TiO_(2-x)N_x薄膜托槽的摩擦性能研究

通过射频磁控溅射法,在不锈钢金属托槽表面制备了不同厚度的TiO2-xNx薄膜。薄膜的晶体结构,表面形貌和表面粗糙度分别通过X射线衍射、扫描电子显微镜和2206型表面粗糙度测量仪分析。通过14FW往复摩擦磨损测试仪考察薄膜托槽体外摩擦性能。结果显示,所制备的纳米TiO2-xNx薄膜为锐钛矿型,结构均匀致密。不同厚度的TiO2-xNx薄膜托槽的动、静摩擦系数不论干燥或湿润条件下均小于对照组。在同一湿性环境下,随薄膜厚度增加TiO2-x Nx薄膜托槽摩擦系数呈递减趋势。TiO2-xNx薄膜托槽表现出了良好的低摩擦性能。     

掺氮TiO_(2-x)N_x薄膜托槽的细胞相容性研究

采用射频磁控溅射法在普通MBT直丝弓金属托槽表面制备了锐钛矿相掺氮TiO2-xNx薄膜,通过MTT比色法、细胞形态学观察、扫描电镜及荧光染色法评价薄膜托槽的细胞学性能。结果表明,掺氮TiO2-xNx薄膜托槽的细胞毒性为0级,与对照组相比,薄膜托槽组细胞的相对增殖率差异无统计学意义(P0.05);扫描电镜图像显示细胞在薄膜托槽表面贴壁生长良好;荧光显微镜观察显示粘附在材料表面的细胞其细胞核呈亮黄绿色荧光,细胞质呈绿色荧光,细胞生长良好。由此证明掺氮TiO2-xNx薄膜托槽具有良好的细胞相容性。     

掺氮TiO_(2-x)N_x薄膜托槽的制备及其性能研究

利用射频磁控溅射制备了氮掺杂TiO2-xNx薄膜托槽,通过X射线衍射(XRD)、扫描电镜(SEM)等测试手段表征了托槽表面薄膜的结构、形貌,并通过原子力显微镜(AFM)、多功能材料表面试验仪等研究了TiO2-xNx薄膜与基底托槽的附着力、TiO2-xNx薄膜托槽的表面粗糙度以及表面摩擦系数。结果表明制备的托槽表面为均一的锐钛矿相结构TiO2-xNx薄膜,晶粒粒径为30nm,纳米TiO2-xNx薄膜托槽表面致密、平整,薄膜与托槽衬底结合紧密、附着性好,托槽表面粗糙度降低,摩擦系数变小,改善了托槽表面性能,为抗菌性研究奠定了基础。     

ITO/TiO2-xNx/NiO复合电极制备及其光电化学性能

以三乙胺为氮源,钛酸丁酯为钛源,采用溶胶-凝胶法制备氮掺杂TiO2,并用旋涂法制备ITO导电玻璃为基材的氮掺杂TiO2薄膜,经300℃、400℃、500℃处理制得ITO/TiO2-xNx薄膜。采用XRD、XPS、SEM和UV-Vis吸收光谱等对样品进行表征,并进行光电化学性能测定,结果表明500℃处理制得的ITO/TiO2-xNx薄膜具有最佳的光电催化性能。进一步采用化学沉积法在ITO/TiO2-xNx薄膜表面上沉积多孔NiO薄膜,制得ITO/TiO2-xNx/NiO复合薄膜,研究表明该复合薄膜具有很好的光电致色特性及储放电性能,可应用于光电致变色和光电能量储存领域。     

掺氮类金刚石薄膜的制备与性能研究

利用空心阴极放电在玻璃基底表面沉积掺氮类金刚石(DLc)薄膜.拉曼光谱(Raman)分析表明,所制备的碳膜具有典型的类金刚石结构.扫描电镜(SEM)和原子力显微镜(AFM)分析了薄膜表面形貌和粗糙度;利用摩擦磨损仪测量膜的摩擦磨损性能.结果表明,氮的掺入使得薄膜中颗粒致密平整,改变了薄膜的表面微观形貌,进而改善了薄膜的摩擦磨损性能.     

医用镍钛合金表面多层薄膜的制备及摩擦磨损和耐腐蚀性能

采用阳极氧化技术和射频磁控溅射技术在NiTi合金表面分别制备了TiO2薄膜以及Ti/TiN/TiO2多层薄膜。借助扫描电子显微镜(SEM)、X射线衍射仪(XRD)、摩擦磨损试验仪及电化学工作站等仪器对薄膜的形貌、结构、摩擦磨损性能及耐腐蚀性能进行了研究。结果表明,NiTi合金经表面处理后,其摩擦磨损性能和耐腐蚀性能均得以不同程度的改善,其中阳极氧化和磁控溅射复合处理的NiTi合金的耐磨性和耐蚀性具有最佳的配合。     

多层纳米TiO2薄膜的摩擦学性能研究

采用溶胶-凝胶法在普通载玻片上制备了1-4层纳米TiO2薄膜,使用AFM、SEM及UMT-2MT摩擦试验机等考察了薄膜的表面形貌、磨痕形貌及不同条件下的摩擦学性能.实验结果表明,所制备的薄膜平整、致密并具有良好的减摩抗磨性能.与TiO2/GCr15钢球相比TiO2/Si3N4陶瓷球摩擦副的摩擦学性能更稳定;薄膜的耐磨性能并不随膜层数的增加而增大,2层薄膜具有最佳的摩擦学性能;薄膜的摩擦失效机理主要为严重塑性变形、磨粒磨损和局部脆性断裂.     

锡青铜表面超疏水薄膜的制备及其水润滑减摩性能

为了改善锡青铜在水润滑条件下的摩擦性能,在其表面以1％氟硅烷乙醇溶液制备了超疏水薄膜.通过扫描电镜(SEM)观察了超疏水薄膜的表面形貌,测量了其接触角;在CETRUMT-2球-盘摩擦磨损试验机上考察了超疏水薄膜水润滑下的减摩性能.结果表明:锡青铜表面刻蚀并成膜后形成了粗糙的微纳复合结构,刻蚀40 min表面接触角可达151.1°,具备超疏水性能;超疏水薄膜在水润滑下具有较低的摩擦系数,可有效降低摩擦副的磨损.     

掺钽TiO2薄膜的生物活性研究

采用射频磁控溅射技术在表面纳米化316L不锈钢基体上制备掺钽TiO2薄膜,研究了不同掺钽量对表面纳米化316L不锈钢基TiO2薄膜形貌、结构、亲水性和生物活性的影响规律。结果表明掺杂适量的钽能够细化TiO2薄膜颗粒;掺钽能够改善TiO2薄膜的亲水性和生物活性;含钽36%的TiO2薄膜表面自由能比未掺杂时提高了30.1mN/m,在SBF溶液中能促进羟基磷灰石在其表面晶化。     

掺碳TiB2薄膜/钢摩擦副的干摩擦磨损性能

采用室温磁控溅射技术成功地在钢(Cr12MoV)基材表面制备出TiB2/SiC双层薄膜及掺碳TiB2(TiB2-C)/SiC双层薄膜,SiC薄膜为中间层。研究了掺碳对TiB2薄膜组织结构和摩擦磨损性能的影响。结果表明:SiC薄膜与基材和TiB2,TiB2-C薄膜间都具有明显且呈梯度的元素扩散;掺入的C以sp3C-C和sp2C-C形式存在,即以类金刚石形式存在;与钢球(直径为4 mm)对摩、干摩擦条件下,TiB2薄膜和TiB2-C薄膜的磨损速率在105mm3/(m.N)级,掺C明显降低了薄膜的摩擦系数(从0.82降低到0.45,5 min)和对对摩件(钢)的元素转移。分析表明,摩擦磨损性能的提高主要是TiB2-C薄膜中的C起到了固体润滑作用所致。     

Improvement of Optical Reactivity for Nano-TiO2 Film by Nitrogen ECR Plasma

Nitrogen ion was implanted into the nano-TiO2 film surfaces by electron cyclotron resonance （ECR） plasma modification to improve the optical reactivity in visible-light region for nano-TiO2. Diagnosing the N2 plasma by optical emission spectroscopy （OES） was applied to the process of plasma modification. X-ray photoelectron spectroscopy （XPS） was used for analysis of the binding of element after plasma modification. It is shown that the surface modification was caused by excitated N. The injecting of N2 and N＋ leads to the increase in the dissociative interstitial state N in the films. The doped N makes for TiO2-xNx appearing in the TiO2 films. TiO2-xNx forms the impurity energy state in the TiO2 energy band gap and reduces the energy band gap. This is the main reason leading to the red shift of absorption edge.     

多层纳米TiO2薄膜化学及机械稳定性的研究

采用溶胶-凝胶法在普通载玻片上制备了多层纳米TiO2薄膜,用XRD、XPS、UV/vis、SEM及UMT-2MT摩擦试验机等研究了薄膜的晶体结构、化学组成、光学特性、腐蚀前后的微观形貌以及薄膜与基底的结合强度.实验结果表明,所制备的薄膜晶体结构为锐钛矿型,具有较好的透光性;层数对薄膜的透光率、吸光率没有明显影响;经pH=3和13的酸碱溶液浸泡60小时后薄膜的表面形貌及光学性能均未发生变化;摩擦实验及划痕实验结果证实,薄膜与基底结合牢固,且具有较好的内部结合力.     

Fabrication and hydrogen sensing properties of interlinked ribbon-like TiO2 films

Interlinked ribbon-like TiO2 films were prepared by micro-arc oxidation (MAO) process and subsequent chemical-treatment of titanium substrate. The chemical-treatment included two steps: firstly, alkali treatment was performed on the surface of the porous TiO2 films, and then the samples were ion-exchanged in acid aqueous solution. The phase and microstructure of the samples were characterized by XRD, FE-SEM and TEM. It is found that ribbon-like sodium titanate is formed by alkali treatment, and its morphology remains unchanged after acid-treatment. However, the phase compositions of the samples surface change into TiO2 (MAOC-TiO2) after heat-treatment above 500 degrees C. The hydrogen sensing properties at low concentrations were investigated. The result shows that such ribbon-like TiO2 films present high sensing properties at a low temperature.     

Nanostructure Study of TiO2 Films Prepared by Dip Coating process

The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy(AFM).The films were prepared by dip coating process.The optical properties of the films were explained on the basis of the microstructure of the films.     

钽掺杂二氧化钛薄膜的溶胶-凝胶法制备及光电性能调控

用溶胶凝胶法在石英基板上制备不同钽掺杂浓度的二氧化钛薄膜,并采取后续氢气退火的方法改善其光电性能以用于TCO薄膜。采取SEM、XRD等测试手段观察薄膜的微观形貌、结晶性能及组成态,并利用四探针测试、可见光透过率测试和椭偏测试得出薄膜的电学和光学性能。结果表明掺杂钽元素以Ta~(5+)形式存在于TiO_2晶格中,大大提高了二氧化钛薄膜的n型导电性能,这是由于掺钽后费米能级向导带方向移动所致。氢气退火后二氧化钛晶粒尺寸变大且均匀,薄膜的结晶性能得到改善,并且由于引入了更高浓度的氧空位,导电性能得到明显的提升。最终获得了钽掺杂浓度为8%、电阻率为7.95Ω·cm、可见光区域的透过率约为75%的钽掺杂氧化钛薄膜,有潜力应用于透明导电薄膜生产领域。     

二氧化钛过渡层对脉冲激光沉积钛酸锶钡薄膜微结构和介电性质的影响

选取极薄Ti02作为过渡层,采用脉冲激光沉积法分别在Si(100)和Pt(111)/Ti/SiO2/Si(100)基底上制备了Bao.6Sro.4TiO3(BST)薄膜,研究过渡层对BST薄膜微结构及电学性质的影响.发现厚度20纳米以内的锐钛矿相结晶TiO2过渡层可使BST薄膜由无规则取向转变为(111)择优取向,而非晶和较厚TiO2过渡层对BST薄膜的取向无影响.结晶的TiO2过渡层也使薄膜的表面颗粒变细.还研究了不同厚度TiO2对BST薄膜电学性质的影响,结果表明BST薄膜在Pt(111)底电极上加入极薄的结晶TiO2过渡层后电学性质有明显改善,薄膜的介电常数和可调谐度提高,而介电损耗降低.加入膜厚约5nm的TiO2过渡层后,测试频率为10 kHz时薄膜相应介电常数、介电损耗及可调谐度分别为513、0.053和36.7%.     

热喷涂纳米结构A1203／Ti02涂层及其应用

为进一步揭示热喷涂纳米结构A12O3／TiO2陶瓷涂层的强韧耐磨机制，通过对比力学性能试验，采用SEM，ESEM，TEM和XRD研究了这种新型纳米结构热喷涂涂层的组织特征，探讨了纳米稀土合金化对涂层微观组织和性能的作用．研究结果表明，这种新型纳米结构陶瓷涂层具有纳米和亚微米尺度三维网络状显微组织特征，呈现出高的韧性，耐磨性与涂层的韧性之间有密切的关系．     

Nitrogen-doped TiO2 nanotube array films with enhanced photocatalytic activity under various light sources

Highly ordered nitrogen-doped titanium dioxide (N-doped TiO(2)) nanotube array films with enhanced photocatalytic activity were fabricated by electrochemical anodization, followed by a wet immersion and annealing post-treatment. The morphology, structure and composition of the N-doped TiO(2) nanotube array films were investigated by FESEM, XPS, UV-vis and XRD. The effect of annealing temperature on the morphology, structures, photoelectrochemical property and photo-absorption of the N-doped TiO(2) nanotube array films was investigated. Liquid chromatography and mass spectrometry were applied to the analysis of the intermediates coming from the photocatalytic degradation of MO. The experimental results showed that there were four primary intermediates existing in the photocatalytic reaction. Compared with the pure TiO(2) nanotube array film, the N-doped TiO(2) nanotubes exhibited higher photocatalytic activity in degradating methyl orange into non-toxic inorganic products under both UV and simulated sunlight irradiation.