Enhanced electrical and photocurrent characteristics of sol-gel derived Ni-doped PbTiO3 thin films

Partial substitution of group 10 metal for titanium is predicted theoretically to be one of the most effective ways to decrease the band gap of PbTiO₃-based ferroelectric photovoltaic materials. It is therefore of interest to experimentally investigate their ferroelectric and photovoltaic properties. In this work, we focus on the electrical and photocurrent properties of Ni-doped PbTiO₃ thin films prepared via a sol-gel route. The nickel incorporation does not modify the crystalline structure of PbTiO₃ thin film, but it can increase the dielectric constant, ferroelectric polarization and photocurrent, and simultaneously decrease the band gap. The maximum remnant polarization (P_r) of 58.1 μC/cm² is observed in PbTi_0.8Ni_0.2O₃ thin film, and its photocurrent density is improved to be approximately one order larger than that of PbTiO₃ thin film and simultaneously exhibits the polarization-dependent switching characteristic, which may be a promising choice for ferroelectric photovoltaic applications.     

Focus on the ferroelectric polarization behavior of four-layered Aurivillius multiferroic thin film

The well-saturated ferroelectric hysteresis loops with double remnant polarization up to 50?μC/cm² were obtained in four layered Aurivillius-type multiferroic Bi₅FeTi₃O₁₅ thin film. Pulsed positive-up negative-down polarization measurements demonstrate the intrinsic ferroelectric polarization, which present optimal rectangularity and polarization value. The hysteresis loops measurements with larger frequency range of 0.2–100?kHz indicate stable and ultra-fast switching speed of ferroelectric domains. Persistent retention properties were observed, and they are also independent of the applied electric field. In fatigue test an increased dielectric constant is observed along with the suppression of switchable polarization. Both of them can be restored partly to their original values via the stimulating of high electric field. The block domain switching due to the oxygen vacancies aggregated on domain walls are discussed for those characteristics. It is providing important contributions of domain wall pinning in the polarization degradation of Aurivillius-type ferroelectric films with four layers.     

Impact of fatigue behavior on energy storage performance in dielectric thin-film capacitors

The polarization hysteresis loops and the dynamics of domain switching in ferroelectric Pb(Zr_0.52Ti_0.48)O₃ (PZT), antiferroelectric PbZrO₃ (PZ) and relaxor-ferroelectric Pb_0.9La_0.1(Zr_0.52Ti_0.48)O₃ (PLZT) thin films deposited on Pt/Ti/SiO₂/Si substrates were investigated under various bipolar electric fields during repetitive switching cycles. Fatigue behavior was observed in PZT thin films and was accelerated at higher bipolar electric fields. Degradation of energy storage performance observed in PZ thin films corresponds to the appearance of a ferroelectric state just under a high bipolar electric field, which could be related to the nonuniform strain buildup in some regions within bulk PZ. Meanwhile, PLZT thin films demonstrated fatigue-free in both polarization and energy storage performance and independent bipolar electric fields, which are probably related to the highly dynamic polar nanodomains. More importantly, PLZT thin films also exhibited excellent recoverable energy-storage density and energy efficiency, extracted from the polarization hysteresis loops, making them promising dielectric capacitors for energy-storage applications.     

Breakdown field enhancement and energy storage performance in four-layered Aurivillius films

In dielectric capacitors, ferroelectric thin films with slim polarisation electric (P-E) hysteresis loops, which are mainly characterised by small residual polarisation (P_r) and large saturation polarisation (P_s) are expected to obtain high recoverable energy density (U_r) and efficiency (η). However, a lower breakdown in ferroelectric thin films usually impedes this result. Here, through the co-doping of La³⁺ and Pr³⁺ ions, a larger U_r of 54.27 J/cm³ and high η of 85.6% were obtained in four-layered Aurivillius phase ferroelectric thin films capacitors due to the enhanced breakdown electric field. The doped films annealed at relatively low temperatures showed similar energy storage properties compared with those of the prototype and higher energy storage efficiency compared with that of higher annealing films. In addition, the obtained thin film shows excellent energy storage properties in a wide frequency range, fatigue durability and good thermal stability. These results indicated that four-layered Aurivillius films are promising candidate materials for dielectric energy storage capacitors. The co-doping of double ions was an effective way to improve energy storage performance.     

Effect of surface charges on the polarization of BaTiO3 thin films investigated by UHV‐SPM

Nanostructured BaTiO₃ polar thin films are increasingly critical to the function of future multilayer ceramic capacitors and related oxide‐based electronic devices. The effect of surface charges on BaTiO₃ polarization behavior is therefore investigated by ultra‐high vacuum scanning probe microscopy (UHV‐SPM) for 3 distinct morphologies—epitaxial, polycrystalline, and nanocrystalline films. Regardless of the film morphology, Kelvin probe force microscopy reveals that BaTiO₃ thin film surfaces exhibit positive charging after contact scanning by various noble AFM probes due to the work function difference between tip and specimen. According to piezoresponse force microscopy, these positive charges uniformly stabilize downward polarized domains. However, the hysteresis and concomitant surface charging behavior are strongly sensitive to microstructure and defects. In particular, the stability and switching behavior are influenced by bulk and interfacial defect distributions and hence correlated to film deposition methods and grain size. Such morphology dependent properties for BaTiO₃ films are revealed only through UHV measurements where screening charges from the ambient can be minimized, demonstrating the importance of UHV‐SPM for understanding ferroelectric thin films and nanostructures.     

Light controlled resistive switching and photovoltaic effects in ferroelectric 0.5Ba(Zr0.2Ti0.8)O3-0.5(Ba0.7Ca0.3)TiO3 thin films

In this work, the structural and ferroelectric properties of 0.5Ba(Zr_0.2Ti_0.8)O₃-0.5(Ba_0.7Ca_0.3)TiO₃ (0.5BZT-0.5BCT) thin films deposited at different pulse repetition rates were studied. The films deposited at pulse repetition rate of 1 Hz display the optimum values of ferroelectric polarization and dielectric permittivity and are chosen for the investigation of resistive switching and photovoltaic studies. The Pt/0.5BZT-0.5BCT/ITO capacitors show the electroforming free resistive switching (RS) and is explained based on the polarization modulation of the Schottky barrier at the 0.5BZT-0.5BCT/ITO interface. Furthermore, it is shown that the RS ratio and switching voltage can be tuned with white light illumination. The capacitors display photovoltaic effect with the open circuit voltage ≈0.8 V and the short circuit current density ≈72.6 μAcm⁻². The photovoltaic efficiency is found to be ≈0.010% and is greater than that of other perovskite ferroelectric thin films. The underlying mechanism for enhanced RS and photovoltaic effects is highlighted.     

Polarization behavior of` lead-free 0.94(Bi0.5Na0.5)TiO3-0.06BaTiO3 thin films with enhanced ferroelectric properties

(Bi_0.5Na_0.5)TiO₃ based ferroelectric lead-free thin films have great potential for modern micro-devices. However, the multicomponent feature and volatile nature of Bi/Na makes the achievement of high quality films challenging. In this work, the morphotropic phase boundary composition, 0.94(Bi_0.5Na_0.5)TiO₃-0.06BaTiO₃ thin films were successfully prepared by CSD method. Dense films with low dielectric loss and low leakage current density were obtained. A well-defined polarization hysteresis loop with a high remnant polarization was observed in the thin films. Moreover, the polarization behavior of the film at original state, under electric field and upon heating was investigated by PFM. A self-polarization and asymmetric domain switching behavior were observed. High temperature induced depolarization and the self-polarization recovered upon cooling. The thin films with good quality show a promising potential for the application in electrical devices, and the in-depth investigation of the polarization behavior improves the understanding of ferroelectric and piezoelectric properties of thin films.     

Growth of the ternary Pb(Mn,Nb)O3–Pb(Zr,Ti)O3 thin film with high piezoelectric coefficient on Si by RF sputtering

In this study, ternary ferroelectric 0.06Pb(Mn_1/3Nb_2/3)O₃–0.94Pb(Zr_0.48Ti_0.52)O₃ (PMN–PZT) thin film with high piezoelectric coefficient were grown on La_0.6Sr_0.4CoO₃-buffered Pt/Ti/SiO₂/Si substrate by RF magnetron sputtering method. The phase and domain structure along with the macroscopic electrical properties were obtained. Under the optimized temperature of 550°C and sputtering pressure 0.9 Pa, the PMN–PZT film owned large remnant ferroelectric polarization of 62 μC/cm². In addition, the PMN–PZT film had polydomain structures with fingerprint-type nanosized domain patterns and typical local piezoelectric response. Through piezoelectric force microscopy, the PMN–PZT thin film at nanoscale exhibited obvious domain reversal when subjected to in situ poling field. It was further found that the quasi-static piezoelectric coefficient of the PMN–PZT thin film reached 267 pC/N, which was about twice to that of the commercial PbZrO₃–PbTiO₃ (PZT) thin film. The optimized relaxor ferroelectric thin film PMN–PZT on silicon with global electrical properties shows great potential in the piezoelectric micro-electro-mechanical systems applications.     

Enhanced photovoltaic properties of PbTiO3-based ferroelectric thin films prepared by a sol-gel process

PbTiO₃ (PTO), Pb(Mn_0.1Ti_0.9)O₃ (PMTO), Pb(Sr_0.1Ti_0.9)O₃ (PSTO), and Pb(Zr_0.1Ti_0.9)O₃ (PZTO) were prepared on an indium tin oxide (ITO)/glass substrate by a sol-gel method. PTO, PMTO, PSTO, and PZTO films exhibited energy band gaps of 3.55 eV, 3.63 eV, 3.59 eV, and 3.66 eV, respectively. All these films generated high photocurrents due to high shift currents, because carrier migration channels were successfully introduced by a lattice mismatch between the films and ITO substrates. The PMTO thin film exhibited the best ferroelectric and photovoltaic properties, with a photovoltage of 0.74 V, a photocurrent density of 70 μA/cm², and a fill factor of 43.34%, which confirms that shift current and ferroelectric polarization are two main factors that affect the ferroelectric photovoltaic properties. The PSTO, PZTO, and PTO thin films displayed space-charge-limited current (SCLC) when the electric field strength was below 10 kV/cm, and these three films broke down when the electric field strength was above 10 kV/cm. Analysis of the shift current mechanism confirmed that the breakdown of the PZTO and PSTO thin films resulted from Pool Frenkel emission current. The PMTO thin film displayed SCLC in the test range, which indicates that doping with Mn could inhibit defect formation in ferroelectric thin films.     

Solution-processed BiFeO3 thin films with low leakage current

Bismuth ferrite (BiFeO₃) is an attractive multiferroic material that shows strong ferroelectric and antiferromagnetic properties. Nevertheless, producing high-quality oriented BiFeO₃ on technology-important platinized silicon substrates by low-cost solution deposition methods is still challenging. In this work, polycrystalline Mn and Ti co-doped BiFeO₃ (BFO) thin films were fabricated on platinized silicon substrates by a solution deposition method. PbTiO₃ nanocrystals were used as a seed layer between the electrode and the BFO thin films to induce a preferential (100) pseudocubic orientation. We show that the introduction of a PbTiO₃ seed layer strongly reduces the leakage current. The films show excellent room-temperature ferroelectric properties at low frequencies (300 Hz), with epitaxial-like remanent polarization as high as 51 μC/cm² and coercive field of 500 kV/cm.     

Multiferroic properties of La/Er/Mn/Co multi-doped BiFeO3 thin films

Bi_0.9-xLa_xEr_0.1Fe_0.96Co_0.02Mn_0.02O₃ (BLa_xEFMCO) thin films were prepared by sol-gel method. The grain size, grain boundary resistance, oxygen vacancies and the amount of Fe²⁺ of the films were reduced by multi-ion doping to reduce the built-in electric field of the films. An applied voltage was adopted to regulate the effects of the directional alignment of the oxygen vacancies, defects, and defect pairs on the ferroelectric domains at the grain boundaries to control the ferroelectric polarization of the films. Meanwhile, the capacitance peak also reveals the effects of the ferroelectric domains switching, the migration of oxygen vacancies, and the directional alignment of defect pairs on the ferroelectric properties. In addition, the remnant polarization value of the BLa_0.01EFMCO thin film reaches 152?μC/cm², the squareness of the hysteresis loop (R_sq) is calculated to be 1.03, and the maximum switching current is 1.50?mA. The typical butterfly curves under positive and negative electric fields indicate the films with the enhanced ferroelectric properties. Moreover, the BLa_0.01EFMCO thin film exhibits the enhanced ferromagnetic properties, and its saturation magnetization (M_s) is 2.32 emu/cm³. Therefore, the ferroelectric properties of the BFO film can be enhanced by the multi-ion doped BFO film to reduce the grain boundary resistance (Rgb), the interface Schottky barrier formed by the asymmetric electrode material at the top and bottom of the film, and the built-in electric field formed by the film internal defect or defect pairs.     

The influence of the crystallization temperature on the reliability of PbTiO3 thin films prepared by chemical solution deposition

The preparation of quality ferroelectric PbTiO₃ (PT) thin films at the lowest possible temperature preserving its functional properties is necessary for their integration in microdevices. The crystallization below, close or above the para-ferrolectric transition temperature of the PbTiO₃ must produce an important effect on the microstructure, texture and residual stress state of the films and on functional properties. In this paper, the Chemical Solution Deposition method has been used to prepare PbTiO₃ films at different temperatures around that of the ferroelectric to paraelectric phase transition. The films were analyzed by X-ray diffraction, Optical and Scanning Electron Microscopy, and their microstructure, texture and residual stress correlated with their functional properties. The results show that these PT films prepared with crystallization temperatures close or below the phase transition develop a favorable microstructure and texture that lead to high remnant and saturation polarization values, making them good candidates for their integration in microdevices.     

Thickness dependent growth and ferroelectric/dielectric properties of phase-pure 0.65Pb(Mg1/3Nb2/3)O3-0.35PbTiO3 thin film derived from a modified sol-gel process

Annealing parameter and thickness are two significant factors affecting microstructure and electrical performance of sol-gel derived 0.65Pb(Mg_1/3Nb_2/3)O₃?0.35PbTiO₃ (0.65PMN-0.35PT) thin film. In this paper, various durations are firstly selected for the investigations on annealing parameter of 0.65PMN-0.35PT thin film. Enhanced insulating and ferroelectric properties can be obtained for the film annealed for 1 min due to its phase-pure and homogeneous perovskite structure. Based on this, a series of 0.65PMN-0.35PT thin films with various thicknesses by modifying deposition layer are synthesized annealed for 1 min and the effects of thickness on crystalline, insulating, ferroelectric and dielectric properties are characterized. It reveals that thickness-dependent behavior can be noticed for 0.65PMN-0.35PT thin film with the results that the 8-layered film possesses a relative large remanent polarization (P_r) of 23.34 μC/cm², and reduced leakage current density of 10^?9 A/cm² with low dissipation factor (tanδ) of 0.03 can be achieved for the 14-layered film.     

Growth and electrical properties of high-Curie point rhombohedral Mn-Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 thin films

High-quality ternary relaxor ferroelectric (100)-oriented Mn-doped 0.36Pb(In_1/2Nb_1/2)O₃-0.36Pb(Mg_1/3Nb_2/3)O₃-0.28PbTiO₃ (Mn-PIMNT) thin films were grown on SrRuO₃-buffered SrTiO₃ single-crystal substrate in a wide deposition temperature range of 550-620°C using the pulsed laser deposition method. The phase structure, ferroelectric, dielectric, piezoelectric properties, and nanoscale domain evolution were studied. Under the deposition temperature of 620°C, the ferroelectric hysteresis loops and current-voltage curves showed that the film owned significantly enhanced remnant ferroelectric polarization of 34.5 μC/cm² and low leakage current density of 2.7 × 10⁻¹⁰ A/cm². Moreover fingerprint-type nanosized domain patterns with polydomain structures and well-defined macroscopic piezoelectric properties with a high normalized strain constant of 40 pm/V was obtained. Under in situ DC electric field, the domain evolution was investigated and 180° domain reversal was observed through piezoelectric force microscope. These global electrical properties make the current Mn-PIMNT thin films very promising in piezoelectric MEMS applications.     

Regulating crystal structure and ferroelectricity in Sr doped HfO2 thin films fabricated by metallo-organic decomposition

HfO₂ based binary ferroelectric oxides are promising candidate for nonvolatile memory devices due to their compatibility with the current Si-based technology. In this work, Sr doped HfO₂ (Sr:HfO₂) ferroelectric thin films with Sr concentration from 0% to 10?mol% were prepared on the platinum electrodes by metallo-organic decomposition (MOD). It was demonstrated that uniform Sr:HfO₂ thin films with extremely low roughness can be achieved and crystallized by MOD under a 700?°C annealing process. A wake-up stage was believed more essential for the ferroelectricity of the MOD derived Sr:HfO₂ thin film, since the remnant polarization of 13.3 µC/cm² and high dielectric constant of 30 were obtained after 10⁵ cycling tests. The transformation from monoclinic phase to cubic phase was observed with increasing the Sr concentration and the thickness of the films. X-ray photoelectron spectroscopy analysis confirmed the bonding type of O-Hf-O and O-Sr-O bonds in the film. The microscopic crystal structure of ferroelectric orthorhombic phase was observed by high resolution transmission electronic microscope. The intrinsic ferroelectricity of Sr:HfO₂ film was demonstrated by the hysteresis polarization-voltage loops and distinct current peaks in the current-voltage curve. Stable domain structure and its switching dynamics were monitored by piezoresponse force microscopy, indicating the native polarization of Sr:HfO₂. This work will provide a controllable routine to fabricate ferroelectric HfO₂ based thin films using MOD method.     

Epitaxial Bi5Ti3FeO15 thin films on Nb-doped SrTiO3 substrates

We investigated the ferroelectric switching dynamics as well as the multiferroic and piezoelectric properties of highly a-oriented epitaxial Bi₅Ti₃FeO₁₅ (BTFO) thin films on Nb-doped SrTiO₃ single crystal substrates. The BTFO thin films favored highly a-oriented crystallinity because c-oriented crystallinity decreased under deposition conditions in which substrate temperature and thin film deposition rate were simultaneously lowered. The highly a-oriented epitaxial BTFO thin films showed the best ferroelectric properties, whereas the highly c-oriented epitaxial BTFO thin films showed the best ferromagnetic properties. In particular, the BTFO thin films in which a- and c-oriented crystallinity were properly mixed showed the best piezoelectric properties.     

Mixed grains and orientation-dependent piezoelectricity of polycrystalline Nd-substituted Bi4Ti3O12 thin films

Polycrystalline Bi_3.15Nd_0.85Ti₃O₁₂ (BNT) thin films were prepared on Pt/Ta/glass substrates by a pulsed laser deposition method. X-ray diffraction measurements revealed that the BNT thin films were preferentially oriented along the (117) direction although they possessed a polycrystalline structure. Good ferroelectric properties of the BNT thin film were observed with a remnant polarization of 13 μC/cm² (2 P_r ~26 μC/cm²). The fatigue resistance test exhibited that the ferroelectric polarization of the BNT thin film degraded significantly after around 10⁹ switching cycles, which can be attributed to its crystal structure. We investigated the surface morphology and ferroelectric domain structure by atomic force microscopy (AFM) and piezoresponse force microscopy (PFM), respectively. Interestingly, mixed grains consisting of long and circular shapes were observed on the BNT film surface, which corresponded to a- and c-axes orientations of crystal growth, respectively. The PFM study revealed that the piezoelectric coefficient (d₃₃) of the long grains was much larger than that of the circular grains.     

Solution processing of morphotropic phase boundary BiFeO3-PbTiO3 thin films with reduced conductivity for high room temperature switchable polarization

The (1 – x)BiFeO₃-xPbTiO₃ (BFO-PTO) perovskite solid solution has great potential for being used in practical devices, as it exhibits significant ferroelectric response at its morphotropic phase boundary (MPB). However, the significant conduction, particularly high electrical leakage currents that BFO-PTO films show at room temperature, deteriorates their functionality. This is mainly associated with the presence of multivalent iron along with A-site and oxygen vacancies. Here, solution-derived BFO-PTO thin films have been crystallized at low temperature on Pt/TiO₂/SiO₂/Si substrates, by a rapid thermal annealing process to minimize Bi and Pb volatilization. X-ray analyses have revealed that textured films are obtained with a pseudocubic perovskite structure and without the formation of detectable second phases. Microstructural studies indicated a columnar growth of the films with grain size well above the nanometric range, which, therefore, should not produce an appreciable reduction of the ferroelectric response due to size effects. Because of the relatively low content of charged defects produced in these BFO-PTO films during processing, ferroelectric hysteresis loops can be measured at room temperature. The highest value of remnant polarizations (2P_R = 58 μC/cm²) was obtained for the 0.65BiFeO₃-0.35PbTiO₃ (65BFO-35PTO) films, which suggests that this film composition lies in the proximity of the MPB where the coexistence of a highly textured <100> tetragonal phase and a rhombohedral one seems to occur.     

(111)-oriented Sn-doped BaTiO3 epitaxial thin films for ultrahigh energy density capacitors

Despite the significant advancements of dielectric materials, the energy density values of dielectric capacitors are extremely low compared to those of other energy storage systems, e.g., batteries and fuel cells. The deposition of solid solution of ferroelectric and paraelectric multicomponent thin films are the most widely used approach to enhance the energy density of dielectric capacitors; however, it is extremely difficult to determine the optimized composition ratio of two or three components. In this study, we develop ultrahigh energy density single-component Sn-doped BaTiO₃ (BTS) epitaxial thin film capacitors. An ultrahigh energy density of 92.5 J/cm³ and energy efficiencies above 78% were successfully achieved in (111)-oriented BTS epitaxial thin film capacitors. These excellent results were attributed to the formation of multi-nanodomains accompanied by delayed polarization saturation, low remnant polarization, high breakdown strength, and high cycling stability. Engineering multi-nanodomains through chemical doping and epitaxial orientation is a facile approach to develop energy-efficient ultrahigh energy density capacitors. This approach can be extended for the design of other single-component-based energy-efficient dielectric capacitors with ultrahigh energy density.     

Electric‐Field‐Induced Domain Switching and Domain Texture Relaxations in Bulk Bismuth Ferrite

Bismuth ferrite, BiFeO₃, is an important multiferroic material that has attracted remarkable attention for potential applications in functional devices. While thin films of BiFeO₃ are attractive for applications in nanoelectronics, bulk polycrystalline BiFeO₃ has great potential as a lead‐free and/or high‐temperature actuator material. However, the actuation mechanisms in bulk BiFeO₃ are still to be resolved. Here we report the microscopic origin of electric‐field‐induced strain in bulk BiFeO₃ ceramic by means of in situ high‐energy X‐ray diffraction. Quantification of intrinsic lattice strain and extrinsic domain switching strain from diffraction data showed that the strain response in rhombohedral bulk BiFeO₃ is primarily due to non‐180° ferroelectric domain switching, with no observable change in the phase symmetry, up to the maximum field used in the study. The origin of strain thus differs from the strain mechanism previously shown in thin film BiFeO₃, which gives a similar strain/field ratio as rhombohedral bulk BiFeO₃. A strong post‐poling relaxation of switched non‐180° ferroelectric domains has been observed and hypothesized to be due to intergranular residual stresses with a possible contribution from the conductive nature of the domain walls in BiFeO₃ ceramics.