线性啁啾相位掩模的设计

啁啾相位掩模法是啁啾光纤光栅的一种非常重要的制作方法。本文研究讨论了用全息干涉方法制作线性啁啾位相掩模的设计方法,提出用两球面波干涉产生条纹密度随空间距离线性变化的干涉条纹记录啁啾位相光栅,按设定光栅端点空频和端点空频差两种优化设计方法设计了长度100mm、啁啾量1nm/mm的线性啁啾光栅,理论和实验结果给出两种设计方案的非线性系数分别为2.5%和1.6%,理论设计和实验结果相符。     

波前编码系统中相位掩膜板的新设计

波前编码技术能扩大非相干光学成像系统的景深。根据传统相位掩膜板的设计原理,从两个方面对原有的相位掩膜板农达式进行扩展。由此提出了两种新的设计方案：“多项式”方案和“高次方”方案。前者是在原有的公式中加入了x平方项,而后者是将原有的高次方指数拓展到小数形式。将这两种新系统进行模拟计算,得到了相关的调制传递函数（MTF）数据和三维图,结果显示MTF随离焦量变化很小（当u=1时,均方差分别为0．0027和0．0021）,而且不会出现零值,跟传统方案MTF差值分别在0．05和0．04以内。由此说明新方案也能实现扩大光学系统景深的目的。     

模因论视角下桂林傩面具的审美嬗变与设计创新研究

目的 从模因论的角度出发,分析桂林傩面具审美嬗变与视觉表征机制,为桂林傩面具的设计推广与传播传承发展提供新的思路和方向。方法 遵循桂林傩面具的形式、观念与审美的历时性变革,将其作为模因复合体剖析,通过选择性注意的过滤器模型与模因传播复制生命周期理论进行传播实验,筛选辨识度高、持续强化的强势模因和辨识度低、逐渐弱化的弱势模因,剖析其视觉表征机制。由此提出强弱模因配比策略,进行设计创新。结论 通过对桂林傩面具模因复合体的内涵解读与设计创新,阐释了桂林傩面具在发展和进化过程中的视觉表征与审美转向,在保持其艺术造型、质料工艺、刻绘装饰与色彩表达强势模因组稳定的视觉传播力之上,强化弱势模因的传播传承能力。并融入现代审美需求,实现视觉设计新突破,赋予其新的文化艺术价值,使桂林傩面具焕发新的文化创造力,也为地域民族文化在新机遇下的有效传承和创新提供了可行途径和方法。     

Cross-talk Noise and Storage Capacity of Holographic Memories with a LiNbO(3) Crystal in the Open-Circuit Condition

A solution to the Kukhtarev equations is obtained for a typical holographic memory system in which multiplexed holograms, including the effects owing to a nonuniform beam profile in the focal regions, are used. The various noise mechanisms and storage capacity are analyzed on the basis of this solution. The cross-talk noise of a typical 4f holographic memory configuration with defocus is compared with that of a phase mask. It is shown that the memory capacity and the signal-to-noise can be significantly improved by design of an optimal phase mask. The experimental results with defocus and an eight-level phase mask are presented.     

Fabrication of phase masks with variable diffraction efficiency using HEBS glass technology

A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed.     

超平多媒体彩管用平板荫罩的设计方法

提出了一种超平多媒体彩管用平板荫罩的设计计算方法 ,既提高了管子的分辨率 ,同时不用制作新的荫罩成形模具 ,并且新管子的制作可以在普通彩色显像管的流水线上完成。通过装管试验 ,分辨率从原来的 6 0 0余线提高到近 80 0线 ,整机显示质量良好。     

赣傩面具文化因子提取及应用

目的 赣傩面具文化是中国传统文化一颗璀璨的明珠,探索赣傩面具文化因子在文创产品中的应用策略。方法 将赣傩面具文化因子引入文创产品的设计范畴,拓宽赣傩面具文化在文创产品设计中的应用范围。通过分析赣傩面具文化因子与文创产品设计的关系及结合方法,阐述赣傩面具文化因子的构成元素,提炼其在形态基因、色彩基因、纹样基因和语义因子等方面的突出特点,寻找文化基因的传播方式和提取模式,构建其在文创产品设计中的新模式。结论 将赣傩面具文化因子与文创产品设计结合,既突出了赣傩面具文创产品的独特性,也提升了其文化附加值,更彰显了赣傩面具文化传承的意义与当代价值。     

Novel approaches to the design of halftone masks for analog lithography

We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.     

Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography

Si–O–N–F has been studied as a new candidate material for a high transmittance attenuated phase shift mask (HT-Att-PSM). The requirements of HT-Att-PSM are 20 ± 5% transmittance and 180° phase shift at the exposure wavelength (157 nm) and less than 40% transmittance at the inspection wavelength (193 nm). Si–O–N–F films were deposited with varying process parameters, such as gas flow rate and deposition time, to find optimum conditions to meet the above requirements. In this study, the effects of process parameters on the optical properties and the degradation of Si–O–N–F films were examined. To satisfy the requirements of HT-Att-PSM, a new mask structure was suggested and analyzed.     

Extended depth of field through wave-front coding

We designed an optical-digital system that delivers near-diffraction-limited imaging performance with a large depth of field. This system is the standard incoherent optical system modified by a phase mask with digital processing of the resulting intermediate image. The phase mask alters or codes the received incoherent wave front in such a way that the point-spread function and the optical transfer function do not change appreciably as a function of misfocus. Focus-independent digital filtering of the intermediate image is used to produce a combined optical-digital system that has a nearly diffraction limited point-spread function. This high-resolution extended depth of field is obtained through the expense of an increased dynamic range of the incoherent system. We use both the ambiguity function and the stationary-phase method to design these phase masks.     

Color image security system using double random-structured phase encoding in gyrator transform domain

A novel method for encoding color information based on a double random phase mask and a double structured phase mask in a gyrator transform domain is proposed. The amplitude transmittance of the Fresnel zone plate is used as structured phase-mask encoding. A color image is first segregated into red, green, and blue component images. Each of these component images are then independently encrypted using first a random phase mask placed at the image plane and transmitted through the first structured phase mask. They are then encoded by the first gyrator transform. The resulting information is again encrypted by a second random phase mask placed at the gyrator transform plane and transmitted through the second structured phase mask, and then encoded by the second gyrator transform. The system parameters of the structured phase mask and gyrator transform in each channel serve as additional encryption keys and enlarge the key space. The encryption process can be realized with an electro-optical hybrid system. The proposed system avoids problems arising from misalignment and benefits of a higher space-bandwidth product. Numerical simulations are presented to confirm the security, validity, and possibility of the proposed idea.     

Extended hartmann test based on the pseudoguiding property of a hartmann mask completed by a phase chessboard

We propose to add a specific phase chessboard to the classical Hartmann mask used for wave-front sensing. By doing this we obtain a pseudoguiding of the energy issuing from this mask, allowing for an increase in the sensitivity of the Hartmann test. This property is illustrated by experiment, and a comparison between classical and new Hartmanngrams is presented.     

Phase-only optical decryption of a fixed mask

We present a system for the implementation of phase-only optical decryption of an encrypted fixed phase mask. We achieve decryption by superimposing a decrypting phase key, implemented on a phase-only spatial light modulator with an encrypted phase mask in two equivalent image planes in an optical system. The decrypted phase information is retrieved by the generalized phase-contrast technique. We have constructed a compact experimental system that uses a 635-nm diode laser in which a fixed encrypted 0/pi binary phase mask is decrypted by a binary phase key produced electronically on the spatial light modulator. The key is aligned by electronic scrolling of its position with respect to the mask.     

Selective edge enhancement using anisotropic vortex filter

In optical image processing, selective edge enhancement is important when it is preferable to emphasize some edges of an object more than others. We propose a new method for selective edge enhancement of amplitude objects using the anisotropic vortex phase mask by introducing anisotropy in a conventional vortex mask with the help of the sine function. The anisotropy is capable of edge enhancement in the selective region and in the required direction by changing the power and offset angle, respectively, of the sine function.     

满族面具图案模数化再设计研究

目的 基于用户需求视角探讨满族面具图案的优化再设计,提高图案自身的时代性与功能性,使其更受新时代用户青睐,促进满族面具图案的活态发展与传承。方法 首先,运用KANO模型对图案再设计的用户需求进行属性划分;其次,使用AHP（层次分析法）构建需求层次模型,计算各层级的权重系数及优先级排序,并结合需求属性进行设计策略分析;再次,根据设计策略,制定图案文化内涵、情绪价值以及造型特征属性的设计方案;最后,根据现存问题引入模数化方法,进行图案网格形态、特征线条、填充色彩的再设计实践及应用,以验证设计方案的可行性。结果 运用KANO模型、AHP（层次分析法）以及模数化方法集成的再设计模型,得到一套更受用户喜欢的满族面具再设计图案作品。结论 通过用户需求视角的策略分析与模数化方法的设计实践,进一步提高了满族面具图案再设计作品的用户认可度,为满族面具图案及相关传统图案的创新设计提供了思路参考。     

针对疫情时期防护用口罩不适问题的结构改良设计

目的 针对防护用口罩在长时间穿戴时普遍存在的不适问题进行改良设计,以求提高人体穿戴体验、避免不适感对人体产生负面影响.方法 基于U-TRIZ理论的解题方法,探讨了防护用口罩的不适问题,提出疫情突发时期物资紧缺、社会生产压力大、医护人员长时间工作等特殊情况下的口罩改良原则和结构改良设计方案,并通过设计实践和穿戴实验对改良设计方案进行可行性验证.结论 经新冠肺炎疫情期间的穿戴实验证明,可调节式口罩带、分散压力式气囊口罩沿和眼镜防滑条的口罩结构改良设计,可有效解决现有口罩大部分不适问题.有效改善因压力不均而脸部疼痛、因口罩带拉力而耳部疼痛和眼镜滑动的问题,有效缓解因密合度不够而眼镜起雾的问题,使口罩的穿戴舒适度提升,同时更加契合面部形态、缩短穿戴时间.     

Shift-tolerance property of an optical double-random phase-encoding encryption system

We investigate the shift-tolerance property of the decrypting phase mask in an optical double-random phase-encoding encryption system. A simple method for improving the shift tolerance of the phase mask is proposed. We demonstrate how the robustness to data loss of the encrypted image extends the shift tolerance of the decrypting phase mask. The signal-to-noise ratio is calculated. Both a computer simulation and an experiment are presented.     

任意形状图形的灰度掩模图的设计系统研究

灰度掩模技术是制作三维微纳结构的有效方法之一,灰度掩模图设计是灰度掩模技术的重要组成部分.目前,在微机械器件制作领域中,通常只给出常用规则形状三维结构对应的灰度掩模图的设计方法,对于任意形状图形的灰度掩模图设计鲜有报道.本文综合灰度光刻技术中的编码原理和有限元法中的铺路法,提出了适合于任意形状图形的灰度掩模图设计算法,解决了误差处理和图形闭合两个关键问题,给出了算法及图形的评价方法,并利用AutoCAD二次开发工具ObjectARX研究了算法的程序实现,构建了灰度掩模图的设计系统.利用该系统设计了多幅常规规则形状和任意形状灰度掩模图,结果表明,该系统可以高效地设计任意形状图形的灰度掩模.研究工作为任意形状图形灰度掩模图的设计提供了一种新方法,可以提高灰度掩模图的设计效率,为三维微纳器件的制作提供技术积累.     

Interleaved,sampled fiber Bragg gratings for use in hybrid wavelength references

We discuss the design and fabrication of interleaved, sampled fiber Bragg gratings (ISFBGs) for use in hybrid wavelength calibration references covering the 1300-1600-nm region. We demonstrate use of sampled phase masks (SPMs) to make sampled gratings and ISFBGs. The success of the SPM technique suggests a single-exposure method with an interleaved, sampled phase mask to make ISFBGs.     

Experimental study of the effects of a six-level phase mask on a digital holographic storage system

We measure the M/# and the bit-error rate of a digital holographic storage system with a 4f optical arrangement for three configurations: recording at the Fourier plane with and without a phase mask and recording outside the Fourier plane without a phase mask. Unexpectedly, no significant change in the dynamic range was observed when a phase mask was used to record in thick crystals. However, we show that a phase mask is a key component in a 4f digital holographic storage system if high-fidelity holograms with optimum volumetric density are to be stored.