镀膜玻璃膜层均匀性探讨

本文对镀膜玻璃的膜层均匀性问题作了初步的探讨。侧重于从溅射原子的沉积过程来分析边缘效应对膜层横向均匀性的影响。     

行星夹具膜厚均匀性分析

利用数学理论模型对平面行星夹具进行膜厚分布分析;然后采用电子束蒸发技术,以常用的Ta2O5和SiO2作为镀膜材料,在该行星夹具上分别沉积一定厚度的Ta2O5和SiO2单层膜,通过对光谱曲线的分析得两种膜料的膜厚的不均匀性都5%,并模拟得出两种膜料大概的蒸发特性n值。为了得到更好的膜厚均匀性,在蒸发源和行星夹具之间加装修正板,同样沉积一定厚度的Ta2O5和SiO2单层膜,此时两种膜料的膜厚的不均匀性减小到1%。     

蒸发镀膜基片工装改进与镀膜均匀性研究

红外滤光片,尤其是中长波红外窄带滤光片等光谱指标要求较高的红外光学薄膜,膜层厚度能达到几十微米,因而对膜料的需求非常大.当镀膜真空室较大时,一次填料不能满足膜料用量需求,通常采用减小蒸发距离的方式提高膜料的利用率,但同时会使膜厚均匀性变差,光谱性能变差.通过镀膜理论分析,在满足产品镀膜均匀性的前提下,设计了一套可自由调...     

用于标定镀膜机的膜厚样板的制备和测量

镀膜在国民经济生活中得到广泛应用。影响镀膜性能的一个主要参数是膜层在整个基片上的厚度均匀性。利用挡板在基片上多个区域沉积台阶,测量台阶高度的差值用于分析膜厚的均匀性。通过集成非接触聚焦式测头的纳米测量机进行测量,针对镀膜产品上各个特殊的曲面台阶,以参差平方和为标准,用基底无台阶区域的曲线模型拟合台阶底部曲线,参考ISO 5436-1：2000的台阶评价方法,对镀膜基片上多台阶进行了评价。该方法可以用于镀膜机的验收。     

磁控溅射膜层厚度均匀性测试

在相对于平面磁控溅射阴极均匀区范围内安放硅片，镀膜后进行膜层厚度测试，然后计算膜层厚度均匀度。结果，片间厚度均匀性为1％～-1．7％；炉间厚度均匀性为3．5％～-2％。     

复合纳米金膜的制备及其光学性质

本文利用化学还原法制备了不同尺寸的金纳米颗粒,并利用离子自组装多层技术在玻璃基底上沉积了基于金纳米颗粒的复合纳米金膜,研究了颗粒尺寸和成膜厚度对复合金膜光学性质的影响。不同比例的柠檬酸钠与氯金酸产生的金纳米颗粒溶液的紫外-可见光谱随着金颗粒直径增大而红移展宽。适量比例的柠檬酸钠与氯金酸能够产生平均直径为14±1.2nm且尺寸分布均匀的金纳米球;其溶液在518nm处有一特征吸收峰。不同大小的金纳米颗粒形成的薄膜的紫外-可见光谱形状不同,局域表面等离子体共振峰的位置随着颗粒直径的减小而向短波方向迁移。薄膜的沉积层数越多,薄膜表面的颗粒分布越均匀,局域表面等离子体峰的峰值变化也将减小。本工作证实了利用离子自组装多层技术能够快速、简易、低成本地在玻璃基底上沉积具有局域表面等离子体共振的复合纳米金膜。     

Manufacture and Measurement of Film Thickness Sample for Calibration of Coating Machine

镀膜在国民经济生活中得到广泛应用.影响镀膜性能的一个主要参数是膜层在整个基片上的厚度均匀性.利用挡板在基片上多个区域沉积台阶,测量台阶高度的差值用于分析膜厚的均匀性.通过集成非接触聚焦式测头的纳米测量机进行测量,针对镀膜产品上各个特殊的曲面台阶,以参差平方和为标准,用基底无台阶区域的曲线模型拟合台阶底部曲线,参考ISO 5436-1:2000的台阶评价方法,对镀膜基片上多台阶进行了评价.该方法可以用于镀膜机的验收.     

中频反应溅射SiO2膜与直流溅射ITO膜的在线联镀

多数ITO透明导电玻璃生产线在实现SiO2膜与ITO膜在线联镀时，应用SiO2靶射频溅射沉积SiO2膜工艺和ITO靶直流溅射沉积ITO膜工艺，如果SiO2膜应用硅靶反应磁控溅射工艺，存在这种工艺是否可以与ITO靶直流溅射沉积ITO膜工艺在线联用以及如何实现联用的问题。作者对现有的生产线进行了改造设计、加工，做了大量实验、质谱分析和多项测试研究，成功地实现反应溅射SiO2膜与ITO膜在线联镀，做到SiO2镀膜室的工作状态的变化基本上不影响ITO镀膜室的工艺条件。     

ZnO/Cu多层膜的制备及电磁屏蔽性能研究

采用磁控溅射法在涤纶水刺非织造布表面沉积纳米结构Cu单层膜和ZnO/Cu多层膜,利用原子力显微镜(AFM)对薄膜表面形貌进行分析,并利用四探针测试仪和矢量网络分析仪对样品的电学性能进行了测试。结果表明,在ZnO薄膜表面生长的Cu膜比在PET织物表面生长的Cu膜的均匀性、电学性能要好;在Cu镀膜时间相同的情况下,随着ZnO镀膜时间的增加,多层膜ZnO/Cu的电学性能先提高后降低,当ZnO镀膜时间为20min时,多层膜的电学性能达到最好;在ZnO镀膜时间相同的情况下,随着Cu镀膜时间的增加,多层膜ZnO/Cu的电学性能和织物表面颗粒均匀性经历了先提高、最后趋于稳定的过程,屏蔽效能最大平均值达到56dB。     

镀膜玻璃膜系的光学性能分析与制造方法

本文主要分析了镀膜玻璃膜系的光学性能和膜层的作用，并通过膜系的光谱特性曲线对同类型或不同类型膜系光学参数进行了比较，最后介绍了镀膜方法，并简要介绍了ＬＨ公司真空镀膜生产线     

荧光薄膜材料荧光特性对荧光显微镜分析测量效果的影响

荧光显微镜测量结果的准确性,受仪器的线性动态范围、光场均匀性及光源稳定性等因素影响。运用荧光薄膜材料对荧光显微镜进行实验验证,发现荧光线性、均匀性及稳定性等荧光特性对于荧光显微镜分析测量效果十分重要。对荧光薄膜材料的光谱特性、线性、均匀性及光稳定性等方面进行研究,建立了荧光薄膜材料荧光特性的测量方法,对荧光显微镜校准方法进行了初步探索,为荧光显微镜的校准奠定了基础。     

氧化锌脱膜和激光刻蚀制备亚微米自支撑聚酰亚胺薄膜及其性能

探讨小于1 μm自支撑聚酰亚胺薄膜的制备及其性能。以稀盐酸为腐蚀剂, 对涂于氧化锌衬底上的聚酰胺酸薄膜进行剥离, 经热亚胺转化为聚酰亚胺薄膜, 再用准分子激光对其刻蚀减薄。采用原子力显微镜、傅里叶变换红外光谱仪和分光光度计对薄膜的微观结构和光谱性能进行了表征。结果表明, 以室温下溅射的氧化锌薄膜为脱膜剂, 制备了厚度约950 nm的自支撑薄膜, 而激光刻蚀使聚酰亚胺薄膜厚度减薄至150 nm。厚度分别为950和150 nm薄膜的红外谱中均出现了聚酰亚胺特征吸收峰(1775、1720、1380和725 cm^-1), 且两者在400~2500 nm范围的平均透过率分别为80.3% 和83.5%。     

基于遗传退火算法的多层薄膜厚度测量

根据薄膜光学计算理论和最优化理论,本文提出了一种测量多层薄膜厚度的新的全局优化算法.首先利用遗传的种群性去寻找多个局部极值,然后将较优和较差的种群按一定概率接收并作为模拟退火的初值进行搜索.最后结合共轭梯度算法来提高收敛速度,使整体搜索效率进一步提高.这种遗传退火算法有效地提高了算法的稳定性,减少了算法对膜厚搜索范围的限制.文章最后以3层和4层光擘薄膜为例,利用该算法在10 nm至5 μm的大范围内搜索,所取得的结果,其测量误差小于1%.     

倒圆锥面基底蒸发镀膜均匀性理论分析

通过计算得出了蒸发源位于倒圆锥面正下方外部镀膜时锥面上各点的膜厚方程,并对整个锥面上膜厚均匀性进行了理论分析。结果表明：当圆锥面形状固定时,蒸发源与圆锥底圆圆心距离增大使锥面上膜厚均匀性变好;当蒸发源固定时,增大底圆半径导致锥面上膜厚均匀性变差。在同样的配置下,蒸发源为点源或小平面源时锥面上膜厚均匀性的变化趋势一致,小平面源蒸镀比点源蒸镀时圆锥面上膜厚均匀性差。     

The effects of film thickness variations on the residual stress distributions in coated Cr thin films

Generally, the residual stress of thin film coatings is calculated using Stoney's equation. However, variables in the manufacturing of the coated film, such as crystalline particle size and the unevenness of the thickness of the film, cause the radius of curvature of the beam to vary all over the beam. The cantilever beam curves not only in the axial direction but also in the transverse direction. Therefore, the residual stress in a film coating comprises not only axial residual stress but also transverse residual stress, and its distribution is also not uniform. Under such conditions, Stoney's equation must be modified. In this study, Si was used as a substrate in the production of cantilever beam specimens. Chromium thin films of various thicknesses were coated onto the Si substrates. The 3D digital image correlation technique was used to measure the out‐of‐plane displacement of the specimens at various positions. Then the modified Stoney's equation was used to obtain the axial and transverse residual stress at each measurement point to study the effect of variations in the thickness of the thin film on the magnitude and uniformity of the distribution of the residual stresses. Three thin film thicknesses 1, 2, and 3 μm were studied, and three specimens for each thickness were used. For each specimen, axial and transverse residual stresses were obtained at nine test points, and the equivalent residual stress was calculated. The results of this study reveal that as the difference between the thicknesses of the coating increased, average equivalent residual stress decreased and the distribution of stresses became more uniform. By comparing the corresponding results for the 1‐ and 3‐μm‐thick films revealed that the confidence levels in the average value and uniformity of the equivalent residual stress distribution, which increased with thickness, were 92.81% and 80.57%, respectively.     

The Influence of Tablet Shape and Pan Speed on Intra-tablet Film Coating Uniformity

Four different tablet shapes (round, oval, capsule, and large oval) were coated in a small-scale coating pan at three different pan rotational speeds. The coating film thickness was measured on the top face, the edge of the land, and the belly band of each tablet shape. The results showed that tablet shape directly influences intra-tablet coating uniformity (uniformity decreasing from round, oval, capsule, to large oval). In almost all cases, coating uniformity increased with pan speed.     

实时光学薄膜膜厚监控系统研究

在光电极值法基础上采用一定的信号采集方法、数据处理和极值点判断算法,通过硬件电路和高级程序语言设计了膜厚监控系统.实验表明,该系统能够对光学薄膜镀制过程进行实时在线跟踪,以及对膜层厚度的准确控制.     

光反射干涉谱新方法测试薄膜厚度和光学常数

依据测量薄膜和光之间相互作用可确定薄膜特性的原理,并基于光反射干涉谱与德国最新研发薄膜分析软件SCOUT的新方法可测量已知或未知材料的多层薄膜厚度及其折射率n、消光系数k。通过实际测试证明：该方法可测试单晶硅、玻璃、ITO玻璃基底上沉积薄膜的厚度,样品基本不需要特别准备,对样品无破坏性,测试精准。理论上可以测量所有透光或半透光薄膜的厚度和光学常数,操作非常简便,适合于镀膜行业的在线检测和实时监控,且SCOUT软件在多层膜及多种材料的研发、制备等方面具有应用潜力。     

Uniformity of film thickness on rotating planetary planar substrates

For the purposes of obtaining a number of components with nearly identical thickness distributions over the substrate area and of minimizing the inhomogeneities of the film, it is logical to presume that a substrate rotating on its own axis and revolving around another axis will give more uniformity in film thickness than a substrate only revolving around one axis. In relation to the practical applications, an investigation has been undertaken to study the refinement that can be achieved by using a planar planetary substrate holder.It is shown theoretically that the use of the planetary substrate holder under ideal conditions of source and geometry does not offer any further improvement in uniformity of thickness over the conventional rotary work-holder. It is also shown that the geometrical parameters alone have little influence over the uniformity achieved on a planetary substrate, because of the complex cyclidal motion of any point on it. However, for any given geometry, a non-integral speed ratio of the planetary substrate and the work-holder shows considerably less variation in thickness over the substrate area.