808 nm掺铝半导体激光高损伤阈值腔面膜制备

研究了808 nm量子阱脊型波导结构掺铝半导体激光器在空气中解理不同镀膜方法对激光损伤阈值的影响.将半导体激光器管芯分别采用前后腔面不镀膜、前后腔面镀反射膜和前后腔面先镀钝化薄膜,再镀腔面反射膜的方法进行对比.测试半导体激光器输出功率的结果表明:腔面镀钝化薄膜的方法比只镀腔面反射膜的方法的激光损伤闽值高36%,并且能有效防止灾变性光学镜面损伤,同时,还分析了半导体激光器管芯和光学薄膜之间发生的物理效应.在大功率半导体激光器芯片腔面上镀钝化薄膜是提高其激光损伤阈值的一个行之有效的方法.     

大功率半导体激光器抗腔面灾变性光学损伤技术综述

激光器腔面灾变性光学损伤对大功率半导体激光器的最大输出功率和可靠性有很大的负面影响,是激光器突然失效的主要机制。如何克服腔面灾变性光学损伤,从而获得高性能的大功率半导体激光器成为重要的研究课题。文章首先对腔面灾变性光学损伤的研究历程进行了简要介绍,随后论述了腔面灾变损伤的物理机制及热动力学过程,最后从技术原理、方法、优缺点、改进方法、研究进展及应用现状的角度,逐一对各种抑制腔面灾变损伤的方法进行了归纳和总结。     

1.5mm腔长InAs/InP量子点激光器镜面外腔光谱特性研究

基于研制的1.5mm腔长InAs/InP共面条状量子点激光器,搭建了其镜面外腔结构,并对其光谱特性进行了测试,获得了镜面外腔周期性调制光谱,并在周期性的产生、多模激射和模式随电流的变化等方面对其光谱特性进行了分析研究。相比以前为获得单模使用的超短腔长超短外腔量子阱激光器,长腔长InAs/InP量子点激光器表现出较小的模式压缩比,更容易发生多模激射。     

基于腔面非注入技术的大功率半导体激光器

采用腔面电流非注入技术,提高了808nm半导体激光器灾变性光学损伤(COD)阈值。通过腐蚀GaAs高掺杂层的方法,在半导体激光器腔面附近形成电流非注入区,以此来减少腔面处的载流子注入。载流子注入水平的降低,减少了腔面处非辐射复合的发生,因而提高了激光器的灾变性光学损伤阈值。应用电流非注入技术制作的器件的最大输出功率达到3.7W;而应用常规工艺制作的器件的最大输出功率为3.1W。同常规工艺相比,采用该技术使器件的最大输出功率提高了近20%。     

光泵浦Si衬底GaN基回音壁模式微盘谐振腔激光器

氮化镓基微盘结构光学谐振腔具有波长选择范围宽、模式体积小和激射阈值低等特点,其在腔量子电动力学、低阈值激光器、生物传感器等方面具有重要的研究价值.通过优化制备微盘的干法刻蚀工艺及选择性湿法腐蚀技术,制备出侧壁陡峭且光滑的高Q值Si衬底GaN基回音壁模式微盘谐振腔,该微盘谐振腔的制备工艺简单、表面损伤小.在室温、266 nm短波长激光泵浦条件下,微盘谐振腔激光器实现了激射,阈值为2.85 MW/cm2,Q值达到2161.     

氦离子注入形成980nm脊型波导激光器腔面非注入区的研究

报道了氦离子注入技术在提高980nm半导体激光器灾变性光学损伤(catastrophic optical damage,COD)阈值上的应用.p-GaAs材料经氦离子注入后可以获得高的电阻率.在距离腔面25μm的区域内进行氦离子注入,由此形成腔面附近的电流非注入区.腔面附近非注入区减少了腔面载流子的注入,因此减少了非辐射复合的发生,提高了激光器的灾变性光学损伤阈值.应用氦离子注入形成腔面非注入区的管芯的平均最大功率达到440.5mW,没有发生COD现象.而应用常规工艺制作的管芯的平均COD阈值功率为407.5mW.同常规工艺相比,应用氦离子注入形成腔面非注入区技术使管芯的最大输出功率提高了8%.     

氦离子注入形成980nm脊型波导激光器腔面非注入区的研究

报道了氦离子注入技术在提高 980nm半导体激光器灾变性光学损伤 (catastrophicopticaldamage,COD)阈值上的应用 .p GaAs材料经氦离子注入后可以获得高的电阻率 .在距离腔面 2 5 μm的区域内进行氦离子注入 ,由此形成腔面附近的电流非注入区 .腔面附近非注入区减少了腔面载流子的注入 ,因此减少了非辐射复合的发生 ,提高了激光器的灾变性光学损伤阈值 .应用氦离子注入形成腔面非注入区的管芯的平均最大功率达到 44 0 5mW ,没有发生COD现象 .而应用常规工艺制作的管芯的平均COD阈值功率为 40 7 5mW .同常规工艺相比 ,应用氦离子注入形成腔面非注入区技术     

大功率半导体激光器腔面抗烧毁技术

首先介绍了连续激光器单管老化试验,试验通过测试不同老化时间激光器腔面的烧毁功率,对腔面烧毁发生的过程进行了分析。分析认为,大功率半导体激光器腔面烧毁失效的根本原因是腔面烧毁功率在老化过程中持续减小,最终低于激光器输出功率,造成激光器灾变性光学镜面破坏(COMD)。随后对腔面烧毁的微观物理机理进行了介绍,重点讨论了腔面缺陷相关的非辐射复合、量子阱带边吸收、自由载流子吸收造成的腔面温度升高以及腔面高温导致腔面缺陷密度增加并且向腔内攀移的微观过程。最后,介绍了电流非注入腔面、大光腔材料、长腔长设计、腔面离子铣钝化工艺等腔面抗烧毁技术研究情况,并对这些技术提高腔面抗烧毁功率以及改善腔面长期稳定性的效果进行了讨论。     

非对称大光腔GaAlAs／GaAs激光器及其特性

本文分析了非对称大光腔结构在提高激光器灾变性光学损伤阈值光功率方面的优点；报道了我们研究非对称大光腔ＧａＡｌＡｓ／ＧａＡｓ激光器的初步结果：未涂覆单而输出光功率（ＣＷ）大于８５ｍＷ；阈值电流范围为６０—８０ｍＡ；微分量子效率每面２５％；器件为基横模工作．     

刻蚀腔InGaAsP/InP双异质结激光器的制作与特性

本文报道了用反应离子刻蚀（RIE）与晶向湿法化学腐蚀（XWCE）相结合沿InP衬底（110）方向获得工作波长1．3μm的InGaAsP／InP双异质结激光器的腔面的方法．用CH4：H2：Ar2的混合物作干法刻蚀的反应气体，用H2SO4：HCl：H2O2作湿法腐蚀的腐蚀剂，我们获得了质量较好的激光器的光学腔面．用一个刻蚀腔面与一个解理面组成激光器的F－P腔，我们获得了它的宽接触阈值电流和微分量子效率与用传统的解理腔面的激光器的宽接触阈值电流与微分量子效率相当的激光器．     

高性能InAs/GaAs量子点外腔激光器

为了获得高性能的量子点外腔激光器(ECL),利用InAs/GaAs量子点Fabry-Perot(FP)腔激光器研制了光栅外腔可调谐ECL。对InAs/GaAs量子点ECL进行了一系列的性能测试,主要包括单模稳定性测试、单模调谐范围测试、阈值电流密度测试、无跳模连续调谐测试和输出功率测试。在室温条件下获得了24.6nm的连续调谐范围,覆盖波长从999.2nm到1 023.8nm,并且实现了波长无跳模连续调谐。在调谐范围内最低阈值电流密度为1 525A/cm2,而且在中心波长处获得的单模输出功率为15mW,单模边模抑制比(SMSR)高达35dB。研究结果表明,通过构建光栅外腔可以实现高性能的InAs/GaAs量子点ECL。     

Butt joint integrated extended cavity InAs/ InP (100) quantum dot laser emitting around 1.55 μm

The first butt joint integrated extended cavity InAs/InP (100) quantum dot (QD) Fabry-Perot laser emitting around 1.55 mum is demonstrated. Continuous wave lasing at room temperature on the QD ground state transition is achieved. The threshold current is comparable to that of all-active QD lasers. The Butt joint reflectivity for straight waveguides is below -40 dB.     

Time-Resolved Linewidth Enhancement Factors in Quantum Dot and Higher-Dimensional Semiconductor Amplifiers Operating at 1.55 $mu{hbox{m}}$

We report time-resolved measurements of the linewidth enhancement factors (-factors) , and , associated with the adiabatic carrier recovery, carrier heating, and two-photon absorption dynamical processes, respectively, in semiconductor optical amplifiers (SOAs) with different degrees of dimensionality-one InAs/InGaAsP/InP quantum dot (0-D), one InAs/InAlGaAs/InP quantum dash (1-D), and a matching InGaAsP/InGaAsP/InP quantum well (2-D)-all operating near 1.55- wavelengths. We find the lowest values in the QD SOA, 2-10, compared to 8-16 in the QW, and values of and that are also lower than in the QW. In the QD SOA, the -factors exhibit little wavelength dependence over the gain bandwidth, promising for wide-bandwidth all-optical applications. We also find significant differences in the -factors of lasers with the same structure, due to the differences between gain changes that are induced optically or through the electrical bias. For the lasers we find the QW structure instead has the lower -factor, having implications for directly modulated laser applications.     

Continuous-wave operation of long-wavelength quantum-dot diodelaser on a GaAs substrate

Continuous-wave operation near 1.3 μm or a diode laser based on self-organized quantum dots (QD's) on a GaAs substrate is demonstrated. Multiple stacking of InAs QD planes covered by thin InGaAs layers allows us to prevent gain saturation and achieve long-wavelength lasing with low threshold current density (90-105 A/cm²) and high output power (2.7 W) at 17°C heatsink temperature. It is thus confirmed that QD lasers of this kind are potential candidates to substitute InP-based lasers in optical fiber systems     

Room-temperature operation of InP-based InAs quantum dot laser

A ridge waveguide quantum dot (QD) laser with a stripe width of 15 /spl mu/m was fabricated by using the seven-stacked InAs QD layers based on the InAlGaAs-InAlAs material system on InP [001] substrate. Room-temperature lasing operation was observed at 1.501 /spl mu/m, which is the first observation from the InAs QDs with the InAlGaAs-InAlAs structure. The characteristic temperature of the InAs QD laser calculated from the temperature dependence of threshold current density was 135 K in the temperature range from 200 K to room temperature.     

Progress in Epitaxial Growth and Performance of Quantum Dot and Quantum Wire Lasers

We report on interplay of epitaxial growth phenomena and device performance in quantum dot (QD) and quantum wire (QWW) lasers based on self-organized nanostructures. InAs QDs are the most explored model system for basic understanding of "near-ideal" QD devices. Vertically-coupled growth of QDs and activated phase separation allow ultimate QD wavefunction engineering enabling GaAs lasers beyond 1400 nm and polarization-insensitive optical amplification. A feasibility of QD semiconductor optical amplifiers at terabit frequencies using InAs QDs is manifested at 1300 and 1500 nm. 1250-1300 nm QD GaAs edge emitters and VCSELs operate beyond 10 Gb/s with ultimate temperature robustness. Furthermore, temperature-insensitive operation without current or modulation voltage adjustment at >20 Gb/s is demonstrated up to ~90 degC. Light-emitting devices based on InGaN-QDs cover ultraviolet (UV) and visible blue-green spectral ranges. In these applications, InN-rich nanodomains prevent diffusion of nonequilibrium carries towards crystal defects and result in advanced degradation robustness of the devices. All the features characteristic to QDs are unambiguously confirmed for InGaN structures. For the red spectral range InGaAlP lasers are used. Growth on misoriented surfaces, characteristic to these devices, leads to nano-periodi- cally-step-bunched epitaxial surfaces resulting in two principal effects: 1) step-bunch-assisted alloy phase separation, leading to a spontaneous formation of ordered natural super lattices; 2) formation of quantum wire-like structures in the active region of the device. A high degree of polarization is revealed in the luminescence recorded from the top surface of the structures, in agreement with the QWW nature of the gain medium. QD and QWW lasers are remaining at the frontier of the modern optoelectronics penetrating into the mainstream applications in key industries.     

Theory of threshold characteristics of semiconductor quantum dot lasers

A comprehensive theory of threshold characteristics of quantum dot (QD) lasers, which provides a basis for optimization of their design, is reviewed. The dependences of the gain, transparency current, threshold current, characteristic temperature, and multimode generation threshold on the parameters of the QD ensemble (surface density and size dispersion of QDs), cavity (stripe length and thickness of the waveguide region), heterocontacts (band offsets), and temperature are considered in detail. The limiting characteristics of the laser (optimum structure parameters, minimum threshold current density, and characteristic temperature of the optimized structure) are discussed at length. The results of the analysis may serve as direct recommendations for the development of QD lasers that significantly outperform the semiconductor lasers currently in use.     

Nano-engineering approaches to self-assembled InAs quantum dot laser medium

A number of nano-engineering methods are proposed and tested to improve optical properties of a laser gain medium using the self-assembled InAs quantum dot (QD) ensemble. The laser characteristics of concern include higher gain, larger modulation bandwidth, higher efficiency at elevated temperatures, higher thermal stability, and enhanced reliability. The focus of this paper is on the management of QD properties through design and molecular beam epitaxial growth and modification of QD heterostructures. This includes digital alloys as high-quality wide-bandgap barrier; under- and overlayers with various compositions to control the dynamics of QD formation and evolution on the surface; shape engineering of QDs to improve electron-hole overlap and reduce inhomogeneous broadening; band engineering of QD heterostructures to enhance the carrier localization by reduction of thermal escape from dots; as well as tunnel injection from quantum wells (QWs) to accelerate carrier transfer to the lasing state. Beneficial properties of the developed QD media are demonstrated at room temperature in laser diodes with unsurpassed thermal stability with a characteristic temperature of 380 K, high waveguide modal gain >50 cm⁻¹, unsurpassed defect tolerance over two orders of magnitude higher than that of QWs typically used in lasers, and efficient emission from a two-dimensional (2-D) photonic crystal nanocavity.     

Room-temperature optical absorption in the InAs/GaAs quantum-dot superlattice under an electric field

Electroluminescence and absorption spectra of a ten-layer InAs/GaAs quantum dot (QD) superlattice built in a two-section laser with sections of equal length is experimentally studied at room temperature. The thickness of the GaAs spacer layer between InAs QD layers, determined by transmission electron microscopy, is ∼6 nm. In contrast to tunnel-coupled QDs, QD superlattices amplify the optical polarization intensity and waveguide absorption of the TM mode in comparison with the TE mode. It is found that variations in the multimodal periodic spectrum of differential absorption of the QD superlattice structure are strongly linearly dependent on the applied electric field. Differential absorption spectra exhibit the Wannier-Stark effect in the InAs/GaAs QD superlattice, in which, in the presence of an external electric field, coupling of wave functions of miniband electron states is suppressed and a series of discrete levels called the Wannier-Stark ladder states are formed.