垒层Si掺杂对AIGaInP/GaInP多量子阱性能的影响

低压MOCVD方法生长了垒层掺Si与不掺Si的AlGaInP/GaInP多量子阱结构,运用X双晶衍射与光荧光技术研究了掺Si对量子阱性能的影响.测试结果表明垒层掺Si使量子阱的生长速度增加,掺Si量子阱的光荧光强度比未掺Si量子阱的光荧光强度增强了1 3倍.     

掺Si对AlGaInP/GaInP多量子阱发光性能的影响

研究了Si掺杂对MOCVD生长的(Al0.3Ga0.7)In0.5P/Ga0.5In0.5P多量子阱发光性能的影响.样品分为两类:一类只生长了(Al0.3Ga0.7)In0.5P/Ga0.5In0.5P多量子阱结构;另一类为完整的多量子阱LED结构.对于只生长了(Al0.3Ga0.7)In0.5P/Ga0.5In0.5P多量子阱结构的样品,掺Si没有改变量子阱发光波长,但使得量子阱发光强度略有下降,发光峰半高宽明显增大.这应是掺Si使量子阱界面质量变差导致的.而在完整LED结构的情况下,掺Si却大大提高了量子阱的发光强度.相对于未掺杂多量子阱LED结构,垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍,并对这一现象进行了讨论.     

掺Si对AlGaInP/GaInP多量子阱发光性能的影响

研究了Si掺杂对MOCVD生长的（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱发光性能的影响．样品分为两类：一类只生长了（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱结构;另一类为完整的多量子阱LED结构．对于只生长了（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱结构的样品,掺Si没有改变量子阱发光波长,但使得量子阱发光强度略有下降,发光峰半高宽明显增大．这应是掺Si使量子阱界面质量变差导致的．而在完整LED结构的情况下,掺Si却大大提高了量子阱的发光强度．相对于未掺杂多量子阱LED结构,垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍,并对这一现象进行了讨论．     

弛豫SiGe衬底上SiGe/Si Ⅱ型量子阱

采用UHV/CVD系统,在Si衬底上生长了具有渐变Si1-xGex缓冲层结构的弛豫Si0.76Ge0.24虚衬底和5个周期的Si0.76Ge0.24/Si多量子阱.在渐变Si1-xGex缓冲层生长过程中引入原位退火,消除了残余应力,抑制了后续生长的SiGe中的位错成核.透射电子显微照片显示,位错被有效地限制在组份渐变缓冲层内,而SiGe上层和SiGe/Si量子阱是无位错的.在样品的PL谱中,观察到跃迁能量为0.961eV的Ⅱ型量子阱的无声子参与(NP)发光峰.由于Ⅱ型量子阱中电子和空穴不在空间同一位置,较高光功率激发下引起的高浓度载流子导致能带弯曲严重.NP峰随激发功率增加向高能方向移动,在一定激发条件下,电子跃迁或隧穿至弛豫SiGe层弯曲的导带底后与处于同一位置的空穴复合发光,所以NP峰积分强度随光激发功率先增加后减小.     

弛豫SiGe衬底上SiGe/Si Ⅱ型量子阱

采用 UHV / CVD系统 ,在 Si衬底上生长了具有渐变 Si1 - x Gex 缓冲层结构的弛豫 Si0 .76 Ge0 .2 4虚衬底和 5个周期的 Si0 .76 Ge0 .2 4/ Si多量子阱 .在渐变 Si1 - x Gex 缓冲层生长过程中引入原位退火 ,消除了残余应力 ,抑制了后续生长的 Si Ge中的位错成核 .透射电子显微照片显示 ,位错被有效地限制在组份渐变缓冲层内 ,而 Si Ge上层和 Si Ge/Si量子阱是无位错的 .在样品的 PL 谱中 ,观察到跃迁能量为 0 .96 1e V的 型量子阱的无声子参与 (NP)发光峰 .由于 型量子阱中电子和空穴不在空间同一位置 ,较高光功率激发下引起的高浓度载流子导致能带弯曲严重 .NP峰随激发功率增加向高能方向移动 ,在一定激发条件下 ,电子跃迁或隧穿至弛豫 Si Ge层弯曲的导带底后与处于同一位置的空穴复合发光 ,所以 NP峰积分强度随光激发功率先增加后减小     

弛豫SiGe衬底上SiGe/SiⅡ型量子阱

采用 UHV / CVD系统 ,在 Si衬底上生长了具有渐变 Si1 - x Gex 缓冲层结构的弛豫 Si0 .76 Ge0 .2 4虚衬底和 5个周期的 Si0 .76 Ge0 .2 4/ Si多量子阱 .在渐变 Si1 - x Gex 缓冲层生长过程中引入原位退火 ,消除了残余应力 ,抑制了后续生长的 Si Ge中的位错成核 .透射电子显微照片显示 ,位错被有效地限制在组份渐变缓冲层内 ,而 Si Ge上层和 Si Ge/Si量子阱是无位错的 .在样品的 PL 谱中 ,观察到跃迁能量为 0 .96 1e V的 型量子阱的无声子参与 (NP)发光峰 .由于 型量子阱中电子和空穴不在空间同一位置 ,较高光功率激发下引起的高浓度载流子导致能带弯     

UHV/CVD生长SiGe/Si异质结构材料

以Si2H6和GeH4作为源气体,用UHV/CVD方法在Si(100)衬底上生长了Sil-xGex合金材料和Si1-xGex/Si多量子阱结构.用原子力显微镜、X光双晶衍射和透射电子显微镜对样品的表面形貌、均匀性、晶格质量、界面质量等进行了研究.结果表明样品的表面平整光滑,平均粗糙度为1.2nm;整个外延片各处的晶体质量都比较好,各处生长速率平均偏差为3.31％,合金组分x值的平均偏差为2.01％;Si1-xGex/Si多量子阱材料的X光双晶衍射曲线中不仅存在多级卫星峰,而且在卫星峰之间观察到了Pendellosung条纹,表明晶格质量和界面质量都很好;Si1-xGex/Si多量子阱材料的TEM照片中观察不到位错的存在.     

张应变、长波长In_(1-x)Ga_xAs_yP_(1-y)/InP量子阱材料的光荧光谱实验研究

给出了具有二三个量子阱的Ｉｎ１－ｘＧａｘＡｓｙＰ１－ｙ／ＩｎＰ张应变量子阱材料的光荧光谱及ｘ射线双晶衍射摇摆曲线，指出了光荧光峰为量子阱中导带子带和价带子带间本征复合机构所致。理论上分析了光荧光谱中双峰强度比随温度变化的关系，理论计算和实测结果基本一致。     

GaAs／AlGaAs非对称耦合双阱光荧光的温度依赖关系

报道了ＧａＡｓ／ＡｌＧａＡｓ非对称耦合双量子阱ｐｉｎ结构在不同温度下的光荧光谱，观察到宽阱与窄阱重空穴激子峰荧光强度随温度上升而较快下降的不同变化关系，结果表明窄阱电子的热发射是导致窄阱光荧光强度随温度上升而较快下降的主要原因。同时观测到宽阱轻空穴激子峰强度特环的温度依赖关系，并分析了其物理机制。     

GaInAs/AlGaAs应变量子阱结构的荧光特性

本文报道了4—300K温度范围内量子阱宽度分别为20、40、90和130A的GaInAs/AlGaAs应变量子阱结构的光荧光特性。我们考虑量子尺寸对载流子子能带的影响和弹性应变引起带隙的移动,计算了量子阱中本征激子发光的能量位置,计算值与实验结果基本吻合。还研究了荧光峰强度随阱宽的变化以及不同温度下荧光峰的半高宽度。     

Influence of Si-Doping on the Performance of InGaN/GaN Multiple Quantum Well Solar Cells

Semiconductors - The performance of InGaN/GaN multiple quantum well (MQW) solar cells with five different Si-doping concentrations, namely 0, 4 × 1017 cm–3, 1 × 1018 cm–3, 3...     

High-performance 670-nm AlGaInP/GaInP visible strained quantum welllasers

We have grown high-performance AlGaInP/GaInP visible (670 mn) strained quantum well lasers by low-pressure metalorganic chemical vapor deposition. With AlInP cladding layer, a high-power AlGaInP/GaInP visible laser diode is achieved. Its threshold current is about 30 mA. The output power of this laser diode can maintain, at least, at 32 mW under continuous-wave (CW) operation at room temperature. High slope efficiency (0.8 mW/mA) and differential quantum efficiency (0.87) can be achieved. To improve beam quality, AlGaInP/GaInP visible lasers with and without depressed index cladding layer are theoretically and experimentally studied. From experimental results, the transverse beam divergence can be reduced from 41.4° to 26.2° while maintaining a low threshold current (from 36 mA to 46 mA). By using the transfer matrix method, our theoretical calculations are in good agreement with the experimental results     

Influence of Si-doping on the characteristics of InGaN-GaN multiplequantum-well blue light emitting diodes

A detailed study on the effects of Si-doping in the GaN barrier layers of InGaN-GaN multiquantum well (MQW) light-emitting diodes (LEDs) has been performed. Compared with unintentionally doped samples, X-ray diffraction results indicate that Si-doping in barrier layers can improve the crystal and interfacial qualities of the InGaN-GaN MQW LEDs. It was also found that the forward voltage is 3.5 and 4.52 V, the 20-mA luminous intensity is 36.1 and 25.1 mcd for LEDs with a Si-doped barrier and an unintentionally doped barrier, respectively. These results suggests that one can significantly improve the performance of InGaN-GaN MQW LEDs by introducing Si doping in the GaN barrier layers     

Analysis of GaInP/AlGaInP compressive strainedmultiple-quantum-well laser

We have analyzed GaInP/AlGaInP compressive strained MQW lasers, with theoretical calculation and experimental results. Our calculations of TE polarized gain, where the valence subband mixing and the heterobarrier leakage current are taken into account, are in good agreement with the experimental results. When a compressive strain of up to 0.5% is induced in the quantum wells, the density of states near the valence band edge is decreased, due to the reduction of heavy-hole and light-hole subband mixing. At the threshold condition, the compressive strain reduces not only the radiative recombination current, but also the hetero-barrier leakage current. Therefore, the threshold current is reduced, and its temperature dependence is found to be small, In the analysis, we also show that when larger compressive strain of more than 0.5% is induced in the 40-Å-thick quantum wells, the threshold characteristics are degraded     

GaInP/AlGaInP应变多量子阱激光器垂直于结方向上的光束质量研究

用转移矩阵方法对 680nmGaInP/AlGaInP应变多量子阱激光器的波导模式作了分析和计算。根据非傍轴光束传输的矢量矩理论 ,对该激光器垂直于结平面方向上的光束质量因子M2 ⊥ 进行了理论计算 ,结果表明M2 ⊥ 小于 1,和实验结果相符合。这一结果有助于认识半导体激光器垂直于结方向上光束的内在本性     

High performance of AlGaInP/GaInP visible lasers by strain induced effects

An AlGaInP/GaInP visible strained single quantum well (SSQW) laser has been investigated. In comparison with a conventional lattice-matched single quantum well (SQW) laser, it was found that a 25% increase in the differential gain coefficient beta and 60% decrease in the transparency current density J/sub 0/ have been obtained by incorporating 0.65% compressive SSQW active layer structure.<>     

Effect of spin-orbit split-off bands on GaInP/AlGaInP strainedquantum well lasers

We theoretically analyzed the effect of the spin-orbit split-off band on GaInP/AlGaInP strained quantum well lasers using 6×6 Luttinger-Kohn Hamiltonian. Because of the small spin splitting energy of GaInP, we show that the spin-orbit split-off subbands strongly couple with heavy and light hole subbands, and linear gain properties are greatly different from those without the effect of spin-orbit split-off bands. The unstrained quantum well structure is most influenced by the spin-orbit split-off bands, and laser characteristics such as the differential gain and threshold current are degraded. The compressive-strained quantum well has the lowest threshold current, and the tensile-strained quantum well has largest differential gain, which is improved by the effect of the spin-orbit split-off bands     

Very low threshold current density of a GaInP/AlGaInP double-heterostructure laser grown by MOCVD

A GaInP/AlGaInP broad-area (60 × 500 ?m2) laser grown by MOCVD has obtained a very low threshold current density Jth of 1.1 kA/cm2. The dependence of Jth and differential quantum efficiency on cavity length was measured to determine internal quantum efficiency, losses and the gain constant, which were found to be comparable to these characteristics in an AlGaAs laser.     

AlGaInP/GaInAs strained quantum well lasers

AlGaInP cladding layers have been applied for the first time to GaInAs strained quantum well lasers oscillating around 0.98 mu m. The device has lower threshold current and larger T/sub 0/ than a device with GaInP cladding layers. This was expected from a larger bandgap difference between active and cladding layers.<>