表面加工多晶硅薄膜热导率测试结构

提出了一种使用表面加工工艺设计多晶硅薄膜热导率的测试结构,论文推导了热学模型,给出了测试方法.由于其制造工艺能和其它微机械器件制造工艺完全兼容,因而能够达到监控MEMS器件制造工艺和在线检测的目的.     

表面加工多晶硅薄膜热导率测试结构

提出了一种使用表面加工工艺设计多晶硅薄膜热导率的测试结构，论文推导了热学模型，给出了测试方法。由于其制造工艺能和其它微机械器件制造工艺完全兼容，因而能够达到监控MEMS器件制造工艺和在线检测的目的。     

在线检测多晶硅薄膜热导率测试结构的设计与模拟

提出了一种在线测试表面加工多晶硅薄膜热导率的结构,推导了热学模型,给出了测试方法,用ANSYS验证了热学模型.该方法避免了测试结构放置在真空中的缺点,有望在工艺线上得到应用.     

在线检测多晶硅薄膜热导率测试结构的设计与模拟

提出了一种在线测试表面加工多晶硅薄膜热导率的结构,推导了热学模型,给出了测试方法,用ANSYS验证了热学模型.该方法避免了测试结构放置在真空中的缺点,有望在工艺线上得到应用.     

范德堡多晶硅热导率的测试结构

在O.M.Paul等研究的范德堡热导率测试结构的基础上,提出了一种改进结构,利用一组测试结构来测得多晶硅薄膜的热导率。在十字型结构中一个含有多晶硅薄膜,而另一个不含有多晶硅薄膜,根据建立的热学模型,可以获取多晶硅薄膜的热导率。用有限元分析软件ANSYS进行了模拟分析,分析表明模拟值与实验值能较好地吻合,且辐射散热是基本可以忽略的,从而验证了模型建立的正确性,说明该方法能够实现对多晶硅薄膜的测量,且具有较高的测试精确度。     

表面加工多晶硅薄膜热扩散系数的在线提取

提出了一种在线提取多晶硅薄膜热扩散系数的简单测量方法,测试结构可随表面器件工艺加工制作,无需附加工艺。通过分析两个长度相同、宽度与厚度相同梁的瞬态冷却特性,获得其冷却时的温度衰减时间常数,便可以提取出表面加工多晶硅薄膜的热扩散系数。给出了瞬态冷却热电分析模型,综合考虑了梁冷却过程中各种散热因素即对流、辐射以及向衬底传热的影响。实验测得的该表面加工多晶硅薄膜热扩散系数是0.165 cm2-s 1(方块电阻是116.25Ω/sq)。该方法能够实现多晶硅薄膜热扩散系数的在线测试。     

多晶硅薄膜热膨胀系数的电测试结构

提出了一种新型多晶硅薄膜热膨胀系数的电测试结构,给出了热机电耦合模型和测试方法,并利用Coventor软件和ANSYS软件进行模拟和验证.分析表明模拟结果和理论结果基本一致,从而验证了该模型.该方法能够实现多晶硅薄膜热膨胀系数的在线提取,测量方便,独立性较高,以电学量形式输出,对于薄膜热膨胀系数的在线检测有一定参考价值.     

多晶硅薄膜热膨胀系数的电测试结构

提出了一种新型多晶硅薄膜热膨胀系数的电测试结构,给出了热机电耦合模型和测试方法,并利用Coventor软件和ANSYS软件进行模拟和验证.分析表明模拟结果和理论结果基本一致,从而验证了该模型. 该方法能够实现多晶硅薄膜热膨胀系数的在线提取,测量方便,独立性较高,以电学量形式输出,对于薄膜热膨胀系数的在线检测有一定参考价值.     

一种简单的表面加工多晶硅薄膜热扩散率在线测试结构

本文提出了一种表面加工多晶硅薄膜的在线测试结构.模型综合考虑了辐射、对流以及向衬底的传热等因素的影响,通过分析两个长度不同但宽度与厚度相同的梁在相同加热电流下的瞬态电阻变化特性,来提取多晶硅薄膜的热扩散系数.用ANSYS软件验证了该模型的正确性,通过实验测得表面加工多晶硅薄膜的热扩散率为1.059×10^-5±3×10^-6m²/s.     

PECVD法制备类金刚石薄膜结构和表面形貌分析

以CH4为碳源,Ar气为载气,采用等离子体增强化学气相沉积法(PECVD)在硅(100)衬底上制备了类金刚石(DLC)薄膜。利用拉曼(Raman)光谱仪与原子力显微镜(AFM)对其结构与表面形貌进行了表征。结果表明:所制备的DLC薄膜是含sp3和sp2混合键的非晶态碳膜,其表面均匀、光滑、致密;且随着射频功率的提高,薄膜的平均晶粒直径由8.0nm降为4.2nm,粗糙度由2.2nm减为0.9nm。     

Influence of growth time on crystalline structure, conductivity and optical properties of ZnO thin films

This paper examines the growth of ZnO thin films on glass substrate at 350 ℃ using an ultrasonic spray technique. We have investigated the influence of growth time ranging from 1 to 4 min on structural, optical and electrical properties of ZnO thin films. The as-grown films exhibit a hexagonal structure wurtzite and are (002) oriented. The maximum value of grain size G = 63.99 nm is attained for ZnO films grown at 2 min. The average transmittance is about 80%, thus the films are transparent in the visible region. The optical gap energy is found to increase from 3.26 to 3.37 eV with growth time increased from 1 to 2 min. The minimum value of electrical resistivity of the films is 0.13 Ω·cm obtained at 2 min. A systematic study on the influence of growth time on the properties of ZnO thin films deposited by ultrasonic spray at 350 ℃ has been reported.     

Characteristics of thin film transistors fabricated in polysilicon films deposited by plasma enhanced chemical vapor deposition

Thin-film transistors (TFTs) fabricated in polysilicon films deposited by plasma enhanced chemical vapor deposition (PECVD) were characterized. The transistors were fabricated using a low temperature process (i.e., <- 700° C). The characteristics of the devices were found to improve as the deposition temperature of the polysilicon film increased. The best characteristics (μ _FE of 15 cm²/V _s andV _TH of 2.2V) were measured in the devices fabricated in the film deposited at 700° C. The devices fabricated in the PECVD polysilicon films were compared to those fabricated in polysilicon films deposited by thermal CVD in the same reactor in order to decouple the effect of the plasma. A coplanar electrode structure TFT with adequate characteristics (μ _FE of 8 cm²/V _s) was also demonstrated in the PECVD polysilicon films.     

Characterization of the thermal conductivity of insulating thin films by scanning thermal microscopy

This paper reports on the abilities of a Scanning Thermal Microscopy (SThM) method to characterize the thermal conductivity of insulating materials and thin films used in microelectronics and microsystems. It gives a review of the previous works on the subject and gives new results allowing showing the performance of a new method proposed for reducing the thermal conductivity of meso-porous silicon by swift heavy ion irradiation. Meso-porous silicon samples were prepared by anodisation of silicon wafers and underwent irradiation by 845 MeV ²⁰⁸Pb ions, with fluences of 4×10¹¹ and 7×10¹¹ cm⁻². Thermal measurements show that irradiation reduced thermal conductivity by a factor of up to 2.     

MEMS薄膜横向断裂强度的在线测试——热驱动法

就MEMS薄膜断裂强度的测试提出了一种新的测试结构 ,该结构由待测梁 (悬臂梁 )和驱动源 (V形热执行器 )两部分组成。热执行器用来作为悬臂梁断裂的驱动源。用指针标尺读数系统测量悬臂梁弯曲挠度 ,从而根据文中给出的测试用的理论公式就可计算出梁弯曲所能承受的最大应力。悬臂梁和热执行器的制造工艺兼容 ,故整个测试能在芯片上完成     

空位缺陷对Si薄膜热导率的影响

利用非平衡分子动力学方法研究了空位结构缺陷对Si薄膜热导率的影响。当温度在300K-700K之间变化时,热导率随着空位浓度的增加而降低,并且随着温度的升高空位浓度对热导率的影响以及同一空位浓度下温度对热导率的影响都在逐渐减弱。本文还利用Boltzmann输运理论对MD模拟进行验证,结果基本与其一致。同时理论方法还表明,空位缺陷对薄膜热导率的巨大影响归因于晶格应力的存在使点缺陷也发生散射作用的结果。     

Effects of vacancy structural defects on the thermal conductivity of silicon thin films

Vacancy structural defect effects on the lattice thermal conductivity of silicon thin films have been investigated with non-equilibrium molecular dynamics simulation.The lattice thermal conductivities decrease with increasing vacancy concentration at all temperatures from 300 to 700 K.Vacancy defects decrease the sample thermal conductivity,and the temperature dependence of thermal conductivity becomes less significant as the temperature increases.The molecular dynamics result is in good agreement with the theoretical analysis values obtained based on the Boltzmann equation.In addition,theoretical analysis indicates that the reduction in the lattice thermal conductivity with vacancy defects can be explained by the enhanced point-defect scattering due to lattice strain.