A CMOS/SOS 4K static RAM

Discusses high density CMOS/SOS technology used to develop a fully static 4096-bit RAM with a five-transistor storage cell. Selection of a five-transistor memory cell has reduced the access to the flip-flop storage element to a single word line transistor and bit line. The word line transistor must be able to prevent data altering currents from entering the memory cell at all times except for the write operation. The write operation is enhanced by reducing the bias voltage across the memory cell, thereby making the current needed to alter the cell smaller. Through the use of a 5 /spl mu/m design rule, the memory cell occupies 2913 /spl mu/m/SUP 2/. The 4096-bit static CMOS/SOS RAM contains 22553 transistors in 20 mm/SUP 2/. Organised as 1024 4-bit words, the RAM has a read cycle time of 350 ns and standby power dissipation of 50 /spl mu/W at V/SUB cc/=5 V and temperature of 27/spl deg/C.     

High-speed split-emitter I/SUP 2/L/MTL memory cell

Describes a novel circuit/device approach that overcomes the performance drawback of the injection-sensed I/SUP 2/L/MTL memory cell cited in a 16-kbit static MTL RAM (see IEEE ISSCC Dig. Tech. Papers, p.222-4, 1980). As a result, a compact memory cell with extremely low DC standby power in the nanowatt range and with read/write times below 5 ns is achieved. This has been verified by experimental investigations on small test arrays. They have been fabricated with an advanced process featuring a p-polysilicon-base self-alignment scheme and a double-diffused p-n-p structure. In addition, computer circuit simulations have been performed that show the read delay sensitivities in large arrays. Based on these results, an access time of less than 25 ns is projected for a 16-kbit MTL RAM.     

An experimental nanosecond Josephson 1K RAM using 5-µm Pb-alloy technology

A high-speed fully decoded Josephson 1K RAM has been designed and tested. Several bits of the 1K RAM were successfully operated with a typical read access time of 3.3 ns and associated power dissipation of 2.0 mW. The chip, containing about 10 000 Josephson junctions, was fabricated using 5-µm Pb-alloy technology, including a novel junction oxide barrier formation technique. A nondestructive readout (NDRO) Josephson ring cell operating with all current levels equal and an on-chip timing circuit for read/write operations were employed.     

A 21-ns 32 K/spl times/8 CMOS static RAM with a selectively pumped p-well array

The design and performance of a 32 K/spl times/8-b CMOS static RAM (SRAM) are presented. The design features a selectively pumped p-well array. Using this array technology, high-impedance polysilicon resistor loads can be used to reduce the array standby current by three orders of magnitude, and the device characteristics can be optimized to achieve high speed in the peripheral circuits. A unique divided-word-line architecture with shared sense amplifiers is used to achieve high-speed read operation. The read speed is further enhanced by a novel quasistatic equalization that minimizes peak current. A high-speed write circuit with a write-to-read transition detection is used to achieve a fast write operation. An advanced 1.2-/spl mu/m double-level-metal CMOS technology was used to fabricate the devices. The access time is 21 ns and the active power is 330 mW at 22 MHz.     

An asynchronous GaAs MESFET static RAM using a new current mirrormemory cell

An experimental 1-kb GaAs MESFET static RAM using a new memory cell has been designed, fabricated and tested. The new memory cell is not subject to the destructive read problems that constrain the design of the conventional six-transistor memory cell. The biasing arrangement for this new cell minimizes the leakage currents associated with unselected bits attached to a column, maximizing the number of bits allowed per column. This new memory cell also provides a much larger access current for readout than is possible using a conventional memory cell of the same area and cell power. A write time of 1.0 ns and address access times of between 1.0 and 2.3 ns have been obtained from a 1-kb test circuit. A cell area of 350 μm² and cell current of 60 μA were achieved using a conventional E/D process     

An experimental 64-bit decoded Josephson NDRO random access memory

The design and testing of an experimental fully decoded 64-bit Josephson NDRO (nondestructive readout) RAM chip are described. Tree decoders were used to access the memory cells. The basic memory cell was a ring cell containing a single write gate. The chips were built in a coarse 25 /spl mu/m technology since neither speed nor density were stressed in this study. An access time of 4 ns with full margins and of 2.3 ns with reduced margins were demonstrated. The corresponding full memory cycle times were 5 and 3.5 ns, respectively. Good agreement with computer simulations was obtained throughout.     

GaAs Schmitt trigger memory cell design

A novel GaAs five-transistor static memory cell derived from a Schmitt trigger is proposed. The memory cell overcomes MESFET subthreshold leakage loss by using a self ground-shifting technique which limits the leakage current flow to the cell. Compared with conventional GaAs SRAM cells, it offers small area and as well as fast read/write cycles. A 1 Kb prototype implemented in 1 μm nonself-aligned GaAs MESFET technology exhibited read and write access times of the order of 2.0 ns     

A 0.1-μm 1.8-V 256-Mb Phase-Change Random Access Memory (PRAM) With 66-MHz Synchronous Burst-Read Operation

A 256-Mb phase-change random access memory has been developed, featuring 66-MHz synchronous burst-read operation. Using a charge pump system, write performance was characterized at a low supply voltage of 1.8 V. Measured initial read access time and burst-read access time are 62 and 10 ns, respectively. The write throughput was 0.5 MB/s with internal times2 write and can be increased to ~2.67 MB/s with times16 write. Endurance and retention characteristics are measured to be 10⁷ cycles and ten years at 99 degC     

An 18 ns CMOS/SOS 4K static RAM

A high-speed CMOS/SOS 4K word/spl times/1 bit static RAM is described. The RAM features a MoSi/SUB 2/ gate CMOS/SOS technology with 2 /spl mu/m gate length and 500 /spl Aring/ thick gate oxide. Performance advantage of SOS over bulk is discussed for the scaled-down MOS LSI with 1-2 /spl mu/m gate. A standard 6-transistor CMOS cell and a two-stage sense amplifier scheme are utilized. In spite of the rather conservative 3.5 /spl mu/m design rule except for the 2 /spl mu/m gate length, the cell size of 36/spl times/36 /spl mu/m, the die size of 3.11/spl times/4.07 mm, and the typical read access and cycle time of 18 ns are achieved. The active and standby power dissipation are 200 mW and 50 /spl mu/W, respectively.     

A high-speed 16-kbit n-MOS random-access memory

This paper presents one version of a high-speed 16-kbit dynamic MOS random-access memory (RAM). This memory utilizes a one transistor cell with an area of 22/spl times/36 /spl mu/m/SUP 2/ which is fabricated using advanced n-channel silicon-gate MOS technology (5-/spl mu/m photolithography). The main feature of the design is a sense circuitry scheme, which allows a high speed (read access time of 200 ns) with low-power dissipation (600 mW at the 400-ns cycle time). The fully decoded memory is fabricated on a 5/spl times/7 mm/SUP 2/ chip and is assembled in a 22-lead ceramic dual-in-line package.     

Write Disturbance Modeling and Testing for MRAM

The magnetic random access memory (MRAM) is considered one of the potential candidates that will replace current on-chip memories (RAM, EEPROM, and flash memory) in the future. The MRAM is fast and does not need a high supply voltage for read/write operations, and is compatible with the CMOS technology. It can also endure almost unlimited read/write cycles. These combined advantages of RAM and flash memory make it a potential choice for SOC. In this paper, we present the write disturbance fault (WDF) model for MRAM, i.e., a fault that affects the data stored in the MRAM cells due to excessive magnetic field during the write operation. We also construct the SPICE macro model for the magnetic tunneling junction (MTJ) device of the toggle MRAM to obtain circuit simulation results. We then present an MRAM fault simulator called RAMSES-M, based on which we derive the shortest test for the proposed WDF model. The test is shown to be better and more robust as compared with the conventional March C-test algorithm. We also present a March 17 N diagnosis algorithm for identifying WDF. A 1 Mb MRAM chip has been designed and fabricated using a CMOS-based 0.18-mum technology. The proposed WDF model is justified by chip measurement results, with the march test results reported. Finally, specific MRAM fault behavior and test issues are discussed.     

Enhanced write performance of a 64-mb phase-change random access memory

The write performance of the 1.8-V 64-Mb phase-change random access memory (PRAM) has been improved, which was developed based on 0.12-/spl mu/m CMOS technology. For the improvement of RESET and SET distributions, a cell current regulator scheme and multiple step-down pulse generator were employed, respectively. The read access time and SET write time are 68 ns and 180 ns, respectively.     

An 8K/spl times/8 bit static MOS RAM fabricated by n-MOS/n-well CMOS technology

A 64 kbit fully static MOS RAM which contains about 402500 elements on the chip area of 5.44/spl times/5.80 mm has been designed. The memory cell is a basic cross-coupled flip-flop with four n-MOSFETs and two polysilicon load resistors. The memory cell size is decreased to 16/spl times/19 /spl mu/m (304 /spl mu/m/SUP 2/) by using advanced n-MOS technology with double-level polysilicon films and photolithography of 2 /spl mu/m dimensions. By applying n-well CMOS technology fabricated on a high-resistivity p-type silicon substrate to peripheral circuits of the RAM, high performance characteristics with high speed access times and low power dissipation are obtained. The RAM is designed for single 5 V operation. Address and chip select access times are typically 80 ns. Power dissipation in the active and standby mode is typically 300 and 75 mW, respectively.     

A 1024-bit MNOS RAM using avalanche-tunnel injection

MNOS memory cells which consist of one MNOS transistor and two MOS transistors are incorporated into a fully decoded 1024-word by 1-bit random access memory (RAM) with nonvolatility. The features of the present nonvolatile RAM are: 1) by introducing a novel mode of write operation, electrical isolators, such as p-n junction isolation between the memory cells and the other circuits are not required, 2) stored data can last more than one year without any kind of external power supply, 3) the chip size of the memory is 3.60/spl times/3.61 mm/SUP 2/, 4) the read-access time is 600 ns and the write cycle time is 10 /spl mu/s-100 /spl mu/s.     

Model for a 15 ns 16K RAM with Josephson junctions

An experimental memory model for investigating the feasibility of a 16K RAM memory with Josephson junctions was fabricated and tested. There are nearly 4500 Josephson junctions in the design which includes array, line drivers, and address decoders. Storage element is a single flux-quantum (SFQ) cell arranged in a 2K array. Drivers and decoders are based on the principle of current steering in superconducting loops, which is a medium speed but low power approach. The measured read-access time of the model is approximately 10 ns. Power dissipation of the unselected chip is zero, whereas for a read/write cycle time of 30 ns, it amounts to about 10 /spl mu/W. Results indicate that a 16K chip is feasible electrically. The estimated access time and power dissipation are 15 ns and 40 /spl nu/W, respectively.     

铁电存储器在存储测试系统中的应用

为了实现环境试验的存储测试系统,采用了FRAM存储器M28W640结合SOC片上系统C8051F340的设计,通过分析其性能和接口电路,编写了相应的读写程序。由于这种并行非易失性存储测试技术方式具有高速读写、超低功耗、几乎无限次擦写,读写程序编写简便的优点,非常适合在此类存储测试系统中使用。     

A 209 K-transistor ECL gate array with RAM

A 12 K-gate ECL gate array with 36 kbit of dedicated RAM has been developed. An ECL logic cell structure with an extra transistor buried under a V/sub cc/ power bus is proposed to implement both the logic function and a memory cell. The logic part has the capability of implementing configurable RAM with up to 5.8 kbit. By employing 0.6- mu m double-polysilicon self-aligned technology, the intrinsic gate delay is 110 ps at a power consumption of 1.8 mW/gate. The address access times of dedicated RAM and configurable RAM are 3.0 and 1.8 ns, respectively. The gate array is applied to 9 K-gate logic circuitry with 35-kbit table look-aside buffer (TLB) memory using dedicated RAM and a 16-word*18-bit register file using configurable RAM.<>     

A 2-ns 16K bipolar ECL RAM with reduced word-line voltage swing

A reduced word-line voltage swing (RWS) circuit configuration that results in a high-speed bipolar ECL (emitter coupled logic) RAM is proposed. The write operation can be performed with the configuration in the condition of reduced word-line voltage swing, which causes write operation error in conventional circuit configurations. The proposed configuration cuts off the hold current of the selected memory cell, and then the low-voltage node is charged up through the load p-n-p transistor. A 16-kb ECL RAM with a p-n-p loaded memory cell was fabricated by advanced silicide-base transistor (ASBT) process technology. A 2-ns access time was obtained with 1.8-W power consumption in which the word-line voltage swing was reduced by 0.7 V from a conventional case. Simulation results show that the access time is improved by 25% compared with a conventional case. Simulation results also show that writing time becomes comparable with the conventional time of 1.7 ns when the load p-n-p transistor has a saturation current of 5.0× 10¹⁷ A and a current gain of 1.0. The saturation current is 5 times larger and the current gain is 5 times smaller than those of the standard lateral p-n-p transistor     

A 64K/spl times/1 bit dynamic ED-MOS RAM

A 64K/spl times/1 bit dynamic RAM based on an innovative short channel ED-MOS process technology and an improved ED-MOS sense amplifier circuit has been realized. The RAM has been designed by using 2-3 /spl mu/m design rules and employing ED-MOS peripheral circuits capable of low supply voltage operation. As a result, dynamic memory operation has been demonstrated with an access time less than 140 ns and a cycle time of 350 ns, using a single 5 V power supply.     

A 200-mW GaAs 1 K SRAM with 2-ns cycle time

A very high-speed and low-power 1024/spl times/1 SRAM has been designed and fabricated using a normally-off recessed-gate FET technology. Minimum gate length is 0.7 /spl mu/m. A minimum access time of 1.4 ns has been obtained with a power dissipation of 210 mW. The memory cell area is 1197 /spl mu/m/SUP 2/ and the chip size is 1.91/spl times/2.21 mm/SUP 2/. The output voltage swing across a 50-/spl Omega/ load is 700 mV. The maximum simulated yield for 1 K SRAMs is discussed theoretically. A mean standard deviation in threshold voltage less than 15 mV is required to obtain 100% design yield. The SRAM has been shown to be fully operational using the march and checkerboard tests and exhibits read and write cycle times of 2 ns.