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1.
阐述了LIGA技术的组成及特点。对LIGA工艺掩膜、X射线光刻、电铸及塑铸等进行了朱理分析。用一次成型法制作了以聚酰亚胺为衬基、以Au为吸收体的X射线光刻掩膜。简单介绍了这种掩膜的制作工艺过程,并用这种掩膜在北京电子对撞机国家实验室进行了同步辐射X射线光刻,得到了深度为500μm,深宽比达8.3的PMMA材料的微型电磁马达联轴器结构。给出掩膜和X射线光刻照片。同时,对Au、Ni等金属材料的厚膜电铸进行了工艺研究。  相似文献   

2.
同步辐射X射线光刻应用新领域—LIGA技术   总被引:3,自引:0,他引:3  
介绍了一种超微细加工新方法-LIGA技术对掩模材料、光刻胶和光源的要求予以讨论,同时还介绍了国外在这方面的最新研究成果,LIGA技术是深度X射线刻蚀,电铸成型和塑料铸模等技术相结合的综合技术,是制造微型机械最有前途的方法,与传统半导体超微细加工方法相比,LIGA技术有以下优点:(1)用材广泛,可以是金属、陶瓷、聚合物及玻璃;(2)可加工任意复杂的图形结构;(3)可制造有较大高宽比的超微细元件;(4  相似文献   

3.
LIGA工艺在工程中的两类应用   总被引:6,自引:0,他引:6  
高杨  李枚  彭良强  张菊芳  黄军容 《核技术》2002,25(10):883-888
本文从LIGA工艺的工程应用角度,简要介绍微小型安全密码锁机构、微小型加速开关结构的基本设计问题和工艺问题,初步分析了这两类组件制造对LIGA工艺的需求与要求。  相似文献   

4.
5.
通过在北京高能所3W1束线上进行的X光深层光刻工艺研究,获得了侧壁光滑、陡直、厚度达100μm,深宽楷比达20的光刻胶和金属微结构,表明该光束线适用于LIGA技术的研究。  相似文献   

6.
小型中子照相装置慢化体的研究   总被引:5,自引:0,他引:5  
文章研究用混合D-T束密封中子发生器进行中子照相的14MeV中子慢化问题,提出了用高密度聚乙烯和铅相结合慢化14MeV中子的结构,实验证实,在源附近加一定厚度的铅层可以把热化比降低三分之一左右。这种结构的热化比是用水慢化14MeV中子的热化比的1/2—1/3。慢化体加铅后对中子束镉比的影响并不很大。  相似文献   

7.
马维超  周明达 《核技术》1994,17(9):535-541
对天然铀和聚乙烯的各种组合进行了计算,结果可见:用2—2.5cm厚的天然铀紧包14MeV中子源,在离源面2—3cm范围内使用热中子为最佳,用浓缩铀作增强物,只有当离源一定距离放置时,才能比天然铀有较好的效果。讨论了在由高浓缩铀和聚乙烯组成的、几何尺寸与上面计算相同的次临界系统中使用天然铀或铅增强物对14MeV中子源的倍增情况,得出天然铀和铅在该次临界系统中仍有明显的增强作用;在合适的结构中,设k为该次临界系统中的有效增殖因数,则可使增强因子M接近甚至大于(1-k)-1。  相似文献   

8.
D-T中子发生器慢化体结构的蒙特卡罗方法研究   总被引:1,自引:0,他引:1  
本文介绍了利用MCNP/4C程序对聚乙烯和重金属结合慢化14MeV中子的慢化体结构进行模拟计算和分析。计算结果显示:三种重金属中铅对增加慢化体热中子注量率最好,铋次之,铁最差。模拟确定了空心圆柱慢化体的壁厚为14cm。模拟结果证实了在源附近加5cm厚度的铅层,慢化体中引出孔热中子注量率最大,与全聚乙烯结构相比,可以把热化比降低三分之一左右,为实验确定慢化体结构提供了可靠的科学依据。  相似文献   

9.
本报道了作在同步辐射X射线光刻研究中的一些新进展,其中,最细尺寸已达50纳米。  相似文献   

10.
介绍在北京同步辐射装置上进行的国内首次LLL型X射线干涉实验研究,在X光底片上观察到了Moire干涉条纹,为进一步利用X射线干涉技术实现纳米测量打下了初步基础。  相似文献   

11.
王丽玮  谷鸣  袁启兵 《核技术》2012,(7):543-548
设计采用反馈控制的方法改善脉冲调制器输出高压脉冲幅度稳定性,分析了实现稳定性目标对数据采集系统软、硬件的要求,介绍了相关的实验测试和信号处理方法。数据采集系统由Stratix ii FPGA开发板、AD6645、上位PC机组成,借用差分放大器提高测量分辨率。数据处理采用脉冲采样样本均值作为表征幅度的特征量,并采用平均、插值、数字滤波、BP神经网络等方法来提高幅度监测值的分辨率能力和抗干扰能力。  相似文献   

12.
大功率固态调制器组元电路设计与实验   总被引:3,自引:0,他引:3  
尚雷  谭泓  丛晓艳  陆业明 《核技术》2006,29(10):787-790
文章介绍了用于直线加速器的大功率固态调制器组元电路设计,电路中采用了3.3 kVIGBT及大尺寸纳米晶磁环,磁环采用国产材料,在施加偏磁情况下磁芯伏秒数达到0.006.介绍了驱动电路、反向吸收、偏磁等辅助电路.最后给出了动态磁性能测量结果及组元电路主要波形.  相似文献   

13.
Design of 150kV bouncer modulator   总被引:1,自引:0,他引:1  
The 150 kV bouncer modulator is designed to drive the 10 MW multi-beam klystron for the DESY TESLA Test Facility. The modulator is different from the 10 kV modulators previously built at Fermilab. First, the new 150 kV bouncer modulator has no transformer, so the modulator circuit is simplified and the output waveform is improved well. Second, the bouncer circuit has been changed to fit the output need, which is the most significant challenge. This paper gives the design of the 150 kV long pulse bouncer modulator.  相似文献   

14.
1 Introduction output pulse is designed to meet the following speci- fications: The 24 kV long pulse modulator converts AC line Output voltage: 120 kVvoltage to pulsed high voltage in the 120 kV range to Output current: 138 Abe applied to the Thomson TH1801 multibeam kly- Pulse width: 1.7 msstron catho…  相似文献   

15.
In this paper,the nature and origin of single event effects (SEE) are studied by injecting laser pulses into different circuit blocks,combining with analysis to map pulse width modulators circuitry in the microchip die.A time-domain error-identification method is used in the temporal characteristic analysis of SEE.SEE signatures of different injection times are compared.More serious SEE are observed when the laser shot occurs on a rising edge of the device output for blocks of the error amplifier,current sense comparator,and T and SR latches.  相似文献   

16.
As a combination device for a step-up pulse transformer and a magnetic switch,the saturable pulse transformer is widely used in pulsed-power and plasma technology.A fractional-turn ratio saturable pulse transformer is constructed and analyzed in this paper.Preliminary experimental results show that if the primary energy storage capacitors are charged to 300 V,an output voltage of about 19 kV can be obtained across the capacitor connected to the secondary windings of a fractional-tum ratio saturable pulse transformer.Theoretical and experimental results reveal that this kind of pulse transformer is not only able to integrate a step-up transformer and a magnetic switch into one device,but can also lower the saturable inductance of its secondary windings,thus leading to the relatively high step-up ratio of the pulse transformer.Meanwhile,the application of the fractional-turn ratio saturable pulse transformer in a μs range pulse modulator as a voltage step-up device and main switch is also included in this paper.The demonstrated experiments display that an output voltage with an amplitude of about 29 kV,and a 1.6 μs pulse width can be obtained across a 3500 Ω resistive load,based on a pulse modulator,if the primary energy storage capacitors are charged to 300 V.This compact fractional-turn ratio saturable pulse transformer can be applied in many other fields such as surface treatment,corona plasma generation and dielectric barrier discharge.  相似文献   

17.
For an all solid-state Marx modulator applied in dielectric barrier discharges (DBDs),hard switching results in a very low efficiency.In this paper,a series resonant soft switching circuit,which series an inductance with DBD capacitor,is proposed to reduce the power loss.The power loss of the all circuit status with hard switching was analyzed,and the maximum power loss occurred during discharging at the rising and falling edges.The power loss of the series resonant soft switching circuit was also presented.A comparative analysis of the two circuits determined that the soft switching circuit greatly reduced power loss.The experimental results also demonstrated that the soft switching circuit improved the power transmission efficiency of an all solid-state Marx modulator for DBDs by up to 3 times.  相似文献   

18.
One design of multi-function LIGA beamline has been reported. In this design, two plane mirrors and a series of filters have been employed. One can choose the spectrum range of X-ray easily according to the exposure requirement by adjusting the grazing angle of mirrors and the thickness of filters. And the spot size in the horizontal direction is up to 120mm, which is large enough for exposing 5 inch silicon slice. The typical exposure time is about 1.2h, 1.Sh, 0.5h, corresponding to PMMA thickness of 500μm, 200 μm, 20 μm, respectively.  相似文献   

19.
AP1000反应堆主泵屏蔽套制造工艺浅析   总被引:5,自引:0,他引:5  
简要地从材料、成形、焊接、热处理几个方面对我国引进的第三代核电站AP1000反应堆主泵屏蔽套的制造工艺进行了浅析,阐明了在屏蔽套制造过程中应该注意的问题,对于实现我国反应堆主泵的国产化具有一定的积极意义。  相似文献   

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