄膜在不同温度下的光学性质

通过椭偏仪对生长在蓝宝石上的不同厚度氮化铝薄膜的变温光学性质进行了研究, 并采用托克-洛伦兹模型对椭偏实验数据进行了拟合分析, 精确得到了氮化铝薄膜的厚度和光学常数(折射率n, 消光系数k)等.研究的结果表明: 相比薄的氮化铝薄膜, 厚的氮化铝薄膜的折射率较大.随着温度的升高, 氮化铝的折射率、消光系数和带隙会向低能端单调地移动(红移);厚度对带隙随温度改变的影响较小, 对折射率则有一定的影响.     

半导体氮化物AlInN的光学性质

测量了AlInN薄膜(包括InN和AIN)的透射和反射光谱,结合四层透射和反射模型得到AlInN的一系列变温光学性质,包括吸收系数、能带带隙、乌尔巴赫带尾参数、折射率等等.采用一套经验公式,描述InN薄膜在本征吸收区和乌尔巴赫吸收区的吸收系数.发现带隙以下,AIN薄膜的折射率遵守Sellmeier经验公式.用基于态密度...     

氧化钨薄膜对发光二极管特性的影响研究

氧化钨薄膜具有适中的光学带隙、折射率及高功函数等半导体特性,本文采用溅射法(Sput-tering)制备氧化钨薄膜测试其光电特性,使用AFM、XRD观察薄膜外观结构与晶体状态,应用XPS、UPS表征薄膜的化学计量组分及薄膜功函数,并将此薄膜应用于AlGaInP发光二极管器件中,以增加与p-GaP欧姆接触特性,增加载流子...     

使用椭偏光谱研究氮化铝薄膜在不同温度下的光学性质（英文）

通过椭偏仪对生长在蓝宝石上的不同厚度氮化铝薄膜的变温光学性质进行了研究,并采用托克-洛伦兹模型对椭偏实验数据进行了拟合分析,精确得到了氮化铝薄膜的厚度和光学常数(折射率n,消光系数k)等.研究的结果表明:相比薄的氮化铝薄膜,厚的氮化铝薄膜的折射率较大.随着温度的升高,氮化铝的折射率、消光系数和带隙会向低能端单调地移动(红移);厚度对带隙随温度改变的影响较小,对折射率则有一定的影响.     

掺杂Al对DC反应溅射ZnO薄膜的影响

采用金属单质靶和直流反应溅射制备了不同Al含量(摩尔分数)掺杂的ZnO薄膜,得到的薄膜均为c-轴择优取向的纤锌矿结构,在可见波段具有很高的透过率。薄膜的晶面间距、光学折射率和带隙在掺Al的起始阶段变化很大,待Al掺杂量达到一定值后,光学折射率和带隙的变化不大,薄膜的晶面间距趋于一稳定值0.266 nm。分析表明掺杂的Al均作为施主对载流子浓度作出了贡献,影响薄膜导电性能的主要原因被推断为晶格中的缺陷等因素导致了载流子的局域束缚。     

溅射压力对制备a-GaAs1-xNx 薄膜光学常数的影响

采用反应磁控溅射法在室温条件下制备了a-GaAs_1-xN_x 薄膜。实验测定了薄膜厚度、氮含量、载流子浓度和光学透过率及并研究了其随溅射压的变化。系统研究了溅射压对所制备薄膜的光学带隙、折射率和色散参数的影响。所制备的薄膜为直接带隙材料,利用Cauchy和Wemple模型能够很好地拟合所制备薄膜的折射率色散曲线。     

铁电薄膜光学性质的研究

本文对铁电薄膜的光学性质的研究进展进行了详细的总结。与人们对铁电薄膜的电学性质的研究相比,人们对光学性质的研究较少。由于铁电薄及其无定形薄膜都具有许多优良的电学性质,因此对它们的光学性质研究也很有必要。光学手段具有非破坏性,通过这种手段可以获得薄膜的光学常数折射率和消光系数,从而进一步获得它们的禁带宽度。中红外透射可以表征铁电薄膜内部结构的相变过程。通过远红外手段,可以研究薄膜的内部微观机制,如晶格振动等。最后,阐述了铁电薄膜及其无定形薄膜光学性质研究的发展方向。     

Cd0.8Zn0.2S 薄膜的结构和光学性质

采用真空共蒸发法在玻璃衬底上制备了Cd1-xZnxS薄膜,并用XRD、XRF以及光学透射谱对刚沉积薄膜的结构、组分和光学性质进行了表征。刚沉积的薄膜为六方结构,沿(002) 择优取向。XRF测试结果表明石英振荡法监控的薄膜组分与XRF 获得的结果非常好地吻合。由Cd0.8Zn0.2S薄膜的光学透射谱,通过Swanepoel 原理与Wemple- DiDomenico 单振子模型,推导出薄膜的光学参量,如折射率、单振子能量、色散能、吸收系数、光学能隙等。     

高性能有机薄膜晶体管(OTFT)制备及其导电机制

详细介绍了在SiO2和高kHfO2介质层上制备并五苯薄膜晶体管方面的研究,特别是利用原子力显微技术(AFM)和静电力显微技术(EFM)研究了并五苯分子初始生长模式,揭示了衬底形貌、表面化学性能(包括化学清洗和聚合物层修饰)对有机半导体成膜结构和薄膜场效应晶体管性能之间的关联,包括晶体管迁移率、开关比和阈值电压等;针对并五苯初始生长成核模式的差异,分析了不同岛(畴)间畴边界对载流子在有机薄膜内输运的影响,有助于理解有机半导体薄膜导电机理。通过优化和控制介电层和有机半导体薄膜层的界面化学性质,在SiO2介质层上成功制备出迁移率为1.0cm2/V.s、开关电流比达到106的OTFT器件;在高kHfO2介质层上获得的OTFT器件的工作电压在-5V以下,开关电流比达到105,载流子迁移率为0.6cm2/V.s;器件性能指标已经达到目前国际上文献报道的最好水平。     

Theoretical investigation of the electronic structure,optical, elastic,hardness and thermodynamics properties of jadeite

A detailed theoretical study of the electronic structure, optical, elastic and thermodynamics properties of jadeite have been performed by means of the first principles based on the state-of-the-art of density functional theory within the generalized gradient approximation. The optimized lattice constants and the atomic positions are in good agreement with experimental data. The total density of states and partial density of states of jadeite have been discussed. The energy gap has been calculated along the Γ direction found to be 5.338 eV, which shows that jadeite has wide direct band gap. The optical properties, such as the dielectric function, refractive index, extinction coefficient, reflectivity coefficient, loss function and absorption coefficient for [100] and [001] directions have been described for the first time in the energy range 0–40 eV. The elastic constants, bulk modulus, Young׳s modulus, anisotropic factor and Poisson׳s ratio have been calculated. Furthermore, the Vickers hardness and Debye temperature of jadeite have been predicted. The calculated values of all above parameters are compared with the available experimental values.     

Theoretical investigation of mechanical,optoelectronic and thermoelectric properties of BiGaO3 and BiInO3 compounds

The cubic BiGaO₃ and BiInO₃ perovskite oxides have been investigated for their structural stability, mechanical and opto-electronic properties by employing the density functional theory. The exchange-correlation effects have been modeled with Perdew–Burke–Ernzerhof generalized gradient approximation, while the improved evaluation of electronic properties has been achieved by using the Tran–Blaha modified form of semi-local Becke–Johnson functional. Structural properties are calculated and the thermodynamics stability of BiGaO₃ and BiInO₃ in the cubic perovskite structure has been established in terms of enthalpies of formation. Furthermore, elastic coefficients such as C_ij, bulk modules B, anisotropy factor, shear modulus G, Young’s modulus Y, Poisson’s ratio ν, and B/G ratio are predicted. Band structure calculations reveal that investigated compounds have an indirect band gap between the occupied O 2p and unoccupied Bi 6p orbitals. The optical response of BiGaO₃ and BiInO₃ are also inspected by computing the complex dielectric function, refractive index, absorption coefficient, extinction coefficient, reflectivity and optical conductivity for radiation with energy up to 16 eV. The important thermoelectric properties of the compounds are described in terms of thermal conductivity, electrical conductivity, Seebeck coefficient and figure of merit.     

K+掺杂对SnO2-LiZnVO4系湿敏陶瓷性能的影响

为了提高 SnO_2-LiZnVO_4系湿敏材料的性能,采用共沉淀法制备出 SnO_2-K_2O-LiZnVO_4系纳米湿敏粉体。考察了液相掺杂 K+对材料湿敏性能、复阻抗特性和电容特性的影响。实验结果表明,采用共沉淀法制备纳米粉体并使K+液相掺杂量为 2.5%(摩尔分数),可使湿敏材料低湿电阻小、灵敏度适中,适当的 K+添加量可明显改善 SnO_2-LiZnVO_4系纳米材料的感湿特性。     

Effect of annealing temperature on structural,electrical and optical properties of spray pyrolytic nanocrystalline CdO thin films

Nanocrystalline CdO thin films were prepared onto a glass substrate at substrate temperature of 300 °C by a spray pyrolysis technique. Grown films were annealed at 250, 350, 450 and 550 °C for 2.5 h and studied by the X-ray diffraction, Hall voltage measurement, UV-spectroscopy, and scanning electron microscope. The X-ray diffraction study confirms the cubic structure of as-deposited and annealed films. The grain size increases whereas the dislocation density decreases with increasing annealing temperature. The Hall measurement confirms that CdO is an n-type semiconductor. The carrier density and mobility increase with increasing annealing temperature up to 450 °C. The temperature dependent dc resistivity of as-deposited film shows metallic behavior from room temperature to 370 K after which it is semiconducting in nature. The metallic behavior completely washed out by annealing the samples at different temperatures. Optical transmittance and band gap energy of the films are found to decrease with increasing annealing temperature and the highest transmittance is found in near infrared region. The refractive index and optical conductivity of the CdO thin films enhanced by annealing. Scanning electron microscopy confirms formation of nano-structured CdO thin films with clear grain boundary.     

Effect of substrate temperature on structural,morphological, optical and electrical properties of MnIn2S4 thin films prepared by nebulizer spray pyrolysis technique

Manganese indium sulphide (MnIn₂S₄) thin films were deposited using an aqueous solution of MnCl₂, InCl₃ and (NH₂)₂CS in the molar ratio 1:2:4 by simple chemical spray pyrolysis technique. The thin film substrates were annealed in the temperature range between 250 and 350 °C to study their various physical properties. The structural properties as studied by X-ray diffraction showed that MnIn₂S₄ thin films have cubic spinel structure. The formation of cube and needle shaped grains was clearly observed from FE-SEM analysis. The energy dispersive spectrum (EDS) predicts the presence of Mn, In and S in the synthesized thin film. From the optical studies, it is analyzed that the maximum absorption co-efficient is in the order between 10⁴ and 10⁵ cm⁻¹ and the maximum transmittance (75%) was noted in the visible and infrared regions. It is noted that, the band gap energy decreases (from 3.20 to 2.77 eV) with an increase of substrate temperature (from 250 to 350 °C). The observations from photoluminescence studies confirm the emission of blue, green, yellow and red bands which corresponds to the wavelength range 370–680 nm. Moreover, from the electrical studies, it is observed that, as the substrate temperature increases the conductivity also increases in the range 0.29–0.41×10⁻⁴ Ω⁻¹ m⁻¹. This confirms the highly semiconducting nature of the film. The thickness of the films was also measured and the values ranged between 537 nm (250 °C) to 483 nm (350 °C). This indicates that, as the substrate temperature increases, the thickness of the film decreases. From the present study, it is reported that the MnIn₂S₄ thin films are polycrystalline in nature and can be used as a suitable ternary semiconductor material for photovoltaic applications.     

Structural,elastic, electronic and thermodynamic properties of uranium filled skutterudites UFe4P12: First principle method

We present a theoretical study of structural, elastic, thermodynamic, and electronic properties of the uranium filled skutterudite UFe₄P₁₂. We use the full-potential linear muffin–tin orbital (FP-LMTO) method in which the local density approximation (LDA) is used for the exchange-correlation (XC) potential. The lattice parameter at equilibrium, the bulk modulus, its pressure derivative, the elastic constants and the band structure energy of the filled skutterudite UFe₄P₁₂ are calculated and systematically compared to available theoretical and experimental data. Herein, we use the total energy variation as function of strain technique to determine independent elastic constants and their pressure dependence. Furthermore, using quasi-harmonic Debye model with phonon effects, the effect of pressure P and temperature T on the lattice parameter, bulk modulus, thermal expansion coefficient, Debye temperature and the heat capacity of UFe₄P₁₂ are investigated for the first time. Band structure of UFe₄P₁₂ indicates a tendency of forming a pseudo-gap that appears above the Fermi level at Γ point. This is a unique characteristic of skutterudite, especially when a single phosphorous p-band crosses the Fermi level. The crossing band is, indeed, pushed down by the repulsion of U f-resonance states.     

Effect of rhenium doping on various physical properties of single crystals of MoSe2

Effect of rhenium doping is examined in single crystals of MoSe₂ viz. MoRe_0.005Se_1.995, MoRe_0.001Se_1.999 and Mo_0.995Re_0.005Se₂, which is grown by using the direct vapor transport (DVT) technique. The grown crystals are structurally characterized by X-ray diffraction, by determining their lattice parameters a and c, and X-ray density. Also, the Hall effect and thermoelectric power (TEP) measurements show that the single crystals exhibit a p-type semiconducting nature. The direct and indirect band gap measurements are also undertaken on these semiconducting materials.     

Effect of rhenium doping on various physical properties of single crystals of MoSe2

正Effect of rhenium doping is examined in single crystals of MoSe_2 viz.MoRe_(0.005)Se_(1.995), MoRe_(0.001)Se_(1.999) and Mo_(0.995)Re_(0.005)Se_2,which is grown by using the direct vapor transport(DVT) technique. The grown crystals are structurally characterized by X-ray diffraction,by determining their lattice parameters a and c,and X-ray density.Also,the Hall effect and thermoelectric power(TEP) measurements show that the single crystals exhibit a p-type semiconducting nature.The direct and indirect band gap measurements are also undertaken on these semiconducting materials.     

Optical,morphological and electrical studies of Zn:PbS thin films

Structural, electrical, and optical properties of undoped and Zn doped lead sulfide (PbS) thin films are benign reported in this paper. The subjected films were grown on glass substrates at 25 °C by a chemical bath deposition (CBD) method. The concentration of Zn in the deposition bath represented by the ratio [Zn²⁺]/[Pb²⁺] was varied from 0% to 5%. It was found that the film׳s grains decreased in size with increasing Zn content in the film. XRD data showed the polycrystalline nature of the film its crystal orientation peak intensities decreased with higher doping concentration of Zn. Atomic force microscopy (AFM) measurements revealed that the surface roughness of the films decreased due to zinc doping as well. However, with increasing of the dopant concentration from 0% to 5%, the average transmittance of the films varied over the range of 35–75%. The estimated optical band (E_g) gaps of undoped and Zn doped PbS thin films were in the range of 0.72–1.46 eV. Hall Effect measurements electrical resistivity, carrier concentration and Hall mobility have been determined for the titled film as functions on the Zn content within the film׳s textures. The overall result of this work suggested that the Zn:PbS film is a good candidate as an absorber layer in the modern solar cell devices.     

Effect of Co doping on structural, optical, electrical and thermal properties of nanostructured ZnO thin films

Nanocrystalline Zn1-x CoxO(where x varies from 0 to 0.04 in steps of 0.01) thin films were deposited onto glass substrate by the spray pyrolysis technique at a substrate temperature of 350 ℃. The X-ray diffraction patterns confirm the formation of hexagonal wurtzite structure. The crystal grain size of these films was found to be in the range of 11–36 nm. The scanning electron micrographs show a highly crystalline nanostructure with different morphologies including rope-like morphology for undoped ZnO and nanowalls and semispherical morphology for Co-doped Zn O. The transmittance increases with increasing Co doping. The optical absorption edge is observed in the transmittance spectra from 530 to 692 nm, which is due to the Co2C absorption bands corresponding to intraionic d–d shifts. The direct and indirect optical band gap energies decrease from 3.05 to 2.75 eV and 3.18 to 3.00 eV, respectively for 4 mol% Co doping. The electrical conductivity increases with increasing both the Co doping and temperature, indicating the semiconducting nature of these films. The temperature dependence thermal electromotive force measurement indicates that both undoped and Co-doped ZnO thin films show p-type semiconducting behavior near room temperature. This behavior dies out beyond 313 K and they become n-type semiconductors.