1.0-/spl mu/m n-Well CMOS/Bipolar Technology

High-performance 1.0-/spl mu/m n-well CMOS/bipolar on-chip technology was developed. For process simplicity, an n-well and a collector of bipolar transistors were formed simultaneously, and base and NMOS channel regions were also made simultaneously resulting in collector-isolated vertical n-p-n bipolar transistor fabrication without any additional process step to CMOS process. On the other hand, 1.0-/spl mu/m CMOS with a new "hot carrier resistant" seIf-defined Polysilicon sidewall spacer (SEPOS) LDD NMOS was developed. It can operate safely under supply voltage over 5 V without performance degradation of CMOS circuits. By evaluating ring oscillators and differential amplifiers constructed by both CMOS and bipolar transistors. it can be concluded that in a digital and in an analog combined system, CMOS has sufficiently high-speed performance for digital parts, while bipolar is superior for analog parts. In addition, bipolar transistors with an n/sup +/-buried layer were also fabricated to reduce collector resistance. Concerning the bipolar input/output buffers, the patterned n/sup +/-buried layer improves the drivability and high-frequency response. As a result, the applications of n-well CMOS/bipolar technology become clear. This technology was successfully applied to a high-speed 64-kbit CMOS static RAM, and improvement in access time was observed.     

Highly linear 0.18-/spl mu/m CMOS power amplifier with deep n-Well structure

The linearity of a 0.18-/spl mu/m CMOS power amplifier (PA) is improved by adopting a deep n-well (DNW). To find the reason for the improvement, bias dependent nonlinear parameters of the test devices are extracted from a small-signal model and a Volterra series analysis for an optimized nMOS PA with a proper matching circuit is carried out. From the analysis, it is revealed that the DNW of the nMOS lowers the harmonic distortion generated from the intrinsic gate-source capacitance (C/sub gs/), which is the dominant nonlinear source, and partially from drain junction capacitance (C/sub jd/). Single-ended and differential PAs for 2.45-GHz WLAN are designed and fabricated using a 0.18-/spl mu/m standard CMOS process. The single-ended PA with the DNW improves IMD3 and IMD5 about 5 dB with identical power performances, i.e., 20 dBm of P/sub out/, 18.7 dB of power gain and 31% of power-added efficiency (PAE) at P/sub 1dB/. The IMD3 and IMD5 are below -40 dBc and -47dBc, respectively. The differential PA with the DNW also shows about 7 dB improvements of IMD3 and IMD5 with 20.2 dBm of P/sub out/, 18.9 dB of power gain and 35% of PAE at P/sub 1dB/. The IMD3 and IMD5 are below -45 dB and -57 dBc, respectively. These performances of the linear PAs are state-of-the-art results.     

A 1-/spl mu/m Bipolar VLSI Technology

A 1-/spl mu/m VLSI process technology has been developed for the fabrication of bipolar circuits. The process employs electron-beam slicing writing, plasma processing, ion implantation, and low-temperature oxidation/annealing to fabricate bipolar device structures with a minimum feature size of 0.9 /spl mu/m. Both nonisolated I/sup 2/L and isolated Schottky transistor logic (STL) devices and circuits have been fabricated with this process technology. The primary demonstration vehicle is a seated LSI, I/sup 2/L, 4-bit processor chip (SBP0400) with a minimum feature size of 1 /spl mu/m. Scaled SPB0400's have been fabricated that operate at clock speeds 3X higher than their full-size counterparts at 50-mA chip current. Average propagation delay has been measured as a function of minimum feature size for both I/sup 2/L and STL device designs. Power-delay products of 14 fJ for I/sup 2/L and 30 fJ for STL have been measured.     

Optimized retrograde N-well for 1-/spl mu/m CMOS technology

Using experiment and simulation, transistors in a high-energy implanted N-well are designed for optimum device performance suitable for 1-/spl mu/m CMOS technology. The effect of process parameters on device performance is obtained. Superior body effect, junction capacitance, punchthrough voltage, and subthreshold slope are achieved for 1-/spl mu/m n- and p-channel transistors. With shallow P/P+ epitaxial material, this retrograde N-well approach also provides latch-up immunity for high-density CMOS.     

A Bluetooth radio in 0.18-/spl mu/m CMOS

This paper describes the results of an implementation of a Bluetooth radio in a 0.18-/spl mu/m CMOS process. A low-IF image-reject conversion architecture is used for the receiver. The transmitter uses direct IQ-upconversion. The VCO runs at 4.8-5.0 GHz, thus facilitating the generation of 0/spl deg/ and 90/spl deg/ signals for both the receiver and transmitter. By using an inductor-less LNA and the extensive use of mismatch simulations, the smallest silicon area for a Bluetooth radio implementation so far can be reached: 5.5 mm/sup 2/. The transceiver consumes 30 mA in receive mode and 35 mA in transmit mode from a 2.5 to 3.0-V power supply. As the radio operates on the same die as baseband and SW, the crosstalk-on-silicon is an important issue. This crosstalk problem was taken into consideration from the start of the project. Sensitivity was measured at -82 dBm.     

A 0.18-/spl mu/m CMOS bioluminescence detection lab-on-chip

The paper describes a bioluminescence detection lab-on-chip consisting of a fiber-optic faceplate with immobilized luminescent reporters/probes that is directly coupled to an optical detection and processing CMOS system-on-chip (SoC) fabricated in a 0.18-/spl mu/m process. The lab-on-chip is customized for such applications as determining gene expression using reporter gene assays, determining intracellular ATP, and sequencing DNA. The CMOS detection SoC integrates an 8 /spl times/ 16 pixel array having the same pitch as the assay site array, a 128-channel 13-bit ADC, and column-level DSP, and is fabricated in a 0.18-/spl mu/m image sensor process. The chip is capable of detecting emission rates below 10/sup -6/ lux over 30 s of integration time at room temperature. In addition to directly coupling and matching the assay site array to the photodetector array, this low light detection is achieved by a number of techniques, including the use of very low dark current photodetectors, low-noise differential circuits, high-resolution analog-to-digital conversion, background subtraction, correlated multiple sampling, and multiple digitizations and averaging to reduce read noise. Electrical and optical characterization results as well as preliminary biological testing results are reported.     

A 50-/spl mu/A standby 1M/spl times/1/256K/spl times/4 CMOS DRAM with high-speed sense amplifier

A 1M word/spl times/1-bit/256K word/spl times/4-bit CMOS DRAM with a test mode is described. The use of an improved sense amplifier for the half-V/SUB CC/ sensing scheme and a novel half-V/SUB CC/ voltage generator have yielded a 56-ns row access time and a 50-/spl mu/A standby current at typical conditions. High /spl alpha/-particle immunity has been achieved by optimizing the impurity profile under the bit line, based on a triple-layer polysilicon n-well CMOS technology. The RAM, measuring 4.4/spl times/12.32 mm/SUP 2/, is fit to standard 300-mil plastic packages.     

A low-voltage folded-switching mixer in 0.18-/spl mu/m CMOS

Scaling of CMOS technologies has a great impact on analog design. The most severe consequence is the reduction of the voltage supply. In this paper, a low voltage, low power, AC-coupled folded-switching mixer with current-reuse is presented. The main advantages of the introduced mixer topology are: high voltage gain, moderate noise figure, moderate linearity, and operation at low supply voltages. Insight into the mixer operation is given by analyzing voltage gain, noise figure (NF), linearity (IIP3), and DC stability. The mixer is designed and implemented in 0.18-/spl mu/m CMOS technology with metal-insulator-metal (MIM) capacitors as an option. The active chip area is 160 /spl mu/m/spl times/200 /spl mu/m. At 2.4 GHz a single side band (SSB) noise figure of 13.9 dB, a voltage gain of 11.9 dB and an IIP3 of -3 dBm are measured at a supply voltage of 1 V and with a power consumption of only 3.2 mW. At a supply voltage of 1.8 V, an SSB noise figure of 12.9 dB, a voltage gain of 16 dB and an IIP3 of 1 dBm are measured at a power consumption of 8.1 mW.     

A matrix amplifier in 0.18-/spl mu/m SOI CMOS

A fully integrated matrix amplifier with two rows and four columns (2-by-4) fabricated in a three-layer metal 0.18-/spl mu/m silicon-on-insulator (SOI) CMOS process is presented. It exhibits an average pass-band gain of 15 dB and a unity-gain bandwidth of 12.5 GHz. The input and output ports are matched to 50 /spl Omega/ using m-derived half sections; the measured S/sub 11/ and S/sub 22/ values exceed -7 and -12 dB, respectively. Integrated in 2.0/spl times/2.9mm/sup 2/, it dissipates 233.4 mW total from 2.4- and 1.8-V power supplies.     

A third-order /spl Sigma//spl Delta/ modulator in 0.18-/spl mu/m CMOS with calibrated mixed-mode integrators

This paper describes a third-order sigma-delta (/spl Sigma//spl Delta/) modulator that is designed and implemented in 0.18-/spl mu/m CMOS process. In order to increase the dynamic range, this modulator takes advantage of mixed-mode integrators that consist of analog and digital integrators. A calibration technique is applied to the digital integrator to mitigate mismatch between analog and digital paths. It is shown that the presented modulator architecture can achieve a 12-dB better dynamic range than conventional structures with the same oversampling ratio (OSR). The experimental prototype chip achieves a 76-dB dynamic range for a 200-kHz signal bandwidth and a 55-dB dynamic range for a 5-MHz signal bandwidth. It dissipates 4 mW from 1.8-V supply voltages and occupies 0.7-mm/sup 2/ silicon area.     

A 10-/spl mu/W standby power 256K CMOS SRAM

A 32K/spl times/8-bit CMOS static RAM using titanium polycide technology has been developed. The RAM has a standby power of 10 /spl mu/W, an active power of 175 mW, and an access time of 55 ns. The standby power has been achieved by an optimization of polysilicon resistors in a memory cell. A digit line circuit controlled by three internal clocks contributes to reduction of active power. The cell size has been reduced to 89.5 /spl mu/m/SUP 2/ by using both a buried isolation and a polycide GND line. Furthermore a simplified address-transition detection circuit and a single data bus configuration result in a small layout area, thus offering a 40.7 mm/SUP 2/ die size.     

A low-power oscillator mixer in 0.18-/spl mu/m CMOS technology

A downconversion double-balanced oscillator mixer using 0.18-/spl mu/m CMOS technology is proposed in this paper. This oscillator mixer consists of an individual mixer stacked on a voltage-controlled oscillator (VCO). The stacked structure allows entire mixer current to be reused by the VCO cross-coupled pair to reduce the total current consumption of the individual VCO and mixer. Using individual supply voltages and eliminating the tail current source, the stacked topology requires 1.0-V low supply voltage. The oscillator mixer achieves a voltage conversion gain of 10.9 dB at 4.2-GHz RF frequency. The oscillator mixer exhibits a tuning range of 11.5% and a single-sideband noise figure of 14.5 dB. The dc power consumption is 0.2 mW for the mixer and 2.94 mW for the VCO. This oscillator mixer requires a lower supply voltage and achieves a higher operating frequency among recently reported Si-based self-oscillating mixers and mixer oscillators. The mixer in this oscillator mixer also achieves a low power consumption compared with recently reported low-power mixers.     

A 15-gb/s 2:1 multiplexer in 0.18-/spl mu/m CMOS

By employing the inductive peaking technique and the super-dynamic flip-flops, a 2:1 multiplexer (MUX) is presented for high-speed operations. The proposed circuit is realized in a 0.18-/spl mu/m CMOS process. With a power consumption of 110mW from a 2-V supply voltage, the fully integrated MUX can operate at an output rate up to 15Gb/s. From the measured eye-diagrams, the 15-Gb/s half-rate MUX exhibits an output voltage swing of 225mV and a root-mean-square jitter of 2.7ps.     

0.18-/spl mu/m CMOS Bluetooth analog receiver with -88-dBm sensitivity

A CMOS Bluetooth analog low-IF receiver that includes a low-noise amplifier, image-rejection mixer, IF bandpass active filter, and programmable gain amplifier (PGA) was fabricated in a 0.18-/spl mu/m bulk CMOS process. In order to achieve good sensitivity and tolerance against blocking signals, operational amplifiers were used in the active filter and PGA, the filter and PGA were interleaved to minimize noise, and an on-chip automatic tuner adjusts the filter frequency. Other features included a feedforward automatic gain control with rapid convergence. When connected to the digital demodulator of a BiCMOS Bluetooth transceiver, -88-dBm sensitivity was measured at 65-mW power dissipation. All blocking signal specifications were also satisfied.     

A 5.9-GHz voltage-controlled ring oscillator in 0.18-/spl mu/m CMOS

This paper presents the design of three- and nine-stage voltage-controlled ring oscillators that were fabricated in TSMC 0.18-/spl mu/m CMOS technology with oscillation frequencies up to 5.9 GHz. The circuits use a multiple-pass loop architecture and delay stages with cross-coupled FETs to aid in the switching speed and to improve the noise parameters. Measurements show that the oscillators have linear frequency-voltage characteristics over a wide tuning range, with the three- and nine-stage rings resulting in frequency ranges of 5.16-5.93 GHz and 1.1-1.86 GHz, respectively. The measured phase noise of the nine-stage ring oscillator was -105.5 dBc/Hz at a 1-MHz offset from a 1.81-GHz center frequency, whereas the value for the three-stage ring oscillator was simulated to be -99.5 dBc/Hz at a 1-MHz offset from a 5.79-GHz center frequency.     

A 0.35-/spl mu/m CMOS 2-GHz VCO in wafer-level package

This letter presents a complementary metal oxide semiconductor (CMOS) voltage-controlled oscillator (VCO) with a high-Q inductor in a wafer-level package for the LC-resonator. The on-chip inductor is implemented using the redistribution metal layer of the wafer-level package (WLP), and therefore it is called a WLP inductor. Using the thick passivation and copper metallization, the WLP inductor has high quality-factor (Q-factor). A 2-nH inductor exhibits a Q-factor of 8 at 2 GHz. The center frequency of the VCO is 2.16 GHz with a tuning range of 385 MHz (18%). The minimum phase noise is measured to be -120.2 dBc/Hz at an offset frequency of 600 kHz. The dc power consumed by the VCO-core is 1.87 mW with a supply voltage of 1.7 V and a current of 1.1 mA. The output power with a 50-/spl Omega/ load is -12.5/spl plusmn/1.3 dBm throughout the whole tuning range. From the best of our knowledge, compared with recently published 2-GHz-band 0.35 /spl mu/m CMOS VCOs in the literature, the VCO in this work shows the lowest power consumption and the best figure-of-merit.     

A 2.4-GHz 0.18-/spl mu/m CMOS self-biased cascode power amplifier

A two-stage self-biased cascode power amplifier in 0.18-/spl mu/m CMOS process for Class-1 Bluetooth application is presented. The power amplifier provides 23-dBm output power with a power-added efficiency (PAE) of 42% at 2.4 GHz. It has a small signal gain of 38 dB and a large signal gain of 31 dB at saturation. This is the highest gain reported for a two-stage design in CMOS at the 0.8-2.4-GHz frequency range. A novel self-biasing and bootstrapping technique is presented that relaxes the restriction due to hot carrier degradation in power amplifiers and alleviates the need to use thick-oxide transistors that have poor RF performance compared with the standard transistors available in the same process. The power amplifier shows no performance degradation after ten days of continuous operation under maximum output power at 2.4-V supply. It is demonstrated that a sliding bias technique can be used to both significantly improve the PAE at mid-power range and linearize the power amplifier. By using the sliding bias technique, the PAE at 16 dBm is increased from 6% to 19%, and the gain variation over the entire power range is reduced from 7 to 0.6 dB.     

A 3-V, 0.35-/spl mu/m CMOS Bluetooth receiver IC

A fully integrated CMOS low-IF Bluetooth receiver is presented. The receiver consists of a radio frequency (RF) front end, a phase-locked loop (PLL), an active complex filter, a Gaussian frequency shift keying (GFSK) demodulator, and a frequency offset cancellation circuit. The highlights of the receiver include a low-power active complex filter with a nonconventional tuning scheme and a high-performance mixed-mode GFSK demodulator. The chip was fabricated on a 6.25-mm/sup 2/ die using TSMC 0.35-/spl mu/m standard CMOS process. -82 dBm sensitivity at 1e-3 bit error rate, -10 dBm IIP3, and 15 dB noise figure were achieved in the measurements. The receiver active current is about 65 mA from a 3-V power supply.     

A 285-MHz pipelined MAP decoder in 0.18-/spl mu/m CMOS

Presented in this paper is a pipelined 285-MHz maximum a posteriori probability (MAP) decoder IC. The 8.7-mm/sup 2/ IC is implemented in a 1.8-V 0.18-/spl mu/m CMOS technology and consumes 330 mW at maximum frequency. The MAP decoder chip features a block-interleaved pipelined architecture, which enables the pipelining of the add-compare-select kernels. Measured results indicate that a turbo decoder based on the presented MAP decoder core can achieve: 1) a decoding throughput of 27.6 Mb/s with an energy-efficiency of 2.36 nJ/b/iter; 2) the highest clock frequency compared to existing 0.18-/spl mu/m designs with the smallest area; and 3) comparable throughput with an area reduction of 3-4.3/spl times/ with reference to a look-ahead based high-speed design (Radix-4 design), and a parallel architecture.