脉冲N离子束轰击对TiAlN膜层和W18Cr4V高速钢结合力的影响

用电弧离子镀在刀具表面制备TiAlN膜层有利于提高其硬度和耐磨性能,但却降低了膜基结合力,影响其使用寿命。采用UVN 0.5D2I脉冲离子束辅助电弧离子镀沉积设备,在W18Cr4V高速钢基材上沉积TiAlN膜层。研究了基材N离子束轰击及在膜层沉积过程中N离子束辅助轰击对TiAlN膜层结合力的影响。结果表明:膜层沉积之前,N离子轰击与基材原子发生了相互作用,造成了原子级洁净的表面,形成了大量的高密度形核点,且形成了含有N元素的改性层;在膜层沉积初期,脉冲N离子束轰击形成了由W,Cr,V,Fe,N,Ti,Al元素组成的具有一定厚度的"扩散层",其与"改性层"的共同作用是膜基结合力提高的主要原因,膜基结合力最高为80 N。     

脉冲N离子束轰击对TiAIN膜层和W18Cr4V高速钢结合力的影响

用电弧离子镀在刀具表面制备TiAlN膜层有利于提高其硬度和耐磨性能,但却降低了膜基结合力,影响其使用寿命。采用UVN0．5D2I脉冲离子束辅助电弧离子镀沉积设备,在W18Cr4V高速钢基材上沉积TiAlN膜层。研究了基材N离子束轰击及在膜层沉积过程中N离子束辅助轰击对TiAlN膜层结合力的影响。结果表明：膜层沉积之前,N离子轰击与基材原子发生了相互作用,造成了原子级洁净的表面,形成了大量的高密度形核点,且形成了含有N元素的改性层;在膜层沉积初期,脉冲N离子束轰击形成了由W,Cr,V,Fe,N,Ti,Al元素组成的具有一定厚度的“扩散层”,其与“改性层”的共同作用是膜基结合力提高的主要原因,膜基结合力最高为80N。     

过渡层对含氢非晶碳膜生长的影响

本文利用射频等离子体增强化学气相沉积（RFPECVD）工艺在不锈钢基底上制备了含氢非晶碳膜（a-C：H膜）。在沉积碳膜之前，首先在基底表面预先沉积了Ti／TiC、Ti／TiN和Ti／TiN／TiC等过渡层以提高膜基结合力。利用激光Raman光谱分析了过渡层对a-C：H膜生长过程及膜中sp^3含量的影响。实验结果表明，采用Ti／TiN／TiC过渡层时所制备的a-C：H膜中sp^3含量最多，同时膜基结合力最大。     

15-5PH不锈钢基体上硬质膜层制备及性能研究

对比不同的表面处理工艺,选择多弧离子镀方法在15-5 PH不锈钢基材表面制备TiN硬质涂层.分析制备工艺对膜层的表面硬度、膜/基结合强度、膜层结构等基本物理性能的影响,进行工艺优化.结果显示在预热温度高于200℃后,TiN膜层结晶效果较好;负偏压达到600V后,膜／基间“伪扩散”层出现,膜／基结合性能明显提高;工作气压升高,膜层表面硬度、膜／基结合力和沉积速率先升高后下降,分别在4.0,3.0和2.5Pa达到峰值.最终获得的TiN硬质膜层表面硬度大于2000HV0.05,膜／基结合力最小临界载荷高于70N.镀膜处理后,工件的各种性能测试均能满足具体使用要求.     

调制周期对Ti-TiN-Zr-ZrN多层膜性能的影响

采用真空阴极电弧沉积技术,在TC11钛合金表面沉积同等厚度的三种不同调制周期Ti-Ti N-Zr-Zr N软硬交替多层膜。用扫描电镜、显微硬度计、结合力划痕仪和砂粒冲刷试验仪分析测试了多层膜的厚度、表面及截面形貌、硬度、膜/基结合力和抗砂粒冲蚀磨损性能等;重点研究了调制周期的改变对多层膜性能的影响。结果表明:随着周期数的增加,单一调制周期变薄,膜层中金属"液滴"颗粒等缺陷减少,同时也增加了大量的层间界面;层界面之间反复形核,晶粒细化,有利于多层膜表面光洁度、致密度、硬度、结合力和抗砂粒冲蚀能力的改善。     

7A04铝合金表面DLC薄膜制备及性能研究

为提高7A04铝合金的表面性能,利用射频辅助等离子体浸没离子注入与沉积设备,在其表面制备类金刚石(DLC)薄膜。由于DLC薄膜与铝合金基体力学性能差别较大,导致膜基结合力差。本研究采用非平衡磁控溅射技术预先沉积一层Si膜,作为过渡层改善膜基结合力;利用激光拉曼光谱仪、维式显微硬度计、纳米划痕仪、摩擦磨损试验机等设备,系统分析了薄膜结构、显微硬度、膜基结合力及耐磨损性能。结果表明,Si过渡层的制备提高了基体的承载能力和膜基结合力,进而使耐磨损性能得到大幅度提高。     

15-5PH不锈钢表面多弧离子镀高结合性能TiN膜层研究

多弧离子镀方法在15-5PH不锈钢材料表面制备结合力、硬度和致密性高的TiN涂层,提高材料表面硬度和抗高温氧化性能。分析结果显示过渡层成分、预热温度、工作气压及负偏压等主要参数对膜层性能影响明显。得到Ti为过渡层时,预热250℃,气压3.0Pa,600V偏压镀膜工艺参数最佳,制备的膜基结合力高于60N,表面硬度>1200HV0.05,膜层表面大液滴密度尺寸最低。膜层表面显微硬度、膜层沉积速率和膜基结合力随工作气压升高不同程度地先升高后降低。     

采用钛-铝-钼过渡层在铜基底上沉积金刚石薄膜的研究

采用钛-铝-钼过渡层研究了铜基片上金刚石薄膜的化学气相沉积.用SEM和Raman谱研究了薄膜的形貌和质量.用XRD分析了膜基间形成的化合物的成分,并进一步分析了铝的存在对膜基结合力的影响.实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力.     

偏压对电弧离子沉积锆膜性能的影响

为研究偏压对通过电弧离子沉积法沉积的锆膜性能的影响,并探究锆膜在不同存储条件下的氧化程度,通过调整沉积过程偏压的大小以及占空比制备多组试样,利用扫描电子显微镜、X射线测厚仪、X射线衍射仪以及纳米划痕仪对薄膜的表面形貌、沉积速率、薄膜结构、膜基结合力进行了研究。并利用X射线光电子能谱测试了锆膜在不同存储状态下的氧化程度。结果表明,偏压的增大会提升膜层表面光洁度。但因高能粒子反溅射作用的增强,会降低薄膜的沉积速率。同时,膜基结合力随着偏压的增大有升高的趋势,且膜层的(100)晶面择优趋势会逐渐减小。另外,偏压占空比的增加也会导致沉积速率下降。锆膜表面的氧化层厚度随着时长会逐渐增大,且膜层在大气中暴露一天的氧化程度比真空存储(10^-5 Pa)半年严重。     

不锈钢表面化学发黑工艺及膜层性能研究

为了提高1Cr18Ni9Ti不锈钢表面化学发黑膜的外观质量及耐蚀性能,通过正交试验研究了表面化学发黑优化工艺.采用擦拭的方法测试了膜层与基体的结合力;采用贴滤纸法测试了膜层的空隙率;采用3%硫酸铜点滴和10%三氯化铁点滴试验测试了其耐蚀性能,用扫描探针显微镜观察了发黑膜层的AFM图.结果表明:膜层具有良好的光泽度,膜层致密、均匀,没有明显的缺陷,与基体之间具有良好的结合力,较小的孔隙率.发黑膜以胞状结构沉积在基体表面,具有良好的耐蚀性能.     

Microstructure of interface for high-adhesion DLC film on metal substrates by plasma-based ion implantation

The diamond-like carbon (DLC) film was prepared on various metal substrates with a plasma-based ion implantation and deposition using superimposed RF and negative high-voltage pulses. The adhesion strength of DLC film was enhanced above the epoxy resin strength by implantation of carbon ions or mixed ions of carbon and silicon to the substrate surface before DLC deposition. In order to clarify the mechanism for improvement in adhesive strength, the microstructure of an interface between DLC film and substrate was examined in detail by transmission electron microscopy (TEM) observations in combination with EDS analysis. As a result, the enhancement in adhesion strength of DLC film by C ion implantation resulted from the formation of amorphous-like phase in the ion-implanted region of substrate, the production of carbon-component graded interface, the destruction of the oxide layer on the top surface of substrate, and the reduction of residual stress in DLC film by ion implantation during the deposition. The production of stress-free DLC film allowed us to demonstrate a supra-thick DLC film of more than 400 μm in thickness.     

物理气相沉积薄膜的界面与附着力

近十多年来,气相沉积技术发展十分迅速,无论在理论研究还是应用研究上都取得了丰硕的成果,尤其在PVD薄膜的附着力方面,研究十分活跃。本文根据有限的资料,初步归纳出在PVD过程中,膜/基附着力与基体表面活性密切相关;薄膜与基体之间也可以化学吸附形式结合,形成界面化合物;也可借助离子的轰击作用形成结合良好的扩散过渡层;膜/基界面之间不匹配将使附着力下降,可通过设置过渡层(梯度层)的方式加以解决。     

脉冲真空电弧离子镀在不锈钢上沉积类金刚石薄膜的研究

利用脉冲真空电弧离子镀技术在3Cr13不锈钢上制备了类金刚石(DLC)薄膜,通过Raman光谱分析了膜的结构特征,采用摩擦磨损试验机测试了薄膜在不同载荷下的摩擦系数,运用划痕仪研究了膜基的结合强度.结果表明:所镀制的薄膜具有典型类金刚石结构特征,膜中ID/IG为1.33;摩擦系数随着载荷的增大而减小,载荷为5 N,转速120 r/min时的摩擦系数为0.12;Ti过渡层的引入显著地提高了膜基结合力.     

离子源辅助电子束沉积凹印版耐磨层

针时凹印版电镀存在的污染和高能耗，采用射频感应偶合（ICP）离子源辅助电子束沉积硬质铬耐磨层，通过控制离子源参数和加入过渡层来提高薄膜与基体的结合力和显微硬度。利用扫描电镜、原子力显微镜、显微硬度计、划痕仪、表面轮廓仪，摩擦磨损仪对膜层的组织结构和性能进行了研究，探讨了在薄膜沉积过程中，离子源工艺参数对薄膜界面结合机理，组织结构和性能的影响。     

2.1 Metal-semiconductor junctions—related to deposition of thin films

The electrical properties of metal-semiconductor junctions are defined by the barrier height, by interface states, by interfacial layers and by doping and carrier lifetime of the semiconductor. Schottky contacts have a high barrier at the junction which the carriers have to surmount for current transport. Ohmic contacts require a low barrier or a low tunnelling resistance through the barrier.The surface preparation, the choice of the metal, the deposition technique and the post deposition treatment have an influence on the junction properties. The influence, however, is limited by surface states and is modified by the degree to which an interfacial layer is desired or to be eliminated.The heating of the semiconductor by the deposition process and the radiation damage when e-gun evaporation, sputtering or ion implantation is used, must be examined as to their influence on the junction. With most of the semiconductors a thermal treatment is part of the deposition process.     

高功率脉冲磁控放电等离子体注入与沉积CrN薄膜研究

采用高功率脉冲磁控放电等离子体离子注入与沉积的方法在不锈钢基体上制备了高膜基结合力的CrN硬质薄膜,并研究了不同的Ar/N流量比对薄膜形貌、结构及性能的影响.采用扫描电子显微镜、X射线衍射对其表面形貌和结构进行分析,发现制备的薄膜表面光滑、致密,相结构单一,主要是CrN(200)相.对薄膜的结合力、硬度、弹性模量、耐磨...     

In vivo histological evaluation of bioactive NiTi alloy after two years implantation

This work is aimed at evaluating the in vivo histological performance of HA coated NiTi through chemical treatments and the untreated NiTi after two years implantation by animal model. A complete implant–bone interfacial osseointegration was observed after HA coated and untreated NiTi was implanted into the animal model for two years. However, the osseous lamella structure on HA coated NiTi was more mature and the osseous tissue was more compact as compared with that of untreated NiTi, which was ascribed to the differences resulted from nickel ion release from the alloy, cell adhesion ability and osteogenesis mechanism during the early stage of implantation. The bioactivity and biocompatibility of NiTi alloy are significantly improved by coating the alloy with HA through chemical treatment, though the untreated NiTi shows good biocompatibility after long time implantation.     

Some features of the ion-beam mixing during simultaneous ion implantation and metal deposition

Experimental results on the ion implantation of Ta and Cu ions into an Al substrate, accompanied by the deposition of these ions in the form of a surface coating are reported. The coatings composed of the implant elements exhibit a complicated structure and lead to an increase in the microhardness, adhesion properties, and corrosion resistance of the substrate. An analysis of data on the energy distribution of secondary ions shows that the surface layer of ion-implanted substrates contains intermetallic phases.     

Metallurgical applications of ion implantation and ion bombardment

The physical background to the metallurgy of ion implantation is discussed. For instance, the fate of implanted atoms is considered in the content of the precipitation processes which occur as a consequence of exceeding the solubility limit during implantation.The Metallurgical applications of ion implantation and ion bombardment are discussed under the following headings: surface and interfacial energies, surface applications, superconductivity and void formation.     

类金刚石薄膜在不锈钢表面结合强度及耐腐蚀性研究

类金刚石(DLC)薄膜与不锈钢的结合强度是DLC薄膜应用于血管支架表面改性的关键技术问题.利用磁过滤阴极真空弧源沉积方法在316L不锈钢表面沉积DLC薄膜,研究沉积时基体偏压、薄膜厚度以及钛过渡层对DLC薄膜与基体结合强度的影响.研究结果表明,316L表面制备相同厚度的DLC薄膜,采用-1000V脉冲偏压制备的薄膜结合强度明显优于-80V直流偏压下制备的DLC薄膜;随着DLC薄膜厚度的增大,DLC薄膜与316L基体的结合力下降;316L不锈钢表面制备一层100nm的钛过渡层之后可以改善DLC薄膜的结合状况,并且经过20%的拉伸变形后,DLC薄膜完整,耐蚀性优于未表面处理的316L不锈钢.以上研究结果表明,磁过滤阴极真空弧源方法制备DLC薄膜与316L结合强度高,可以有效的提高316L的耐腐蚀性,是一种具有应用前景的血管支架表面改性方法.