Optimal $ Sigma Delta$ Modulator Architectures for Fractional-$ {N}$ Frequency Synthesis

This paper presents a comparative study of $Sigma Delta$ modulators for use in fractional-$ {N}$ phase-locked loops. It proposes favorable modulator architectures while taking into consideration not only the quantization noise of the modulator but also other loop nonidealities such as the charge pump current mismatch that contributes to the degradation in the synthesized tone's phase noise. The proper choice of the modulator architecture is found to be dependent upon the extent of the nonideality, reference frequency, and loop bandwidth. Three modulator architectures are then proposed for low, medium, and high levels of nonidealities.      

High-Performance $hbox{In}_{0.7}hbox{Ga}_{0.3}hbox{As}$ -Channel MOSFETs With High-$kappa$ Gate Dielectrics and $alpha$-Si Passivation

Long and short buried-channel $hbox{In}_{0.7}hbox{Ga}_{0.3}hbox{As}$ MOSFETs with and without $alpha$-Si passivation are demonstrated. Devices with $alpha$-Si passivation show much higher transconductance and an effective peak mobility of 3810 $hbox{cm}^{2}/ hbox{V} cdot hbox{s}$. Short-channel MOSFETs with a gate length of 160 nm display a current of 825 $muhbox{A}/muhbox{m}$ at $V_{g} - V_{t} = hbox{1.6} hbox{V}$ and peak transconductance of 715 $muhbox{S}/muhbox{m}$. In addition, the virtual source velocity extracted from the short-channel devices is 1.4–1.7 times higher than that of Si MOSFETs. These results indicate that the high-performance $hbox{In}_{0.7}hbox{Ga}_{0.3} hbox{As}$-channel MOSFETs passivated by an $alpha$ -Si layer are promising candidates for advanced post-Si CMOS applications.      

High Density and Low Leakage Current in $ hbox{TiO}_{2}$ MIM Capacitors Processed at 300 $^{circ} hbox{C}$

We report Ir/TiO₂/TaN metal-insulator-metal capacitors processed at only 300degC, which show a capacitance density of 28 fF/mum² and a leakage current of 3 times 10^-8 (25degC) or 6 times 10^-7 (125degC) A/cm² at -1 V. This performance is due to the combined effects of 300degC nanocrystallized high-kappa TiO₂, a high conduction band offset, and high work-function upper electrode. These devices show potential for integration in future very-large-scale-integration technologies.     

A Comparative NBTI Study of $hbox{HfO}_{2}$, $hbox{HfSiO}_{x}$, and SiON p-MOSFETs Using UF-OTF $I_{rm DLIN}$ Technique

The time, temperature, and oxide-field dependence of negative-bias temperature instability is studied in $hbox{HfO}_{2}/hbox{TiN}$, $ hbox{HfSiO}_{x}/hbox{TiN}$, and SiON/poly-Si p-MOSFETs using ultrafast on-the-fly $I_{rm DLIN}$ technique capable of providing measured degradation from very short (approximately microseconds) to long stress time. Similar to rapid thermal nitrided oxide (RTNO) SiON, $hbox{HfO}_{2}$ devices show very high temperature-independent degradation at short (submilliseconds) stress time, not observed for plasma nitrided oxide (PNO) SiON and $hbox{HfSiO}_{x}$ devices. $hbox{HfSiO}_{x}$ shows lower overall degradation, higher long-time power-law exponent, field acceleration, and temperature activation as compared to $hbox{HfO}_{2}$, which are similar to the differences between PNO and RTNO SiON devices, respectively. The difference between $ hbox{HfSiO}_{x}$ and $hbox{HfO}_{2}$ can be attributed to differences in N density in the $hbox{SiO}_{2}$ IL of these devices.      

Impacts of $hbox{N}_{2}$ and $hbox{NH}_{3}$ Plasma Surface Treatments on High-Performance LTPS-TFT With High-$kappa$ Gate Dielectric

Low-temperature polycrystalline-silicon thin-film transistors (LTPS-TFTs) with high- $kappa$ gate dielectrics and plasma surface treatments are demonstrated for the first time. Significant field-effect mobility $mu_{rm FE}$ improvements of $sim$86.0% and 112.5% are observed for LTPS-TFTs with $hbox{HfO}_{2}$ gate dielectric after $hbox{N}_{2}$ and $ hbox{NH}_{3}$ plasma surface treatments, respectively. In addition, the $hbox{N}_{2}$ and $ hbox{NH}_{3}$ plasma surface treatments can also reduce surface roughness scattering to enhance the field-effect mobility $mu_{rm FE}$ at high gate bias voltage $V_{G}$, resulting in 217.0% and 219.6% improvements in driving current, respectively. As a result, high-performance LTPS-TFT with low threshold voltage $V_{rm TH} sim hbox{0.33} hbox{V}$, excellent subthreshold swing S.S. $sim$0.156 V/decade, and high field-effect mobility $mu_{rm FE} sim hbox{62.02} hbox{cm}^{2}/hbox{V} cdot hbox{s}$ would be suitable for the application of system-on-panel.      

Eigendecomposition of Images Correlated on $S^{1}$, $S^{2}$, and $SO(3)$ Using Spectral Theory

Eigendecomposition represents one computationally efficient approach for dealing with object detection and pose estimation, as well as other vision-based problems, and has been applied to sets of correlated images for this purpose. The major drawback in using eigendecomposition is the off line computational expense incurred by computing the desired subspace. This off line expense increases drastically as the number of correlated images becomes large (which is the case when doing fully general 3-D pose estimation). Previous work has shown that for data correlated on S ¹ , Fourier analysis can help reduce the computational burden of this off line expense. This paper presents a method for extending this technique to data correlated on S ² as well as SO(3) by sampling the sphere appropriately. An algorithm is then developed for reducing the off line computational burden associated with computing the eigenspace by exploiting the spectral information of this spherical data set using spherical harmonics and Wigner-D functions. Experimental results are presented to compare the proposed algorithm to the true eigendecomposition, as well as assess the computational savings.     

2 MHz AO $Q$ -switched ${rm TEM}_{00}$ Grazing Incidence Laser With 3 at.% Neodymium Doped Nd:YVO$_{4}$

We present a detailed experimental and theoretical study of the ultrahigh repetition rate AO $Q$ -switched ${rm TEM}_{00}$ grazing incidence laser. Up to 2.1 MHz $Q$-switching with ${rm TEM}_{00}$ output of 8.6 W and 2.2 MHz $Q$ -switching with multimode output of 10 W were achieved by using an acousto-optics $Q$ -switched grazing-incidence laser with optimum grazing-incidence angle and cavity configuration. The crystal was 3 at.% neodymium doped Nd:YVO$_{4}$ slab. The pulse duration at 2 MHz repetition rate was about 31 ns. The instabilities of pulse energy at 2 MHz repetition rate were less than ${pm}6.7hbox{%}$ with ${rm TEM}_{00}$ operation and ${pm}3.3hbox{%}$ with multimode operation respectively. The modeling of high repetition rate $Q$-switched operation is presented based on the rate equation, and with the solution of the modeling, higher pump power, smaller section area of laser mode, and larger stimulated emission cross section of the gain medium are beneficial to the $Q$-switched operation with ultrahigh repetition rate, which is in consistent with the experimental results.      

Improved Electrical Properties of Ge p-MOSFET With $ hbox{HfO}_{2}$ Gate Dielectric by Using $hbox{TaO}_{x} hbox{N}_{y}$ Interlayer

The electrical characteristics of germanium p-metal-oxide-semiconductor (p-MOS) capacitor and p-MOS field-effect transistor (FET) with a stack gate dielectric of HfO₂/TaOxNy are investigated. Experimental results show that MOS devices exhibit much lower gate leakage current than MOS devices with only HfO₂ as gate dielectric, good interface properties, good transistor characteristics, and about 1.7-fold hole-mobility enhancement as compared with conventional Si p-MOSFETs. These demonstrate that forming an ultrathin passivation layer of TaOxNy on germanium surface prior to deposition of high-k dielectrics can effectively suppress the growth of unstable GeOx, thus reducing interface states and increasing carrier mobility in the inversion channel of Ge-based transistors.     

Compact Variable ${rm TE}$-${rm TM}$ Polarization Splitter Based on Simplified Coherent Coupling in Lithium Niobate

A compact-sized electrically tunable ${rm TE}$- ${rm TM}$ mode splitter composed of a mode converter and an asymmetric Y-branch structure is presented. The asymmetric Y-branch consists of a straight and a bent waveguides to split two polarization modes based on the mode-sorting effect. To shorten the device length, a simplified coherently coupled-bending structure is utilized for the bent waveguide. Experimental results show that the device length is reduced about 52%, extinction ratios of both ${rm TE}$ and ${rm TM}$ modes are higher than 25 dB, yet the applied voltage is not significantly increased.      

Two-Pulse $C$–$V$ : A New Method for Characterizing Electron Traps in the Bulk of $ hbox{SiO}_{2}/hbox{high-}kappa$ Dielectric Stacks

$hbox{SiO}_{2}/hbox{high-}kappa$ dielectric stack is a candidate for replacing the conventional $hbox{SiO}_{2}$-based dielectric stacks for future Flash memory cells. Electron traps in the high-$ kappa$ layer can limit the memory retention via the trap-assisted tunneling, and there is a pressing need for their characterization. A new two-pulse $C$ –$V$ measurement technique is developed in this letter, which, for the first time, allows us to probe the discharge of electron traps throughout the $hbox{SiO}_{2}/hbox{high-}kappa$ stack. It complements the charge pumping technique, which can only probe near-interface traps. It is demonstrated that a large number of electron traps, indeed, exist in the bulk of high-$kappa$ layer. Bulk electron traps also have different discharge characteristics from those near the $hbox{SiO}_{2}/hbox{high-}kappa$ interface.      

High-Performance Poly-Silicon TFTs Using a High-$k$ $hbox{PrTiO}_{3}$ Gate Dielectric

In this letter, a polycrystalline-silicon thin-film transistor (poly-Si TFT) with a high- $k$ $hbox{PrTiO}_{3}$ gate dielectric is proposed for the first time. Compared to TFTs with a $hbox{Pr}_{2}hbox{O}_{3}$ gate dielectric, the electrical characteristics of poly-Si TFTs with a $hbox{PrTiO}_{3}$ gate dielectric can be significantly improved, such as lower threshold voltage, smaller subthreshold swing, higher $I_{rm on}/I_{rm off}$ current ratio, and larger field-effect mobility, even without any hydrogenation treatment. These improvements can be attributed to the high gate capacitance density and low grain-boundary trap state. All of these results suggest that the poly-Si TFT with a high- $k$ $hbox{PrTiO}_{3}$ gate dielectric is a good candidate for high-speed and low-power display driving circuit applications in flat-panel displays.      

The Performance of Acoustic-Optical $Q$-switched Mode-Locking 1.34 $mu$m Nd:GdVO$_{4}$ Laser

A diode-end-pumped $Q$ -switched mode-locking $hbox{Nd:GdVO}_{4}$ laser operating at 1.34 $mu{hbox {m}}$ with an acousto-optical (AO) Q-switch in a compact V-type cavity was realized in our experiment for the first time. When the AO Q-switch repetition rate was 10 kHz, the maximum average output power of 750 mW and the pulse energy of 75 $muhbox{J}$ were obtained at the maximum incident pump power of 9 W. The mode-locking modulation depth of about 100% was obtained at certain pump power over the threshold. The mode-locked pulse inside in the $Q$-switched pulse had a repetition rate of 341 MHz, and its average pulsewidth was estimated to be about 350 ps. A developed rate equation model for the $Q$ -switched and mode-locked lasers with an AO Q-switch were proposed by using the hyperbolic secant functional methods. The results of numerical calculations of the rate equations were in good agreement with the experimental results.      

22.7-dB Gain $-$19.7-dBm $ICP_{1{rm dB}}$ UWB CMOS LNA

A fully differential CMOS ultrawideband low-noise amplifier (LNA) is presented. The LNA has been realized in a standard 90-nm CMOS technology and consists of a common-gate stage and two subsequent common-source stages. The common-gate input stage realizes a wideband input impedance matching to the source impedance of the receiver (i.e., the antenna), whereas the two subsequent common-source stages provide a wideband gain by exploiting RLC tanks. The measurements have exhibited a transducer gain of 22.7 dB at 5.2 GHz, a 4.9-GHz-wide B _3dB, an input reflection coefficient lower than -10.5 dB, and an input-referred 1-dB compression point of -19.7 dBm, which are in excellent agreement with the postlayout simulation results, confirming the approach validity and the design robustness.     

AlGaN/GaN MOSHEMTs With Liquid-Phase-Deposited $ hbox{TiO}_{2}$ as Gate Dielectric

$hbox{TiO}_{2}$ films deposited on GaN layers at room temperature through a simple and low-cost liquid-phase deposition (LPD) method are investigated and served as gate dielectrics in AlGaN/GaN MOSHEMTs. The electrical characteristics of the MOS structure on n-doped GaN show that the leakage current is about $hbox{1.01} times hbox{10}^{-7} hbox{A/cm}^{2}$ at 1 MV/cm and that the breakdown field is more than 6.5 MV/cm. The maximum drain current density of MOSHEMTs is higher than that of conventional HEMTs, and a wider gate voltage swing can also be observed. The maximum transconductance and threshold voltage almost maintain the same characteristics, even after inserting a dielectric layer between the gate metal and the 2DEG channel by using $ hbox{TiO}_{2}$ as a gate dielectric. The gate leakage current density is significantly improved, and the bias stress measurement shows that current collapse is much suppressed for MOSHEMTs.      

Nonvolatile-Memory Characteristics of $hbox{AlO}^{-}$ -Implanted $hbox{Al}_{2}hbox{O}_{3}$

The nonvolatile-memory (NVM) characteristics of $hbox{AlO}^{-}$ -implanted $hbox{Al}_{2}hbox{O}_{3}$ structures are reported and shown to exhibit promising behaviors, including fast program/erase speeds and high-temperature data retention. Photoconductivity spectra show the existence of two dominant trap levels, located at around 2 and 4 eV below the conduction band minimum of $hbox{Al}_{2}hbox{O}_{3}$, and our calculations show that these levels are likely attributed to the defects in the $hbox{Al}_{2}hbox{O}_{3}$, such as the Al–O divacancy. The relative concentrations of these defects vary with the implant fluence and are shown to explain the NVM characteristics of the samples irradiated to different fluences.      

Low-Voltage Organic Field-Effect Transistor With PMMA/$ hbox{ZrO}_{2}$ Bilayer Dielectric

This paper reports on the application of a bilayer polymethylmethacrylate (PMMA)/ $hbox{ZrO}_{2}$ dielectric in copper phthalocyanine (CuPc) organic field-effect transistors (OFETs). By depositing a PMMA layer on $hbox{ZrO}_{2}$, the leakage of the dielectric is reduced by one order of magnitude compared to single-layer $hbox{ZrO}_{2}$. A high-quality interface is obtained between the organic semiconductor and the combined insulators. By integrating the advantages of polymer and high- $k$ dielectrics, the device achieves both high mobility and low threshold voltage. The typical field-effect mobility, threshold voltage, on/off current ratio, and subthreshold slope of OFETs with bilayer dielectric are $hbox{5.6}timeshbox{10}^{-2} hbox{cm}^{2}/hbox{V} cdot hbox{s}$, 0.8 V, $hbox{1.2} times hbox{10}^{3}$, and 2.1 V/dec, respectively. By using the bilayer dielectrics, the hysteresis observed in the devices with single-layer $hbox{ZrO}_{2}$ is no longer present.      

Improvement of On–Off-Current Ratio in $ hbox{TiO}_{rm x}$ Active-Channel TFTs Using $hbox{N}_{2} hbox{O}$ Plasma Treatment

Without sacrificing the on-current in the transfer characteristics, we have successfully reduced the off-current part by the optimal $hbox{N}_{2}hbox{O}$ plasma treatment to improve the on–off-current ratio in n-type titanium oxide $( hbox{TiO}_{rm x})$ active-channel thin-film transistors. While the high-power (275 W) $hbox{N}_{2}hbox{O}$ plasma treatment oxidizes the whole $hbox{TiO}_{rm x}$ channel and results in the reduction of both on- and off-current, the optimized low-power (150 W) process makes the selective oxidation of the top portion in the channel and reduces only the off-current significantly. Increase in on–off ratio by almost five orders of magnitude is achieved without change in on-current by using the presented method.      

A Center-Offset Polycrystalline-Silicon Thin-Film Transistor With ${rm n}^{+}$ Amorphous-Silicon Contacts

We have studied a bottom-gate polycrystalline-silicon thin-film transistor (poly-Si TFT) with amorphous-silicon (a-Si) ${rm n}^{+}$ contacts and center-offset gated structure, where intrinsic poly-Si is used in the center-offset region. The fabrication process is compatible with the conventional a-Si TFT with addition of thermal annealing for crystallization of a-Si. The bottom-gate poly-Si TFT with a 5-$muhbox{m}$ offset length exhibited a field-effect mobility of 18.3 $hbox{cm}^{2}/hbox{V} cdot hbox{s}$ and minimum OFF-state current of $hbox{2.79} times hbox{10}^{-12} hbox{A}/muhbox{m}$ at $V_{rm ds} = hbox{5} hbox{V}$. The leakage currents are two orders of magnitude lower than those of a nonoffset TFT with mobility drop from 23.8 to 18.3 $hbox{cm}^{2}/ hbox{V} cdot hbox{s}$.      

Dual-Gate Graphene FETs With $f_{T}$ of 50 GHz

A dual-gate graphene field-effect transistor is presented, which shows improved radio-frequency (RF) performance by reducing the access resistance using electrostatic doping. With a carrier mobility of 2700 cm²/V · s, a cutoff frequency of 50 GHz is demonstrated in a 350-nm-gate-length device. This f_T value is the highest frequency reported to date for any graphene transistor, and it also exceeds that of Si MOS field-effect transistors at the same gate length, illustrating the potential of graphene for RF applications.     

Sharp $p$ -Divisibility of Weights in Abelian Codes Over ${BBZ}/p^d{BBZ}$

A theorem of McEliece on the $p$-divisibility of Hamming weights in cyclic codes over ${BBF}_p$ is generalized to Abelian codes over ${{{BBZ}/p^d{BBZ}}}$. This work improves upon results of Helleseth–Kumar–Moreno–Shanbhag, Calderbank–Li–Poonen, Wilson, and Katz. These previous attempts are not sharp in general, i.e., do not report the full extent of the $p$ -divisibility except in special cases, nor do they give accounts of the precise circumstances under which they do provide best possible results. This paper provides sharp results on $p$-divisibilities of Hamming weights and counts of any particular symbol for an arbitrary Abelian code over ${{{BBZ}/p^d{BBZ}}}$. It also presents sharp results on $2$-divisibilities of Lee and Euclidean weights for Abelian codes over ${{{BBZ}/4{BBZ}}}$.