Fabrication of large area high density, ultra-low reflection silicon nanowire arrays for efficient solar cell applications

High density vertically aligned and high aspect ratio silicon nanowire (SiNW) arrays have been fabricated on a Si substrate using a template and a catalytic etching process. The template was formed from polystyrene (PS) nanospheres with diameter 30–50 nm and density 10¹⁰/cm², produced by nanophase separation of PS-containing block-copolymers. The length of the SiNWs was controlled by varying the etching time with an etching rate of 12.5 nm/s. The SiNWs have a biomimetic structure with a high aspect ratio (∼100), high density, and exhibit ultra-low reflectance. An ultra-low reflectance of approximately 0.1% was achieved for SiNWs longer than 750 nm. Well-aligned SiNW/poly(3,4-ethylenedioxy-thiophene):poly(styrenesulfonate) (PEDOT:PSS) heterojunction solar cells were fabricated. The n-type silicon nanowire surfaces adhered to PEDOT:PSS to form a core-sheath heterojunction structure through a simple and efficient solution process. The large surface area of the SiNWs ensured efficient collection of photogenerated carriers. Compared to planar cells without the nanowire structure, the SiNW/PEDOT:PSS heterojunction solar cell exhibited an increase in short-circuit current density from 2.35 mA/cm² to 21.1 mA/cm² and improvement in power conversion efficiency from 0.4% to 5.7%.      

掺杂硅纳米线的研究进展

掺杂是制备硅纳米线半导体器件的一个有效手段。介绍了掺杂硅纳米线的最新进展,主要就掺杂种类,包括硼、磷及锂掺杂硅纳米线,性能测量,包括光致发光特性、电子输运特性、场发射特性及其近端X射线吸收精细结构光谱等及在单电子探测器与计数器、存储元件、纳米线传感器等最新应用研究进展进行了较详细的讨论,最后对掺杂硅纳米线的发展前景作了展望。     

Fabrication of slantingly-aligned silicon nanowire arrays for solar cell applications

Large-area slantingly-aligned silicon nanowire arrays (SA-SiNW arrays) on Si(111) substrate have been fabricated by wet chemical etching with dry metal deposition method and employed in the fabrication of solar cells for the first time. The formation of SA-SiNW arrays possibly results from the anisotropic etching of silicon by silver catalysts. Superior to the previous cells fabricated with vertically-aligned silicon nanowire arrays (VA-SiNW arrays), the SA-SiNW array solar cells exhibit a highest power conversion efficiency of?11.37%. The improved device performance is attributed to the integration of the excellent anti-reflection property of the arrays and the better electrical contact of the cell as a result of the special slantingly-aligned structure. The high surface recombination velocity of minority carriers in SiNW arrays is still the main limitation on cell performance.     

无电金属沉积法硅纳米线阵列的制备研究

采用无电金属沉积法在硅衬底上制备出了大面积规整的硅纳米线阵列,并对其形貌控制的影响因素和形成机理进行了研究。用扫描电子显微镜(SEM)、X射线衍射仪(XRD)对硅纳米线阵列和相应银枝晶的形貌和结构进行了表征。结果表明,硅纳米线阵列的形貌受水热体系中溶液配比、温度和时间的影响,在温度为50℃、HF和AgNO3浓度分别为4.6和0.02mol/L的条件下,容易得到大面积排列规整的硅纳米线阵列,并且硅纳米线的长度为30～50μm,直径为200nm左右。无电金属沉积法为硅纳米线及其阵列的制备提供了一种设备简单、条件温和的制备方法。     

图案化金属铜纳米线阵列的制备与表征

采用紫外线光刻技术与电化学沉积相结合的方法,成功制备了不同图案的铜纳米线阵列:一种是圆形图案;另一种是QDU图案.首先利用紫外线光刻技术在多孔阳极氧化铝模板(AAO)生成预设图案,以此作为"二次模板";再利用电化学方法将铜纳米线沉积到"二次模板"的开孔中.扫描电镜(SEM)测试结果表明,大面积、高规整的铜纳米线图案阵列各自独立地立在基底上, 同时,用电子能谱(EDS)分析了铜纳米线的化学成分.透射电镜(TEM)也探测到了铜纳米线的微结构.     

Analysis of optical absorption in silicon nanowire arrays for photovoltaic applications

This paper presents analysis of the optical absorption in silicon nanowire arrays that have potential applications in solar cells. The effects of wire diameter, length, and filling ratio on the absorptance of nanowire arrays are simulated. The study reveals that nanowire arrays with moderate filling ratio have much lower reflectance compared to thin films. In a high-frequency regime, nanowire arrays have higher absorptance than their thin film counterparts. In low-frequency regime, nanowire arrays absorb less but can be designed to approach that of the film by changing the filling ratio.     

Fabrication of suspended silicon nanowire arrays

A method to fabricate suspended silicon nanowires that are applicable to electronic and electromechanical nanowire devices is reported. The method allows for the wafer-level production of suspended silicon nanowires using anisotropic etching and thermal oxidation of single-crystal silicon. The deviation in width of the silicon nanowire bridges produced using the proposed method is evaluated. The NW field-effect transistor (FET) properties of the device obtained by transferring suspended nanowires are shown to be practical for useful functions.     

Improved sensing characteristics of dual-gate transistor sensor using silicon nanowire arrays defined by nanoimprint lithography

Abstract

This work describes the construction of a sensitive, stable, and label-free sensor based on a dual-gate field-effect transistor (DG FET), in which uniformly distributed and size-controlled silicon nanowire (SiNW) arrays by nanoimprint lithography act as conductor channels. Compared to previous DG FETs with a planar-type silicon channel layer, the constructed SiNW DG FETs exhibited superior electrical properties including a higher capacitive-coupling ratio of 18.0 and a lower off-state leakage current under high-temperature stress. In addition, while the conventional planar single-gate (SG) FET- and planar DG FET-based pH sensors showed the sensitivities of 56.7 mV/pH and 439.3 mV/pH, respectively, the SiNW DG FET-based pH sensors showed not only a higher sensitivity of 984.1 mV/pH, but also a lower drift rate of 0.8% for pH-sensitivity. This demonstrates that the SiNW DG FETs simultaneously achieve high sensitivity and stability, with significant potential for future biosensing applications.     

硅纳米线阵列光阳极的制备及其光电转换性能研究

结合光刻和金属援助硅化学刻蚀法成功地制备出了用于光伏型光电化学池的图形化硅纳米线阵列光阳极,并表征和研究了其光电转换性能.扫描电子显微镜和漫反射光谱测试表明光阳极表面为多孔状,在300nm - 1000nm的光谱范围之内光反射率低于5％.基于该光阳极的光电化学池具有明显的光响应,光电转换效率为0.33％.通过光电转换过...     

铁纳米线阵列的制备及磁性质

使用电化学沉积方法，在有序的氧化铝模板（AAO）孔洞中制备了铁纳米线有序阵列．用X射线衍射仪（XRD）、场发射扫描电子显微镜（FE-SEM）、透射电子显微镜（TEM）、对样品的结构、形貌、进行表征和观测．XRD的结果表明所制备的样品为纯的立方面心铁．SEM的图片清晰地说明铁纳米线阵列是大面积、高填充率和高度有序的．TEM的结果显示纳米线直径均匀、表面光滑且长径比大．磁测量的结果表明纳米线阵列的易磁化轴是垂直于模板表面的。     

Patterned growth of polyaniline nanowire arrays on a flexible substrate for high-performance gas sensing

Uniform patterning of polyaniline nanowire arrays on a wafer-sized flexible substrate is achieved by combining photolithography and in situ polymerization techniques. Chemical gas sensors based on the patterned polyaniline nanowire arrays exhibit excellent performance because of their highly ordered morphology and large specific surface area.     

Zero-static-power nonvolatile logic-in-memory circuits for flexible electronics

Flexible logic circuits and memory with ultra-low static power consumption are in great demand for battery-powered flexible electronic systems.Here,we show that a flexible nonvolatile logic-in-memory circuit enabling normally-off computing can be implemented using a poly(1,3,5-trivinyl-1,3,5-trimethyl cyclotrisiloxane) (pV3D3)-based memristor array.Although memristive logic-in-memory circuits have been previously reported,the requirements of additional components and the large variation of memristors have limited demonstrations to simple gates within a few operation cycles on rigid substrates only.Using memristor-aided logic (MAGIC) architecture requiring only memristors and pV3D3-memristor with good uniformity on a flexible substrate,for the first time,we experimentally demonstrated our implementation of MAGIC-NOT and-NOR gates during multiple cycles and even under bent conditions.Other functions,such as OR,AND,NAND,and a half adder,are also realized by combinations of NOT and NOR gates within a crossbar array.This research advances the development of novel computing architecture with zero static power consumption for batterypowered flexible electronic systems.     

CoFe2O4纳米线阵列的制备与磁性

在氧化铝模板的纳米孔洞中,用电化学的方法沉积钴铁合金纳米线,经过550℃、30h氧化处理,成功制备出钴铁氧体纳米线阵列.分别用透射电子显微镜(TEM)、X射线衍射仪(XRD)和振动样品磁场计(VSM)对样品的形貌、晶体结构和磁学性质进行了表征测试.TEM观察结果显示纳米线粗细均匀,直径约为70nm.XRD显示纳米线的物相结构为CoFe2O4;VSM测试结果表明,CoFe2O4纳米线阵列的磁滞回线矫顽力为1.190×105A/m,比氧化处理前的钴铁合金纳米线阵列有显著提高.     

模板法合成Sr2CeO4纳米线阵列

以多孔阳极氧化铝为模板,采用逆向迁移技术,在模板的纳米孔道内反应形成一维纳米结构前驱体,再经后续处理,制得了Sr2CeO4纳米线.通过X射线衍射光谱(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)等检测手段对产物进行了表征,结果表明,所得Sr2CeO4纳米线阵列排列整齐,单体纳米线的直径大约为60nm,与所用模板的孔径相当,长度可达30μm.     

Elaborate positioning of nanowire arrays contributed by highly adhesive superhydrophobic pillar-structured substrates

Elaborate positioning of nanowire arrays can be generated upon highly adhesive superhydrophobic pillar-structured silicon substrates. The site of each nanowire can be precisely positioned by well designed tip-structured micropillars, yielding on-demand nanowire patterns. This approach might affect existing applications and enable new opportunities in organically functional devices and bio/chemical sensors.     

Electro-codeposition synthesis and room temperature ferromagnetic anisotropy of high concentration Fe-doped ZnO nanowire arrays

Fe-doped ZnO dilute magnetic semiconductor (DMS) nanowire arrays were fabricated in anodic aluminum oxide (AAO) membranes using electro-codeposition followed by long-time anneal process. The morphology, chemical composition and crystal structure were characterized by field emission scanning electron microscope (FE-SEM), high resolution transmission electron microscope (HRTEM) equipped with an energy dispersive x-ray spectrometer, and X-ray diffraction (XRD) spectroscopy. The results prove that the Fe has been successfully doped in the lattice of ZnO nanowire arrays and the estimated Fe atomic ratio is around 22%. Micro-superconducting quantum interference device (SQUID) shows that the nanowire arrays exhibit room temperature (300 K) ferromagnetic and anisotropic ferromagnetic behavior which may be a consequence of the easy magnetization direction along the wire axes and magnetostatic interaction.     

反应源温度对ZnO纳米线阵列定向性及发光性能的影响

以Au薄膜为催化剂、ZnO与碳混合粉末为反应源,采用碳热还原法在单晶Si衬底上制备了ZnO纳米线阵列.通过扫描电子显微镜( SEM)、X射线衍射仪(XRD)、荧光分光光度计对样品的表征,研究了反应源温度对ZnO纳米线阵列的定向性和光致发光性能的影响.样品在源温度920℃条件下沿(002)方向择优生长,定向性最好,温度过低不利于ZnO纳米线阵列密集生长,而温度过高导致Zn原子二次蒸发,因而也不利于纳米线阵列的定向和择优生长;样品在源温度880℃有最强的近紫外带边发射,表明温度过高和过低都不利于ZnO晶体结构的优化;由于ZnO纳米线在缺氧氛围下生长,氧空位是缺陷存在的主要形式,因此所有样品都有较强的绿光发射.温度升高导致纳米线生长速度提高而增加了氧空位缺陷数量,从而使样品绿峰强度增强并在源温度920℃时达最大值,但温度的进一步升高可导致ZnO纳米线表面Zn元素的蒸发而降低氧空位缺陷的数量,从而抑制绿峰强度.