表面粗化提高倒装AlGaInP发光二极管的光提取效率

对发光二极管进行表面粗化能够大幅度的提高其光提取效率。利用晶片键合技术并采用湿法刻蚀的办法粗化n面AlGaInP表面制作了一种带表面粗化的倒装薄膜发光二极管。刻蚀后的表面形貌呈现金字塔状。270μm x 270μm管芯裸装在TO-18金属管座上,在20mA的注入电流下,粗化了的LED-I光强达到了315mcd,输出光功率达到了4.622mW,比没有粗化的LED-II的光功率高1.7倍。光功率增加的原因在于粗化后形成的这种金字塔状表面,其不但减少了背部镜面系统和半导体-空气接触面的反射,而且能有效的将光从LED中散射出去。     

高可靠高亮度AlGaInP发光二极管

分析了隧道再生双有源区A lG aInP发光二极管的工作原理,测试了不同注入电流下管芯的轴向光强,得到了轴向光强随注入电流的变化关系。20 mA注入电流条件下,发射峰值波长为620 nm的隧道再生双有源区A lG aInP发光二极管,透明封装成视角15°后平均轴向光强达到5.5 cd。对透明封装成15°隧道再生双有源区发光二极管进行了寿命实验,在温度为25°C、30 mA直流电流条件下,隧道再生双有源区A lG aInP发光二极管的寿命超过了1.2×105h。     

晶圆键合技术在LED应用中的研究进展

简要介绍了晶圆键合技术在发光二极管(LED)应用中的研究背景,分别论述了常用的黏合剂键合技术、金属键合技术和直接键合技术在高亮度垂直LED制备中的研究现状,包括它们的材料组成和作用、工艺步骤和参数以及优缺点.其中,黏合剂键合是一种低温键合技术,且易于应用、成本低、引入应力小,但可靠性较差;金属键合技术能提供高热导、高电导的稳定键合界面,与后续工艺兼容性好,但键合温度高,引入应力大,易造成晶圆损伤;表面活化直接键合技术能实现室温键合,降低由于不同材料间热失配带来的负面影响,但键合良率有待提高.     

有机白光发光二极管研究进展

有机白光发光二极管是实现全色显示的重要原型器件之一,而且作为一种超薄光源还可用作液晶的背光源以及一些特殊场合的照明.本文从发光区域、器件结构、材料选择等方面回顾了有机白光发光研究的一些进展情况.     

High-contrast top-emitting organic light-emitting diodes with AlO1.086 dark-and-conductive electrodes

To improve the poor contrast of conventional organic light-emitting diodes (OLEDs) resulting from highly reflective metal electrode, a dark-and-conductive electrode with an average reflectance of 28.1% and a resistivity of 4.6 × 10⁻⁴ Ω/cm was fabricated by fine-tuning O₂/Ar flow ratio on aluminum electrode sputtering. X-ray photoelectron spectroscopy analysis indicates pure aluminum and aluminum oxide coexist in the fabricated dark-and-conductive electrodes. With the proposed dark-and-conductive AlO_1.086 electrodes, top-emitting OLEDs exhibit significantly improved contrast, whereas maintain moderate luminous efficiency. The demonstrated AlO_1.086 dark-and-conductive electrodes can potentially replace the circular polarizers for high-contrast OLED display applications.     

具有纳米凹坑氧化铟锡的LED光提取效率的提高

由于低的光提取效率,氮化镓基发光二极管的应用受到了限制。氧化铟锡—氮化镓界面的光的全反射作用是造成低的光提取效率的重要原因。人们提供了多种方法来提高光提取效率。本文揭示了一种简单并且经济的方法。通过自组装和干法刻蚀的方法制作粗化的氧化铟锡薄膜。运用原子力显微镜（AFM）对表面形态和粗糙程度进行观察。测量各个样品的I-V特性、出光功率和出光辐射图并进行对比。刻蚀之后,在ITO表面形成了圆柱体和凹坑结构,它们的高度随着刻蚀时间增大。结果显示,LED的出光功率和随着刻蚀时间的增加而增加。由于圆柱体和凹坑结构的形成以及它们深度的增加,ITO-GaN界面的光的全反射减少了。因此,出光率提高。     

用表面粗化ITO的欧姆接触提高GaN基LED性能

应用ICP干法刻蚀工艺和自然光刻技术,制备了ITO表面粗化的GaN基LED芯片。聚苯乙烯纳米颗粒在干法刻蚀中作为刻蚀掩膜。通过扫描电镜(SEM)观察ITO薄膜的粗糙度,并且报道了优化的粗化工艺参数。结果表明,ITO表面粗化的GaN基LED芯片同传统的表面光滑的芯片相比在20 mA的驱动电流下,发光强度提高了70%。     

不同表面预处理对有机电致发光显示器性能的影响

从生产角度研究了基板表面的预处理工艺对OLED性能的影响,分别用UVOzone、氧Plasma以及两者相结合的方式对基板进行表面处理,并按照生产工艺制作器件,从接触角、方阻以及光电特性等测试结果对各种表面处理的样品进行比较。结果表明以上处理都改善了器件性能,不同程度提高了器件的清洁度、亮度和发光效率,其中UVOzone和氧Plasma结合的方式处理效果最为显著,器件在10V时亮度达到79920cd/m2,比其他两种处理方式亮度提高约25%。     

表面粗化提高GaN基LED光提取效率的模拟

影响GaN基LED的外量子效率低下的主要因素是光子在半导体和空气界面处的全反射.根据实际芯片建立LED模型,利用蒙特卡罗方法进行光线追迹模拟,分析了光子的主要损耗对出光效率的影响.计算不同的表面粗化微元,微元尺寸及微元底角对LED光提取效率的影响;比较不同微元形成的光场分布.模拟显示:所设计最佳的表面粗化结构在理想状况下可以提高光提取效率3倍以上.     

基于过渡金属氧化物薄膜为连接层的叠层有机电制发光器件的数值模型

By utilizing a two-step process to express the charge generation and separation mechanism of the transition metal oxides （TMOs） interconnector layer, a numerical model was proposed for tandem organic light emitting diodes （OLEDs） with a TMOs thin film as the interconnector layer. This model is valid not only for an n-type TMOs interconnector layer, but also for a p-type TMOs interconnector layer. Based on this model, the influences of different carrier injection barriers at the interface of the electrode/organic layer on the charge generation ability of interconnector layers were studied. In addition, the distribution characteristics of carrier concentration, electric field intensity and potential in the device under different carrier injection barriers were studied. The results show that when keeping one carrier injection barrier as a constant while increasing another carrier injection barrier, carri- ers injected into the device were gradually decreased, the carrier generation ability of the interconnector layer was gradually reduced, the electric field intensity at the interface of the organic/electrode was gradually enhanced, and the electric field distribution became nearly linear： the voltage drops in two light units gradually became the same. Meanwhile, the carrier injection ability decreased as another carrier injection barrier increased. The simulation re- sults agree with the experimental data. The obtained results can provide us with a deep understanding of the work mechanism of TMOs-based tandem OLEDs.     

提高LED外量子效率

提高发光二极管的发光效率是当前的一个研究热点.简要介绍了从芯片技术角度提高发光二极管(IED)外量子效率的几种途径,生长分布布拉格反射层结构、制作透明衬底、衬底剥离技术、倒装芯片技术、表面粗化技术、异形芯片技术、采用光子晶体结构等.此外还介绍了发光材料、能带结构以及工艺对外量子效率的影响.     

Light enhancement of plasmonic nano-structure for PLEDs at RGB wavelengths

In this work, a simple, rapid, and low-cost sputtering system was used to deposit Ag-Au composite nanoparticles (CNPs) onto an indium titanium oxide (ITO) anode for polymer light-emitting diodes (PLEDs) at room temperature. These Ag-Au CNPs on ITO surface serve as the resonators of electrons to result in a broader absorption under the visible light irradiation. The interlayer does not act as electron blocking layer, but hole injection enhancement by electron injection does seem to occur. Because of the localized surface plasmon resonance emission, the luminance efficiencies of the blue-, green-, and red-emitting PLEDs with Ag-Au CNPs increased by approximately 1.5-fold, compared to those of the reference devices. This method provided with the production of chemically stable Ag-Au CNPs under ambient conditions is well suited for enhancing the emission of large-area PLEDs in full color.     

高提取效率表面织构红光发光二极管

给出了用蒙特卡罗射线追踪法模拟发光二极管(LED)光提取效率的过程,并对表面织构LED的光提取效率进行了模拟分析,得到存在一组优化的表面织构参数,可使LED的光提取效率提高36%。通过湿法腐蚀和干法刻蚀相结合工艺,制备了表面织构的红光LED,器件的轴向光强提高了20.6%。理论和实验结果,表明表面织构技术是提高LED光提取效率的一个主要途径。