Fully Functional Nonlinear Table-Based HBT Model With Explicit Thermal Feedback

A fully functional table-based nonlinear model of the heterojunction bipolar transistor (HBT) is presented which includes explicit thermal feedback. The model uses four table-based nonlinear functions: I_c, Q_c, V_be, and Q_b, all defined versus I_b and V_ce by using a nonuniform bias grid. Thermal modeling (self-biasing and environment temperature dependence, T_a) is done by linearly mapping the table-based current functions versus T_a coupled with explicit thermal feedback. Four table-based nonlinear coefficients are required to accurately predict the device behavior versus temperature. Excellent results have been obtained under dc, small, and large signal excitations for InGaP/GaAs HBTs in the range 10degC to 110degC.     

Analysis of temperature dependence of linearity for SiGe HBTs in the avalanche region using Volterra series

In this paper, linearity characteristic of silicon germanium (SiGe) heterojunction bipolar transistors (HBTs) at different temperatures in the avalanche regime is investigated by the Volterra approach incorporating with a physics-based breakdown network for the first time. Third-order intermodulation distortion (IMD₃) decreases with increasing temperature in the impact ionization region due to lower nonlinear contributions from individual nonlinearity according to the Volterra analysis results. Calculated gain, output power, and efficiency of SiGe HBTs are in good agreement with measurement results in the avalanche region. This analysis with respect to temperature can benefit the reliability study of linearity for SiGe HBTs in the avalanche regime.     

On Common–Base Avalanche Instabilities in SiGe HBTs

This paper presents a detailed investigation of the key device-level factors that contribute to the bias-dependent features observed in common-base (CB) dc instability characteristics of advanced SiGe HBTs. Parameters that are relevant to CB avalanche instabilities are identified, extracted from measured data, and carefully analyzed to yield improved physical insight, a straightforward estimation methodology, and a practical approach to quantify and compare CB avalanche instabilities. The results presented support our simple theory and show that CB-instability characteristics are strongly correlated with the parasitic base and emitter resistances. The influence of weak quasi-pinch-in effects are shown to contribute additional complexity to the bias dependence of the CB-instability threshold. Measured data from several technology nodes, including next-generation (300-GHz) SiGe HBTs, are presented and compared. Experimental analysis comparing different device geometries and layouts shows that while device size plays an important role in CB avalanche instabilities across bias, these parameters are not sensitive to standard transistor layout variations. However, novel measurements on emitter-ring tetrode transistor structures demonstrate the influence of perimeter-to-area ratio on CB stability and highlight opportunities for novel transistor layouts to increase .     

Noise in SiGe HBT RF Technology: Physics, Modeling, and Circuit Implications

This paper presents an overview of the physics, modeling, and circuit implications of RF broad-band noise, low-frequency noise, and oscillator phase noise in SiGe heterojunction bipolar transistor (HBT) RF technology. The ability to simultaneously achieve high cutoff frequency (f/sub T/), low base resistance (r/sub b/), and high current gain (/spl beta/) using Si processing underlies the low levels of low-frequency 1/f noise, RF noise, and phase noise of SiGe HBTs. We first examine the RF noise sources in SiGe HBTs and the RF noise parameters as a function of SiGe profile design, transistor biasing, sizing, and operating frequency, and then show a low-noise amplifier design example to bridge the gap between device and circuit level understandings. We then examine the low-frequency noise in SiGe HBTs and develop a methodology to determine the highest tolerable low-frequency 1/f noise for a given RF application. The upconversion of 1/f noise, base resistance thermal noise, and shot noises to phase noise is examined using circuit simulations, which show that the phase noise corner frequency in SiGe HBT oscillators is typically much smaller than the 1/f corner frequency measured under dc biasing. The implications of SiGe profile design, transistor sizing, biasing, and technology scaling are examined for all three types of noises.     

RF power characteristics of SiGe HBTs at cryogenic temperatures

This paper investigates the temperature dependence (from 77 to 300 K) of dc, ac, and power characteristics for n-p-n SiGe heterojunction bipolar transistors (HBTs) with and without selectively implanted collector (SIC). In SiGe HBTs without SIC, the valance band discontinuity at the base-collector heterojunction induces a parasitic conduction band barrier while biasing at saturation region and high current operation at cryogenic temperatures. This parasitic conduction band barrier significantly reduces the current gain and cutoff frequency. For transistors biased with fixed collector current, the measured output power, power-added efficiency, and linearity at 2.4 GHz decrease significantly with decreasing operation temperatures. The temperature dependence of output power characteristic is analyzed by Kirk effect, current gain, and cutoff frequency at different temperatures. The parasitic conduction band barrier in SiGe HBTs with SIC is negligible, and thus the device achieves better power performance at cryogenic temperatures compared with that in SiGe HBT without SIC.     

Modelling of SiGe heterobipolar transistors: 200 GHz frequencies with symmetrical delay times

Our basic approach is to develop a symmetrical design with equal delay times for collector, base and the total load to simulate the high frequency behaviour of SiGe heterobipolar transistors (HBTs). On this base we have investigated the feasibility of SiGe HBTs with transit frequencies f_T above 200 GHz. A symmetrical design reaching f_T=208 GHz is presented. The dependence of the high frequency behaviour on Ge content and vertical transistor design is shown. Critical parameters like the maximum current density and the breakthrough voltage are considered. An analytical model is compared to numerical simulations and experimental data.     

Characterization and modeling of avalanche multiplication in HBTs

The accurate modeling of weak avalanche breakdown of HBTs in compact bipolar transistor models for circuit simulation is presented. Based on various device electrical characteristics that are grouped into three classes, a modified VBIC avalanche multiplication model is proposed. By simply replacing one constant avalanche model parameter with current linear dependence, the new model predicts well broad behaviors of breakdown from weak avalanche up into high level injections.     

Current gain dependence on subcollector and etch-stop doping inInGaP/GaAs HBTs

The DC current gain dependence of InGaP/GaAs heterojunction bipolar transistors (HBTs) on subcollector and etch-stop doping is examined. Samples of InGaP/GaAs HBTs having various combinations of subcollector doping and etch-stop doping are grown, and large area 60 μm×60 (μ) HBTs are then fabricated for DC characterization. It is found that the DC current gain has a strong dependence on the doping concentration in the subcollector and the subcollector etch-stop. Maximum gain is achieved when the subcollector is doped at 6~7×10 ¹⁸ cm^-3 while the subcollector etch-stop is doped either above 6×10¹⁸ cm^-3 (current gain/sheet resistance ratio, β/R_b=0.435 at I_c=1 mA) or below 3.5×10¹⁷ cm^-3 (β/R_b=0.426~0.438 at I_c=1 mA). The data show that it is not necessary to heavily dope the subcollector etch-stop to reduce the conduction barrier and to obtain high current gain. The high current gain obtained with the low InGaP etch-stop doping concentration is attributed to the reduction of the effective energy barrier thickness due to band bending at the heterojunction between the InGaP etch-stop and the GaAs subcollector. These results show that the β/R_b of InGaP/GaAs HBTs can improve as much as 69% with the optimized doping concentration in subcollector and subcollector etch-stop     

Collector-base junction avalanche multiplication effects inadvanced UHV/CVD SiGe HBTs

The collector-base junction avalanche multiplication factor (M-1) in SiGe HBTs is investigated using a new technique better tolerant to self-heating and collector-base leakage. The new technique provides higher accuracy at low current densities and enables M-1 to be measured at high current densities typically used in circuits. Comparisons with identically processed silicon control devices show that M-1 is not inadvertently increased by the incorporation of SiGe, despite its smaller bandgap. With cooling, M-1 first increases, and then saturates when T<117 K. A 2.3 V critical reverse CB voltage at which base current reversal occurs is observed down to 83 K, which is sufficiently high for today's bipolar and BiCMOS logic applications     

Substrate current based avalanche multiplication measurement in 120 GHz SiGe HBTs

A new substrate current-based technique for measuring the avalanche multiplication factor (M - 1) in high-speed SiGe heterojunction bipolar transistors (HBTs) is proposed. The technique enables M - 1 measurement at high operating current densities required for high-speed operation, where conventional techniques fail because of self-heating. Using the proposed technique, M - 1 was measured up to 10 mA//spl mu/m/sup 2/ on SiGe HBTs featuring 120 GHz peak f/sub T/ which occurs at J/sub C/ about 7 mA//spl mu/m/sup 2/. Implications for circuit applications are also discussed.     

A New Analytical Method for Robust Extraction of the Small-Signal Equivalent Circuit for SiGe HBTs Operating at Cryogenic Temperatures

We present a new analytical direct parameter-extraction methodology for obtaining the small-signal equivalent circuit of HBTs. It is applied to cryogenically operated SiGe HBTs as a means to allow circuit design of SiGe HBT low-noise amplifiers for cooled radio astronomy applications. We split the transistor into an intrinsic transistor (IT) piece modeled as a Pi-topology, and the quasi-intrinsic transistor (QIT), obtained from the IT after that the base resistance (R_b) has been removed. The relations between Z-Y-parameters of the IT and QIT are then established, allowing us to propose a new methodology for determining R_b. The present extraction method differs from previous studies in that each of the model elements are obtained from exact equations that do not require any approximations, numerical optimization, or post-processing. The validity of this new extraction methodology is demonstrated by applying it to third-generation SiGe HBTs operating at liquid-nitrogen temperature (77 K) across the frequency range of 2-22 GHz.     

Novel phenomenon of avalanche breakdown saturation with negativeresistance in a bipolar transistor

A breakdown saturation phenomenon of negative resistance has been observed in a bipolar transistor. The collector current becomes saturated and reaches a critical current (I_CC) after avalanche breakdown. At this critical current, a negative resistance appears. I_CC is determined by the thermal condition of the transistor, as obtained from pulse measurements and temperature dependence. For the multiplication factor (M), it is clear that there are two distinct regions: 1) low voltage (Region I) and 2) higher voltage (Region II). In Region I, the multiplication factor begins to increase with increasing applied voltage and is fixed almost constant for temperature, whereas in Region II, the multiplication factor decreases with increasing temperature. As a result, (∂M/∂V) _T≃0 is realized at about 20 V and 124°C, corresponding to the saturation of avalanche breakdown     

Hot carrier induced bipolar transistor degradation due to basedopant compensation by hydrogen: theory and experiment

New experimental and analytical results are presented which show that extrinsic and intrinsic base dopant compensation by hydrogen is responsible for large changes in the bipolar transistor parameters of emitter-base breakdown voltage (V_ebo), forward collector current (I_c) and series base resistance (R_bx) when such transistors are operated under avalanche and inverted mode stress conditions. A new physical model has been developed to explain the observed changes in V_ebo and I_c as a function of stress time, and the analytical results are shown to be well correlated with the experimental data. Lastly, the effects of degradation on transistor voltage gain bandwidth (f_max) and emitter coupled bipolar comparator delay (τ_delay) are assessed and discussed in terms of circuit performance degradation     

Measurement of collector-base junction avalanche multiplicationeffects in advanced UHV/CVD SiGe HBT's

This paper presents measurements of the avalanche multiplication factor (M-1) in SiGe HBTs using a new technique capable of separating the avalanche multiplication and Early effect contributions to the increase of collector current with collector-base bias, as well as allowing safe measurements at practical current densities. The impact of collector doping, current density, Ge profile, and operation temperature are reported for the first time using measured and simulated results from a production quality UHV/CVD SiGe HBT technology. Limitations of the technique in the presence of significant self-heating are discussed. By turning on the secondary hole impact ionization, we revealed the difference in impact ionization between strained SiGe and Si in the presence of the “dead space” effect. Despite its smaller bandgap, the compressively strained SiGe layer shows an apparent decrease in the secondary hole impact ionization rate compared to Si     

Quantifying neutral base recombination and the effects ofcollector-base junction traps in UHV/CVD SiGe HBTs

This work quantifies neutral base recombination in UHV/CVD SiGe heterojunction bipolar transistors (HBTs) using calibrated two-dimensional (2-D) simulation. The simulated collector-base conductance through neutral base recombination (NBR) modulation is far below the experimentally observed values, and hence does not explain the measured output resistance degradation under forced-I_B operation. In spite of the output resistance degradation, these UHV/CVD SiGe HBTs have approximately the same base current as the silicon control, and hence higher current gain. Based on the observation of the majority carrier concentration limited recombination in the CB junction depletion layer, as opposed to the minority carrier concentration limited recombination in the neutral base, local presence of traps in the CB junction depletion layer is suggested. This explains the measured CB conductance modulation and the related output resistance degradation without compromising the current gain. Numerical simulations using traps locally introduced into the CB junctions successfully reproduced the measured collector-base conductance from simulation without appreciable degradation in current gain     

Velocity-modulation and transit-time effects in InP/InGaAs HBTs

The base-collector capacitance C_bc and the collector transit time delay τc govern the high-speed performance of modern heterojunction bipolar transistors (HBTs). Both are shown to be strongly modified by velocity modulation effects in InP/InGaAs HBTs: The carrier velocity in the collector depends on V_cb and I_c, causing a reduction of C_bc and τc respectively. The current induced transit time modulation is shown to be conveniently expressed by a minor but important modification of the conventional transit time delay expression. Particle simulations are performed to assess the relevance of these effects     

An investigation of low-frequency noise in complementary SiGe HBTs

We present a comprehensive investigation of low-frequency noise behavior in complementary (n-p-n + p-n-p) SiGe heterojunction bipolar transistors (HBTs). The low-frequency noise of p-n-p devices is higher than that of n-p-n devices. Noise data from different geometry devices show that n-p-n transistors have an increased size dependence when compared with p-n-p transistors. The 1/f noise of p-n-p SiGe HBTs was found to have an exponential dependence on the (intentionally introduced) interfacial oxide (IFO) thickness at the polysilicon-to-monosilicon interface. Temperature measurements as well as ionizing radiation were used to probe the physics of 1/f noise in n-p-n and p-n-p SiGe HBTs. A weak temperature dependence (nearly a 1/T dependence) of 1/f noise is found in both n-p-n and p-n-p devices with cooling. In most cases, the magnitude of 1/f noise is proportional to I/sub B//sup 2/. The only exception in our study is for noise in the post-radiation n-p-n transistor biased at a low base current, which exhibits a near-linear dependence on I/sub B/. In addition, in proton radiation experiments, the 1/f noise of p-n-p devices was found to have higher radiation tolerance than that of n-p-n devices. A two-step tunneling model and a carrier random-walk model are both used to explain the observed behavior. The first model suggests that 1/f noise may be caused by a trapping-detrapping process occurring at traps located inside IFO, while the second one indicates that noise may be originating from the emitting-recapturing process occurring in states located at the monosilicon-IFO interface.     

500 GHz cutoff frequency SiGe HBTs

A current gain cutoff frequency f_T of 508 GHz is reported for a SiGe heterojunction bipolar transistor (HBT) operating at 40 K. This 63% increase over the 311 GHz value measured at room temperature results from the overall decrease of the transit and charging times. Two HBTs are compared to highlight the importance of the topology of the HBT to reach maximum performances.     

Avalanche multiplication and pinch-in models for simulating electrical instability effects in SiGe HBTs

The onset of impact ionization-induced instabilities limits the operative range of SiGe hetero-junction bipolar transistors. Based on referential Monte Carlo simulation results, a critical review of major models for the avalanche multiplication factor (M) is presented, and a new analytical model is proposed and successfully verified by measurements. The novel M formulation has been incorporated in a two-dimensional theoretical model describing bipolar transistor operation under pinch-in conditions/above the open-base breakdown voltage BV_CEO. The physical mechanisms leading to electrical instability are addressed, and closed form analytical relations defining the onset of instability under forced-I_E conditions are derived. The proposed model defines the limits of the Safe Operating Area (SOA) related to impact ionization, enabling the reliable usage of HBTs above BV_CEO.