钴掺杂对氧化镍薄膜电致变色性能的影响

采用恒电位法在FTO玻璃上沉积Co与Ni摩尔比为0.16:1的薄膜,用X射线衍射仪、扫描电镜和能谱仪分析了膜的成分、结构和形貌,用紫外-可见分光光度计表征了膜的透光性能,用循环伏安法表征了膜的电化学稳定性和可逆性,用双电位阶跃法表征了膜的开关响应时间,研究了钴掺杂对氧化镍薄膜电致变色性能的影响。结果表明,钴掺杂使NiO薄膜颗粒更加细小和均匀,提高了薄膜在可见光波段着色态与消色态之间的透光率差值,降低了电致变色反应的工作电压,有利于薄膜在电致变色过程的可逆性,缩短了着色响应时间。     

离子液体电沉积制备Cu掺杂NiO电致变色薄膜及其性能EI北大核心

NiO是一种常见的电致变色材料,元素掺杂改性是改善NiO薄膜电致变色性能的重要方法。以离子液体为介质,采用电沉积法制备Cu掺杂NiO薄膜,并研究Cu元素掺杂对NiO薄膜电致变色性能的影响。结果表明:Cu掺杂NiO薄膜的电致变色性能相较于纯NiO薄膜有明显提升。Cu掺杂含量为6%(原子分数,下同)时,薄膜光调制范围最大,为54.7%,着色效率最高,为61.54 cm^(2)/C,Cu掺杂含量为12%时,薄膜的着褪色响应时间最短,分别达到2.7 s与2.6 s。薄膜的物相结构为面心立方晶相Ni_(1-x)Cu_(x)O,由纳米粒子堆积而成,表面存在大量利于离子扩散的孔隙。     

NiO/PB复合电致变色薄膜的制备及其性能研

采用水热法制备了垂直生长的氧化镍(NiO)纳米片薄膜, 并利用电沉积法将普鲁士蓝(PB)负载到NiO纳米片薄膜上, 制备了新型的NiO/PB复合电致变色薄膜。利用X射线衍射仪(XRD)、场发射扫描电镜(SEM)对样品的晶型以及微观形貌进行了表征, 采用紫外-可见光光度计以及电化学工作站对NiO/PB复合薄膜的电化学和电致变色性能进行了研究和表征。结果表明: NiO/PB复合电致变色薄膜具有多孔结构和较大的比表面积, 可以增大电解质与电极材料的接触面积。PB成功负载到NiO薄膜表面, 使NiO/PB复合薄膜表现出较大的电流密度。相比于单层NiO薄膜, NiO/PB复合薄膜表现出更好的电致变色性能, 其光调制范围可以达到46%, 着色效率为141 cm²/C, 并且其着色时间可以缩短到5 s, 褪色时间为6 s。     

制备NiO电致变色薄膜的低电压反应离子镀工艺研究

采用低电压反应离子镀工艺制备NiO电致变色薄膜,重点研究不同的氧气分压对NiO薄膜的电致变色特性的影响,通过与普通电子束蒸发工艺制备的NiO薄膜进行物理性能和电致变色性能的比较,以及在塑料基板上制备NiO电致变色薄JP2 膜的讨论,总结出低电压反应离子镀技术制备NiO电致变色薄膜的工艺和优势.     

NiO/PB复合电致变色薄膜的制备及其性能研究

采用水热法制备了垂直生长的氧化镍(NiO)纳米片薄膜,并利用电沉积法将普鲁士蓝(PB)负载到NiO纳米片薄膜上,制备了新型的NiO/PB复合电致变色薄膜。利用X射线衍射仪(XRD)、场发射扫描电镜(SEM)对样品的晶型以及微观形貌进行了表征,采用紫外–可见光光度计以及电化学工作站对NiO/PB复合薄膜的电化学和电致变色性能进行了研究和表征。结果表明:NiO/PB复合电致变色薄膜具有多孔结构和较大的比表面积,可以增大电解质与电极材料的接触面积。PB成功负载到NiO薄膜表面,使NiO/PB复合薄膜表现出较大的电流密度。相比于单层NiO薄膜,NiO/PB复合薄膜表现出更好的电致变色性能,其光调制范围可以达到46%,着色效率为141 cm~2/C,并且其着色时间可以缩短到5 s,褪色时间为6 s。     

钛掺杂三氧化钨薄膜结构与电致变色性能研究

通过射频溅射法, 常温下制备了纯相WO₃和Ti掺杂WO₃薄膜, 采用XRD、SEM、Raman、电化学工作站、紫外-可见-近红外分光光度计等对薄膜的微观结构、循环稳定性、光学性能进行了表征和分析。研究发现: 钛掺杂对WO₃薄膜的表面形貌和光学常数影响不明显, 但使薄膜的晶化温度升高。电化学测试结果表明, Ti掺杂可以提高离子在薄膜中注入/抽出的可逆性, 提高薄膜的循环稳定性, 同时薄膜的响应速度和光学调制性能也得到提高, 掺杂后薄膜着色态和漂白态的响应时间分别由9.8、3.5 s减小为8.4、2.7 s, 因此Ti掺杂WO₃薄膜具有更好的电致变色性能。     

四元掺杂电致变色薄膜材料的制备及其性能的研究

用溶胶 凝胶法首次制备了组分为 WO3、TiO2、CrO3、PEO的四元掺杂电致变色薄膜材料,得到了较佳的组分配比,用 TG DTA,XRD 研究薄膜材料的结构变化,推断出最佳热处理温度。循环伏安和可见光透过率测试表明该薄膜材料有较好的电化学性能和阴极着色效应,可以作为电致变色器件中的阴极电致变色层薄膜材料。     

钒掺杂氧化钨纳米线的制备与电致变色/储能性能

与Nb同族的V元素离子半径略小于W离子的半径，掺杂V元素可以提高氧化钨纳米线的离子扩散速率和结构稳定性。采用磁控溅射法和水热法制备V掺杂氧化钨纳米线薄膜，并通过场发射扫描电子显微镜、X射线衍射、透射电子显微镜、X射线光电子能谱和电化学测量装置探究不同V掺杂量对样品形态、成分以及电致变色性能等方面的影响。结果表明：通过适当的V掺杂，样品的光学性能得到了提升。当V掺杂量为0.1%(原子分数)时，氧化钨薄膜表现出最佳的电致变色性能。晶面间距、V—O键的加强和氧空位浓度等因素是影响氧化钨薄膜电致变色性能的关键因素。本工作将为V掺杂氧化钨纳米线结构作为电致变色材料和器件的研究提供有益参考。     

钒掺杂氧化钨纳米线的制备与电致变色/储能性能EI北大核心

与Nb同族的V元素离子半径略小于W离子的半径,掺杂V元素可以提高氧化钨纳米线的离子扩散速率和结构稳定性。采用磁控溅射法和水热法制备V掺杂氧化钨纳米线薄膜,并通过场发射扫描电子显微镜、X射线衍射、透射电子显微镜、X射线光电子能谱和电化学测量装置探究不同V掺杂量对样品形态、成分以及电致变色性能等方面的影响。结果表明:通过适当的V掺杂,样品的光学性能得到了提升。当V掺杂量为0.1%(原子分数)时,氧化钨薄膜表现出最佳的电致变色性能。晶面间距、V—O键的加强和氧空位浓度等因素是影响氧化钨薄膜电致变色性能的关键因素。本工作将为V掺杂氧化钨纳米线结构作为电致变色材料和器件的研究提供有益参考。     

电子束蒸发制备氧化钨、氧化镍薄膜的电致变色性能

电致变色(EC)材料在外加电压作用下能可逆地改变其光学性能.其中氧化钨与氧化镍是典型的电致变色用材料.本文用电子束蒸发的方法在ITO玻璃基片上制备了此两种薄膜,研究了热处理工艺对薄膜结构与电致变色性能的影响.电致变色性能由电化学方法测试.封装的半固态智能窗器件具有很好的电致变色性能.     

Nanostructured nickel oxide films prepared by chemical vapor deposition and their electrochromic properties

The influence of the deposition conditions on the structural features and electrochromic properties of nickel oxide (NiO) films prepared by chemical vapor deposition has been investigated. NiO films have been prepared on fluorine doped tin oxide (FTO) coated glass substrates from nickel-acetylacetonate precursor and their electrochromic properties have been studied by cyclic voltammetry in a 0.1 M KOH solution at room temperature. Films exhibiting only the NiO phase were obtained at deposition temperatures higher than 450 degrees C in a wide range of reactor pressures (0.13 to 66.6 kPa). Particularly, NiO films prepared at 500-550 degrees C from 0.13 to 53.3 kPa are transparent in nature and exhibit a crystallite size varying from 10 to 60 nm. An appreciable anodic electrochromic change from transparent to black coloured resulted from a very porous surface morphology and film thickness of about 3.5 microm. The electrochromic change was maintained over 3000 switching cycles. Nanostructured 3.5 microm-thick NiO films showed a maximum difference in optical transmittance of about 40% in the near-infrared region. These results make the nanostructured NiO films comparables with those prepared by other deposition techniques.     

Screen‐printed gold thick films for electrochemical sensor applications

Screen‐printed gold electrodes have been assembled in Low Temperature Co‐fired Ceramics technology and characterised and tested for applications in electrochemical analytics. They were investigated by scanning electron microscopy and by cyclovoltammetry in sulphuric acid and of typical redox couples such as hexacyanoferrate and quinhydrone. The electrodes differ in surface morphology, microstructure with the formation of preferential crystal orientation and exhibit different real surface sizes depending on the chosen gold paste. After pre‐treatment in sulphuric acid an almost reversible behaviour can be achieved however differences between the thick films occur at high scan rates and especially with quinhydrone. Differences in the sensitivity of the thick films at low analyte concentration can be explained by their surface properties.     

用直流溅射工艺制备的氧化铌薄膜的性能

采用直流反应溅射工艺制备了氧化铌（Nb2O5)薄膜，用XRD、AFM、AES和循环伏安等测试手段分析并研究了薄膜的组成、结构、表面形貌和电致变色性能间的关系。结果表明：在基础加热条件下可获得晶态TT－Nb2O5薄膜，沉积气压较高时的薄膜具有沿（100）面定向生长、结构相对较为疏松的柱状结构，这种薄膜具有良好的电化学稳定性，锂离子注入／抽出可逆性好，并具有灰色变色特性，在可见区（波长600nm)的透过率调制幅度为35％.     

射频溅射制备氧化镍电致变色薄膜的研究

采用射频反应磁控溅射工艺，以纯镍靶为靶材，在SnO2玻璃上制备电致变色NiOx薄膜。通过对薄膜X射线衍射（XRD）、X光电子能谱（XPS）、扫描隧道显微镜（STM）、循环伏安曲线及可见光透过率的测定，探讨了NiOx薄膜的电致变色性能和微观结构之间的关系，研究了热处理过程中的结构变化和表面形貌。测试表明该氧化镍薄膜具有良好的电致变色性能和阳极着色效应，以及较高的使用寿命。     

Electrochromic performance of hybrid tungsten oxide films with multiwalled-CNT additions

In this study, tungsten oxide films were prepared by sol–gel technique. Various amounts of multiwalled carbon nanotubes (MWCNTs) were added during sol–gel process to obtain hybrid WO₃/MWCNT films. The original and hybrid films were characterized by thermogravimetric analysis, X-ray diffraction analysis, and scanning electron microscopy analysis, whereas the electrochromic performance was evaluated by measuring changes in the optical transmittance caused by potentiostatic charge–discharge intercalation. The influence on the structure and properties of tungsten oxide film due to MWCNT addition was also investigated. The results showed that all of the films were amorphous and exhibited porous microstructure. The electrochromic performance of pristine WO₃ film was improved by adding MWCNTs that served as a template for the growth of WO₃ and resulted in more porous microstructure. The hybrid tungsten oxide films with 0.1 wt.% MWCNT addition exhibited the best electrochromic performance.     

NiO-silica based nanostructured materials obtained by microemulsion assisted sol-gel procedure

NiO-silica based materials have been synthesized by microemulsion assisted sol-gel procedure. The versatility of these soft nanotechnology techniques has been exploited in order to obtain different types of nanostructures, such as NiO nanoparticles, NiO silica coated nanoparticles and NiO embedded in silica matrix. These materials have been characterized by adequate structural and morphology techniques: DLS, HR-TEM/SAED, BET, AFM. Optical and semiconducting properties (band-gap values) of the synthesized materials have been quantified by means of VIS-NIR diffuse reflectance spectra, thus demonstrating their applicative potential in various electron transfer phenomena such as photocatalysis, electrochromic thin films, solid oxide fuel cells.     

锂离子电池正极材料LiNi_(1/3)Co_(1/3)Mn_(1/3)O_2的制备与表征

以乙酸锂、硝酸镍、硝酸钴和乙酸锰为原料,通过高温固相法,分别采用一次烧结和二次烧结合成了LiNi1/3Co1/3Mn1/3O2。采用X射线衍射、扫描电镜分析以及电化学测试等手段对LiNi1/3Co1/3Mn1/3O2的微观结构、表面形貌和电化学性能进行了研究。结果表明,高温固相法能得到结晶良好的LiNi1/3Co1/3Mn1/3O2,但二次烧结提高了材料的I(003)/I(104)值,降低了c/a值,得到的LiNi1/3Co1/3Mn1/3O2具有更完善的层状结构和更优良的电化学性能。