1.5 V 1 K-CMOS-RAM with only 8 pins

A 256-bit/spl times/4-bit static RAM working on a supply voltage down to 1.2 V is described. A serial interface for the address and the data with a 4-bit bus reduces the pincount of the RAM to only 8. Special design techniques to reach the design goal-very low power at a reasonable circuit speed-are discussed in detail. The device is fabricated in a low power silicon gate CMOS process. An operating power of 500 /spl mu/W/MHz and a standby power of less than 1 /spl mu/W at 1.5 V supply voltage was achieved. With this serial interface a cycle time of 1 /spl mu/s at 1.5 V was measured.     

SODEL FET: novel channel and source/drain profile engineering schemes by selective Si epitaxial growth technology

In this paper, novel channel and source/drain profile engineering schemes are proposed for sub-50-nm bulk CMOS applications. This device, referred to as the silicon-on-depletion layer FET (SODEL FET), has the depletion layer beneath the channel region, which works as an insulator like a buried oxide in a silicon-on-insulator MOSFET. Thanks to this channel structure, junction capacitance (C/sub j/) has been reduced in SODEL FET, i.e., C/sub j/ (area) was /spl sim/0.73 fF//spl mu/m/sup 2/ both in SODEL nFET and pFET at Vbias =0.0 V. The body effect coefficient /spl gamma/ is also reduced to less than 0.02 V/sup 1/2/. Nevertheless, current drives of 886 /spl mu/A//spl mu/m (I/sub off/=15 nA//spl mu/m) in nFET and -320 /spl mu/A//spl mu/m (I/sub off/=10 nA//spl mu/m) in pFET have been achieved in 70-nm gate length SODEL CMOS with |V/sub dd/|=1.2 V. New circuit design schemes are also proposed for high-performance and low-power CMOS applications using the combination of SODEL FETs and bulk FETs on the same chip for 90-nm-node generation and beyond.     

High performance 35 nm gate length CMOS with NO oxynitride gate dielectric and Ni salicide

The 35 nm gate length CMOS devices with oxynitride gate dielectric and Ni salicide have been fabricated to study the feasibility of higher performance operation. Nitrogen concentration in gate oxynitride was optimized to reduce gate current I/sub g/ and to prevent boron penetration in the pFET. The thermal budget in the middle of the line (MOL) process was reduced enough to realize shallower junction depth in the S/D extension regions and to suppress gate poly-Si depletion. Finally, the current drives of 676 /spl mu/A//spl mu/m in nFET and 272 /spl mu/A//spl mu/m in pFET at V/sub dd/=0.85 V (at I/sub off/=100 nA//spl mu/m) were achieved and they are the best values for 35 nm gate length CMOS reported to date.     

Effect of tilt angle variations in a halo implant on V/sub th/ values for 0.14-/spl mu/m CMOS devices

Sensitivity of critical transistor parameters to halo implant tilt angle for 0.14-/spl mu/m CMOS devices was investigated. V/sub th/ sensitivity was found to be 3% per tilt degree. A tilt angle mismatch between two serial ion implanters used in manufacturing was detected by tracking V/sub th/ performance for 0.14-/spl mu/m production lots. Even though individual implanters may be within tool specifications for tilt angle control (/spl plusmn/0.5/spl deg/ for our specific tool type), the relative mismatch could be as large as 1/spl deg/, and therefore, result in a V/sub th/ mismatch of over 3% from nominal. The V/sub th/ mismatch results are in qualitative agreement with simulation results using SUPREM and MEDICI software.     

A CMOS voltage reference based on weighted /spl Delta/V/sub GS/ for CMOS low-dropout linear regulators

A CMOS voltage reference, which is based on the weighted difference of the gate-source voltages of an NMOST and a PMOST operating in saturation region, is presented. The voltage reference is designed for CMOS low-dropout linear regulators and has been implemented in a standard 0.6-/spl mu/m CMOS technology (V/sub thn//spl ap/|V/sub thp/|/spl ap/0.9 V at 0/spl deg/C). The occupied chip area is 0.055 mm/sup 2/. The minimum supply voltage is 1.4 V, and the maximum supply current is 9.7 /spl mu/A. A typical mean uncalibrated temperature coefficient of 36.9 ppm//spl deg/C is achieved, and the typical mean line regulation is /spl plusmn/0.083%/V. The power-supply rejection ratio without any filtering capacitor at 100 Hz and 10 MHz are -47 and -20 dB, respectively. Moreover, the measured noise density with a 100-nF filtering capacitor at 100 Hz is 152 nV//spl radic/(Hz) and that at 100 kHz is 1.6 nV//spl radic/(Hz).     

Characterization of 1.9- and 1.4-nm ultrathin gate oxynitride by oxidation of nitrogen-implanted silicon substrate

For gate oxide thinned down to 1.9 and 1.4 nm, conventional methods of incorporating nitrogen (N) in the gate oxide might become insufficient in stopping boron penetration and obtaining lower tunneling leakage. In this paper, oxynitride gate dielectric grown by oxidation of N-implanted silicon substrate has been studied. The characteristics of ultrathin gate oxynitride with equivalent oxide thickness (EOT) of 1.9 and 1.4 nm grown by this method were analyzed with MOS capacitors under the accumulation conditions and compared with pure gate oxide and gate oxide nitrided by N/sub 2/O annealing. EOT of 1.9- and 1.4-nm oxynitride gate dielectrics grown by this method have strong boron penetration resistance, and reduce gate tunneling leakage current remarkably. High-performance 36-nm gate length CMOS devices and CMOS 32 frequency dividers embedded with 57-stage/201-stage CMOS ring oscillator, respectively, have been fabricated successfully, where the EOT of gate oxynitride grown by this method is 1.4 nm. At power supply voltage V/sub DD/ of 1.5 V drive current Ion of 802 /spl mu/A//spl mu/m for NMOS and -487 /spl mu/A//spl mu/m for PMOS are achieved at off-state leakage I/sub off/ of 3.5 nA//spl mu/m for NMOS and -3.0 nA//spl mu/m for PMOS.     

A new CMOS pixel structure for low-dark-current and large-array-size still imager applications

A pixel structure for still CMOS imager application called the pseudoactive pixel sensor (PAPS) is proposed and analyzed in this paper. It has the advantages of a low dark current, high signal-to-noise ratio, and a high fill factor over the conventional passive pixel sensor imager or active pixel sensor imager. The readout circuit called the zero-bias column buffer-direct-injection structure is also proposed to suppress both the dark current of the photodiode and the leakage current of row switches by keeping both biases of photodiode and the parasitic p-n junction in the column bus at or near zero voltage. The improved double delta sampling circuits are also used to suppress fixed pattern noise, clock feedthrough noise, and channel charge injection. An experimental chip of the proposed PAPS CMOS imager with the format of 352/spl times/288 (CIF) has been fabricated by using a 0.25-/spl mu/m single-poly-five-level-metal (1P5M) n-well CMOS process. The pixel size is 5.8 /spl mu/m/spl times/5.8 /spl mu/m. The pixel readout speed is from 100 kHz to 10 MHz, corresponding to the maximum frame rate above 30 frames/s. The proposed still CMOS imager has a fill factor of 58%, chip size of 3660 /spl mu/m/spl times/3500 /spl mu/m, and power dissipation of 24 mW under the power supply of 3.3 V. The experimental chip has successfully demonstrated the function of the proposed new PAPS structure. It can be applied in the design of large-array-size still CMOS imager systems with a low dark current and high resolution.     

0.5-V analog circuit techniques and their application in OTA and filter design

We present design techniques that make possible the operation of analog circuits with very low supply voltages, down to 0.5 V. We use operational transconductance amplifier (OTA) and filter design as a vehicle to introduce these techniques. Two OTAs, one with body inputs and the other with gate inputs, are designed. Biasing strategies to maintain common-mode voltages and attain maximum signal swing over process, voltage, and temperature are proposed. Prototype chips were fabricated in a 0.18-/spl mu/m CMOS process using standard 0.5-V V/sub T/ devices. The body-input OTA has a measured 52-dB DC gain, a 2.5-MHz gain-bandwidth, and consumes 110 /spl mu/W. The gate-input OTA has a measured 62-dB DC gain (with automatic gain-enhancement), a 10-MHz gain-bandwidth, and consumes 75 /spl mu/W. Design techniques for active-RC filters are also presented. Weak-inversion MOS varactors are proposed and modeled. These are used along with 0.5-V gate-input OTAs to design a fully integrated, 135-kHz fifth-order elliptic low-pass filter. The prototype chip in a 0.18-/spl mu/m CMOS process with V/sub T/ of 0.5-V also includes an on-chip phase-locked loop for tuning. The 1-mm/sup 2/ chip has a measured dynamic range of 57 dB and draws 2.2 mA from the 0.5-V supply.     

A low-power 22-bit incremental ADC

This paper describes a low-power 22-bit incremental ADC, including an on-chip digital filter and a low-noise/low-drift oscillator, realized in a 0.6-/spl mu/m CMOS process. It incorporates a novel offset-cancellation scheme based on fractal sequences, a novel high-accuracy gain control circuit, and a novel reduced-complexity realization for the on-chip sinc filter. The measured output noise was 0.25 ppm (2.5 /spl mu/V/sub RMS/), the DC offset 2 /spl mu/V, the gain error 2 ppm, and the INL 4 ppm. The chip operates with a single 2.7-5 V supply, and draws only 120 /spl mu/A current during conversion.     

Design and anaylsis of a 2.5-Gbps optical receiver analog front-end in a 0.35-/spl mu/m digital CMOS technology

This paper presents the design of an optical receiver analog front-end circuit capable of operating at 2.5 Gbit/s. Fabricated in a low-cost 0.35-/spl mu/m digital CMOS process, this integrated circuit integrates both transimpedance amplifier and post limiting amplifier on a single chip. In order to facilitate high-speed operations in a low-cost CMOS technology, the receiver front-end has been designed utilizing several enhanced bandwidth techniques, including inductive peaking and current injection. Moreover, a power optimization methodology for a multistage wide band amplifier has been proposed. The measured input-referred noise of the optical receiver is about 0.8 /spl mu/A/sub rms/. The input sensitivity of the receiver front-end is 16 /spl mu/A for 2.5-Gbps operation with bit-error rate less than 10/sup -12/, and the output swing is about 250 mV (single-ended). The front-end circuit drains a total current of 33 mA from a 3-V supply. Chip size is 1650 /spl mu/m/spl times/1500 /spl mu/m.     

A technique to improve the drive current of high-voltage I/O transistors in digital CMOS technologies

By combining a 0.12-/spl mu/m-long 1.2-V thin-oxide transistor with a 0.22-/spl mu/m-long 3.3-V thick-oxide transistor in a 0.13-/spl mu/m CMOS process, a composite MOS transistor structure with a drawn gate length of 0.34 /spl mu/m is realized. Measurements show that at V/sub GS/=1.2 V and V/sub DS/=3.3 V, the composite transistor has more than two times the drain current of the minimum channel length (0.34 /spl mu/m) 3.3-V thick-oxide transistor, while having the same breakdown voltage (V/sub BK/) as the thick-oxide transistor. Exploiting these, it should be possible to implement 3.3-V I/O transistors with better combination of drive current, threshold voltage (V/sub T/) and breakdown voltage in conventional CMOS technologies without adding any process modifications.     

Normal optical flow measurement on CMOS APS imager

A 92/spl times/52 active pixel sensor (APS) for dense normal flow estimation is presented. The sensor combines imaging and processing on the same chip efficiently. The algorithm computes partial derivatives with respect to time and space and uses their ratio to compute normal flow velocity. The chip, which has been fabricated in a CMOS 0.5 /spl mu/m process, occupies an area of 4.5 mm/sup 2/ and consumes 2.6 mW power at V/sub dd/=5 V.     

A 1.8-V 10-Gb/s fully integrated CMOS optical receiver analog front-end

A fully integrated 10-Gb/s optical receiver analog front-end (AFE) design that includes a transimpedance amplifier (TIA) and a limiting amplifier (LA) is demonstrated to require less chip area and is suitable for both low-cost and low-voltage applications. The AFE is fabricated using a 0.18-/spl mu/m CMOS technology. The tiny photo current received by the receiver AFE is amplified to a differential voltage swing of 400 mV/sub (pp)/. In order to avoid off-chip noise interference, the TIA and LA are dc-coupled on the chip instead of ac-coupled though a large external capacitor. The receiver front-end provides a conversion gain of up to 87 dB/spl Omega/ and -3dB bandwidth of 7.6 GHz. The measured sensitivity of the optical receiver is -12dBm at a bit-error rate of 10/sup -12/ with a 2/sup 31/-1 pseudorandom test pattern. Three-dimensional symmetric transformers are utilized in the AFE design for bandwidth enhancement. Operating under a 1.8-V supply, the power dissipation is 210 mW, and the chip size is 1028 /spl mu/m/spl times/1796 /spl mu/m.     

A 0.5-V 25-MHz 1-mW 256-kb MTCMOS/SOI SRAM for solar-power-operated portable personal digital equipment - sure write operation by using step-down negatively overdriven bitline scheme

Multithreshold-voltage CMOS (MTCMOS) technology has a great advantage in that it provides high-speed operation with low supply voltages of less than 1 V. A logic gate with low-V/sub th/ MOSFETs has a high operating speed, while a low-leakage power switch with a high-V/sub th/ MOSFET eliminates the off-leakage current during sleep time. By using MTCMOS circuits and silicon-on-insulator (SOI) devices, the authors have developed a 256-kb SRAM for solar-power-operated digital equipment. A double-threshold-voltage MOSFET (DTMOS) is adopted for the power switch to further reduce the off leakage. As regards the SRAM core design, we consider a hybrid configuration consisting of high-V/sub th/ and low-V/sub th/ MOSFETs (that is, multi-V/sub th/ CMOS). A new memory cell with a separate read-data path provides a larger readout current without degrading the static noise margin. A negatively overdriven bitline scheme guarantees sure write operation at ultralow supply voltages close to 0.5 V. In addition, a charge-transfer amplifier integrated with a selector and data latches for intrabus circuitry are installed to enhance the operating speed and/or reduce power dissipation. A 32K-word /spl times/ 8-bit SRAM chip, fabricated with the 0.35-/spl mu/m multi-V/sub th/ CMOS/SOI process, has successfully operated at 25 MHz under typical conditions with 0.5-V (SRAM core) and 1-V (I/O buffers) power supplies. The power dissipation during sleep time is less than 0.4 /spl mu/W and that for 25-MHz operation is 1 mW, excluding that of the I/O buffers.     

Low-voltage high performance compact all cascode CMOS current mirror

A high performance and compact current mirror with extremely low input and high output resistances (R/sub in//spl sim/0.01/spl Omega/, R/sub out//spl sim/10 G/spl Omega/), high copying accuracy, very low input and output voltage requirements (V/sub in/, V/sub out//spl ges/V/sub DSsat/), high bandwidth (200 MHz using a 0.5 /spl mu/m CMOS technology) and low settling time (25 ns) is proposed. Simulations and experimental results are shown that validate the circuit.     

A Micropower CMOS-Instrumentation Amplifier

A CMOS switched capacitor instrumentation amplifier is presented. Offset is reduced by an auto-zero technique and effects due to charge injection are attenuated by a special amplifier configuration. The circuit which is realized in a 4-/spl mu/m double poly process has an offset (/spl tau/) of 370 /spl mu/V, an rms input referred integrated noise (0.5 -f/sub c//2) of 79 /spl mu/V, and consumes only 21 /spl mu/W (f/sub c/ = 8 kHz, V/sub DD/ = 3 V).     

Two-phase boosted voltage generator for low-voltage DRAMs

A two-phase boosted voltage (V/sub PP/) generator circuit was proposed for use in gigabit DRAMs. It reduced the maximum gate-oxide voltage of pass transistor and the lower limit of supply voltage to V/sub PP/ and V/sub TN/, respectively, while those for the conventional charge-pump circuit are V/sub PP/+V/sub DD/ and 1.5 V/sub TN/ respectively. Also, the pumping current was increased in the new circuit. The newly proposed two-phase V/sub PP/ charge-pump circuit worked successfully at V/sub DD/ down to 0.8 V by eliminating the threshold voltage loss of the control pulse generator and was tested successfully in a 0.16-/spl mu/m test chip using triple-well CMOS technology.     

Characterization of CMOS Devices for VLSI

CMOS bulk and SOS technologies are discussed for VLSI with emphasis on static and dynamic characteristics of two-input NAND gates. Olpthnum performance (minimum figure of merit FM= f/sub pd/P/sub d/) is obtained for a CMOS/SOS two-input NAND gate (FO = 2, C/sub L/ = 22 fF) with an electrical channel length L = 0.75 /spl mu/m, channel width W= 5.0 /spl mu/m, and oxide thickness X/sub O/ = 450 /spl Aring/with V/sub DD/ = 3.0 V, to yield t/sub pd/ = 400 ps and P/sub d/ = 250 /spl mu/W (t/sub pd/P/sub d/ = 100 fJ) at room temperature. Bulk technology performs within a factor of 2 of SOS for t/sub pd/ and P/sub d/. CMOS technologies offer subnanosecond propagation delays, similar to ECL bipolar, at the low submilliwatt power levels of CMOS. An analytical expression for t/sub pd/ describes the performance of two-input NAND gates in terms of device modeling and fabrication parameters. Such an expression provides a hierarchal modeling approach to characterize mini-cells for VLSI.     

A CMOS analog front-end IC for portable EEG/ECG monitoring applications

A new digital programmable CMOS analog front-end (AFE) IC for measuring electroencephalograph or electrocardiogram signals in a portable instrumentation design approach is presented. This includes a new high-performance rail-to-rail instrumentation amplifier (IA) dedicated to the low-power AFE IC. The measurement results have shown that the proposed biomedical AFE IC, with a die size of 4.81 mm/sup 2/, achieves a maximum stable ac gain of 10 000 V/V, input-referred noise of 0.86 /spl mu/ V/sub rms/ (0.3 Hz-150 Hz), common-mode rejection ratio of at least 115 dB (0-1 kHz), input-referred dc offset of less than 60 /spl mu/V, input common mode range from -1.5 V to 1.3 V, and current drain of 485 /spl mu/A (excluding the power dissipation of external clock oscillator) at a /spl plusmn/1.5-V supply using a standard 0.5-/spl mu/m CMOS process technology.     

A reprogrammable EDGE baseband and multimedia handset SoC with 6-mbit embedded DRAM

A CMOS EDGE baseband and multimedia handset SoC features a dual core (microcontroller and DSP) architecture together with all the necessary interface logic and hardware accelerators interconnected by a multi-layer bus. The DSP memory hierarchy features an instruction cache coupled to a 6-Mbit embedded DRAM instruction memory allowing in the field software flexibility (for example dynamic upgrade of DSP software), while minimizing power and area (closely matching a ROM based solution). The chip is implemented in a 130-nm 6-metal layer CMOS process and is packaged in a 12 /spl times/ 12 ball-grid array. Full chip standby mode current is 690 /spl mu/A (with data retention), resulting in a 500 hour complete GSM/EDGE terminal autonomy.