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1.
尝试采用三种方式来平衡载流子的浓度,以提高量子点发光二极管(QLED)的外量子效率等性能:在正装结构(ITO/HIL/HTL/QD/ETL/EIL/金属阴极)的QLED的发光层和电子传输层中间插入超薄聚甲基丙烯酸甲脂(PMMA)电子阻挡层;在空穴注入和传输层方面,通过使用更加优化的HIL等来提高空穴注入和传输几率;在QD发光层方面,用短链配体来置换量子点的长链配体以增加载流子向量子点发光层中的传输效率等。在进行量子点配体交换的同时带来了量子点在正交溶剂中的可溶性优势,有利于QLED器件的全溶液法制备。  相似文献   

2.
以量子点电致发光器件(QLED)中能级分布和载流子浓度的关系为理论基础,研究了QLED发光层能级变化与驱动电压的关系,建立了数学模型.以CdSe/ZnS核壳结构量子点为发光层,计算了器件正常发光时的阈值电压,分析了电流密度与量子点中电子准费米能级与空穴准费米能级之差的关系.结果表明,当驱动电压大于9.8V时,CdSe/ZnS中电子的准费米能级与空穴的准费米能级之差大于1.03 eV,量子点电致发光器件正常发光;理论模型证实由于电子在发光层与电子传输层界面的大量积聚,导致淬灭发生,降低发光效率.  相似文献   

3.
阳秀  黎威志  钟志有  蒋亚东 《半导体光电》2006,27(2):161-163,209
采用聚乙烯基咔唑(PVK)作为空穴传输层,8-羟基喹啉铝(Alq3)作为发光层,制备了结构为ITO/PVK/Alq3/Mg∶Ag/Al的有机发光二极管(OLED),通过测试器件的电流-电压-发光亮度特性,研究了空穴传输层厚度对OLED器件性能的影响,优化了器件功能层的厚度匹配.实验结果表明,OLED的光电性能与空穴传输层的厚度密切相关,空穴传输层厚度为15nm时,OLED器件具有最低的启亮电压,最高的发光亮度和最大的发光效率.  相似文献   

4.
采用溶液法旋涂薄膜、真空蒸镀铝电极,制备了ITO/PEDOT∶PSS/空穴传输材料/量子点/纳米氧化锌(ZnO Nanoparticles)/Al结构的量子点发光二极管(QLED)器件。对比了不同纳米氧化锌分散剂对器件性能的影响。当用乙醇和乙醇胺分散氧化锌时,对量子点层破坏较小,器件的亮度最高达22 940cd/m2,电流效率达28.9cd/A。研究了在聚乙烯咔唑(PVK)中掺杂不同比例4,4′-环己基二[N,N-二(4-甲基苯基)苯胺](TAPC)器件的发光特性。在PVK中掺杂TAPC材料能够促进器件空穴传输以及电子空穴注入平衡,当PVK∶TAPC=3∶1时,器件的空穴传输层形貌较为平整,亮度较高;当PVK∶TAPC=1∶1时,器件的开启电压最低。通过对器件膜层表面形貌以及电学、光学性能的对比,分析了电荷传输层优化对器件特性改善的原因。  相似文献   

5.
为研究混合量子点(QD)发光二极管(QLED)的性能, 利用红、绿量子点混合作为发光层,制备了结构为 ITO/PEDOT:PSS/poly-TPD/QDs(红、绿1∶1混合)/ZnO/Al的橙光QLED,并与 结构为 ITO/PEDOT:PSS/poly-TPD/QDs(红光)/ZnO/Al的红光QLED进行了对比。实验结果表明, 基于红、绿QD混合的橙光QLED的制备方法是有效的,制备的橙光QLED 电流密度和亮度均小 于红光QLED, 但电流效率远大于红光QLED。研究发现,器件性能与各功能层能级以及厚度密切相关,应通 过选取适当能 级的发光层材料,将注入的空穴以及电子同时限制在发光层内从而提高器件的电流效率,并 调节各功能层 厚度使得载流子注入平衡从而提高器件性能。  相似文献   

6.
采用聚乙烯基咔唑(PVK)作为空穴传输层,PF-BT15作为发光层,制备了结构为ITO/PEDOT/PVK(060 nm)/PF-BT15/Cs2CO3/Al的聚合物发光二极管。通过测试器件的电流密度-电压-发光亮度特性,研究了空穴传输层厚度对聚合物发光二级管器件性能的影响,优化了器件功能层的厚度匹配。实验结构表明,聚合物发光二极管的光电性能与空穴传输层的厚度密切相关,当转速约为2 000 r/s,浓度约为1%,膜厚约为40 nm时,其器件光电性能有较大的提高。  相似文献   

7.
采用基于光酸反应的光刻工艺,获得均匀的红、绿、蓝三基色量子点薄膜作为发光层,成功制备出高分辨全彩QLED器件(子像素宽度5μm)。通过对光刻量子点表面进行配体钝化,并引入电荷阻挡层以降低非发光区的漏电流,明显提升了全彩QLED的器件性能,所制备器件的最大亮度为23 831 cd/m2,外量子效率为3.78%。  相似文献   

8.
在量子点发光二极管(QLED)中,电子-空穴注入不平衡和量子点层/电子传输层间界面的荧光猝灭限制着QLED效率的提升。基于此,采用金属卤化物(ZnCl2)原位处理电子传输层方法来减少氧化锌(ZnO)电子传输层的氧空位,同时有效钝化其表面不饱和键,因此在一定程度上实现抑制量子点/电子传输层界面的荧光猝灭和提高QLED中的电子-空穴注入平衡的目的,最终得到了高亮度、高效率的QLED。原位钝化处理后的ZnO基QLED的最大亮度、峰值电流效率、峰值功率效率和峰值外量子效率(EQE)分别从未处理QLED的176 800 cd/m2、9.86 cd/A、8.38 lm/W和7.42%提高到219 200 cd/m2、15.14 cd/A、12.66 lm/W和11.65%。结果表明,ZnCl2原位钝化ZnO电子传输层对QLED性能的提升起到重要的作用。  相似文献   

9.
综述了采用旋涂法制备的量子点发光二极管(QLED)中各功能层材料的研究进展,对可旋涂制备的多种载流子注入层和传输层材料的特性及应用进行了对比总结。多项研究表明:对于电子传输层(ETL),ZnO和TiO2等无机金属氧化物材料在电子迁移率及器件可靠性方面都要优于有机材料;对于空穴传输层(HTL),则是具有较高空穴迁移率及成膜质量好的聚[双(4-苯基)(4-丁基苯基)胺](Poly-TPD)、聚(9-乙烯咔唑)(PVK)等有机聚合物材料应用更为广泛;而MoOx和WOx等无机金属氧化物材料则由于其能级匹配和可靠性方面的优势更多用于空穴注入层。随着技术的成熟及QLED应用中对高效率和高可靠性的要求,无机金属氧化物材料在QLED中的应用将越来越广泛,结合成本低廉的旋涂法,将有力地推动QLED的商业化。  相似文献   

10.
空穴注入层(HIL)在量子点发光二极管(QLEDs)中有重要作用。使用低温溶液法制作了MoOx纳米颗粒,将其在氧化铟锡(ITO)玻璃上旋涂成膜后使用不同温度进行退火处理,并作为空穴注入层进行量子点发光二极管的制作。实验结果表明,氧化钼薄膜有着与ITO玻璃阳极和Poly-TPD空穴传输层匹配的能级,可用作量子点发光二极管的空穴注入层,而使用经100 ℃退火处理后的MoOx薄膜作为空穴注入层的器件性能最佳:器件启亮电压为2.5 V,最高外量子效率为11.6%,在偏压为10 V时,器件的最高亮度达到27 100 cd/m2。  相似文献   

11.
Solution-processed colloidal quantum dot light-emitting diodes (QLED) have attracted many attentions with significant progress in recent years. However, QLED devices still face some challenges. The energy barrier between Cd-base quantum dots (QDs) and commonly used hole transport materials is larger than that between QDs and electron transport materials, which leads to the imbalance of carriers in the light emitting layer (EML) and the low performance of QLED devices. Herein, we report a simple strategy to improve the device performance by doping small molecule transport material 4,4′-cyclohexylidenebis[N,N-bis(p-tolyl)aniline] (TAPC) into red CdSe/ZnS QDs. The optimized red QLED devices with TAPC-doped emissive layer at a ratio of 3.2 wt% achieve 20.0 cd/A of maximum current efficiency, 16.6 lm/W of power efficiency and 15.7% of external quantum efficiency, which is 30%, 58% and 33% higher than the control device. The improved performance of devices can be ascribed to the increase of hole current density, decrease of leakage electrons and more balanced quantity of carriers in EML. This work put forward a viewpoint to improve the performance of QLED devices via doping high hole mobility materials into emission layer.  相似文献   

12.
The balance of electron–hole charge carriers in quantum dot (QD) light-emitting diodes (QLEDs) is an important factor to achieve high efficiency. However, poor interfacial properties between QDs and their adjacent layers are likely to deteriorate the electron–hole charge balance, resulting in the poor performance of a QLED. In this paper, we report an enhanced efficiency in red-emitting inverted QLEDs by modifying the interface properties between QDs and ZnO electron transport layer (ETL) using a thin layer of non-conjugated polymer, poly(4-vinylpyridine) (PVPy). Based on the precise control of the electrical properties with PVPy, the maximum efficiency of the QLED is enhanced by 30% compared to the device without a PVPy layer. In particular, the efficiency at low current density region is significantly increased. We investigate the effect of the PVPy interlayer on the performance of QLEDs and find that this thin layer not only shifts the energy levels of the underlying ZnO ETL, but also effectively blocks the leakage current at the ETL/QD interface.  相似文献   

13.
为研究量子点发光器件结构与性能的关系,制备了以CdSe/ZnS量子点作为发光层、poly-TPD作为空穴传输层,Alq3作为电子传输层的量子点发光二极管,对器件结构及性能参数进行了表征,结果显示器件具有开启电压低、色纯度高等特点.结合测试数据,对量子点发光二极管进行了器件结构建模,利用隧穿模型及空间电荷限制电流模型对实验结果进行了分析,研究了器件中载流子的注入与传输机理.器件测试与仿真结果表明:各功能层厚度会影响载流子在量子点层的注入平衡,同时器件中载流子的注入与传输存在一转变电压,当外加电压低于转变电压时,器件中载流子的注入主要符合隧穿模型;当外加电压高于转变电压时,器件中载流子的注入主要符合空间电荷限制电流模型.研究结果验证了器件结构建模的合理性,可以利用仿真的方法进行器件结构优化并确定相关参数,这对器件性能的提高具有指导意义.  相似文献   

14.
量子点发光二极管中载流子注入机理的研究   总被引:1,自引:1,他引:0  
针对量子点(QDs)发光二极管(QLED)中载流子注 入不平衡的问题,对载流子的注入机理进行了研 究。在隧穿注入和空间电荷限制电流(SCLC)模型的基础上,仿真分析了空穴和电子在QDs 层的注入情况,制备 了QLED的样品。CdSe/CdS作为QDs层,PEDOT:PSS作为空穴注入层(HIL),TPD作为 空穴传输层(HTL),Alq3作为电子传输层(ETL)。优选的QDs层厚为25nm时,确定了TPD和Alq3的理论最优厚分别为48nm。研究发现, 当驱动电压低于6.5V时,隧穿注入电流在载流子的传输过 程中起主导作用;高于6.5V时,SCLC在载流子的传输过程中起主导 作用。实验结果表明,当 Alq3厚为20nm时,器件发出QDs的红光,随着Alq3厚度的增加, 器件开始出现绿光,实验结果与仿 真结果基本吻合。研究结果对QLED的制备具有理论借鉴意义。  相似文献   

15.
Solution-processed blue quantum dot light-emitting diodes (QLEDs) suffer from low device efficiency, whereas the balance of electron and hole injection is critical for obtaining high efficiency. Herein, synergistical double hole transport layers (D-HTLs) are employed, which use poly(9-vinylcarbazole) (PVK) stacked on poly[(9,9-dioctylfluorenyl-2,7-diyl)-alt-(4,4'-(N-(4-butylphenyl) (TFB). The fabrication of D-HTLs is achieved by using dimethyl formamide (DMF) as the solvent for PVK, with which the underlying TFB layer almost remains unwashed and undamaged during the spin-coating process of PVK layer. TFB/PVK D-HTLs form the stepwise energy level for hole injection, which reduces the hole injection barrier and favors the carrier balance in the emission layer (EML). The optimized blue QLED with TFB/PVK D-HTLs shows a maximum external quantum efficiency (EQE) of 13.7%, which is 3-fold enhancement compared to that of the control device with single TFB HTL. The enhancement of the QLED performance can be attributed to the improvement of surface morphology and charge injection balance for the stepwise D-HTLs based QLEDs. This work manifests the positive effect on performance boost by selecting appropriate solvents towards stepwise D-HTLs formation and paves the way to fabricate highly efficient all-solution processed light emitting diodes.  相似文献   

16.
Injecting holes from the hole transport layer (HTL) into the quantum dot (QD) emitting layer in quantum dot light-emitting diodes (QLEDs) is considered challenging due to the presence of a relatively high hole injection barrier at the HTL/QD interface. However, QLEDs with exceptional brightness and efficiency are achieved, prompting a reevaluation of the traditional hole injection mechanisms. This study examines the hole injection mechanism in QLEDs using a combination of experiments and simulations. The results demonstrate that the applied bias significantly reduces the barrier height between the highest occupied molecular orbital level of the HTL and the valence band (VB) of the QDs, facilitating hole injection. The bending of the lowest unoccupied molecular orbital energy level of the HTL at the HTL/QD interface confines electrons within the QD, effectively minimizing leakage current. Additionally, the triangle-shaped potential barrier arising from the bending of the VB energy level of the QDs creates favorable conditions for hole–tunneling injection. Moreover, both simulations and experiments consistently demonstrate that the predominant pathway for hole injection from the HTL to the QDs in the QLED device involved thermally assisted tunneling. This study is important to understand the hole injection mechanism in QLEDs.  相似文献   

17.
The poor film formation of CdSe/ZnS quantum dots (QDs) during spin-coating makes a substantial impact on the device performance of quantum dot light-emitting diodes (QLEDs). This work proposes a method to improve the morphology of the quantum dot light-emitting layer (EML) by adding small organic molecular 4,4''-Bis(9H-carbazol-9-yl) biphenyl (CBP) into the layer. Its surface roughness reduces from 6.21 nm to 2.71 nm, which guarantees a good contact between hole transport layer (HTL) and EML. Consequently, the CdSe/ZnS QDs:CBP based QLED achieves maximum external quantum efficiency (EQE) of 5.86%, and maximum brightness of 10 363 cd/m2. It is demonstrated that the additive of small organic molecules could be an effective way to improve the brightness and the efficiency of QLEDs.  相似文献   

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