GaAs衬底上（ZnS）n／（ZnSe）n（001）超晶格的光学性质

本文用Ｌｉｎｅａｒｉｚｅｄ－Ｍｕｆｆｉｎ－Ｔｉｎ Ｏｒｂｉｔａｌｓ能带方法，计算ＧａＡｓ衬底上（ＺｎＳ）ｎ／（ＺｎＳｅ）ｎ（００１）超晶格的能带结构。计算中采用外加调整势进行带隙修正，从而得到较准确的能带结构和波函数。在此基础上计算了超晶格系统的光学介电函数虚部ε２（ω）。结果表明，该超晶格系统的光学性质结合了ＺｎＳ和ＺｎＳｅ体材料光学性质的特点，在相当宽的能量范围内有较好的光谱响应，并且该超晶格     

GaAs(001)衬底上MnTe与相关超晶格的晶格生长和光谱特性

在ＧａＡｓ（００１）衬底上，用分子束外延方法生长ＭｎＴｅ薄膜和ＭｎＴｅ／ＺｎＴｅ等超晶格，发现在ＭｎＴｅ外延层中可能出现的ｂｃｃ晶畴，在超晶格中得到抑制，而且ＭｎＴｅ薄膜或超晶格中的ＭｎＴｅ层都不是严格的闪锌矿结构．通过比较２Ｋ下ＭｎＴｅ／ＺｎＴｅ和Ｚｎ０．８４Ｍｎ０．１６Ｔｅ／ＺｎＴｅ的低温光致发光谱和反射谱，发现ＭｎＴｅ／ＺｎＴｅ的由应力造成的红移更大，半宽也增大，并对其发光峰位进行了理论计算     

50周期的In_(0.3)Ga_(0.7)As/GaAs应变超晶格的生长

在本文，我们用一个低组分的InxGa(1-x)As缓冲层（x～0．01），有效地限制了50周期的In0.3Ga0．7As／GaAs应变超晶格本身弛豫所产生的位错，X射线双晶衍射测量结果表明使用这样缓冲层的超晶格质量明显改善，可以观察到12级卫星峰，而在没有这个缓冲层的样品上只能观察到3个衍射卫星峰．透射电子显微镜上观察到产生的位错被限制在这个缓冲层中或弯曲进入了衬底而没有进入所需要的外延层。     

分子束外延系统中生长Si/SiO_2超晶格及其发光

在硅分子束外延（ＭＢＥ）系统中，利用Ｓｉ和Ｏ２共淀积的方法生长出化学配比理想的ＳｉＯ２，在此基础上生长了Ｓｉ／ＳｉＯ２超晶格并观察到其光致发光（ＰＬ）谱     

GaAs／SrTiO3MBE外延单晶薄膜晶格振动的研究

利用远红外反射光谱和拉曼散射光谱法测量了ＧａＡｓ／ＳｒＴｉＯ３外延单晶薄膜样品,研究了这种新型异结构的晶格振动光学特性。实验结果表明：在钙钛矿型结构的ＳｒＴｉＯ３衬底上外延生长的ＧａＡｓ薄膜具有单晶结构,有与ＧａＡｓ单晶体材料相同的晶格振动特性。     

正弦平方势和形变超晶格的沟道特征

本文利用我们曾提出的粒子-晶体相互作用势(正弦平方势)讨论了带电粒子在形变超晶格中的运动行为,导出了共振退道时的退道系数,指出了用沟道技术研究形变超晶格的灵敏性、可靠性和重要性。     

GaAs(111)B上MBE同法质外延生长中的表面再构和RHEED分析

采用分子束外延(MBE)技术,在正晶向GaAs(111)B衬底上进行同质外延生长时,利用反射式高能电子衍射(RHEED)绘制出静态和动态生长条件下的表面相图,研究了生长参数对表面再构的影响,并通过衍射图案强度分析确定了适合镜像外延生长的(√19×√19)再构区域。在生长过程中,通过RHEED强度振荡和表面形貌的分析优化了生长参数,成功地生长出无金字塔结构的镜像外延薄膜。     

GaAs同质外延生长过程的RHEED分析

采用激光分子束外延方法(L-MBE),在GaAs(001)衬底上同质外延GaAs薄膜。利用反射式高能电子衍射(RHEED)研究了材料沉积过程中的各级条纹及其强度的变化,进而得出GaAs薄膜外延生长的适宜激光能量和沉积温度分别为500 mJ和570℃。RHEED强度随时间的变化曲线表明,GaAs为良好的层状外延生长模式,并随着沉积时间延长,层状生长模式逐渐向岛状模式转变。实验研究还表明层状生长的GaAs薄膜经表面弛豫后,可以得到更好的平整表面,并出现GaAs(001)-(2×4)的表面重构。原位X射线光电子能谱仪(XPS)研究表明沿(001)面外延的GaAs薄膜表面Ga∶As化学计量比约为52∶48,出现Ga的聚集。     

Symmetry-Mismatch-Induced Ferromagnetism in the Interfacial Layers of CaRuO3/SrTiO3 Superlattices

By modifying the entangled multi-degrees of freedom of transition-metal oxides, interlayer coupling usually produces interfacial phases with unusual functionalities. Herein, a symmetry-mismatch-driven interfacial phase transition from paramagnetic to ferromagnetic state is reported. By constructing superlattices using CaRuO₃ and SrTiO₃, two oxides with different oxygen octahedron networks, the tilting/rotation of oxygen octahedra near interface is tuned dramatically, causing an angle increase from ≈150° to ≈165° for the Ru O Ru bond. This in turn drives the interfacial layer of CaRuO₃, ≈3 unit cells in thickness, from paramagnetic into ferromagnetic state. The ferromagnetic order is robust, showing the highest Curie temperature of ≈120 K and the largest saturation magnetization of ≈0.7 µ_B per formula unit. Density functional theory calculations show that the reduced tilting/rotation of RuO₆ octahedra favors an itinerant ferromagnetic ground state. This work demonstrates an effective phase tuning by coupled octahedral rotations, offering a new approach to explore emergent materials with desired functionalities.     

Real-time monitoring of the surface stoichiometry during molecular beam epitaxy of cubic GaN on (001) GaAs by RHEED

We study the plasma-assisted molecular beam epitaxy of cubic GaN on GaAs(OOl) substrates by means ofin-situ reflection high-energy electron diffraction. The epilayers are characterized by x-ray diffraction, photoluminescence, and Hall measurements, and it is found that the overall best films are grown under a N/Ga ratio close to one. For anin-situ determination of the N/Ga ratio, the growth kinetics is studied via surface reconstruction transitions. The effective N flux giving rise to growth is measured using the transient behavior of the half-order diffraction streak intensity for various plasma operating conditions.     

薄层SOS薄膜材料外延生长及其器件应用

亚微米CMOS/SOS器件发展对高质量的100-200纳米厚度的薄层SOS薄膜提出了更高的要求.实验证实;采用CVD方法生长的原生SOS薄膜的晶体质量可以通过固相外延工艺得到明显改进.该工艺包括:硅离子自注入和热退火.X射线双晶衍射和器件电学测量表明:多晶化的SOS薄膜固相外延生长导致硅外延层晶体质量改进和载流子迁移率提高.固相外延改进的薄层SOS薄膜材料能够应用于先进的CMOS电路.     

薄层SOS薄膜材料外延生长及其器件应用

亚微米 CMOS/ SOS器件发展对高质量的 1 0 0 - 2 0 0纳米厚度的薄层 SOS薄膜提出了更高的要求 .实验证实 :采用 CVD方法生长的原生 SOS薄膜的晶体质量可以通过固相外延工艺得到明显改进 .该工艺包括 :硅离子自注入和热退火 .X射线双晶衍射和器件电学测量表明 :多晶化的 SOS薄膜固相外延生长导致硅外延层晶体质量改进和载流子迁移率提高 .固相外延改进的薄层 SOS薄膜材料能够应用于先进的 CMOS电路 .     

Growth of Topological Insulator Bi2Se3 Thin Films on SrTiO3 with Large Tunability in Chemical Potential

The growth of high quality, gate‐tunable topological insulator Bi₂Se₃ thin films on SrTiO₃ substrates by molecular beam epitaxy is reported in this paper. The optimized substrate preparation procedures are critical for obtaining undoped Bi₂Se₃ thin films with sufficiently low carrier densities while maintaining the strong dielectric strength of the substrates. The large tunability in chemical potential is manifested in the greatly enhanced longitudinal resistivity and the reversal of the sign of the Hall resistivity at negative back‐gate voltages. These thin films provide a convenient basis for fabrication of hybrid devices consisting of gate‐tunable topological insulators and other materials such as a superconductor and a ferromagnet.     

BaTiO3超薄膜的制备和性能研究

用LB(Langmuir Blodgett)膜技术制备的BaTiO3超微粒–硬脂酸复合LB膜,热处理后形成BaTiO3超薄膜。用紫外–可见光吸收光谱、电子自旋共振、红外光谱和X射线衍射对BaTiO3超薄膜进行研究。BaTiO3超薄膜在190~287 nm范围内具有明显的吸收,而在299 nm附近有强烈的吸收;超薄膜中的BaTiO3微粒存在氧空位,分子内部结构和晶体结构都发生了明显的变化。     

超晶格(Ge_2)_1/(GaAs)_m(110)(m=1-20)的电子能带结构研究

在紧束缚的框架下,利用重整化方法计算了超晶格(Ge_2)_1/(GaAs)_m(110)(m=1-20)的电子能带结构。计算结果表明,对不同m的超晶格(Ge_2)_1/(GaAs)_m(110) 都具有间接能隙结构,而且间接导带底的电子状态具有明显的二维特性。单层超晶格(Ge_2)_1/(GaAs)_1(110)具有非常小的间接和直接禁带宽度。当GaAs层的层数m逐渐增加时,导带的电子状态逐渐由三维特性向二维特性过渡,但是这一过渡对布里渊区内的各点,情况都各不相同。超晶格导带底的横向色散关系当m≥10以后,基本上不再随m的增加而改变。     

稀土氯化物溶液掺杂BaTiO3基PTC陶瓷性能研究

采用稀土氯化物(YCl3、LaCl3)溶液作为施主掺杂剂,在1350℃空气气氛下烧结制备一系列BaTiO3陶瓷样品。借助XRD、XRF等手段,研究了氯化物溶液掺杂对BaTiO3基PTC陶瓷性能的影响。结果显示,YCl3掺杂样品的最低室温电阻率为17?·cm、LaCl3掺杂的为47?·cm,且样品都具有一定的PTC效应。室温电阻率大幅降低的原因,是引入的Cl元素有一部分能进入晶格取代O位起施主作用。     

Growth of zinc- blende GaN on GaAs (100) substrates at high temperature using low-pressure MOVPE with a Low V/lll molar ratio

Zinc-blende GaN films were grown on GaAs (100) substrates by low-pressure metalorganic vapor phase epitaxy using trimethylgallium or triethylgallium and NH₃. Films grown at lower temperatures contained considerable amounts of carbon, but the carbon concentration was reduced in high temperature growth. When the film was grown at 950°C using triethylgallium and NH₃, its carbon concentration was on the order of 10¹⁷ cm⁻³. The crystalline and optical quality of zinc-blende GaN crystal also improved with high-temperature growth at a low V/III ratio using a thin buffer layer. The films exhibited only one sharp photoluminescence peak at 3.20 eV with a full width at half maximum as low as 70 meV at room temperature.     

On the Feasibility of Growing Pb[(Zn1/3Nb2/3)0.91Ti0.09]O3 Single Crystals

Pb[(Zn_1/3Nb_2/3)_0.91Ti_0.09]O₃ (PZNT91/9) single crystals were grown by two methods: from solution using PbO as a self‐fluxing agent (SC method) and directly from the melt without fluxing (MC method). In both growth methods, an allomeric Pb[(Mg_1/3‐Nb_2/3)_0.69Ti_0.31]O₃ (PMNT69/31) single crystal was used as a seed. X‐ray diffraction patterns of ground crystals showed that phase‐pure perovskite PZNT91/9 single crystals were successfully fabricated by the above two methods. The composition of the crystals obtained by both the SC and MC methods was analyzed using X‐ray fluorescence, which confirmed that the crystal composition is close to the nominal value, although volatilization of PbO and segregation during crystal growth are inevitable. The MC PZNT91/9 crystals exhibit excellent piezoelectric properties, with the piezoelectric constant, d₃₃, in the range of 1800–2200 pC N^–1. This value is comparable to that of the SC crystals. However, the MC crystals show an abnormal dielectric behavior. In contrast with the SC crystals, in the MC crystals a much broader dielectric peak appears in the dielectric response curves, accompanied by a much lower peak temperature of around 105 °C. Furthermore, frequency dispersion is apparent over a much wider temperature range (even more apparent than in pure relaxors), where a large, i.e., about 70 °C, full width at half maximum (FWHM) for the dielectric peaks is observed in the dielectric response. It is speculated that such an unusual phenomenon correlates with defects, microinhomogeneities, and polar regions in the as‐grown MC crystals. The origins of this abnormality have not been interpreted in detail until now. However, optical observation of the domain structure confirms that both the SC and MC crystals possess complex structural states.