柔性衬底氧化物半导体透明导电膜的研究进展

回顾和评述了柔性衬底氧化物透明导电膜（包括锡掺杂的三氧化二铟ITO薄膜、铝掺杂的氧化锌AZO薄膜等）的研究进展情况。报道了在柔性衬底上制备的ITO膜、ZnO膜的光电性质对衬底种类、制备工芑及制备参数的依赖关系,给出了在此领域内应进一步进行的工作。     

柔性透明导电膜衬底材料的研究进展

综述了柔性透明导电膜材料的应用以及可用作柔性透明导电膜衬底材料的种类、存在的问题和可行的解决方法。介绍了柔性透明导电膜材料的优点、应用和国内外研究现状。重点介绍了可用作柔性透明导电膜衬底的聚合物材料—聚酰亚胺和聚酯,分析了各自的特点。通过分析柔性衬底存在的不足,寻求可行的解决方法,使柔性衬底可以更好地满足导电膜对衬底材料的要求,为柔性衬底材料的设计提供依据。     

掺铝氧化锌透明导电膜的研究进展

掺铝氧化锌(AZO)透明导电薄膜作为一种性能优异的多功能材料引起了研究人员的普遍关注,被认为是当前极具发展潜力的传统铟锡氧化物(ITO)薄膜的替代者.综述了AZO薄膜的不同制备工艺,并叙述了衬底温度、Al掺杂量、氧分压、退火条件、同质缓冲层5个因素对薄膜的结构以及光电性能的影响.针对AZO透明导电薄膜的研究现状,提出了今后的研究方向:理论与经验相结合,优化工艺设备,在提高薄膜透光率的同时进一步降低其表面电阻和制造成本,并不断开拓AZO薄膜新的应用领域.     

可用于沉积透明导电氧化物薄膜的柔性衬底研究进展

柔性衬底表面沉积TCO薄膜具有许多独特的优点且应用广泛.但柔性衬底存在不耐高温的缺点,如何选择合适的柔性衬底,在表面沉积TCO薄膜过程中至关重要.简单介绍了各种柔性衬底的相关性能,阐述了当前国内外在该领域中各柔性衬底的研究成果,展望了未来柔性衬底的选择及应用趋势.     

透明导电膜研究进展

论述了透明导电膜工艺及其发展水平，对其发展方向提出了展望。     

射频磁控溅射有机衬底SnO2∶Sb透明导电膜性能的研究

采用射频磁控溅射法在聚丙烯己二酯有机薄膜(polypropylene adipate, PPA)衬底上低温制备出锑掺杂的氧化锡(SnO2∶Sb)透明导电膜.研究了薄膜的厚度效应对SnO2∶Sb薄膜的结构、光学和电学特性的影响.制备薄膜为多晶膜,并且保持了纯二氧化锡的金红石结构.载流子浓度和迁移率随着薄膜厚度的增加而增大,电阻率随着薄膜厚度的增加而减小,最低电阻率为 2×10-3Ω*cm.     

射频磁控溅射有机衬底SnO2：Sb透明导电膜性能的研究

采用射频磁控溅射法在聚丙烯己二酯有机薄膜(polypropylene adipate, PPA)衬底上低温制备出锑掺杂的氧化锡(SnO2∶Sb)透明导电膜.研究了薄膜的厚度效应对SnO2∶Sb薄膜的结构、光学和电学特性的影响.制备薄膜为多晶膜,并且保持了纯二氧化锡的金红石结构.载流子浓度和迁移率随着薄膜厚度的增加而增大,电阻率随着薄膜厚度的增加而减小,最低电阻率为 2×10-3Ω*cm.     

柔性聚酰亚胺(PI)衬底上ITO薄膜的生长及其透明导电性能影响机制研究

采用直流磁控溅射法在聚酰亚胺(PI)柔性衬底上生长氧化铟锡(ITO)薄膜,采用XP-2探针台阶仪、X射线衍射(XRD)、霍尔测试仪、紫外-可见分光光度计等对ITO薄膜进行结构和光电性能表征.结果表明溅射功率和沉积气压是影响磁控溅射法生长ITO薄膜透明导电性能的主要因素,实验系统研究了溅射功率和沉积气压对ITO薄膜透明导...     

聚合物基透明导电膜研究进展

与玻璃基透明导电膜相比，聚合物基透明导电膜耐析，对靡摩，成本也较低，可广泛使用。概述了聚合物透明导电膜的种类，特点，制备及其在一些领域的应用。     

Mechanical properties of ZnO thin films deposited on polyester substrates used in flexible device applications

ZnO is growing in importance as a functional film in flexible devices because of the wide range of electrical properties that can be achieved through appropriate doping and the relative abundance of Zn. We have deposited ZnO films with various thicknesses by sputtering on polyethylene terephthalate (PET) and polyethylene naphthalate (PEN) flexible substrates and measured their mechanical properties using compression and scratch tests coupled with in-situ optical microscopy. The cracking of ZnO, during compression, is thickness dependent and at lower thicknesses the films sputtered on PEN exhibit the highest crack onset strains, around 2%. During scratch testing, two major scratch failure mechanisms are observed, analyzed and discussed. It is also found that scratch resistance of ZnO is thickness dependent for both PET and PEN. At high scratch loads a secondary failure mechanism due to impregnation of film debris into the polymer substrates is observed.     

Properties of ZnO:Al films deposited on polycarbonate substrate

Transparent conducting aluminum-doped zinc oxide (ZnO:Al) films have been prepared on polycarbonate (PC) substrates by pulsed laser deposition technique at low substrate temperature (room-100 °C); Nd-YAG laser with wavelength of 1064 nm was used as laser source. The experiments were performed at various oxygen pressures (3 pa, 5 pa, and 7 Pa). In order to study the influence of the process parameters on the deposited (ZnO:Al) films, X-ray diffraction and atomic force microscopy were applied to characterize the structure and surface morphology of the deposited (ZnO:Al) films. Polycrystalline ZnO:Al films having a preferred orientation with the c-axis perpendicular to the substrate were deposited with a strong single violet emission centering about 377–379 nm without any accompanying deep level emission. The average transmittances exceed 85% in the visible spectrum for 300 nm thick films deposited on polycarbonate.     

ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells

Throughout the last years strong efforts have been made to use aluminium doped zinc oxide (ZnO:Al) films on glass as substrates for amorphous or amorphous/microcrystalline silicon solar cells. The material promises better performance at low cost especially because ZnO:Al can be roughened in order to enhance the light scattering into the cell. Best optical and electrical properties are usually achieved by RF sputtering of ceramic targets. For this process deposition rates are low and the costs are comparatively high. Reactive sputtering from metallic Zn/Al compound targets offers higher rates and a comparable high film quality in respect to transmission and conductivity. In the presented work the process has been optimised to lead to high quality films as shown by reproducible cell efficiencies of around 9% initial for single junction amorphous silicon solar cells on commercial glass substrates. The crucial point for achieving high efficiencies is to know the dependency of the surface structure after the roughening step, which is usually performed in a wet etch, on the deposition parameters like oxygen partial pressure, aluminium content of the targets and temperature. The most important insights are discussed and the process of optimisation is presented.     

Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering

ZnO:Al thin films deposited on transparent TPT substrates by magnetron sputtering were etched in acetic acid solution. The effects of etching solution concentration and etching time on the structure and properties of ZnO:Al films were investigated. The obtained films had a hexagonal structure and a highly preferred orientation with the c-axis perpendicular to the substrate. The ZAO film etched in 1% acetic acid solution for 10 s had a pyramidal structure and an enhanced light scattering ability, the average transmittance and reflectance in the visible region were 72% and 26% respectively, the sheet resistance was 260 Ω/□. Both transmittance and reflectance of the films decreased as the etching solution concentration and etching time increasing. Etching had a negative effect on the conductive properties of ZAO films. The lowest sheet resistance was 120 Ω/□ for the ZAO film without etching.     

Ellipsometric studies on ZnO:Al thin films: Refinement of dispersion theories

We characterize sputter-deposited aluminum-doped zinc oxide (ZnO:Al) thin films on glass and silicon substrates by variable-angle spectroscopic ellipsometry in the spectral range of 240 nm to 1700 nm. The model dielectric function includes the excitonic effects of direct band-gap semiconductors in the presence of high carrier densities as well as the scattering of free carriers by ionized donors. We show that an energy-dependent broadening term of the band-gap model avoids an extended absorption tail below the absorption threshold as it usually results from Lorentzian broadening. Uniaxial anisotropy takes account of the oriented growth of hexagonal crystalline ZnO:Al thin films. All the parameters derived from the optical measurements such as surface roughness, free-carrier concentration and mobility agree with the results of independent thin-film characterization methods such as atomic-force microscopy, Hall and four-point probe measurements. In the case of the glass samples, we need an additional interface layer which is confirmed by transmission-electron microscopy as an intermix layer of ZnO and glass.     

Mn-doped ZnO transparent conducting films deposited by DC magnetron sputtering

Mn-doped zinc oxide (ZnO:Mn) thin films with low resistivity and relatively high transparency were firstly prepared on glass substrate by direct current (DC) magnetron sputtering at room temperature. Influence of film thickness on the properties of ZnO:Mn films was investigated. X-ray diffraction (XRD) and scanning electron microscopy (SEM) show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. As the thickness increases from 144 to 479 nm, the crystallite size increases while the electrical resistivity decreases. However, as the thickness increases from 479 to 783 nm, the crystallite size decreases and the electrical resistivity increases. When film thickness is 479 nm, the deposited films have the lowest resistivity of 2.1 × 10^− 4 Ω cm and a relatively high transmittance of above 84% in the visible range.     

Multifunctional ZnO:V thin films deposited by rf-magnetron sputtering from aerogel nanopowder target material

ZnO:V thin films have been grown onto suprasil substrates by rf-magnetron sputtering at room temperature using nanocrystalline powder synthesized by modified sol-gel method. In our approach the water for hydrolysis used in the synthesis of nanopowder was slowly released by esterification reaction followed by a thermal drying in ethyl alcohol at 250 °C. The effects of V concentration on structural, electrical, morphological and optical properties were studied. The as-deposited films with a thickness of about 0.4 μm were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The films present high optical transmittance in the visible range of approximately 90%, carrier concentration of about 10²⁰ cm^− 3 and electrical resistivity of 10^− 3 Ω cm at room temperature. In the as-prepared state the films also present ferromagnetic properties attributed to the presence of vanadium based secondary phases.     

Low-temperature deposited Titanium-doped zinc oxide thin films on the flexible PET substrate by DC magnetron sputtering

Transparent conducting Titanium-doped zinc oxide thin films (TZO) with high transparency and relatively low resistivity were firstly deposited on water-cooled polyethylene terephthalate (PET) substrates at room temperature by DC magnetron sputtering. The microstructure, optical and electrical properties of the deposited films were investigated and discussed. The XRD patterns show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. The electrical resistivity decreases when the sputtering power increases from 45 W to 60 W. However, as the puttering power continue increases from 60 W to 90 W, the electrical resistivity increases rapidly. When the puttering power is 60 W, the films deposited on PET substrate have the lowest resistivity of 4.72 × 10⁻⁴ Ω cm and a relatively high transmittance of above 92% in the visible range.     

Structural, electrical and bending properties of transparent conductive Ga-doped ZnO films on polymer substrates

We investigated the characteristics of highly transparent conductive Ga-doped ZnO (GZO) polycrystalline films of 100 nm thickness deposited on glass and polymer substrates. GZO films were deposited by ion plating with dc-arc discharge. We developed multiple-deposition method to obtain various deposition process temperatures lower than 100 °C. Cross-sectional SEM images show that all the GZO films have columnar structure. Analysis of data obtained by XRD measurements shows that all the GZO films with wurtzite structure exhibit highly (002) orientation perpendicular to the substrate. The resistivity of the GZO films deposited on polyester and glass substrates were 5.0 × 10^-4 Ω · cm. The mechanical bending properties of the GZO films were investigated by comparing the sheet resistance determined before and after a bending test with various bending diameters. For the bending diameter of more than 30 mm, all the GZO films exhibited excellent bending properties with no change in sheet resistance. For the bending diameter of less than 20 mm, we found the sheet resistance affected by the bending. We demonstrated that our multiple-deposition method to achieve different controllable polyester substrate temperatures is highly suitable for improving the bending properties of GZO films.