GaAs基GaSb体材料及InAs/GaSb超晶格材料的MBE生长

采用分子束外延方法在GaAs(100)衬底上生长GaSb体材料,以此GaSb为缓冲层生长了不同InAs厚度的InAs/GaSb超晶格,其10K光致发光谱峰值波长在2.0～2.6 μm.高分辨透射电子显微镜观察证实超晶格界面清晰,周期完整.     

InAs/GaSb超晶格长波红外探测器

InAs/GaSb Ⅱ类超晶格红外探测器因其特殊的能带结构及其自身的材料和器件优势,在红外成像技术上具备极大的应用价值和前景,同时在大面阵长波红外探测器及甚长波红外探测器领域展现出优异的器件性能,并推动世界各国对这一低维半导体研究的持续发展,成为第三代红外探测器技术的最佳选择,并在国防建设、医疗、电力、天文学、抗灾方面有着广泛的应用.本文着重介绍了Ⅱ类超晶格长波红外探测器器件的制备、焦平面的成像测试以及器件的相关性能.长波探测器器件在77 K条件下10%截止波长为14 μm,峰值量子效率为35%,峰值响应2.6 A/W,峰值探测率接近1×1010 cmHz1/2W-1.     

GaAs基GaSb体材料及InAs/GaSb超晶格材料的MBE生长

采用分子束外延方法在GaAs(100)衬底上生长GaSb体材料,以此GaSb为缓冲层生长了不同InAs厚度的InAs/GaSb超晶格,其10K光致发光谱峰值波长在2.0～2.6 μm.高分辨透射电子显微镜观察证实超晶格界面清晰,周期完整.     

GaAs基短周期InAs/GaSb超晶格红外探测器研究

采用分子束外延(MBE)方法,在(001)GaAs衬底上生长了短周期Ⅱ型超晶格(SLs):InAs/GaSb (2ML/8ML)和InAs/GaSb (8ML/8ML).从X射线衍射(HRXRD)中计算出超晶格周期分别为31.2和57.3.室温红外透射光谱表明两种超晶格结构在短波2.1μm和中波5μm处有明显吸收.通过腐蚀、光刻和欧姆接触,制备了短波和中波的单元光导探测器.在室温和低温下进行光谱响应测试和黑体测试,77K下,50%截止波长分别为2.1μm和5.0μm,黑体探测率D·bb均超过2×108cmHz1/2/W.室温下短波探测器D·bb超过108cmHz1/2/W.     

InAs/GaSb应变超晶格红外调制光谱研究

在用步进扫描傅里叶变换红外(Fourier Transform Infrared, FTIR)调制光致发光(Photoluminescence, PL)光谱仪进行测试时,基于FTIR的优势,并结合PL无损、灵敏度高、简单的优点,通过减弱背景干扰来提高信号强度。研究了背景噪声、杂质能级和温度对InAs/GaSb应变超晶格材料的发射峰强度及位置的影响,并通过改变测试参数,总结出了针对不同材料的测试方法。这项研究结果对InAs/GaSb应变超晶格材料的外延生长及后续加工具有参考价值。     

320×256元InAs/GaSb II类超晶格中波红外双色焦平面探测器

报道了320×256元InAs/GaSb II类超晶格红外双色焦平面阵列探测器的初步结果.探测器采用PN-NP叠层双色外延结构,信号提取采用顺序读出方式.运用分子束外延技术在GaSb衬底上生长超晶格材料,双波段红外吸收区的超晶格周期结构分别为7 ML InAs/7 ML GaSb和10 ML InAs/10 ML GaSb.焦平面阵列像元中心距为30μm.在77 K时测试,器件双色波段的50%响应截止波长分别为4.2μm和5.5μm,其中N-on-P器件平均峰值探测率达到6.0×10~(10) cmHz~(1/2)W~(-1),盲元率为8.6%;P-on-N器件平均峰值探测率达到2.3×10~9 cmHz~(1/2)W~(-1),盲元率为9.8%.红外焦平面偏压调节成像测试得到较为清晰的双波段成像.     

InAs/GaSb II类超晶格中波红外探测器

InAs/GaSb II类超晶格探测器是近年来国际上发展迅速的红外探测器,其优越性表现在高量子效率和高工作温度,以及良好的均匀性和较低的暗电流密度,因而受到广泛关注。报道了InAs/GaSb超晶格中波材料的分子束外延生长和器件性能。通过优化分子束外延生长工艺,包括生长温度和快门顺序等,获得了具原子级表面平整的中波InAs/GaSb超晶格材料,X射线衍射零级峰的双晶半峰宽为28.8,晶格失配a/a=1.510-4。研制的p?鄄i?鄄n单元探测器在77 K温度下电流响应率达到0.48 A/W,黑体探测率为4.541010 cmHz1/2W,峰值探测率达到1.751011 cmHz1/2W。     

InAs/GaSb二类超晶格红外探测材料的ICP刻蚀

分别采用 Cl2/Ar和SiCl4/Ar作为刻蚀气体对InAs/GaSb二类超晶格红外探测材料进行ICP（Inductively Couple Plasma）刻蚀。结果表明,两种刻蚀气体的刻蚀深度与刻蚀时间都呈线性关系;在2 mTorr气压下,RF功率为50 W,SiCl4流量为3 sccm,Ar为9 sccm时,刻蚀速率为100 nm/min,且与材料的掺杂浓度无关。实验还表明,SiCl4/Ar作为刻蚀气体时,Ar流量在很大范围内对刻蚀速率没用明显影响,但Ar的流量越大,刻蚀的均匀性越好;用Cl2/Ar作为刻蚀气体时,刻蚀速率也是100 nm/min,但Ar流量对刻蚀速率有影响:当Ar流量小于3 sccm时,刻蚀速率随Ar流量的减小而明显降低。     

2～3μmGaAs基InAs/GaSb超晶格材料

采用分子束外延方法在GaAs(100)衬底上生长GaSb体材料,以此GaSb为缓冲层生长了不同InAs厚度的InAs/GaSb超晶格,其10 K光荧光谱峰值波长在2～2.6 μm.高分辨透射电子显微镜观察证实超晶格界面清晰,周期完整.InAs/GaSb超晶格材料的成功生长是制备这类红外探测器件重要的第一步.     

InAs/GaSb超晶格/GaSb体材料中短波双色红外探测器

采用GaSb体材料和InAs/GaSb超晶格分别作为短波与中波吸收材料,外延生长制备了NIPPIN型短中双色红外探测器。HRXRD及AFM测试表明,InAs/GaSb超晶格零级峰和GaSb峰半峰宽FWHM分别为17.57 arcsec和19.15 arcsec,10μm×10μm范围表面均方根粗糙度为1.82?。77 K下,SiO_2钝化器件最大阻抗与面积乘积值RA为5.58×10~5Ω?cm~2,暗电流密度为5.27×10~(-7)A?cm~(-2),侧壁电阻率为6.83×10~6Ω?cm。经阳极硫化后,器件最大RA值为1.86×10~6Ω?cm~2,暗电流密度为4.12×10~(-7)A?cm~(-2),侧壁电阻率为4.49×10~7Ω?cm。相同偏压下,硫化工艺使器件暗电流降低1-2个数量级,侧壁电阻率提高了1个数量级。对硫化器件进行了光谱响应测试,器件具有依赖偏压极性的低串扰双色探测性能,其短波通道与中波通道的50%截止波长分别为1.55μm和4.62μm,在1.44μm、2.7μm和4μm处,响应度分别为0.415 A/W、0.435 A/W和0.337 A/W。     

256×256 focal plane array midwavelength infrared camera based on InAs/GaSb short-period superlattices

An infrared camera based on a 256×256 focal plane array (FPA) for the second atmospheric window (3–5 μm) has been realized for the first time with InAs/GaSb short period superlattices (SLs). The SL detector structure with a broken gap type-II band alignment was grown by molecular beam epitaxy on GaSb substrates. Effective bandgap and strain in the superlattice were adjusted by varying the thickness of the InAs and GaSb layers and the controlled formation of InSb-like bonds at the interfaces. The FPAs were processed in a full wafer process using optical lithography, chemical-assisted ion beam etching, and conventional metallization technology. The FPAs were flip-chip bonded using indium solder bumps with a read-out integrated circuit and mounted into an integrated detector cooler assembly. The FPAs with a cut-off wavelength of 5.4 μm exhibit quantum efficiencies of 30% and detectivity values exceeding 10¹³ Jones at T=77 K. A noise equivalent temperature difference (NETD) of 11.1 mK was measured for an integration time of 5 ms using f/2 optics. The NETD scales inversely proportional to the square root of the integration time between 5 ms and 1 ms, revealing background limited performance. Excellent thermal images with low NETD values and a very good modulation transfer function demonstrate the high potential of this material system for the fabrication of future thermal imaging systems.     

The growth of InAsSb/InAsP strained-layer superlattices for use in infrared emitters

We describe the metalorganic chemical vapor deposition of InAsSb/InAsP strained-layer superlattice (SLS) active regions for use in mid-infrared emitters. These SLSs were grown at 500°C, and 200 Torr in a horizontal quartz reactor using TMIn, TESb, AsH₃, and PH₃. By changing the layer thickness and composition, we have prepared structures with low temperature (≤20K) photoluminescence wavelengths ranging from 3.2 to 4.4 μm. Excellent performance was observed for a SLS light emitting diode (LED) and both optically pumped and electrically injected SLS lasers. An optically pumped, double heterostructure laser emitted at 3.86 μm with a maximum operating temperature of 240K and a characteristic temperature of 33K. We have also made electrically injected lasers and LEDs utilizing a GaAsSb/InAs semi-metal injection scheme. The semi-metal injected, broadband LED emitted at 4 μm with 80 μW of power at 300K and 200 mA average current. The InAsSb/InAsP SLS injection laser emitted at 3.6 μm at 120K.     

InAs/GaSb超晶格中波焦平面材料的分子束外延技术

报道了InAs/GaSb超晶格中波材料的分子束外廷生长技术研究.通过改变GaSb衬底上分子束外延InAs/GaSb超晶格材料的衬底温度,以及界面的优化等,改善超晶格材料的表面形貌和晶格失配,获得了晶格失配△a/a=1.5×10-4,原子级平整表面的InAs/GaSb超晶格材料,材料77 K截止波长为4.87 μm.     

InAs/GaSb II类超晶格红外焦平面台面的 ICP 刻蚀研究

本文报道了采用Cl2/N2电感耦合等离子（ICP）组合体刻蚀工艺在InAs/GaSb II类超晶格红外焦平面台面加工过程中的研究结果,实验采用分子束外延技术在GaSb衬底上生长的PIN型超晶格材料。结果表明,气体流量比例直接对刻蚀速率和刻蚀形貌产生影响,氯气含量越高,刻蚀速率越大,当氮气含量增加,刻蚀速率降低并趋于一定值。当氯气和氮气的流量比例和等离子腔体内压力等参数一定时,随着温度升高,刻蚀速率和选择比在有限范围内同时线性增大,台面的倾角趋于直角,台面轮廓层状纹理逐渐消失,但沟道内变得粗糙不平,并出现坑点。在实验研究范围内,电感耦合等离子源的ICP功率和RF功率对刻蚀结果产生的影响较小。     

Growth and fabrication of a mid-wavelength infrared focal plane array based on type-II InAs/GaSb superlattices

We present the fabrication of a mid-wavelength infrared focal plane array(FPA)based on type-II InAs/GaSb strain layer superlattices(SLs).The detectors contain a 400-period 8 ML InAs/8 ML GaSb SL active layer,which is grown by solid source molecular beam epitaxy on GaSb(100)N type substrates.Lattice mismatch between the superlattices and GaSb substrate achieves 148.9 ppm.The full width at half maximum of the first order satellite peak from X-ray diffraction was 28 arcsec.Single element detectors and FPA with a 128 128 pixels were fabricated using citric acid based solution wet chemical etching.Chemical and physical passivation effectively reduces the surface leakage and this process was characterized by I–V measurement.The devices showed a 50%cut-off wavelength of 4.73 m at 77 K.The photodiode exhibited an R0A of 103cm2.The FPA was characterized with an integration time of 0.5 ms and F/2.0 optics at 77 K and the average blackbody detectivity of the detectors is 2.01 109cm Hz1=2/W.     

Characterization of very high purity InAs grown using trimethylindium and tertiarybutylarsine

The growth of high purity InAs by metalorganic chemical vapor deposition is reported using tertiarybutylarsine and trimethylindiμm. Specular surfaces were obtained for bulk 5-10 μm thick InAs growth on GaAs substrates over a wide range of growth conditions by using a two-step growth method involving a low temperature nucleation layer of InAs. Structural characterization was performed using atomic force microscopy and x-ray diffractometry. The transport data are complicated by a competition between bulk conduction and conduction due to a surface accumulation layer with roughly 2–4 × 10¹² cm⁻² carriers. This is clearly demonstrated by the temperature dependent Hall data. Average Hall mobilities as high as 1.2 x 10⁵ cm²/Vs at 50K are observed in a 10 μm sample grown at 540°C. Field-dependent Hall measurements indicate that the fitted bulk mobility is much higher for this sample, approximately 1.8 × 10⁵ cm²/Vs. Samples grown on InAs substrates were measured using high resolution Fourier transform photoluminescence spectroscopy and reveal new excitonic and impurity band emissions in InAs including acceptor bound exciton “two hole transitions.” Two distinct shallow acceptor species of unknown chemical identity have been observed.     

四层结构模型下的InAs/GaSb超晶格材料能带计算

在包络函数近似下采用K.P理论计算了InAs/Ga(In)Sb II类超晶格材料的能带结构.同时, 计算了超晶格材料的电子有效质量和空穴有效质量, 以及不同的结构对应的吸收系数.在此基础上使用了考虑包括界面在内的四层超晶格模型进行能带计算, 并与实验结果进行比较, 超晶格材料响应截止波长的结果更为接近实验值.不同的界面也会引起能带结构的变化, 带来截止波长的变化.对于应变补偿的InAs/GaSb超晶格材料, 非对称InSb界面相比对称界面有更大的截止波长.     

四层结构模型下的InAs/GaSb超晶格材料能带计算

在包络函数近似下采用K.P理论计算了InAs/Ga(In) Sb Ⅱ类超晶格材料的能带结构.同时,计算了超晶格材料的电子有效质量和空穴有效质量,以及不同的结构对应的吸收系数.在此基础上使用了考虑包括界面在内的四层超晶格模型进行能带计算,并与实验结果进行比较,超晶格材料响应截止波长的结果更为接近实验值.不同的界面也会引起能带结构的变化,带来截止波长的变化.对于应变补偿的InAs/GaSb超晶格材料,非对称InSb界面相比对称界面有更大的截止波长.     

红橙光InGaN/GaN量子阱的结构与光学性质研究

采用金属有机物化学气相沉积(MOCVD)技术生长了具有高In组分InGaN阱层的InGaN/GaN多量子阱(MQW)结构,高分辨X射线衍射(HRXRD)ω-2θ扫描拟合得到阱层In含量28%。比较大的表面粗糙度表明有很大的位错密度。室温下光致荧光(PL)研究发现该量子阱发射可见的红橙光,峰位波长在610 nm附近。变温PL(15～300 K)进一步揭示量子阱在低温下有两个发光机制,对应的发射峰波长分别为538 nm和610 nm。由于In分凝和载流子的局域化导致的载流子动力改变,使得量子阱PL发光峰值随温度增加呈明显的"S"变化趋势。