超晶格量子阱长波红外焦平面阵列技术的进展

随着分子束外延(MBE)和有机金属化学汽相淀积(MOCVD)技术的发展,出现了新型的半导体超晶格量子阱长波红外探测器。本文分别评述 AlGaAs/GaAs,InGaAs,InAsSbⅢ-Ⅴ族化合物新型半导体超晶格量子阱器件目前的研究进展状况,着重于器件的工作机理、结构形式、制作工艺以及目前达到的主要性能参数水平,特别是在长波红外响应波长、暗电流和探测率方面的进展,在长波红外焦平面阵列方面的应用状况和发展前景。     

多色量子阱红外探测器的发展

军用红外探测器需要使用工作在各种红外波段的大规格、高均匀性多色焦平面阵列器件.满足这些要求的一个候选者就是量子阱红外（光电）探测器（Quantum Well Infrared Photodetector,QWIP）.作为新一代红外探测器,QWIP基于极薄半导体异质结构中的载流子束缚效应. GaAs/AlGaAs/QWIP的主要优点包括标准的Ⅲ-Ⅴ族衬底材料和技术、良好的热稳定性、大面积、低研发成本以及抗辐射性.QWIP的另一个重要优点是具有带隙工程能力.可以通过调节量子阱宽度和势垒组分设计出满足特殊要求（例如多色焦平面列阵应用）的器件结构.介绍了对QWIP探测物理机制的理解以及近年来多色QWIP技术的发展状况.     

Ⅲ-Ⅴ族半导体全（多）光谱焦平面探测器新进展

近年来,经济社会和武器装备的信息化对半导体光电子学器件提出了更高的要求,无论是国防还是民用工程都需要有自己的关键器件。光电探测器组件作为关键器件之一,世界各国都给予了高度重视,也取得了很大的进展。文中主要介绍了Ⅲ-Ⅴ族半导体全(多)光谱焦平面探测器的研究进展情况,包括量子阱红外探测器(QWIP)、AlGaN紫外焦平面探测器、InGaAs近红外室温焦平面探测器和Sb化物焦平面探测器等。     

GaAs／AIGaAs量子阱红外探测器的发展

半导体超晶格量子阱红外探测器的研制近年来取得了引人注目的成果,其中 GaAs/AlGaAs 红外器件的发展最快。本文在简要综述其单元探测器的基础上,着重介绍这种材料用于红外探测器列阵和焦平面的新成果。     

GaAs／AlGaAs量子阱红外探测器的发展及展望

本文较为详细的评述了GaAs/AlGaAs量子阱红外探测器在国内外的发展动态,内容涉及单元探测器的国内外最新水平和研究焦点;新型器件如双色型、光伏型等的国内外最新发展动态,此外还评述了大面积焦平面列阵器件的进展。     

Ⅲ—Ⅴ族超晶格量子阱结构红外探测器最新进展

半导体超晶格量子阱作为新一代微电子器件材料而迅速堀起,亦为寻求品质优异、具有特殊性能的红外探测器材料开拓了一个全新的能带工程领域。本文综述了国外发展很快的Ⅲ-Ⅴ族超晶格量子阱红外器件,着重介绍近两年的新成果。     

多色量子阱红外探测器的发展（上）

军用红外探测器需要使用工作在各种红外波段的大规格,高均匀性多色焦平面阵列器件。满足这些要求的一个候选者就是量子阱红外（光电）探测器（QuantumWell Infrared Photodetector,QWIP）。作为新一代红外探测器,QWIP基于极薄半导体异质结构中的载流子束缚效应。GaAs／A1GaAs／QWIP的主要优点包括标准的III—V族衬底材料和技术、良好的热稳定性、大面积、低研发成本以及抗辐射性。QWIP的另一个重要优点是具有带隙工程能力。可以通过调节量子阱宽度和势垒组分设计出满足特殊要求（例如多色焦平面列阵应用）的器件结构。介绍了对QwIP探测物理机制的理解以及近年来多色QwIP技术的发展状况。     

256×1甚长波量子阱红外焦平面研究

GaAs/AlGaAs量子阱红外探测器由于其所依据的GaAs基材料较为成熟的材料生长和器件制备工艺,使其特别适合于高均匀性、大面积红外焦平面的应用。报道了甚长波256×1元GaAs/AlGaAs多量子阱红外焦平面器件的研制成果, 探测器的峰值波长为15 μm,响应带宽大于1.5 μm。在40 K工作温度下,器件的平均黑体响应率Rp=3.96×106 V/W, 平均黑体探测率为D*=1.37×109 cm·Hz1/2/W, 不均匀性为11.3%, 并应用研制的器件获得了物体的热像图。     

320×256 GaAs/AlGaAs长波红外量子阱焦平面探测器

量子阱红外探测器(Quantum well infrared photodetector, QWIP)已经经历了20多年的深入研究,各种QWIP器件,包括量子阱红外探测器焦平面阵列(FPA)的研制也已经相当成熟。但是在国内,受制于整体工业水平, QWIP焦平面阵列器件的研制仍然处于起步阶段。研制了基于GaAs/ AlxGa1-xAs 材料、峰值响应波长为9.9 m的长波320256 n型QWIP焦平面阵列器件,其像元中心距25 m, 光敏元面积为22 m22 m。GaAs衬底减薄后的QWIP焦平面阵列,与Si基CMOS读出电路(ROIC)通过铟柱倒焊互连,并且在65 K工作温度下进行了室温环境目标成像。该焦平面器件的规模和成像质量相比之前国内报道的结果都有较大提高。焦平面平均峰值探测率达1.51010 cmHz1/2/W。     

量子阱红外探测器最新进展

量子阱红外探测器(QWIP)自从20世纪80年代被验证后,得到了广泛积极的研究。基于Ⅲ-Ⅴ材料体系、器件工艺的成熟和自身的稳定性、响应带宽窄等特有的优势,QWIP成为对低成本、大面阵、双(多)色高精度探测有综合要求的第三代红外焦平面阵列(FPA)的重要发展方向。本文主要总结了国际QWIP器件的最新发展动态,并展望了其发展趋势。     

Novel Type of Wide-Bandwidth GaAs/AIGaAs Infrared Photodetectors

A novel asymmetrical GaAs/AlGaAs photoconductance infrared detector based on the new idea proposed in this paper has been developed,which uses the intersubband transition within the same conduction (valence) band due to infrared radiation. The detectors with two wells or six wells grown by Metalorganic Chemical Vapor Deposition (MOCVD) system are fabricated by etching a mesa size of 200tμm ×200μm. Evident infrared absorption on the wavelength from 5 to 10μm has been observed for two samples,so has the peak of negative differential conductance. It is demonstrated that the photocurrent together with the signal-to-noise ratio increases with the number of the wells, but have nothing to do with the increase of the noise current under the same electric field,i, e.,the voltage drops per period,as is different from the conventional GaAs/AlGaAs Quantum Well Infrared Photodetectors (QWIPs). The noise current is one order's magnitude lower than that of the conventional GaAs/AlGaAs QWIPs. It is anticipated that the photocurrent and detector performances can be improved further by increasing the number of wells and optimizing the structural parameters.     

量子阱太赫兹探测材料设计与生长的研究*

子带跃迁的量子阱结构太赫兹探测器具有响应速度快等特点,有广泛的应用前景,越来越受到研究 人员的关注。以量子力学基本原理,量子阱结构材料光吸收的特性,以及光导型探测器暗电流分析为基础,进行了 量子阱厚度、势垒层Al 含量和量子阱掺杂浓度等参数的AlGaAs/ GaAs 量子阱太赫兹探测材料结构设计,按照优化 后的外延参数进行了材料生长,获得了符合设计要求的探测材料。     

Recent Progress in Mid- and Far-Infrared Semiconductor Detectors

The recent developments of semiconductor infrared detectors in extending the wavelength coverage and improving the focal plane array (FPA) performance are reviewed. The emphasis is on the GeSi/Si heterojunction infrared photoemission detectors (HIPs), GaAs/AlGaAs quantum well infrared photodetecots (QWIPs), Si, Ge and GaAs blocked impurity band detectors (BIBS), and Si and GaAs homojunction interfacial work-function internal photo-emission (HIWIP) far-infrared (FIR) detectors. The advantages, current status, and potential limitations of these infrared detectors have also been discussed.     

Semiconductor terahertz detectors and absorption enhancement using plasmons

As novel applications using terahertz radiation are developed, there is an increased demand for sensitive terahertz detectors. This has led to new approaches for enhancing the response of terahertz detectors. Results were recently reported on the terahertz response of a p-type AlGaAs/GaAs, n-type GaAs/AlGaAs, n-type GaN/AlGaN, and p-type GaSb/GaSb Interfacial Workfunction Internal Photoemission detectors. The use of surface plasmon coupling due to metal grids is one approach discussed here to enhance the performance of these terahertz detectors. Due to the greatly enhanced near fields of the plasmons, the absorption would be increased leading to improved detectors. Results are presented on the enhancement of absorption by plasmon effects in a thin film coupled with a metal grid.     

Optoelectronic Smart Pixels Comprising Flip-Chip-Bonded GaAs/AIGaAs MQW Detectors and Modulators on Silicon CMOS Circuit

Optoelectronic smart pixels with hybrid integration of GaAs/AlGaAs multiple quantum well (MQW) detectors and modulators arrays have beed made,which are flip-chip bonded directly on the top of lμm silicon CMOS circuits,as enables an achievement of Optoelectronic Integrated Circuits (OEIC) as well as does the design and optimization of CMOS circuits and GaAs/AlGaAs MQW devices to proceed independently.     

GaAs／AlGaAs多量子阱器件均匀性研究

从几个方面研究了ＧａＡｓ／ＡｌＧａＡｓ多量子阱红外探测器的均匀性,找到了影响其均匀性的几个因素,今后的工作奠定了基础。     

Etching behavior of GaAs/AlGaAs multilayer structure during laser beam scanning

The thermochemical etching behavior of GaAs/AlGaAs multilayer structure during laser beam scanning has been studied. The etch rate changes between GaAs and AlGaAs epilayers as the etching process proceeds through the layered sample. The phenomenon can be explained by the difference of thermal parameters of the heterojunction interface. The local temperature rise from laser irradiation has been calculated to investigate etching characteristics for GaAs and AlGaAs. It is concluded that the good thermal confinement at GaAs/AlGaAs interface produces the wider etch width of GaAs layer than that of AlGaAs layer in GaAs/AlGaAs multilayer. The maximum etch rate of the GaAs/AlGaAs multilayer was 32.5 μm/sec and the maximum etched width ratio of GaAs to AlGaAs was 1.7.     

新一代长波长红外探测器

文章旨在介绍适应于长波红外焦平面阵列技术发展的红外探测器，由于篇幅的关系，本文着重评述ＩｎＡｓＳｂ应变层超晶格红外探测器和ＧａＡｓ／ＧａＡｌＡｓ多量子阱红外探测器的特点、器件结构、主要制作工艺，性能参数，以及急需要解决的一些问题。     

GaAs／AlGaAs多量子阱红外探测器的光电流谱

测量了ＧａＡｓ／ＡｌＧａＡｓ多量子阱红外探测器在零偏压、小偏流和大偏压等条件下的光电流谱，并结合理论计算的光跃迁能量讨论了光电流谱的多峰结构和异常增强特性。