二元氧化物熔盐Na2WO4-WO3的成分分析及电沉积钨涂层的研究

二元氧化物熔盐Na2WO4-WO3是一种理想的电沉积钨涂层熔盐体系,研究该熔盐在不同条件下的成分变化及离子组成对电沉积钨涂层技术参数与性能控制非常重要.通过XRD、Raman光谱和SEM等测试分析技术,系统分析了熔融温度和电沉积时间对二元氧化物熔盐Na2WO4-WO3的成分和离子组成的影响,同时分析了在该熔盐中采用电沉积方法获得的钨涂层的表面形貌.结果表明,熔融温度与电沉积时间对熔盐的成分和离子种类都没有影响,电沉积中主要的离子源来自于阳极钨;电沉积获得的涂层为纯金属钨,而且表面致密均匀.     

电沉积钨及钨合金涂层的研究进展

金属钨及含钨涂层具有优良的性能,如高熔点、高硬度、良好的化学稳定性和较低的热膨胀系数,在多个领域被广泛应用,金属钨及含钨涂层有很多制备方法,其中电沉积法具有重要的地位。综述了熔盐电沉积钨涂层及溶液电沉积钨合金涂层的研究进展,并展望了熔盐电沉积钨涂层及溶液电沉积钨合金涂层的发展趋势。     

激光重熔改性对电弧喷涂Al涂层性能的影响

为改进电弧喷涂Al层和钢基体之间的结合强度,利用Comsol软件分析不同激光功率对材料温度场的影响,然后通过激光重熔工艺对模拟结果进行实验验证。采用扫描电子显微镜(SEM)、能谱仪(EDS)分析试样界面形貌、涂层化学元素与微观结构组成,探讨了涂层与基体的结合性能,并通过电化学腐蚀实验分析涂层耐腐蚀性能。结果表明,在600W和1000W激光功率下,基体与涂层均未实现理想结合;在800W功率下,Al涂层与基体在激光重熔后由机械结合变为冶金结合,形成了基体-结合层-涂层的复合结构,使基体与涂层的结合性能得到显著提高,强化了Al涂层的耐腐蚀性能。     

低压沉积温度对MoSi2涂层微观结构与性能影响

以SiCl₄和H₂为原料,采用低压化学气相沉积（LPCVD）渗硅法在Mo基体表面原位反应制备了MoSi₂涂层,研究了沉积温度对MoSi₂涂层微观形貌、物相组成、沉积速率、涂层的硬度、涂层与基体结合强度的影响. 研究结果表明：在1100~1200℃下制备的涂层结构致密,由单一MoSi₂组成,沉积速率、涂层的硬度以及与基体的结合强度均表现为増加的趋势;当沉积温度高于1200℃,涂层出现开裂现象,由游离Si和MoSi₂两相组成,涂层沉积速率、硬度和结合强度均出现下降的趋势. 1100℃以下沉积的主要控制步骤为Si与Mo反应,而1100℃以上Si在涂层中的扩散对沉积过程起控制作用.     

冷喷涂CoNiCrAlY涂层在Na_2SO_4熔盐中的热腐蚀行为

利用冷喷涂技术制备CoNiCrAlY涂层,并对涂层进行了真空预氧化处理。结合X射线衍射,扫描电镜,能谱分析等方法研究预氧化处理前后的CoNiCrAlY涂层在900℃的Na2SO4熔盐中的热腐蚀行为。结果表明:冷喷涂CoNiCrAlY涂层含氧量为0.12%(质量分数),孔隙率小于0.28%(体积分数)。真空预氧化处理在涂层表面生成厚约0.26μm连续、致密的α-Al_2O_3氧化膜;喷涂态涂层和预氧化涂层在热腐蚀150h后表面均生成了以α-Al_2O_3为主的致密连续氧化膜,保护了基体免受腐蚀破坏;真空预氧化处理有效减缓了S和O等元素向涂层内扩散的速率,从而提高了涂层的抗Na2SO4熔盐热腐蚀性能;高温热腐蚀对涂层的破坏作用远大于高温氧化。在相同温度下,涂层在单一Na2SO4熔盐中腐蚀时,Al的消耗速率约为高温氧化时的2倍。     

TiAl涂层对Ti_3Al合金腐蚀行为的影响

利用磁控溅射的方法在Ti_3Al合金上溅射Ti-48Al-8Cr-2Ag (原子分数/%)涂层,研究涂层对Ti_3Al合金熔盐热腐蚀和电化学腐蚀行为的影响.同时通过TEM,SEM,EDX,电化学工作站对合金的腐蚀进行研究,并对腐蚀机理进行探讨.结果表明:在熔盐热腐蚀中,涂层对基体具有很好的防护作用,这主要是因为Ti_3Al合金表面发生了大面积的脱落,而涂层试样表面腐蚀膜结合牢固.经过电化学腐蚀研究,涂层试样表面发生明显的分级钝化现象,表明涂层在Na2SO4+K2SO4溶液中具有很好的钝化性能,显示了很好的抗电化学腐蚀性能.     

低压沉积温度对MoSi2涂层微观结构与性能影响

以SiCl₄和H₂为原料,采用低压化学气相沉积（LPCVD）渗硅法在Mo基体表面原位反应制备了MoSi₂涂层,研究了沉积温度对MoSi₂涂层微观形貌、物相组成、沉积速率、涂层的硬度、涂层与基体结合强度的影响. 研究结果表明：在1100~1200℃下制备的涂层结构致密,由单一MoSi₂组成,沉积速率、涂层的硬度以及与基体的结合强度均表现为増加的趋势;当沉积温度高于1200℃,涂层出现开裂现象,由游离Si和MoSi₂两相组成,涂层沉积速率、硬度和结合强度均出现下降的趋势. 1100℃以下沉积的主要控制步骤为Si与Mo反应,而1100℃以上Si在涂层中的扩散对沉积过程起控制作用.     

高温热处理对带热障涂层DD6单晶高温合金互扩散行为及持久断裂特征的影响

采用电子束物理气相沉积方法在DD6单晶高温合金基体上制备了热障涂层,带涂层试样首先在1100℃空气气氛中分别进行了50h和100h热处理,然后在980℃/250MPa条件下进行持久实验,研究了持久断裂后合金与黏结层界面的互扩散行为、组织形貌以及断裂特征。结果表明:经过1100℃热处理,合金与黏结层之间的元素发生了互扩散,合金基体中Cr含量增加,而Re,Nb,Mo,Ta等元素向黏结层扩散;随热处理时间的增加,析出的不稳定相数量增多,持久断裂试样γ′相粗化程度增加;1100℃热处理带热障涂层持久断口为韧窝断口,与合金标准试样断口特征类似。     

高温合金/NiAl封严涂层的电偶腐蚀行为研究

采用空气等离子喷涂工艺在高温合金基体上制备了NiAl封严涂层。研究了NiAl涂层/高温合金在5%(质量分数)NaCl溶液中的电偶腐蚀行为,结合极化曲线、开路电位和SEM形貌检测,探讨封严涂层的腐蚀机理。结果表明,高温合金基体与NiAl涂层的电偶电流密度为2.1356μA/cm2,电位较负的NiAl涂层作为电偶对的阳极,腐蚀更严重,腐蚀产物疏松呈絮状覆盖在涂层表面。等离子喷涂的NiAl涂层含有较多的孔隙和氧化物,腐蚀容易在缺少氧化物覆盖的区域发生。NiAl涂层边缘的氧化物也容易优先溶解,形成腐蚀产物膜,堵塞涂层微孔,抑制腐蚀的进行。随着腐蚀时间延长,NiAl涂层的防护性能逐渐减弱。     

低温熔盐电沉积羟基磷灰石复合涂层的研究

为了提高羟基磷灰石涂层的结合强度,在AlCl3-NaCl-TiCl3低温熔盐体系中加入HA微粒,复合电沉积制备Al-Ti/HA复合涂层,并对涂层的表面形貌、结构和结合强度进行了研究.结果表明: HA微粒均匀分散在Al-Ti合金镀层中,其共沉积量随电流密度的减小和熔盐中HA浓度的增大而增强;涂层的结合强度随HA共沉积量的增大而增强,当HA的共沉积量为40.1%(质量分数)时,Al-Ti/HA复合涂层的结合强度达到28.1 MPa.     

Efficiency and behavior of textured high emissivity metallic coatings at high temperature

Three metallic coatings with textured surfaces, made of rhenium, tungsten and molybdenum, were studied in the frame of the Solar Probe Plus mission (NASA) as candidate materials. The role of these coatings is to dissipate a maximum of energy from a hot instrument facing the Sun, by the mean of their high total hemispherical emissivity. The total hemispherical emissivity of the three coatings was measured in the temperature range 1100–1900 K, as well as over time in order to study their high temperature stability. Various emissivity levels were obtained depending on the surface texture. The highest total hemispherical emissivity was obtained on a rhenium coating, with an emissivity of 0.8 in the temperature range 1300–1700 K. However, this rhenium coating with a fine, sharp surface texture, presented an instability at high temperature, which might limit its optimal operating temperature to about 1500 K. As for the tungsten coating, the total hemispherical emissivity was increased by a factor 2 due to the enhanced surface texturation and its great stability over the whole temperature range was shown.     

柠檬酸体系电沉积Ni-Cr合金镀层工艺影响因素分析

为了提高铝材的耐蚀性和表面硬度,用柠檬酸体系在铝基体上制备了Ni-Cr合金镀层.研究了工艺参数对镀层组成、形貌和结构的影响,确定了最佳工艺条件.结果表明:最佳工艺条件获得的镀层光亮、平滑,显示出密集的球形细粒状形貌特征;镀层为面心立方(FCC)Ni-Cr固溶体纳米晶结构;适当降低温度,增大电流密度,提高镀液中CrCl3...     

Electrodeposition of High-Purity Molybdenum Coatings on Nickel1

High-purity molybdenum coatings suitable as matrix materials for superconducting microwave systems were prepared on nickel substrates by electrodeposition from a CaCl₂–CaMoO₄–CaO melt. The contamination of molybdenum with nickel was found to be insignificant, so that, in producing matrices for microwave applications, the required coating thickness depends only on subsequent mechanical or other treatments.     

Deposition of superconducting niobium coatings on titanium from molten salts

Superconducting niobium coatings have been electrodeposited from molten salts onto titanium substrates with a copper, nickel, or molybdenum protective layer, and their structure and magnetic properties have been studied. The coatings are shown to be suitable as a starting material for the superconducting layer of the rotor of cryogenic gyroscopes.     

超音速火焰喷涂制备纳米和微米结构WC-η涂层的耐熔锌腐蚀性能

以钨氧化物、钴氧化物和炭黑为原料, 通过原位还原碳化反应制备纳米WC-η(η为Co₃W₃C、Co₆W₆C等缺碳相)复合粉, 粉末平均粒径为155 nm。该复合粉经团聚造粒制备得到具有高致密性和良好流动性的热喷涂粉末。以此纳米结构和商业化的微米结构低碳WC-12Co粉末作为喂料, 通过超音速火焰喷涂制备硬质合金涂层。结果表明, 纳米结构涂层中生成了一定量等轴状的W₂C相, 裂纹主要沿晶界或相界面扩展, 而微米结构涂层中除W₂C外还含有较多的W相, 主要包裹在WC颗粒表面, 穿晶断裂比例较高, 裂纹扩展路径较平滑。由于纳米结构涂层组织致密、晶粒细小、界面积大, 因此比微米结构涂层具有更高的硬度和断裂韧性。两种涂层在熔融锌液中浸泡200 h后, 微米结构涂层中产生了较多的横向和纵向裂纹, 导致材料的大面积剥落和基材腐蚀; 纳米结构涂层中没有发生锌的浸蚀, 在局部产生了少量纵向裂纹, 裂纹间隙被钨钴氧化物所填充, 反而抑制了熔锌对涂层的腐蚀, 因此纳米结构涂层表现出更高的耐熔锌腐蚀性能。     

Deposition and Coating Properties on CVD Tungsten

Surface characterization and microstructure studies are performed on chemical vapor deposited (CVD) tungsten coating. There is about 2 μm thickness diffusion layer of tungsten in the molybdenum substrate. The thermal shock test shows tungsten coating has good adhesion with molybdenum substrate, but the elements of oxygen and carbon in the tungsten coating have the bad affection to the adhesion. The result of high-temperature diffusion experiment is the diffusion rate from molybdenum substrate to tungsten coating is faster.     

Electrical resistivity and lattice parameters of sputtered iridium alloys

Films of iridium and Ir-Cr, Ir-Mo, Ir-W, Ir-Re and Ir-Pt alloys were prepared by r.f. sputtering on Al₂O₃ substrates. Because an asymmetric target arrangement was used for the iridium and alloying elements the sputtered films had a defined compositional gradient. Resistance probes, 1 × 5 mm in area, with well-defined alloy composition were cut out of the film using a computer-controlled laser. The electrical resistivity of the alloys was measured between 4 and 684 K. The temperature coefficient of the resistivity at 283 K varies with the composition from 400 to 1500 ppm K^-1. The increase in resistivity with impurities is 2.04, 3.65, 3.02, 2.70 and 1.33 μΩ cm at.%^-1 for chromium, molybdenum, tungsten, rhenium and platinum respectively. The linear size factor (1/a₀) (da/dc)_{c = 0} is -7.0%, +3.0%, +3.0%, +0.1% and +2.0% for chromium, molybdenum, tungsten, rhenium and platinum respectively.     

Characterization of Co–Cr–Mo alloys after a thermal treatment for high wear resistance

The cobalt–chromium–molybdenum alloys are characterized by a high resistance to wear and corrosion, as well as good mechanical properties, allowing their use in the substitution of hip and knee joints.Five alloys were used as substrates for a coating deposition by a thermal treatment in molten salts, as reported elsewhere, in order to form a tantalum‐rich coating on the sample surface, able to improve the biocompatibility and wear resistance of the materials. However, the temperature (970 °C), reached during this process, is considered critical for the phase transformation of the Co-based alloys.The aim of this work is the evaluation of the temperature effects on the structure, microstructure, mechanical and tribological properties of the considered substrates, after the removal of the coating by polishing. The substrates are characterized through X-ray diffraction (XRD), scanning electron microscopy with energy dispersion spectrometry (SEM-EDS) and profilometry. The mechanical behavior is evaluated by the macro- and micro-hardness and bending tests, whereas the tribological properties are analyzed through a ball on disc test. A comparison between the as-received alloys and thermal treated substrates is reported. The biocompatibility feature is not reported in this work.The substrate crystalline structure changed during the heat treatment, inducing the formation of the hexagonal cobalt phase and the decrement of the cubic one. This crystallographic modification does not seem to influence the tribological behavior of the substrates. On the contrary, it affects the strength and ductility of the substrates.     

Effects of bias voltage and gas pressure on orientation and microstructure of iridium coating by double glow plasma

Iridium coating was produced on various substrates using a double glow plasma. The effects of bias voltage and gas pressure on orientation and microstructure of the coating were studied. The orientation, microstructure and composition of the coating were evaluated by X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy. The results showed that iridium coatings on various substrates all exhibited the preferred (220) orientation under the same deposition conditions. The microstructure of the coating was affected by bias voltage, gas pressure and substrate effects. The bias voltages had a significant impact on the crystal orientation of the coating. The increase of bias voltage resulted in high substrate temperature and large deposition rate. An increase in the coating thickness can affect the microstructure and orientation of the coating.