共查询到19条相似文献,搜索用时 759 毫秒
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采用改进的快速推舟液相外延技术在GaAs衬底上成功地生长了GaSb量子点材料.通过原子力显微镜观测了不同生长参数下GaSb量子点材料的形貌(形状、尺寸、密度、尺寸分布均匀性等).分析了不同衬底、不同生长源配比、生长源与衬底的不同接触时间等生长条件参数对GaSb量子点生长的影响.研究表明在GaAs衬底上、富镓生长源配比以及较短的生长源和衬底接触时间下更易获得高质量的GaSb量子点.上述生长条件的摸索和研究对于GaSb量子点器件应用具有重要意义. 相似文献
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在InP(001)衬底上使用分子束外延技术自组织生长了多周期InAs/InAlGaAs量子点阵列结构。根据对透射电镜和光致发光谱结果的分析,认为引入与InP衬底晶格匹配的InAlGaAs缓冲层可以获得较大的InAs量子点结构,而InAlGaAs层的表面特性对InAs量子点的结构及光学性质有很大影响。对InP基InAlGaAs缓冲层上自组织量子点的形核和演化机制进行了探讨,提出量子点的演化过程表现为量子点的合并长大并伴随着自身的徙动,以获得能量最优的分布状态。 相似文献
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R. Gargallo J. Miguel-Snchez . Guzmn U. Jahn E. Muoz 《Microelectronics Journal》2006,37(12):1547-1551
Recently, the growth of patterned surfaces is being used to demonstrate the site control of the three-dimensional nanostructures, and in particular quantum dots. Nevertheless the pre-patterning techniques show some disadvantages. In this work, we report a novel in situ hole-patterning technique which consists of growing by molecular beam epitaxy a dilute nitride GaAsN layer on 1° and 2° towards [2¯ 1 1] misoriented GaAs(1 1 1)B substrates. Later, we carry out a regrowth of GaAs layers on this patterned surfaces in order to improve the surface quality and the homogeneity of the characteristics of holes (size, depth, etc.). Consecutively, we use these patterned surfaces to grow InAs quantum dots, whose growth on these misorientations results in a greater difficulty. A structural characterization of the resulting samples, both hole-patterns and quantum dots, has been performed. Besides, we have realized studies of the dependence of the surface morphology on some important parameters (including substrate misorientation, thicknesses of the GaAsN and GaAs layers grown and growth conditions). 相似文献
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M. Schramboeck A.M. Andrews T. Roch W. Schrenk A. Lugstein G. Strasser 《Microelectronics Journal》2006,37(12):1532-1534
Different techniques for the preparation of patterned GaAs substrates for subsequent overgrowth are presented, including focused ion beam direct writing and laser holography followed by wet chemical or dry etching. GaAs-based buffer layers were grown on the patterns and consequently covered with self-assembled quantum dots (QDs). The effect of a strained InGaAs layer grown directly on the patterned substrates and its influence on QD formation and ordering is shown. The dot density, lateral distribution and size distribution of the dots are measured using atomic force microscopy. A comparison of the growth of QDs on patterned and unpatterned substrates indicates that on patterned substrates a higher QD density at the same InAs deposition can be achieved. 相似文献
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所谓半导体量子点的自组织生长,是指具有较大晶格失配度的两种材料,依靠自身的应变能量,并以Stranki-Krastanov(S-K)生长模式,在衬底表面上形成的一定形状、尺寸和密度分布的自然量子点结构。本文主要介绍了纳米量子点的自组织生长,自组织生长最子点的发光特性及其在光电器件中的应用。 相似文献
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纳米量子点结构的自组织生长 总被引:4,自引:2,他引:2
彭英才 《固体电子学研究与进展》2000,20(2):160-168
所谓自组织生长纳米量子点 ,是具有较大晶格失配度的两种材料 ,依靠自身的应变能量 ,并以 Stranki- Krastanov(S- K)生长模式 ,在衬底表面上形成的具有一定形状、尺寸和密度的自然量子点结构。文中主要介绍了量子点自组织生长的基本原理、几种不同类型量子点的自组织生长及其光致发光特性。 相似文献
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因蓝宝石具有良好的稳定性能,且其生产技术成熟,是目前异质外延GaN应用最广泛的衬底材料之一.采用图形化蓝宝石衬底技术可以降低GaN外延层材料的位错密度,提高LED的内量子效率,同时提高LED出光效率提高,近年来引起了国内外的广泛关注.概述了图形化蓝宝石衬底的研究进展,包括图形化蓝宝石衬底的制备工艺、图形尺寸、图形形状及图形化蓝宝石衬底的作用机理;详细介绍了凹槽状、圆孔状、圆锥形、梯形和半球状5种图形形状,并分析了GaN材料在不同图形形状的图形化蓝宝石衬底上的生长机理及不同图形形状对GaN基LED器件性能的影响.对图形化蓝宝石衬底技术的研究方向进行了展望,提出了亟待研究和解决的问题. 相似文献
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Si衬底氮化物LED器件的研究进展 总被引:2,自引:2,他引:0
通过对比分析目前氮化物LED的三种主要衬底即蓝宝石、SiC与Si的技术特点,指出了发展Si衬底LED的重要意义。详细介绍了目前国内外Si衬底LED的研究现状,解析了在Si衬底上制备LED的多种新型技术,主要包括以提高薄膜沉积质量为目的的缓冲层技术、激光脱离技术、图案掩模技术、阳极氧化铝技术,以及以提高光提取率为宗旨的镜面结构技术和量子阱/量子点技术。这些新型技术与传统的MOCVD,HVPE,MBE等制备技术相结合,在很大程度上克服了Si衬底的不足,使Si衬底上氮化物LED展现出广阔的发展前景。 相似文献
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Richard Nötzel Qian GongM Ramsteiner U JahnK.J Friedland K.H Ploog 《Microelectronics Journal》2002,33(7):573-578
Using a novel growth mechanism on patterned high-index GaAs (311)A substrates we have developed a new concept to fabricate quantum wires and quantum dots as well as coupled quantum wire-dot arrays by molecular beam epitaxy. The combination of self-organized growth with lithographic patterning and the assistance of atomic hydrogen produces these quasi-planar lateral nanostructure arrays with unprecedented uniformity in size and composition and with controlled positioning on the wafer. The sought for one- and zero-dimensional nature of these quantum wire and quantum dot arrays manifests itself in the superior optical properties. To functionalize our lateral semiconductor quantum wire and quantum dot arrays with the properties of magnetic thin films, epitaxial Fe layers have been grown on GaAs (311)A. Defect free Fe layers are obtained on As-saturated GaAs surfaces. The large electrical conductivity of thin Fe layers indicates reduced Fe-GaAs interface compound formation. An unusual in-plane spontaneous Hall-effect is observed in these epitaxial Fe layers of reduced symmetry. 相似文献
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G. E. Cirlin A. I. Khrebtov Yu. B. Samsonenko S. A. Kukushkin T. Kasama N. Akopian L. Leonardo 《Semiconductors》2018,52(4):462-464
III–V nanowires, or a combination of the nanowires with quantum dots, are promising building blocks for future optoelectronic devices, in particular, single-photon emitters, lasers and photodetectors. In this work we present results of molecular beam epitaxial growth of combined nanostructures containing GaAs quantum dots inside AlGaAs nanowires on a silicon substrate showing a new way to combine quantum devices with Si technology. 相似文献