Formation of Single Tiers of Bridging Silicon Nanowires for Transistor Applications Using Vapor–Liquid–Solid Growth from Short Silicon‐on‐Insulator Sidewalls

Single tiers of silicon nanowires that bridge the gap between the short sidewalls of silicon‐on‐insulator (SOI) source/drain pads are formed. The formation of a single tier of bridging nanowires is enabled by the attachment of a single tier of Au catalyst nanoparticles to short SOI sidewalls and the subsequent growth of epitaxial nanowires via the vapor–liquid–solid (VLS) process. The growth of unobstructed nanowire material occurs due to the attachment of catalyst nanoparticles on silicon surfaces and the removal of catalyst nanoparticles from the SOI‐buried oxide (BOX). Three‐terminal current–voltage measurements of the structure using the substrate as a planar backgate after VLS nanowire growth reveal transistor behaviour characteristics.     

碳纳米管场发射特性的研究

将CVD方法制成的碳纳米管沉积在钼针尖上 ,测试了这种材料的场发射特性。结果表明这种材料可作为一种新型高效的场发射体。同时还将其与纯钼针在场发射方面进行了比较     

Carbon Nanotube Field‐Effect‐Transistor‐Based Biosensors

There is an explosive interest in 1D nanostructured materials for biological sensors. Among these nanometer‐scale materials, single‐walled carbon nanotubes (SWNTs) offer the advantages of possible biocompatibility, size compatibility, and sensitivity towards minute electrical perturbations. In particular, because of these inherent qualities, changes in SWNT conductivity have been explored in order to study the interaction of biomolecules with SWNTs. This Review discusses these interactions, with a focus on carbon nanotube field‐effect transistors (NTFETs). Recent examples of applications of NTFET devices for detection of proteins, antibody–antigen assays, DNA hybridization, and enzymatic reactions involving glucose are summarized. Examples of complementary techniques, such as microscopy and spectroscopy, are covered as well.     

金属基底上定向碳纳米管阵列的生长及其场发射性质

在金属基底上,以铁为催化剂,硅做过镀层,乙烯为源气体,通过普通的化学气相沉积方法生长出垂直基底排列的碳纳米管(CNT)阵列.扫描电子显微镜和透射电镜观察表明,生长的CNT具有阵列形貌和多缺陷的结构.对CNT阵列的场发射性质进行了测量,在10 μA/cm2时不锈钢和镍基底上的开启电场分别为1.25 V/μm 和1.57 V/μm.