SnAgCu-xBi/Cu焊点界面反应及微观组织演化

本工作在Sn-3.0Ag-0.5Cu焊料中添加不同含量的Bi(0.1%,0.5%,1.0%(质量分数)),以此来研究Bi含量对Sn-3.0Ag-0.5Cu/Cu焊点的界面反应及金属间化合物微观组织演化的影响。结果发现:回流反应之后,焊点界面形成扇贝状的Cu_6Sn_5,对焊点进行时效处理后发现,在Cu_6Sn_5层与Cu基板之间又出现了一层Cu_3Sn,并且Cu_6Sn_5层的上表面及焊料中出现了颗粒状的Ag_3Sn,Ag_3Sn颗粒的数量随着时效时间的延长而增多;5d的时效处理之后,在Cu基板的上表面和Cu_3Sn层中发现了柯肯达尔孔洞,同时在大多数焊点界面的Cu_6Sn_5层的上表面和Cu_6Sn_5层中出现了裂纹,推测裂纹是由于热膨胀系数差导致的残余应力而形成的。时效过程中,焊点界面金属间化合物(IMC)层的厚度不断增加,并且IMC的平均厚度与时效时间的平方根呈线性关系。对比未添加Bi元素的Sn-3.0Ag-0.5Cu/Cu焊点发现,添加微量的Bi元素对IMC层生长有抑制作用,当Bi含量为1.0%时,抑制作用最为明显,而Bi含量为0.5%时,抑制作用最弱。Cu_6Sn_5晶粒的平均直径随着时效时间的延长而增加,且Cu_6Sn_5晶粒的平均直径与时效时间的立方根呈线性关系。     

Sn8Zn3Bi-xCu/Cu焊接接头界面反应及力学性能研究

以Sn8Zn3Bi为研究对象,采用微合金化方法研究了不同含量的Cu元素对其显微组织、钎料合金与Cu基板钎焊后的界面金属间化合物(IMC)层尺寸及焊接接头剪切强度的影响。结果表明,Sn8Zn3Bi-xCu/Cu(x=0.3,0.5,0.8,1.0,1.5)焊接界面IMC主要为层状Cu5Zn8相。随着Cu含量的增加,界面IMC层的厚度逐渐减小,接头的剪切强度逐渐提高,Sn8Zn3Bi-1.5Cu/Cu接头剪切强度较Sn8Zn3Bi/Cu显著提高。经120℃时效处理后,Sn8Zn3BixCu/Cu(x=0,0.3,0.5,0.8,1.0,1.5)焊接接头剪切强度都明显下降,接头断裂方式由韧性断裂转为局部脆性断裂,但添加了Cu元素的钎料界面IMC生长速度较Sn8Zn3Bi钎料慢,因此Cu元素的添加抑制了界面IMC层的生长。     

200℃等温时效下SAC305/Co-5％P焊点的界面组织及断裂模式演变

目的研究BGA封装的SAC305/Co-5%P焊点在200℃等温时效下的界面反应。方法制备SAC305/Co-5%P的BGA焊点,200℃等温时效0, 200, 400, 600, 1000 h,采用场发射扫描电镜(配EDS)观察不同时效时间下SAC305/Co-5%P焊点界面的IMC形貌与断口特征,采用焊点接合强度测试仪测试相应的剪切强度变化。结果时效1000 h时,在钎料/Co Sn3的IMC层界面处生成(Cu, Co)_6Sn_5,界面CoSn3的IMC之间的通道得到填充,界面形貌变得平整。随着时效时间的增加,焊点的剪切强度先增后降,位于Sn层断口的断裂模式由韧性断裂向韧脆混合型断裂转变。结论随着时效时间的增加,界面IMC层厚度不断增加,界面IMC形貌发生改变。     

时效对无铅焊料Ni-P/Cu焊点的影响

研究了150℃等温时效为62Sn36Bp2Ag/Ni-P/Cu及共晶SnAg/Ni-P/Cu表面贴装焊点微结构及塑切强度的影响,结果表明,在钎料与Ni-P间的界面存在Ni3Sn4金属间化合物层,其厚度随时效时间增加,Ni-P层的厚度减小,时效后,SnPbAg,SnAg焊点的剪切强度下降,对于SnAg焊点,时效250h后其剪切强度剧烈下降,断裂发生在Ni-P/Cu界面上,在长时间时效后焊点一侧的Ni-P层中P的含量较主可能是Ni-P/Cu结合强度变差的主要原因,SnPbAg焊点保持着较高的剪切强度。     

Sn2.5Ag0.7CuxRE钎料时效焊点界面IMC研究

以Sn2.5Ag0.7CuxRE/Cu钎焊为研究对象,借助于扫描电镜和X衍射检测手段,研究了二硫化钼介质下时效焊点界面IMC组织结构特征及生长行为。实验结果表明:时效焊点界面Cu6Sn5IMC呈现由波浪状→扇贝状→层状的形态变化。焊点界面Cu6Sn5和Cu3Sn IMC的生长厚度与时效时间平方根呈线性关系,Cu6Sn5IMC具有较小的生长激活能、较大的生长系数。添加0.1%(质量分数)RE时,界面Cu6Sn5和Cu3Sn IMC的生长激活能最大,分别为81.74 kJ/mol和92.25 kJ/mol,对应焊点剪切强度最高。     

Cu基板表面镀镍浸金保护层对无铅焊点可靠性的影响

结合Sn-3.5Ag和Sn-3.0Ag-0.5Cu两种无铅钎料研究了镀镍浸金层(Electroless Nickel Immersion Gold,ENIG)表面层对焊点界面反应以及力学性能的影响。结果表明,钎焊后在Sn-3.5Ag/ENIG/Cu界面主要生成(Ni_yCu_(1-y))_3Sn_4,在Sn-3.0Ag-0.5Cu/ENIG/Cu界面主要生成(Cu_xNi_(1-x))_6Sn_5。在Sn基钎料/ENIG(Ni)/Cu界面处生成金属间化合物的种类及形貌由焊点中Cu原子含量决定。在时效过程中,ENIG表面层中Ni层有效抑制了焊点界面处金属间化合物的生长,减缓了焊点剪切性能的下降。在钎焊过程中ENIG表面层中的Au层不参与界面反应而是进入钎料基体与Sn反应,但是在时效过程中Au原子向界面迁移并造成焊点界面金属间化合物成分和焊点剪切强度的明显变化。     

激光钎焊Sn-0.7Cu/Cu界面IMC生长行为EI北大核心

金属间化合物IMC厚度及形貌对焊点力学性能起到关键作用。本工作以激光为加热热源,Cu为基底,研究钎焊时激光功率以及激光扫描速度对Sn-0.7Cu无铅焊料界面金属间化合物生长规律的影响。结果表明:不同激光参数下,得到的界面金属间化合物形貌及厚度存在差异。随着激光功率增大,界面处形成的Cu6Sn5IMC层变厚;而随着扫描速度增大,IMC厚度减小;界面IMC厚度变化与功率及扫描速度有如下函数关系:d=D0+Kp/v。     

回流冷却与等温时效过程中Sn-35Bi-1Ag/Ni-P/Cu焊点组织演变

通过回流焊接方法,采用水、炉两种冷却方式分别制备了Sn-35Bi-1Ag/Ni-P/Cu快、慢冷钎焊接头。利用等温时效法对两种焊点界面IMCs层的生长动力学进行研究。采用SEM和EDS对界面层的微观结构和物相组成进行表征。结果表明:快冷条件的钎焊界面为(Ni,Cu)3Sn4+Ni3P的复合结构;慢冷条件下界面结构为(Ni,Cu)3Sn4+Ni3P+(Cu,Ni)6Sn5。等温时效过程中Ni-P层逐渐消耗,(Ni,Cu)3Sn4生长变慢,(Cu,Ni)6Sn5生长遵循时间的平方根动力学,界面IMCs的生长表现为扩散机制控制。两种焊点界面层最终均演化为(Cu,Ni)6Sn5+(Ni,Cu)3Sn4+(Cu,Ni)6Sn5的复合结构。钎焊时效中慢冷焊点IMCs层厚度均大于同等条件的快冷IMCs层,慢冷时界面层IMCs生长速率为4.670×10-18 m2/s,快冷时为3.816×10-18 m2/s,表明钎焊冷却速率影响钎焊及服役过程中焊点的老化行为。     

纳米Cr颗粒对Sn-Zn-Bi-In/Cu钎焊焊点性能的影响

通过向Sn-Zn-Bi-In钎料中添加不同含量的纳米Cr颗粒制成新型复合钎料Sn-5Zn-10Bi-10In-xCr(x=0％,0.1％,0.3％,0.5％,质量分数),探讨纳米C r颗粒对时效前后钎焊焊点的组织形貌、元素分布、物相组成和力学性能的影响.结果表明:纳米Cr颗粒的添加能够抑制焊点金属间化合物(IMCs)的生长,随着纳米Cr颗粒含量的增加,IMCs扩散层厚度逐渐降低;界面处IMCs扩散层靠近母材Cu一侧为Cu5 Zn8相,靠近钎料区一侧为Cu6 Sn5相;随时效时间的增加,钎料侧部分Cu5 Zn8化合物长大分解,Cu3 Sn相形成;纳米Cr颗粒抑制了时效过程中IMCs扩散层的进一步长大;随着纳米Cr颗粒含量的增加,焊接焊点的剪切强度和显微硬度均先增加后下降,Sn-5Zn-10Bi-10In-0.3Cr/Cu焊点的剪切强度和硬度最高;时效后焊件的剪切强度比时效前均有所下降,但纳米Cr颗粒的添加使焊点保持了良好的剪切强度,时效后焊点钎料区显微硬度比时效前有所上升,但也始终保持在30HV0.1以下.     

时效对平面接触型铜/铝设备线夹组织结构及性能的影响

采用超声波浸锡-铅合金钎焊技术制备平面接触型铜/铝设备线夹。通过150℃长时间保温(直至720h)的人工时效,研究线夹在高温运行条件下的显微组织结构变化及其对线夹结合性能、电学性能产生的影响。结果表明:时效导致线夹铜板与锡-铅合金钎料界面间形成由Cu6Sn5和Cu3Sn构成的金属间化合物(IMC)层,同时在IMC层前沿的锡-铅钎料中形成富铅层。时效过程中,IMC层遵守抛物线生长规律,生长系数k=3.5×10-17 m2/s。随着时效的进行,线夹的剪切强度持续降低,时效720℃后,剪切强度下降近20%。线夹的断裂机制也由沿钎料内部的韧性断裂向沿富铅层的脆性断裂转变;同时线夹的电阻率也明显升高。     

Cu Diffusion in Co/Cu/TiN Films for Cu Metallization

Some information on how to use in-situ determined diffusion coefficient of Cu to make barrier layer of Cu metallization in ultra large scale integrations （ULSIs） was provided. Diffusion coefficients of Cu in Co at low temperature were determined to analyze Cu migration to Co surface layer. The diffusion depths were analyzed using X-ray photoelectron spectroscopy （XPS） depth profile to investigate the diffusion effect of Cu in Co at different temperatures. The possible pretreatment temperature and time of barrier layer can be predicted according to the diffusion coefficients of Cu in Co.     

A Cu/ZnO Nanowire/Cu Resistive Switching Device

Nano-Micro Letters - A new device has been realized using flip-chip joining two printed circuit boards (PCBs) on which zinc oxide (ZnO) nanowires were synthesized. Energy dispersive X-ray...     

Interdiffusion phenomena in Au/Cu and Cu/Au bilayers

The microstructures of epitaxial deposits of (111) Cu/(111) Au and (111) Au/(111) Cu at various stages of interdiffusion are described. The most prominent microstructural features of Au/Cu films (where gold deposition occurred at temperatures less than 400 °C) were (Matthews) coincidence lattice misfit dislocations lying along < 1$\text{1}$0 > directions in the film plane with $\text{|b| =}\text{a}\text{2}\text{< 110 >}$ directed out of the film plane. Their spacings, transmission electron microscopy (TEM) hot stage behavior and generation mechanisms are discussed. For more severe diffusion anneals, the coincidence dislocation density decreased and hexagonal networks identified as ( van der Merwe) natural lattice misfit dislocations became resolvable. They are edge type (lying along <11$\text{2}$> directions in the film plane) with $\text{|b| =}\text{a}\text{2}\text{< 1}\text{1}\text{0 >}$. For the case of Cu/(111) Au bilayers, copper deposited at and below 315 °C with a 20 min anneal again showed coincidence misfit networks. Higher temperature deposition of copper (or hot stage annealing) resulted in natural lattice misfit dislocations in the microstructure. The densities of both types of dislocations were determined and their TEM hot stage behavior was investigated. The method by which the two networks contribute to the relief of misfit strain in both bilayers is discussed.     

Cu surface segregation in Ni/Cu system

We report experimental evidence of Cu surface segregation in Ni/Cu system, during deposition of Ni film onto Cu substrate at room temperature and during heat treatment in vacuum. Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) by Tougaard's analysis results show that surface segregation defeats in competition with increase in Ni thickness and terminates when thickness of Ni increase to more than 4 nm. Surface energy and concentration were calculated using contact angle measurements and the results confirm that segregation reduces the surface energy. Surface segregation during heat treatment at 150-220 °C range as a function of time initially shows linear mass transfer. By solving Fick's equation and taking empirical diffusion coefficient, 125 ± 20 kJ/mol is obtained for activation enthalpy of effective diffusion.     

Optimization of Magneto-Optical Kerr Effect in Cu/Fe/Cu Nano-structure

We use an analytical approach to describe the optical response of a magnetoplasmonic structure upon surface plasmon polariton (SPP) excitation in glass/Cu/Fe/Cu multilayer. The proposed structure is based on Kretschmann prism couplers, Fe layer as magneto-optical (MO) medium, and Cu layer as plasmonic metal layer, to enhance the MO effects thanks to the resonant excitation of surface plasmons. The influence of constituent layer thicknesses and layer order is investigated to obtain the maximum MO Kerr signal and figure of merit (FOM) in polar geometry. In addition, we show a range of parameters to determine the maximum Kerr rotation accompanied by minimum Kerr ellipticity which is desirable for data storage applications. Results demonstrate the important role of film thicknesses and incidence angle distribution on resonant excitation of surface plasmons.     

Magnetization behaviour in ultrathin Co/Cu/Ni/Cu(001) trilayers

The magnetization of ultrathin multilayer systems depends in a very sensitive way on their composition. We consider the temperature dependence of magnetization and its orientation in three types of trilayers: 2ML Co/2ML Cu/4ML Ni/Cu(001), 1ML Co/2ML Cu/4ML Ni/Cu(001) and 1ML Co/2ML Cu/3ML Ni/Cu(001). The composition of each system leads to different interdependence of ordering temperatures characterizing the ferromagnetic films. It is shown that in all cases the sublayer magnetizations change gradually their directions as a function of temperature. The use of Néel sublattices concept in Valenta approach allows us to present all dependences in a layer resolved mode which leads to the conclusion that the spin reorientation process runs through non collinear magnetic superstructures.     

Solid state spreading in the Cu/Cu system

Solid state spreading of copper particles on a copper polycrystalline substrate was analysed at 1050^°C. A specific procedure was settled to produce pure monocrystalline and nearly spherical copper particles. Spreading dynamics were analysed from SEM images and preferential particle/substrate orientations were identified by EBSD. The effect of a preferential orientation on the spreading kinetics is limited, if any. A general agreement is found between the kinetic results and numerical calculations of Mullins [1] for mass transport by surface diffusion under the action of surface curvature gradients. The experimental kinetics are however significantly more rapid, due to the contribution of other mechanisms like volume diffusion.