CdZnTe晶片中沉积相分布特性的研究

利用红外显微镜分别对富Cd和富Te配料生长的两组碲锌镉晶片的沉积相进行观察,对观察结果做统计分析,发现两组晶片中的沉积相在形状和分布情况方面有很大差别,采用数据拟合的方法发现两组CdZnTe晶片中不同尺寸的沉积相颗粒的密度满足指数分布.     

Spectroscopic evaluation of n-type CdZnTe gamma-ray spectrometers

This work focuses on the evaluation of the spectroscopic performance of n-type CdZnTe gamma-ray spectrometers, grown by a modified horizontal Bridgman Technique developed at IMARAD Imaging Systems Ltd. Two types of devices are studied: (i) detector arrays grown and produced by IMARAD and employing ohmic indium contacts and (ii) detectors and arrays fabricated at Technion in crystals provided by IMARAD, employing different types of contacts. Alpha particle spectroscopy as well as gamma-ray spectroscopy is used to evaluate and characterize the energy resolution of gamma-ray spectrometers fabricated on n-type CdZnTe grown by a modified horizontal Bridgman and doped with indium. The electron and hole mobility lifetime products of the n-type CdZnTe material grown by IMARAD are estimated by measuring the dependence of charge collection efficiency upon the bias voltage, using a calibrated multichannel analyzer. The measured results indicate that the average electron and hole mobility-lifetime products are, respectively, of the order of μ_nτ_n=(1–2)·10⁻³ cm²/V and μ_pτ_p=6·10⁻⁶ cm²/V. The measured energy resolution of 122 keV photons is −(5–6)% when the source is not collimated and is reduced to −4.5% when the source is collimated. These results are obtained with ohmic cathode as well as with a rectifying cathode. A statistical model for the calculation of the pulse height spectra as a function of photon energy, electron and hole mobility-lifetime products and applied electric field, which has been recently reported in Applied Physical Letters, is used to determine the role of incomplete charge collection in the spectral performance of the n-type CdZnTe spectrometers. The comparison between the measured and modeled results indicates that the dark noise, cross talk and non-uniformity are the main limiting factors of the spectral performance of the n-type spectrometers rather than incomplete charge collection. The good spectroscopic performance of the arrays under study is attributed to an adequate hole mobility lifetime for the geometry of the pixilated arrays. The study indicates that the n-type CdZnTe spectrometers are useful for a wide range of imaging applications.     

GaN薄膜的椭偏光谱研究

采用椭圆偏振光谱法,在1.50～6.50 eV光谱内,研究了在蓝宝石衬底(0001)面上使用金属有机化学气相沉积(MOCVD)的方法制备的非掺杂纤锌矿结构GaN薄膜的光学性质。建立GaN表面层/外延层/缓冲层/衬底四层物理结构模型。与Cauchy和Sellmeier色散公式比较后选择了Tanguy Extended色散公式来分析GaN薄膜的光学性质。椭圆偏振光谱拟合结果表明,Tanguy Extended色散公式能更准确、方便地描述GaN薄膜在全波段(特别是带隙及带隙之上波段)的色散关系。提供了GaN薄膜在1.50～6.50 eV光谱范围内的寻常光(o光)和非寻常光(e光)折射率和消光系数色散关系,为定量分析GaN薄膜带边附近各向异性的光学性质提供了依据。     

硅片抛光工艺质量微细差别的椭偏光谱法鉴别

用椭偏光谱研究了硅片抛光的表面质量.假设一个四相模型,对测量数据进行分析处理.结果表明,(ⅰ)用带间光谱的E_1结构,可以分辨表层质量的稍优或稍劣,而不一定要用E_2结构.(ⅱ)在E_1结构附近,用介电函数的实部B＇(hv)区分表层质量的微细差异,似乎比用其虚部B＂(hv)效果更佳.     

AFM Characterization of Raman Laser-Induced Damage on CdZnTe Crystal Surfaces

Raman laser studies of detector-grade CdZnTe crystals show an increase in intensity of the Te peaks of the Raman spectra even at very low laser powers. In this study, atomic force microscopy (AFM) was used to characterize the extent of damage to the CdZnTe crystal surface following exposure to the Raman laser. AFM images revealed localized surface damage in the areas exposed to the Raman laser beam. Additional studies using conductive-probe AFM techniques provided localized electrical information for the laser-induced Te-rich areas.     

薄膜材料光学特性研究的椭偏光谱数据处理

椭偏光谱由于其独特性而广泛应用于薄膜材料的光学特性研究。文章综述了椭偏光谱数据处理中常用的物理模型,并对椭偏光谱的一般方法作了总结。     

GaN基多层结构椭偏测试模型优化和光谱研究

利用椭圆偏振测试仪,对n+AlGaN/n-AlGaN/超晶格(SL)/AlN/蓝宝石多层复杂结构的椭偏测试方法进行了研究,其中SL层为AlGaN/GaN多层量子阱结构,将其简化为单层处理。通过改变测试条件进行多次测量,分析了结构模型、算法模型及不同入射角度对测试结果的影响,得到了最优测试结构模型和算法模型:粗糙度层(有效介质近似EMA模型)/n+AlGaN(柯西Cauchy模型)/n-AlGaN(Cauchy)/SL(EMA)/AlN(Cauchy)/蓝宝石。选择55°为入射角,在300～800nm波长测试得到了各层膜厚和光学常数谱。结果表明,椭偏测试所得各层膜厚度与工艺给出数据相符,但SL层厚度相对而言有较大偏差,这与其结构复杂性有关,尚待进一步研究。各层折射率色散关系正常,n+AlGaN层折射率与n-AlGaN层折射率相比偏小,这与其较高浓度和较大损伤有关。     

非晶硅薄膜的LF-PECVD制备及椭偏表征

以SiH4为先驱气体,采用低频等离子体增强化学气相沉积（LF-PECVD）方法在Si衬底上制备了氢化非晶硅（a-Si∶H）薄膜。在薄膜沉积过程中,工艺参数将会影响非晶硅薄膜的沉积速率和光学性能。通过反射式椭圆偏振光谱仪（SE）研究了SiH4气体流量、工作压强和衬底温度等条件对氢化非晶硅沉积速率和光学性质的影响。实验结果表明,氢化非晶硅沉积速率随着SiH4流量、工作压强和衬底温度的改变而规律地变化。相比于SiH4流量和工作压强,衬底温度对折射率、吸收系数和折射率的影响更大。各工艺条件下所制备的非晶硅薄膜光学禁带宽度在1.61～1.77eV。     

C~+注入Si形成SiC/Si异质结构的椭偏光谱

用椭偏光谱法测量了 ( 35ke V,1 .0× 1 0 18cm- 2 )和 ( 65ke V,1 .0× 1 0 18cm- 2 ) C+ 注入 Si形成的 Si C/Si异质结构 .应用多层介质膜模型和有效介质近似 ,分析了这些样品的 Si C/Si异质结构的各层厚度及主要成份 .研究结果表明 :注 35ke V C+ 的样品在经 1 2 0 0℃、2 h退火后形成的 Si C/Si异质结构 ,其β- Si C埋层上存在一粗糙表面层 ,粗糙表面层主要由β- Si C、非晶 Si和 Si O2 组成 ,而且 β- Si C埋层与体硅界面不同于粗糙表面层与 β- Si C埋层界面 ;注 65ke V C+的样品在经1 2 50℃、1 0 h退火后形成的 Si C/Si异质结构 ,其表层 Si是较     

碲锌镉缓冲层液相外延技术的研究

文章报道了采用液相外延方法，在碲锌镉衬底上进行碲锌镉薄膜缓冲层生长的情况，并且采用X光双晶衍射仪、X光形貌仪、红外傅里叶光谱仪、二次离子质谱仪等手段对碲锌镉薄膜进行了表征，碲锌镉薄膜具有较好地组分及均匀性，晶体结构质量也较好。采用碲锌镉缓冲结构生长了碲镉汞液相外延片，其碲锌镉与碲镉汞薄膜界面附近的杂质得到了有效的控制。     

Chemical Interaction of CdTe and CdZnTe with Aqueous Solutions of H2O2-HI-Tartaric Acid

An iodine-based etching system, H₂O₂-HI-tartaric acid, was tested on CdTe samples with (110), (100), (111)A, and (111)B orientations. The etching rate of CdTe was shown to depend on the sample orientation, ratio of etchant composition components, temperature, and rotation speed of the disc. A study of the chemical composition and structure of the (211)B Cd_1−x Zn _x Te surfaces etched under different conditions was carried out. X-ray photoelectron spectroscopy (XPS) measurements showed that a nearly stoichiometric surface was achieved after heating of the etched surface in vacuum. Reflection high-energy electron diffraction (RHEED) measurements revealed a very good single-crystalline surface layer in samples etched with HI-based solutions as compared with bromine-methanol treatment.     

碲锌镉缓冲层液相外延技术的研究

文章报道了采用液相外延方法，在碲锌镉衬底上进行碲锌镉薄膜缓冲层生长的情况，并且采用X光双晶衍射仪、X光形貌仪、红外傅里叶光谱仪、二次离子质谱仪等手段对碲锌镉薄膜进行了表征，碲锌镉薄膜具有较好地组分及均匀性，晶体结构质量也较好。采用碲锌镉缓冲结构生长了碲镉汞液相外延片，其碲锌镉与碲镉汞薄膜界面附近的杂质得到了有效的控制。     

Optical Constants of Polycrystalline Cd1−xZnxTe Thin Films by Spectroscopic Ellipsometry

Spectroscopic ellipsometry has been used to determine the optical constants—complex dielectric constant (ϵ* = ϵ₁+ϵ₂), refractive index (n), extinction coefficient (k), absorption coefficient (α) and normal incidence reflectivity (R)—of two-source vacuum-evaporated polycrystalline Cd_1−xZn_xTe thin films formed on Corning 7059 glass substrates. The experimental spectra were measured in the photon energy range 1.1–5.6 eV. The spectra revealed distinct peaks at energies corresponding to interband transitions. © 1997 John Wiley & Sons, Ltd.     

碲锌镉晶体定向研究

碲锌镉材料是制备高性能碲镉汞红外焦平面探测器不可或缺的衬底材料.液相外延工艺和分子束外延工艺分别需要使用(111)晶面和(211)晶面碲锌镉衬底制备碲镉汞薄膜材料.低偏角、高精度衬底的选取有利于高质量碲镉汞外延层的获得.介绍了孪晶线快速定向法、使用X射线衍射仪(X-Ray Diffractome-ter,XRD)定向法...     

脉冲反应磁控溅射氧化钒薄膜的光谱椭偏研究

采用脉冲直流反应磁控溅射技术在不同的占空比条件下制备了氧化钒薄膜.利用X射线光电子能谱仪测定了薄膜的组分,用光谱椭偏仪在300～850 nm的波长范围内对薄膜的光学性质进行了研究.实验结果表明降低占空比具有促进金属钒氧化的作用,而通过采用Tauc-Lorentz谐振子色散模型结合有效介质近似模型对椭偏参数ψ和△进行拟合,得到了较为理想的拟合结果.薄膜的复折射率和透过率均由椭偏拟合结果确定,结果发现占空比的下降,导致了可见光范围内薄膜折射率和消光系数的降低以及透过率的提高.     

基于碲锌镉探测器脉冲整形电路设计

CdZnTe晶体是性能优异的室温半导体核辐射探测新材料,针对该材料制作的探测器设计了一种脉冲整形电路.将Sallen-Key滤波器应用于核脉冲的整形中,采用高速运算放大器来设计和实现了整形电路,用较少的级数就可得到准高斯波形的输出.研究了整形电路的工作原理,测定了电路的各项技术指标.通过OrCAD仿真测试,当脉宽大于1 μs时,反冲较明显,当脉宽不大于1 μs时,几乎没有反冲.采用辐射源~(241) Am,得到峰值为60 keV的能谱图,能量分辨率为9.2%.     

红外光热吸收成像技术在碲锌镉材料检测中的应用

红外光热吸收效应作为一种无损伤非接触的检测技术,已经被广泛用于硅等半导体材料中的微缺陷表征分析.采用光热吸收技术对碲锌镉晶体中的缺陷进行扫描成像分析时发现了一种连续性的光貌相条纹,并对这些条纹的形成机理进行了研究.研究表明碲锌镉晶体中的这种连续性条纹源自于光热测试系统中入射光的干涉,这种干涉和入射光参数、测试样品的厚度、禁带宽度以及热导率等材料特性密切相关.最后,实验通过优化红外光热吸收测量系统获得了碲锌镉材料中的微缺陷结构及其在样品深度方向的三维分布图像.     

Optical properties of Cd0.9Zn0.1 Te studied by variable angle spectroscopic ellipsometry between 0.75 and 6.24 eV

Optical properties of Cd_0.9Zn_0.1Te (CZT) were studied by variable angle spectroscopic ellipsometry (VASE). Measurements made by VASE were performed on CZT and CdTe samples in air at room temperature at multiple angles of incidence. A parametric function model was employed in the VASE analysis to determine the dielectric functions ɛ=ɛ₁+iɛ₂ in the range of 0.75 to 6.24 eV. A two-oscillator analytical model was used to describe the dielectric response of native oxides on CZT. Surface oxide optical properties and thickness on CZT were also determined in conjunction with the VASE measurement and analysis of a CdTe sample. Two samples of CZT of different oxide thicknesses were measured and their optical constants were coupled together in a multiple-sample, multiple-model VASE analysis to resolve correlations between fitting parameters. Effective medium approximation was used to describe the optical properties of the CZT oxide with roughness. A Kramers-Kronig self-consistency check of the real and imaginary parts of the Cd_0.9Zn_0.1Te dielectric functions was performed over the energy range 0.75 to 6.24 eV. A five-Lorentz-oscillator model was employed to describe the dielectric response of CZT in the range of 1.6 to 6.24 eV. Intensity transmission measurements were made on the Cd_0.9Zn_0.1Te and CdTe, showing the absorption energy band edges of ∼1.58 and 1.46 eV, respectively.     

Cd气氛退火对CdZnTe晶片质量影响

在CdZnTe晶体生长时,有时会产生大颗粒的沉积相,严重的影响了CdZnTe晶片的质量,通过电子探针测试证明其为Cd沉积相.采用Cd气氛退火来消除Cd沉积相,可以改善CdZnTe晶片的质量.实验发现:在较高的温度(600℃)条件下,退火可以有效的消除大颗粒(＞5 (m)的Cd沉积相,改善CdZnTe晶片红外透过率、X射线双晶回摆曲线半峰宽(FWHM)和腐蚀坑密度(EPD).在此条件下对CdZnTe晶片进行退火,有助于提高CdZnTe晶片的性能.     

碲锌镉晶片中位错与Te沉淀的透射电子显微分析

采用透射电子显微镜对碲锌镉晶体材料的缺陷特性进行了分析，观察并研究了碲锌镉晶体中Te沉淀相形貌和Te沉淀周围的棱柱位错环. 认为棱柱位错的形成是由Te沉淀相的析出引起的，而沉淀相在基体中的析出与基体形成错配应力，又造成位错的增殖. Te沉淀与棱柱位错两种缺陷是相互依存的.