偏轴磁控溅射法外延BiFeO3薄膜的介电性能与阻变效应

利用偏轴射频磁控溅射法, 在(001) SrTiO₃(STO)单晶基片上制备了Pt/BiFeO₃/La_0.5Sr_0.5CoO₃/STO (Pt/BFO/ LSCO/STO)异质结电容器。研究了BiFeO₃薄膜的结构和物理性能。原子力显微镜(AFM)和X射线衍射(XRD)分析表明: BFO薄膜结晶质量良好, 且为单相(00l)外延钙钛矿结构。介电性能测试结果发现: 在5 V驱动电压下, Pt/BFO/LSCO电容器呈现饱和的蝶形回线, 调谐率和介电损耗分别为14.1%和0.19。此外, 阻变机制研究表明: 在0→5→0 V正向电压和0→-5→0 V负向电压下, 阻变均为高阻向低阻转变规律, 呈现为铁电二极管的阻变开关行为。通过I-V曲线拟合, 得到0→5→0→-5 V时阻变机制为空间电荷限制电流陷阱能级的填充和脱陷, 而-5→0 V时符合界面限制的F-N隧穿机制。     

Forming-Free Unipolar Resistive Switching in BiFe0.95Co0.05O3 Films

We report the forming-free unipolar resistive switching effects in polycrystalline BiFe_0.95Co_0.05O₃ films which were spin-coated on ITO/glass substrates by a chemical solution deposition method. The resistive ratio of the high resistive state (HRS) to the low resistive state (LRS) is more than 2 orders of magnitude. The conduction of the HRS is dominated by the space-charge-limited conduction mechanism, while Ohmic behavior dominates the LRS, which suggests a filamentary conduction mechanism. The oxygen vacancies are considered to play an important role in forming the conducting filaments.     

Bipolar Resistive Switching of Single Gold-in-Ga(2)O(3) Nanowire

We have fabricated single nanowire chips on gold-in-Ga(2)O(3) core-shell nanowires using the electron-beam lithography techniques and realized bipolar resistive switching characteristics having invariable set and reset voltages. We attribute the unique property of invariance to the built-in conduction path of gold core. This invariance allows us to fabricate many resistive switching cells with the same operating voltage by simple depositing repetitive metal electrodes along a single nanowire. Other characteristics of these core-shell resistive switching nanowires include comparable driving electric field with other thin film and nanowire devices and a remarkable on/off ratio more than 3 orders of magnitude at a low driving voltage of 2 V. A smaller but still impressive on/off ratio of 10 can be obtained at an even lower bias of 0.2 V. These characteristics of gold-in-Ga(2)O(3) core-shell nanowires make fabrication of future high-density resistive memory devices possible.     

氧化镍溶胶-凝胶薄膜阻变特性研究

用溶胶-凝胶法在1TO基片上旋涂制备了NiO薄膜,通过对ITO/NiO薄膜/GaIn器件进行伏安特性测试,研究了溶胶浓度、退火、层数以及Cu掺杂等对其电学特性的影响.结果表明:所制备NiO薄膜具有良好可重复双极电阻开关特性.其中,2％Cu掺杂0.2 mol/L溶胶、双层、400℃退火1h制备的薄膜,阈值电压较低,约0.8 V;而开关比受以上因素影响不明显,约3× 102.分析发现薄膜高阻态的荷电输运符合空间电荷限制导电机制,而低阻态为欧姆特性,阻变开关机理为阈值电场及焦耳热导致的氧空位细丝的形成与断裂.     

Analysis of the Bipolar Resistive Switching Behavior of a Biocompatible Glucose Film for Resistive Random Access Memory

Resistive random access memory (RRAM) devices are fabricated through a simple solution process using glucose, which is a natural biomaterial for the switching layer of RRAM. The fabricated glucose‐based RRAM device shows nonvolatile bipolar resistive switching behavior, with a switching window of 10³. In addition, the endurance and data retention capability of glucose‐based RRAM exhibit stable characteristics up to 100 consecutive cycles and 10⁴ s under constant voltage stress at 0.3 V. The interface between the top electrode and the glucose film is carefully investigated to demonstrate the bipolar switching mechanism of the glucose‐based RRAM device. The glucose based‐RRAM is also evaluated on a polyimide film to verify the possibility of a flexible platform. Additionally, a cross‐bar array structure with a magnesium electrode is prepared on various substrates to assess the degradability and biocompatibility for the implantable bioelectronic devices, which are harmless and nontoxic to the human body. It is expected that this research can provide meaningful insights for developing the future bioelectronic devices.     

The Multiferroic Properties of Zn Doped BiFeO3 Thin Films

BiFe_1?x Zn _x O₃ thin films (x=0, 0.05, 0.1, 0.2, and 0.3) were prepared on LaNiO₃ buffered surface oxidized Si substrates using pulsed laser deposition. The effect of Zn dopants on the structural, electrical, magnetic properties, and exchange bias on NiFe layers for BiFeO₃ thin films has been systematically investigated. X ray diffraction and Raman spectra show that BiFe_1?x Zn _x O₃ thin films have polycrystalline rhombohedral structure with Zn concentration smaller than 5 %, and a large amount of the impurity phase of Bi₂Fe₄O₉ with further increasing Zn concentration above 10 %. With 5 % Zn doping in BiFeO₃, the film quality is improved with larger grain size, better ferroelectricity, and larger magnetization. The exchange bias of BiFe_1?x Zn _x O₃ on a 3.6 nm thick NiFe layer drastically decreases with increasing Zn doping concentration, and totally disappears with the Zn concentration larger than 10 %, indicating that the canted antiferromagnetic spin structure of BiFeO₃ was suppressed with increasing the Zn doping concentration.     

Bi2O3薄膜的制备及其电阻开关特性的研究

电阻式存储器由于具有众多的优点有望成为最有前景的下一代高速非挥发性存储器的选择之一.实验利用射频磁控溅射法在重掺硅上沉积了Bi2O3薄膜,并对该薄膜的结晶状态和Au/Bi2O3/n+Si/Al结构的电阻开关特性进行了研究.XRD分析结果表明,射频磁控溅射法沉积所得的Bi2O3薄膜结晶性能好,(201)取向明显.I-V曲线测试结果表明,Au/Bi2O3/n+Si/Al结构具有单极性电阻开关特性.通过对不同厚度Bi2O3薄膜的Au/Bi2O3/n+Si/Al结构I-V特性比较发现,随着薄膜厚度的增加,电阻开关的Forming、Set和Reset阈值电压均随之增加.对于Bi2O3薄膜厚度为31.2 nm的Au/Bi2O3/n+Si/Al结构,其Forming、Set和Reset阈值电压均低于4 V,符合存储器低电压工作的要求.     

Resistive Switching Behavior in Ferroelectric Heterostructures

Resistive random‐access memory (RRAM) is a promising candidate for next‐generation nonvolatile random‐access memory protocols. The information storage in RRAM is realized by the resistive switching (RS) effect. The RS behavior of ferroelectric heterostructures is mainly controlled by polarization‐dominated and defect‐dominated mechanisms. Under certain conditions, these two mechanisms can have synergistic effects on RS behavior. Therefore, RS performance can be effectively improved by optimizing ferroelectricity, conductivity, and interfacial structures. Many methods have been studied to improve the RS performance of ferroelectric heterostructures. Typical approaches include doping elements into the ferroelectric layer, controlling the oxygen vacancy concentration and optimizing the thickness of the ferroelectric layer, and constructing an insertion layer at the interface. Here, the mechanism of RS behavior in ferroelectric heterostructures is briefly introduced, and the methods used to improve RS performance in recent years are summarized. Finally, existing problems in this field are identified, and future development trends are highlighted.     

Iodine Vacancy Redistribution in Organic–Inorganic Halide Perovskite Films and Resistive Switching Effects

Organic–inorganic halide perovskite (OHP) materials, for example, CH₃NH₃PbI₃ (MAPbI₃), have attracted significant interest for applications such as solar cells, photodectors, light‐emitting diodes, and lasers. Previous studies have shown that charged defects can migrate in perovskites under an electric field and/or light illumination, potentially preventing these devices from practical applications. Understanding and control of the defect generation and movement will not only lead to more stable devices but also new device concepts. Here, it is shown that the formation/annihilation of iodine vacancies (V_I's) in MAPbI₃ films, driven by electric fields and light illumination, can induce pronounced resistive switching effects. Due to a low diffusion energy barrier (≈0.17 eV), the V_I's can readily drift under an electric field, and spontaneously diffuse with a concentration gradient. It is shown that the V_I diffusion process can be suppressed by controlling the affinity of the contact electrode material to I^? ions, or by light illumination. An electrical‐write and optical‐erase memory element is further demonstrated by coupling ion migration with electric fields and light illumination. These results provide guidance toward improved stability and performance of perovskite‐based optoelectronic systems, and can lead to the development of solid‐state devices that couple ionics, electronics, and optics.     

PLD法制备TiO2薄膜及电阻转变特性研究

采用脉冲激光沉积法（PLD）,以Pt(111)/Ti/SiO₂/Si为衬底,制备了具有电阻转变特性的TiO₂薄膜.X射线衍射（XRD）分析未发现明显的TiO₂结晶峰,薄膜呈纳米晶或非晶态.扫描电子显微镜（SEM）及原子力显微镜（AFM）分析表明,TiO₂薄膜表面平整、光滑致密.电学测试结果表明,TiO₂薄膜具有明显的单极性电阻转变特性,高低阻态比值达到10⁴.高阻态下薄膜的导电过程可用空间电荷限制电流模型解释,过程中存在软击穿现象.在此基础上,对薄膜中丝导电通道的产生及熔断过程进行了初步分析.     

Electric and Mechanical Switching of Ferroelectric and Resistive States in Semiconducting BaTiO3–δ Films on Silicon

Materials that can couple electrical and mechanical properties constitute a key element of smart actuators, energy harvesters, or many sensing devices. Within this class, functional oxides display specific mesoscale responses which often result in great sensitivity to small external stimuli. Here, a novel combination of molecular beam epitaxy and a water‐based chemical‐solution method is used for the design of mechanically controlled multilevel device integrated on silicon. In particular, the possibility of adding extra functionalities to a ferroelectric oxide heterostructure by n‐doping and nanostructuring a BaTiO₃ thin film on Si(001) is explored. It is found that the ferroelectric polarization can be reversed, and resistive switching can be measured, upon a mechanical load in epitaxial BaTiO_3?δ /La_0.7Sr_0.3MnO₃/SrTiO₃/Si columnar nanostructures. A flexoelectric effect is found, stemming from substantial strain gradients that can be created with moderate loads. Simultaneously, mechanical effects on the local conductivity can be used to modulate a nonvolatile resistive state of the BaTiO_3?δ heterostructure. As a result, three different configurations of the system become accessible on top of the usual voltage reversal of polarization and resistive states.     

Nanoscale Topotactic Phase Transformation in SrFeOx Epitaxial Thin Films for High‐Density Resistive Switching Memory

Resistive switching (RS) memory has stayed at the forefront of next‐generation nonvolatile memory technologies. Recently, a novel class of transition metal oxides (TMOs), which exhibit reversible topotactic phase transformation between insulating brownmillerite (BM) phase and conducting perovskite (PV) phase, has emerged as promising candidate materials for RS memories. Nevertheless, the microscopic mechanism of RS in these TMOs is still unclear. Furthermore, RS devices with simultaneously high density and superior memory performance are yet to be reported. Here, using SrFeO_x as a model system, it is directly observed that PV SrFeO₃ nanofilaments are formed and extend almost through the BM SrFeO_2.5 matrix in the ON state and are ruptured in the OFF state, unambiguously revealing a filamentary RS mechanism. The nanofilaments are ≈10 nm in diameter, enabling to downscale Au/SrFeO_x/SrRuO₃ RS devices to the 100 nm range for the first time. These nanodevices exhibit good performance including ON/OFF ratio as high as ≈10⁴, retention time over 10⁵ s, and endurance up to 10⁷ cycles. This study significantly advances the understanding of the RS mechanism in TMOs exhibiting topotactic phase transformation, and it also demonstrates the potential of these materials for use in high‐density RS memories.     

Solid-Phase Epitaxy of BiFeO3 Films with Magnetoelectric Properties on Sapphire

Technical Physics Letters - The ferroelectric domain structure has been investigated in bismuth-ferrite rhombohedral phase films prepared on the rhombohedral plane of sapphire by solid-phase...     

不同厚度BiFeO_3薄膜的光电性质

利用溶胶-凝胶法制备BiFeO_3靶材,通过射频磁控溅射法在玻璃衬底上制备不同厚度的BiFeO_3薄膜,并研究不同厚度对其微观结构、铁电性、漏电流特性及薄膜折射率和消光系数的的影响。结果表明,随着薄膜厚度的增加,铁电性变好,薄膜折射率和消光系数增大,当电压较低时(U1/22),Poole-Frenkel机制在漏电特性中起主导作用,当电压较高(1/U0.25)时,FN隧穿起主导作用;通过拟合图谱计算出不同沉积时间的薄膜厚度及表面层厚度,结果与原子力显微镜测的数值基本一致。