活性屏等离子体源渗氮技术原理及应用

活性屏等离子体源渗氮技术是一种先进的渗氮技术,消除了常规直流等离子体渗氮技术的固有缺陷,且可处理聚合物材料及表面附着氧化皮的金属材料.本文介绍了活性屏等离子体源渗氮技术传质机理的研究进展,在改性低合金钢、不锈钢、工具钢、聚合物材料以及抗菌功能材料等方面的最新结果,评述了活性屏等离子体源渗氮技术存在的问题和发展趋势.     

活性屏等离子体源渗氮工艺特性及传质机制

为揭示活性屏等离子体源渗氮工艺特性（试样偏压电位和试样距屏高度）对AISI 316奥氏体不锈钢渗氮效果的影响规律,利用最小二乘法线性回归拟合了不同工艺条件下渗氮层厚度数据,绘制了活性屏等离子体源渗氮AISI 316奥氏体不锈钢的工艺特性图,以此确定其最佳工艺参数。并通过对金属网屏上溅射颗粒的化学成分和相结构分析,探讨了活性屏等离子体源渗氮的传质机制。结果表明：渗氮层厚度随试样距屏高度增大而降低,当适当降低渗氮气压或试样施加一定负偏压时,均有助于提高渗氮层的厚度,并且证实了"溅射-再沉积"模型是活性屏等离子体源渗氮重要的传质机制。     

钛合金等离子体表面渗氮改性的研究进展

钛合金具有强度高、耐蚀性好、稳定性好、生物相容性强等特性,在航天航空等行业具有广阔的应用前景,但其硬度低、耐磨性差,使其应用受到了限制。对钛合金进行等离子体表面渗氮强化处理是目前应用较为广泛的技术。本文将对钛合金的直流辉光离子渗氮、活性屏离子渗氮、辅助阴极离子渗氮、空心阴极辅助离子渗氮、激光辅助离子渗氮以及氮离子注入技术等表面等离子体渗氮工艺进行综述。     

材料的活性屏等离子渗氮

近年来,等离子渗氮技术的迅速发展和在表面工程领域的应用呈现出减缓的趋势,其原因是传统的直流等离子体技术存在一些固有的缺点,例如,炉温难以保持均匀,等离子体不够稳定以及因打弧而引起工件表面损伤等。克服这些不足之处的努力促使了活性屏等离子渗氮(ASPN)技术的发展。本文从技术和环境优势角度证明,ASPN可以应用于低合金钢、工具钢、不锈钢以及能进行传统直流等离子渗氮的其他钢种。此外,ASPN可以处理不适合直流等离子渗氮的非导电材料,如经氧化处理的钢和高分子材料。从长远看,对环境友好且技术先进的等离子渗氮比传统的盐浴和气体渗氮更有优势。活性屏等离子渗氮技术是充分发挥等离子体技术在化学热处理及有关表面工程中应用潜力的新方法。     

TC离子渗氮

对渗氮等离子体活性粒子的研究结果 ,提出了与过去完全不同的观点 ,即在渗氮过程中并不是离子 ,而是等离子体中的中性粒子撞击金属表面。正是这些中性粒子对渗氮起作用。因此不需要在被处理的工件上直接生成等离子体。这一重大发现就是“网栅”(TC)或活性屏离子渗氮的基础。这种方法比传统的加工工艺有许多优点。1　工业化学热处理和离子渗氮化学热处理在许多表面加工技术中起着重要的作用。工业上对黑色金属材料 ,要求具有很高的抗疲劳性、承载力和耐磨性。正确设计硬化表层和支承硬化层的深扩散区 ,以及选择适当的基质材料 ,在广大工业部…     

纯氮气氛活性屏离子渗氮的研究

在纯氮气氛中，利用活性屏离子渗氮(ASPN)技术对38CrMoAl钢进行了离子渗氮处理，并对渗层的组织结构、硬度、深度等进行了分析。结果表明，只有直流辉光放电电压高于800V时，在纯氮气氛中才能进行活性屏离子渗氮处理。通过对等离子放电空间的粒子进行XRD分析发现，放电电压低于800V时，沉积在基材表面的粒子主要是氧化铁(Fe3O4)；放电电压高于800V时，沉积在基材表面的粒子才是能进行活性屏离子渗氮处理的铁的氮化物(ε，γ‘)。     

316奥氏体不锈钢的等离子体源渗氮

采用不同的工艺参数,包括渗氮气压、试样与活性屏之间的距离和施加于试样的负偏压,对AISI316奥氏体不锈钢进行了等离子体源渗氮,以研究渗氮工艺对AISI 316不锈钢等离子体源渗氮行为的影响。结果表明:(1)当试样带悬浮电位、渗氮气压为300 Pa时,随着试样与活性屏的间距从20 mm增加至200 mm,渗氮层厚度由18μm减小至7μm,峰值氮浓度从25%降低至17%(原子分数,下同);(2)当试样与活性屏的间距为100 mm时,渗氮气压从300 Pa升高至500 Pa,渗氮层厚度从16μm减少至7.5μm,峰值氮浓度从21%下降至18%;(3)当渗氮气压为300 Pa、试样与活性屏间距为100 mm时,对试样施加200 V负偏压,氮层厚度和峰值氮浓度分别从未施加负偏压的15μm和20%提高到了18μm和24%。AISI 316不锈钢等离子体源渗氮效果随试样与活性屏之间距离的增大而变差,适当降低渗氮气压或对试样施加适当的负偏压,均有助于提高AISI 316不锈钢渗氮层的厚度和氮浓度。     

活性屏离子渗氮技术的研究

在真空室内放置一个钢制网状圆筒，并与直流高压电的负极相接，在直流电场的作用下，通过气体离子对圆筒的轰击溅射，产生了一些纳米数量级的活性粒子，利用这些高活性的纳米粒子簇可以对放置在圆筒内的钢件表面进行渗氮处理。试验证明，这些活性粒子是中性的Fe4N粒子，被处理的工件既可以处于悬浮电位，也可以接地。活性屏离子渗氮可以获得和直流离子渗氮同样的处理效果，并解决了直流离子渗氮技术多年来一直存在的许多难以克服的问题。     

2Cr13不锈钢活性屏等离子体源渗氮层组织与耐蚀性能

目的 探讨活性屏等离子体源渗氮技术提高马氏体不锈钢硬度与耐蚀性能的可行性。方法 将2Cr13马氏体不锈钢进行350～550℃、6 h活性屏等离子体源渗氮处理,采用光学显微镜（OM）、电子探针显微分析仪（EPMA）和X射线衍射仪（XRD）分析渗氮层的组织、成分和相结构,使用显微硬度计测试渗氮层的显微硬度,利用电化学腐蚀试验解析评估渗氮层的耐蚀性能。结果 经活性屏等离子体源渗氮处理后,可在马氏体不锈钢表面形成厚度为2～45μm,N原子分数为20%～25%的渗氮层,其表面显微硬度达1050～1350HV0.25,是基体硬度的4～5倍。350℃时,渗氮层以ε-Fe_2-3N相为主,且含有少量αN相;450℃时,渗氮层由αN、ε-Fe_2-3N和γ’-Fe₄N相构成;渗氮温度升至550℃时,渗氮层由α-Fe、CrN和γ’-Fe4N相构成,αN、ε-Fe2-3N相消失。350、450℃时,渗氮层在3.5%NaCl溶液中的阳极极化曲线出现明显钝化区,而未渗氮的2Cr13不锈钢并未发现钝化区,自腐蚀电位E_corr由未渗...     

高速钢的活性屏离子渗氮

利用活性屏离子渗氮技术对W18Cr4V高速钢进行渗氮处理,对其组织、硬度和渗层深度进行分析,并与普通直流离子渗氮作比较.结果表明,经活性屏离子渗氮处理后.渗氮层硬度梯度变得平缓.且最高硬度不在表面,而是在距表面一定距离处,这将能提高高速钢的耐疲劳性能,改善高速钢的内在质量.     

离子化学热处理及其发展

通过介绍离子化学热处理的背景及其发展,着重阐述了离子渗氮、离子氮碳共渗、离子渗碳等工艺方法及其技术关键,描述了离子化学热处理工艺及设备的新进展。     

Study on the active screen plasma nitriding and its nitriding mechanism

The active screen plasma and DC plasma nitriding of the low alloy steel 722M24 are investigated. Experimental results showed that the metallurgical characteristics and hardening effect on 722M24 steel nitrided by AS plasma nitriding at both floating potential and grounded potential were similar to those nitrided by DC plasma nitriding. Particles sputtered from the active screen and deposited on the specimen surface play the role of the nitrogen carrier in AS plasma nitriding. XRD and high-resolution SEM analysis indicated that the particles with sizes in sub-micron scale were Fe_xN (x > 2). Based on metallurgical analysis and Optical Emission Spectrometer (OES) experimental results, an AS plasma nitriding model has been proposed considering that AS plasma nitriding is a multi-stage process, involving sputtering, physical adsorption, desorption, diffusion and deposition.     

Study of the Active Screen Plasma Nitriding

Active screen plasma nitriding (ASPN) is a novel nitriding process, which overcomes many of the practical problems associated with the conventional DC plasma nitriding (DCPN). Experimental results showed that the metallurgical characteristics and hardening effect of 722M24 steel nitrided by ASPN at both floating potential and anodic (zero) potential were similar to those nitrided by DCPN. XRD and high-resolution SEM analysis indicated that iron nitride particles with sizes in sub-micron scale were deposited on the specimen surface in AS plasma nitriding. These indicate that the neutral iron nitride particles, which are sputtered from the active screen and transferred through plasma to specimen surface, are considered to be the dominant nitrogen carder in ASPN. The OES results show that NH could not be a critical species in plasma nitriding.     

奥氏体不锈钢耐磨和耐蚀复合改性

采用电子回旋共振(ECR)微波等离子体源离子渗氮技术对奥氏体不锈钢进行氮化处理,获得与等离子体浸没离子注入(PII)结果相似的高硬度、高耐磨性表面改性层。     

Surface modification of ultra-high molecular weight polyethylene for joint prosthesis and sports applications

The recent progresses in the surfaee modification of ultra high molecular weight polyethylene (UHMWPE) using such advanced surface modification technologies as conventional ion implantation (CⅡ), new plasma immersion ion implantation (PⅢ) and novel active screen plasma (ASP), were all reported. Significantly improved wear resistance was achieved, which has great potential for extending the life-span of joint replacement prostheses and enhancing the performance of such sports equipment as skis and snowboards.     

钢的等离子体基低能离子注入的传质机制

等离子体基低能离子注入是一种钢的低温,低压表面改性方法,它包括等离子体源离子渗氮和等离子体源离子渗碳两种工艺。等离子体基低能离子注入的主要传质机制是低能离子注入－同步热扩散,即在脉冲负偏压作用下的离子首先完成不依赖于工艺温度的低能离子注入,然后已注入的原子在较低的工艺温度上发生足够的热扩散,等离子体热扩散吸收具有补充的传质作用,但由于工艺温度较低,这种作用很小,连续的热扩散过程有利于改善注入吸收条     

Differences in nitrided layer between classic active screen plasma nitriding and active screen plasma nitriding with hemispherical cathodic cage

Abstract

Active screen plasma nitriding (ASPN) is commonly used when regular surface hardening is necessary. The ASPN technique produces a more homogeneous surface coating than direct current plasma nitriding (DCPN) due to different process principles. The term active screen in plasma nitriding refers to a cathodic cage with a defined geometry. The purpose of this work was to study the differences between ASPN using a hemispherical cathodic cage and ASPN using a normal cylindrical cathodic cage. Following some trials using similar parameters, the tests were carried out with three conditions: with DCPN, with a cylindrical cathodic cage in ASPN and with a hemispherical cathodic cage in ASPN. X-ray diffraction and scanning electron microscopy analysis together with energy dispersive spectroscopy were applied to characterise the nitrided layers. The nitrided layers are not the same for each of the conditions used. The ASPN with a hemispherical cathodic cage produced a layer of almost Fe₃N alone, while the other processes gave significant amounts of Fe₄N in the nitrided layer. Scanning electron microscopy analysis showed different surface morphology for each condition.