A 30-GHz 1-W power HEMT

Millimeter-wave power high electron mobility transistors (HEMT's) employing a multiple-channel structure have been fabricated and evaluated in the R-band frequency range. An output power of 1.0 W (a saturated output power of 1.2 W) with 3.1-dB gain and 15.6-percent efficiency was achieved at 30 GHz with a 0.5-µm gate-length and 2.4-mm gate-periphery device. At 35 GHz, a 2.4-mm device delivered 0.8 W with 2.0-dB gain and 10.7-percent efficiency. These are the highest output power figures reported to date for single-chip power FET's in the 30-GHz frequency range.     

A 4.69-W/mm output power density InAlN/GaN HEMT grown on sapphire substrate

We report high performance InAlN/GaN HEMTs grown on sapphire substrates.The lattice-matched InAlN/GaN HEMT sample showed a high 2DEG mobility of 1210 cm²/（V·s） under a sheet density of 2.6×10¹³ cm^-2.Large signal load-pull measurements for a（2×100μm）×0.25μm device have been conducted with a drain voltage of 24 V at 10 GHz.The presented results confirm the high performances reachable by InAlN-based technology with an output power density of 4.69 W/mm,a linear gain of 11.8 dB and a peak power-added efficiency of 48%.This is the first report of high performance InAlN/GaN HEMTs in mainland China.     

蓝宝石衬底上输出功率密度为4.69W/mm的InAlN/GaN HEMT

We report high performance InAlN/GaN HEMTs grown on sapphire substrates. The lattice-matched InAlN/GaN HEMT sample showed a high 2DEG mobility of 1210 cm²/(V·s) under a sheet density of 2.6 × 10¹³ cm^-2. Large signal load-pull measurements for a (2 × 100 μm) × 0.25 μm device have been conducted with a drain voltage of 24 V at 10 GHz. The presented results confirm the high performances reachable by InAlN-based technology with an output power density of 4.69 W/mm, a linear gain of 11.8 dB and a peak power-added efficiency of 48%. This is the first report of high performance InAlN/GaN HEMTs in mainland China.     

A 4.69-W/mm output power density InAIN/GaN HEMT grown on sapphire substrate

We report high performance InAlN/GaN HEMTs grown on sapphire substrates.The lattice-matched InAlN/GaN HEMT sample showed a high 2DEG mobility of 1210 cm2/(V.s)under a sheet density of 2.6 ×1013 cm-2.Large signal load-pull measurements for a(2 × 100 μm)× 0.25 μm device have been conducted with a drain voltage of 24 V at 10 GHz.The presented results confirm the high performances reachable by InAlN-based technology with an output power density of 4.69 W/mm,a linear gain of 11.8 dB and a peak power-added efficiency of 48％.This is the first report of high performance InA1N/GaN HEMTs in mainland China.     

4-GHz 15-W power GaAs MESFET

High-field behavior of GaAs MESFET's such as drain-source breakdown characteristics and visible light emission and a model explaining these phenomena are described. An FET structure with a high drain-source breakdown voltage in excess of 26 V has been developed following an analysis of the high-field behavior of the device. Typical characteristics of the fabricated devices at 4 GHz are as follows: Pout= 9.6 W Ga= 5 dB ηadd= 33.6 percent at 18 V from single chip (WG= 13 mm) Pout= 15 W Ga= 5 dB ηadd= 28.3 percent at 22 V from two chip (WG= 26 mm) where Pout, Ga, ηadd, and WGindicate the output power, associated power gain, power added efficiency, and total gate width of the FET's, respectively.     

A 1.9-GHz, 1-W CMOS class-E power amplifier for wirelesscommunications

This paper presents a 1-W, class-E power amplifier that is implemented in a 0.35-μm CMOS technology and suitable for operations up to 2 GHz. The concept of mode locking is used in the design, in which the amplifier acts as an oscillator whose output is forced to run at the input frequency. A compact off-chip microstrip balun is also proposed for output differential-to-single-ended conversion. At 2-V supply and at 1.98 GHz, the power amplifier achieves 48% power-added efficiency (41% combined with the balun)     

30-W/mm GaN HEMTs by field plate optimization

GaN high-electron-mobility-transistors (HEMTs) on SiC were fabricated with field plates of various dimensions for optimum performance. Great enhancement in radio frequency (RF) current-voltage swings was achieved with acceptable compromise in gain, through both reduction in the trapping effect and increase in breakdown voltages. When biased at 120 V, a continuous wave output power density of 32.2 W/mm and power-added efficiency (PAE) of 54.8% at 4 GHz were obtained using devices with dimensions of 0.55/spl times/246 /spl mu/m/sup 2/ and a field-plate length of 1.1 /spl mu/m. Devices with a shorter field plate of 0.9 /spl mu/m also generated 30.6 W/mm with 49.6% PAE at 8 GHz. Such ultrahigh power densities are a dramatic improvement over the 10-12 W/mm values attained by conventional gate GaN-based HEMTs.     

A Cost-Effective 5-W GaN HEMT Power Amplifier for Sub-6-GHz 5G Wireless Communications

Mobile Networks and Applications - In this paper, a design method of a compact, low-cost and high-efficiency microwave power amplifier for using in the 5G wireless communication applications is...     

A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate

This Daper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate.The device with a gate width of 0.5 mm and a gate length of 0.35 μm has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz.Under V_(DS)=30 V, CW operating conditions at 14 GHz,the device exhibits a linear gain of 10.4 dB and a 3-dB-gain-compressed output power of 1.4 W with a Dower added efficiency of 41%.Under pulse operating conditions,the linear gain is 12.8 dB and the 3-dB-compressed output power is 1.7 W The power density reaches 3.4 W/mm.     

基于蓝宝石衬底的Ku波段3.4W/mm功率AlGaN/GaN HEMT

本文报道了国内第一个基于蓝宝石衬底的ku波段AlGaN/GaN HEMT。器件总栅宽0.5mm,栅长0.35um。漏压30V下器件的ft为20GHz,fmax为75GHz。在漏压30V、连续波测试条件下,器件在14GHz的线性增益为10.4dB,3dB增益压缩的输出功率为1.4W,附加效率41%。在脉冲测试条件下,线性增益12.8dB,3dB增益压缩的输出功率为1.7W,功率密度达到3.4W/mm。     

9.4-W/mm power density AlGaN-GaN HEMTs on free-standing GaN substrates

High power microwave AlGaN-GaN high electron-mobility transistors (HEMTs) on free-standing GaN substrates are demonstrated for the first time. Measured gate leakage was -2.2 /spl mu/A/mm at -20 V and -10 /spl mu/A/mm at -45 V gate bias. When operated at a drain bias of 50 V, devices showed a record continuous-wave output power density of 9.4 W/mm at 10 GHz with an associated power-added efficiency of 40%. Long-term stability of device RF operation was also examined. Under room conditions, devices driven at 25 V and 3-dB gain compression remained stable in 200 h, degrading only by 0.18 dB in output power. Such results illustrate the potential of GaN substrate technology in supporting reliable, high performance AlGaN-GaN HEMTs for microwave power applications.     

A double-heterojunction doped-channel pseudomorphic power HEMT witha power density of 0.85 W/mm at 55 GHz

The authors report the DC characteristics and RF performances of a 50×0.2-μm² AlGaAs/InGaAs/GaAs pseudomorphic HEMT with a doped InGaAs channel. A transconductance as high as 760 mS/mm and a maximum current density of 800 mA/mm leads to a power density of 0.85 W/mm with 3.3-dB gain and 22.1% power-added efficiency at 55 GHz     

2.1 A/mm current density AlGaN/GaN HEMT

The electrical performance of high current density AlGaN/GaN HEMTs is reported. 2 /spl times/ 75 /spl mu/m /spl times/ 0.7 /spl mu/m devices grown on sapphire substrates showed current densities up to 2.1 A/mm under 200 ns pulse condition. RF power measurements at 8 GHz and V/sub DS/=15 V exhibited a saturated output power of 3.66 W/mm with a 47.8% peak PAE.     

AlInN/AlN/GaN HEMT Technology on SiC With 10-W/mm and 50% PAE at 10 GHz

High-frequency high-electron-mobility transistors (HEMTs) were fabricated on AlInN/AlN/GaN heterostructures grown by low-pressure metal-organic chemical vapor deposition on a SiC substrate. The results presented in this letter confirm the high performance that is reachable by AlInN-based technology with an output power of 10.3 W/mm and a power-added efficiency of 51% at 10 GHz with a gate length of 0.25 ?m. A good extrinsic transconductance value that is greater than 450 mS/mm and exceeding AlGaN/GaN HEMT results was also measured on these transistors. To our knowledge, these results are the best power results published on AlInN/GaN HEMTs. These good results were attributed to optimized heterostructure properties associated with low-resistance ohmic contacts and an effective passivation layer minimizing drain current slump in high-frequency operations.     

GaAs/AlGaAs heterojunction MISFET's having 1-W/mm power density at 18.5 GHz

The previously reported GaAs/AlGaAs heterojunction MISFET with an undoped AlGaAs layer as an insulator has been further optimized for power operation at upper Ku band. A 300-µm gate-width device generated 320 mW of output power with 33-percent efficiency at 18.5 GHz. The corresponding power density exceeds 1 W/mm. When optimized for efficiency, the device has achieved a power added efficiency of 43 percent at 19 GHz.     

Short channel AlGaN/GaN MODFET's with 50-GHz fT and1.7-W/mm output-power at 10 GHz

A thin barrier-donor layer of 200 Å was used to increase the active input capacitance and improve the extrinsic current-gain cutoff frequency (f_t) of short-gate-length AlGaN/GaN MODFETs. 0.2-μm gate-length devices fabricated on such an epi-structure with sheet carrier density of ~8×10¹² cm^-2 and mobility of 1200 cm²/Vs showed a record f_t of 50 GHz for GaN based FETs. High channel saturation current and transconductance of 800 mA/mm and 240 mS/mm respectively were also achieved along with breakdown voltages of 80 V per μm gate-drain spacing. These excellent characteristics translated into a CW output power density of 1.7 W/mm at 10 GHz, exceeding previous record for a solid-state HEMT     

Implementing adaptive power control as a 30/20-GHz fadecountermeasure

Satellite systems in the 30/20-GHz band are very susceptible to outages due to rain-induced fades. In order to reduce the impact of these fades, it has been proposed that the power of a transmitting ground station be adjusted during the fade to compensate for the additional attenuation. Real-time frequency scaling of attenuation from the downlink to the uplink shows promise for estimating the uplink attenuation for uplink power control (ULPC). A scaling-type ULPC algorithm using 20-GHz attenuation scaled to 30 GHz is presented. The limitations of such an algorithm and the effects of scintillation on ULPC are explored. The algorithm is tested using OLYMPUS fade data measured on the 14° elevation OLYMPUS to Blacksburg, VA path. An ULPC scheme employing a beacon at the uplink is also presented. It offers better performance than scaled downlink attenuation ULPC     

A fully integrated 5.3-GHz 2.4-V 0.3-W SiGe bipolar power amplifier with 50-/spl Omega/ output

A radio frequency power amplifier for 4.8-5.7 GHz has been realized in a 0.35-/spl mu/m SiGe bipolar technology. The balanced two-stage push-pull power amplifier uses two on-chip transformers as input-balun and for interstage matching. Further, it uses three coils for the integrated LC-output balun and the RF choke. Thus, the power amplifier does not require any external components. At 1.0-V, 1.5-V, and 2.4-V supply voltages, output powers of 17.7 dBm, 21.6 dBm, and 25 dBm are achieved at 5.3 GHz. The respective power-added efficiencies (PAE) are 15%, 22%, and 24%. The small-signal gain is 26 dB. The output 1-dB compression point at 2.4 V is 22 dBm with a PAE of 14%.     

30-GHz-band over 5-W power performance of short-channel AlGaN/GaN heterojunction FETs

This paper describes the small-signal characterization through delay-time analysis and high-power operation of the Ka-band of AlGaN/GaN heterojunction field-effect transistors (FETs). An FET with a gatewidth of 100 /spl mu/m and a gate length of 0.09 /spl mu/m has exhibited a current gain cutoff frequency (f/sub T/) of 81 GHz, a maximum frequency of oscillation (fmax) of 187 GHz, and a maximum stable gain of 10.5 dB at 30 GHz (8.3 dB at 60 GHz). Delay-time analysis has demonstrated channel electron velocities of 1.50/spl times/10/sup 7/ to 1.75/spl times/10/sup 7/ cm/s in a gate-length range of 0.09-0.25 /spl mu/m. State-of-the-art performance-saturated power of 5.8 W with a linear gain of 9.2 dB and a power-added efficiency of 43.2%-has been achieved at 30 GHz using a single chip having a gatewidth of 1.0 mm and a gate length of 0.25 /spl mu/m.     

A 30-GHz monolithic receiver

Several monolithic integrated circuits have been developed to make a 30-GHz receiver. The receiver components include a low-noise amplifier, an IF amplifier, a mixer, and a phase shifter. The LNA has a 7-dB noise figure with over 17 dB of associated gain. The IF amplifier has a 13-dB gain with a 30-dB control range. The mixer has a conversion loss of 10.5 dB. The phase shifter has a 180° phase shift control and a minimum insertion loss of 1.6 dB.