Patterned self-assembly of gold nanoparticles on chemical templates fabricated by soft UV nanoimprint lithography

Chemical templates for the patterned immobilization of gold nanoparticles were fabricated by soft UV nanoimprint lithography. The template structures were fabricated by means of the consecutively performed process steps of nanoimprint lithography, reactive ion etching, chemical functionalization with amino groups, and lift-off of imprint resist. These chemical templates were used for the defined assembly of 20 nm diameter citrate stabilized gold nanoparticles from aqueous solution. By reducing the ionic strength of the solution, one- and zero-dimensional particle assemblies were generated on sub-100-nm template structures. By this means, the pattern resolution predefined by the lithography process could be easily enhanced by dilution of the nanoparticle solution.     

Durable diamond-like carbon templates for UV nanoimprint lithography

The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e.?tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, we find that the FDTS coating undergoes irreversible degradation after only 10 cycles of UV nanoimprint processes with SU-8 resist. The degradation includes a 28% reduction in surface F atoms and significant increases in the surface roughness. In this paper, diamond-like carbon (DLC) films were investigated as an alternative material not only for coating but also for direct fabrication of nanoimprint templates. DLC films deposited on quartz templates in a plasma enhanced chemical vapor deposition system are shown to have better chemical and physical stability than FDTS. After the same 10 cycles of UV nanoimprints, the surface composition as well as the roughness of DLC films were found to be unchanged. The adhesion energy between the DLC surface and SU-8 is found to be smaller than that of FDTS despite the slightly higher total surface energy of DLC. DLC templates with 40?nm features were fabricated using e-beam lithography followed by Cr lift-off and reactive ion etching. UV nanoimprinting using the directly patterned DLC templates in SU-8 resist demonstrates good pattern transfer fidelity and easy template-resist separation. These results indicate that DLC is a promising material for fabricating durable templates for UV nanoimprint lithography.     

Pattern-definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates

This study reports the pattern definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates. Noble nanopatterned polymer hard template was fabricated by using nanoimprint lithography (NIL) and used for electropolymerization of conducting polymer. Conducting polymer was electrochemically deposited on the template and transferred over to flexible substrates. Eventually conducting polymer films with various nanopatterns were fabricated on flexible substrates. High pattern definability was achieved by nanoimprinted polymer template, which was molded from lithographically fabricated stamp. Low cost fabrication was accomplished due to low cost NIL, reusable polymer templates, and low material consumption of electrodeposition. The electrodeposited films were transferred using double sided tape. Because the templates are made of flexible polymer, the transfer bonding method applied in this study is adaptable to both wafers and flexible polymer substrates. The fabricated nanopatterned conducting polymer film can be applied to gas sensors, super capacitors, super wetting films, and neuron interfaces due to its characteristic of high surface to volume. For an illustrative application, the gas sensing properties of films were tested. The result showed enhanced sensing characteristic with nanopatterned film, which are attributed to the high surface to volume ratio of nanopatterned films.     

Inclined nanoimprinting lithography for 3D nanopatterning

We report a non-conventional shear-force-driven nanofabrication approach, inclined nanoimprint lithography (INIL), for producing 3D nanostructures of varying heights on planar substrates in a single imprinting step. Such 3D nanostructures are fabricated by exploiting polymer anisotropic dewetting where the degree of anisotropy can be controlled by the magnitude of the inclination angle. The feature size is reduced from micron scale of the template to a resultant nanoscale pattern. The underlying INIL mechanism is investigated both experimentally and theoretically. The results indicate that the shear force generated at a non-zero inclination angle induced by the INIL apparatus essentially leads to asymmetry in the polymer flow direction ultimately resulting in 3D nanopatterns with different heights. INIL removes the requirements in conventional nanolithography of either utilizing 3D templates or using multiple lithographic steps. This technique enables various 3D nanoscale devices including angle-resolved photonic and plasmonic crystals to be fabricated.     

Large array of single, site-controlled InAs quantum dots fabricated by UV-nanoimprint lithography and molecular beam epitaxy

We present the growth of single, site-controlled InAs quantum dots on GaAs templates using UV-nanoimprint lithography and molecular beam epitaxy. A large quantum dot array with a period of 1.5 μm was achieved. Single quantum dots were studied by steady-state and time-resolved micro-photoluminescence experiments. We obtained single exciton emission with a linewidth of 45 μeV. In time-resolved experiments, we observed decay times of about 670 ps. Our results underline the potential of nanoimprint lithography and molecular beam epitaxy to create large-scale, single quantum dot arrays.     

Single digit nanofabrication by step-and-repeat nanoimprint lithography

A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.     

Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices

A step and repeat UV nanoimprint lithography process on pre-spin coated resist film is demonstrated for patterning a large area with features sizes down to sub-15 nm. The high fidelity between the template and imprinted structures is verified with a difference in their line edge roughness of less than 0.5 nm (3σ deviation value). The imprinted pattern's residual layer is well controlled to allow direct pattern transfer from the resist into functional materials with very high resolution. The process is suitable for fabricating numerous nanodevices.     

Nanodomain Swelling Block Copolymer Lithography for Morphology Tunable Metal Nanopatterning

Ordered metal nanopatterns are crucial requirements for electronics, magnetics, catalysts, photonics, and so on. Despite considerable progress in the synthetic route to metal nanostructures, highly ordered metal nanopatterning over a large‐area is still challenging. Nanodomain swelling block copolymer lithography is presented as a general route to the systematic morphology tuning of metal nanopatterns from amphiphilic diblock copolymer self‐assembly. Selective swelling of hydrophilic nanocylinder domains in amphiphilic block copolymer films during metal precursor loading and subsequent oxygen based etching generates diverse shapes of metal nanopatterns, including hexagonal nanoring array and hexagonal nanomesh and double line array in addition to common nanodot and nanowire arrays. Solvent annealing condition of block copolymer templates, selective swelling of hydrophilic cylinder nanodomains, block copolymer template thickness, and oxygen based etching methods are the decisive parameters for systematic morphology evolution. The plasmonic properties of ordered Au nanopatterns are characterized and analyzed with finite differential time domain calculation. This approach offers unprecedented opportunity for diverse metal nanopatterns from commonly used diblock copolymer self‐assembly.     

Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

The development of a simple and cost-effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost-effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion-bombardment technique was reported as a new method to create high-resolution and high-aspect-ratio structures. Recent progress in simple and cost-effective top-down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.     

Large-area hard magnetic L10-FePt nanopatterns by nanoimprint lithography

Large-area hard magnetic L1(0)-FePt nanopatterns with out-of-plane texture were fabricated by using a top-down approach. For the fabrication process, ultraviolet nanoimprint lithography (UV-NIL) in combination with inductively coupled plasma reactive Ar-ion etching was used. By this technique a continuous L1(0)-Fe(51)Pt(49) film was nanostructured into a regular arrangement of nanodots over an area of 4 mm(2). The dot dimension and distribution was specified by the stamp, resulting in a dot size of 60 nm and a periodicity of 150 nm. For the large-scale L1(0)-FePt nanopatterns, huge coercivities up to 4.31 T could be achieved. By means of magnetic force microscopy it could be verified that the nanodots were magnetically decoupled from each other and occurred in the single-domain state with perpendicular magnetization.     

Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography

A lithography technique that combines laser interference lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.     

Facile route of flexible wire grid polarizer fabrication by angled-evaporations of aluminum on two sidewalls of an imprinted nanograting

In this study, we report a new method to fabricate a wire grid polarizer (WGP) that greatly relaxes the requirement on patterning and etching, and can be easily applied to produce flexible WGPs. The technique is to pattern a high aspect ratio and narrow linewidth grating by nanoimprint lithography followed by two angled aluminum depositions in opposite directions to produce the narrow spacing between the aluminum lines required for a visible band WGP. Anisotropic reactive ion etching is used to remove the aluminum deposited at the top of the grating but leave the aluminum layer on the grating sidewalls, thereby forming a metal wire grid with much smaller spacings than a lithographically defined grating. As a result, the fabricated WGP showed good performance in a wide range of visible wavelength.     

纳米光子结构软膜紫外光固化纳米压印

紫外光固化纳米压印是实现纳米结构批量复制的一种新技术．其特点是低成本和高分辨，而且可以达到极高的套刻精度．为了得到大面积图案的均匀复制，可用聚二甲基硅氧烷（PDMS）制备透光的压印软模板．其母版图案可由高分辨率电子柬曝光和反应离子刻蚀的方法在硅片基底上获得，然后用浇注的方法将图案转移到PDMS上．本实验特别发展了紫外光固化纳米压印适用于软膜压印的双层膜图型转移技术．该双层膜由廉价的光胶和聚甲基丙烯酸甲脂（PMMA）构成．对光胶层的压印可用普通的光学曝光仪实现．然后再将图案用反应离子刻蚀的方法转移到PMMA层中．为了证明方案的可行性，在两种不同材料的半导体基片上压印了三角晶格的光子晶体和准晶结构的图案，并用剥离的方法将它们转移到金属薄膜上，最后成功地进行了硅片刻蚀实验．相信这一纳米制做方法对大面积纳米光子结构和光学集成芯片的制造是普遍适用的．     

3D Printing-Assisted Nanoimprint Lithography of Polymers

Fused filament fabrication, commonly referred to as 3D printing, is an additive manufacturing method finding plenty of applications nowadays. In contrast, polymer nanopatterning by nanolithographic techniques plays an important role in obtaining functional surfaces and coatings for applications in different fields including micro- and nanoelectronics. In spite of their relevance, additive manufacturing and polymer nanolithography have not found yet a common niche to be developed. Although both approaches are oriented to achieve different types of objects, it is shown that the confluence of both technologies can be desirable and potentially convenient. Herein, it is demonstrated that by employing conventional 3D printing, it is possible to fabricate nanostructured polymer surfaces in a relatively simple way by using similar approaches as those used in nanoimprint lithography but without the need for clean room conditions. To do that, a printed-assisted nanoimprint lithography concept (3DPrANIL) has been tested for different types of polymer and silicon templates. It is demonstrated that a polymeric nanostructured hydrophilic template can be replicated accurately on another polymer rendering a nanostructured surface with enhanced hydrophobicity. The results support 3DPrANIL as novel method to obtain micro- and nanostructured surfaces with different functionalities like iridescence and hydrophobicity.     

Close-packed noncircular nanodevice pattern generation by self-limiting ion-mill process

We describe a self-limiting, low-energy argon-ion-milling process that enables noncircular device patterns, such as squares or hexagons, to be formed using precursor arrays of uniform circular openings in poly(methyl methacrylate) defined using electron beam lithography. The proposed patterning technique is of particular interest for bit-patterned magnetic recording medium fabrication, where square magnetic bits result in improved recording system performance. Bit-patterned magnetic medium is among the primary candidates for the next generation magnetic recording technologies and is expected to extend the areal bit density limits far beyond 1 Tbit/in(2). The proposed patterning technology can be applied either for direct medium prototyping or for manufacturing of nanoimprint lithography templates or ion beam lithography stencil masks that can be utilized in mass production.     

热压印刻蚀技术

纳米压印技术是一种高分辨率、廉价、高效的纳米结构制备技术。它既继承了传统光刻技术所具有的并行性,又同时拥有传统光刻技术不易达到的纳米结构制备能力,这为今后纳米结构的广泛应用提供了良好的条件。文章介绍了纳米热压印技术中核心工艺流程,包括：模板的制备、抗粘层的制备、压印过程中温度与压力的影响、反应离子刻蚀,并且给出了利用纳米热压印技术制备的光栅结构,最后展望了纳米压印技术的前景。     

Flexible Au micro-array electrode with atomic-scale Au thin film for enhanced ethanol oxidation reaction

The catalysis of Au thin film could be improved by fabrication of array structures in large area.In this work,nanoimprint lithography has been developed tofabricate flexible Au micro-array(MA)electrodes with~100%coverage.Advanced electron microscopy characterisations have directly visualised the atomic-scale three-dimensional(3D)nanostructures with a maximum depth of 6 atomic layers.In-situ observation unveils the crystal growth in the form of twinning.High double layer capacitance brings about large number of active sites on the Au thin film and has a logarithmic relationship with mesh grade.Electrochemistry testing shows that the Au MAs perform much better ethanol oxidation reaction than the planar sample;MAs with higher mesh grade have a greater active site utilisation ratio(ASUR),which is important to build electrochemical double layer for efficient charge transfer.Further improvement on ASUR is expected for greater electrocatalytic performance and potential application in direct ethanol fuel cell.     

Creating nanopatterns of His-tagged proteins on surfaces by nanoimprint lithography using specific NiNTA-histidine interactions

Directed assembly of the DsRed FT protein is demonstrated on self-assembled monolayers (SAMs) on silicon substrates patterned by nanoimprint lithography. Initially, the DsRed protein is attached using electrostatic interactions on both topographical (polymer) templates with an amino functionalization and on chemically patterned (flat) substrates. In a second experiment, a patterned NiNTA SAM is used in order to attach the DsRed FT protein via supramolecular interactions, taking advantage of the histidine functionalization of the DsRed FT protein. The NTA SAM is formed on silicon oxide using a multistep covalent process. Patterning of the NTA SAM is performed using nanoimprint lithography. The DsRed FT protein is attached on the patterned NTA layer after treating this with a Ni(II) solution. Moreover, the histidine-NiNTA binding may be reversed by removing the Ni using EDTA or by competition using imidazole. The regeneration and reuse of the substrate by subsequently attaching and removing two different histidine-functionalized proteins from the patterned NTA is shown by fluorescence microscopy.     

Making modified fluoropolymer molds for ultraviolet nanoimprint lithography

A technique of using commercial polymers and additive to fabricate the modified fluoropolymer molds for ultraviolet nanoimprint is proposed, which is based on direct replicating of the electronic beam lithography resist patterns by cast molding process. A small amount of the added additive can increase the oleophobic behavior of the fluoropolymer, and so to reduce its surface energy remarkably. The cast-molded modified fluoropolymer molds (CMF-mold) not only satisfy the rigidity requirement for replicating very fine features and are solvent resistant but also possess low surface energy by themselves and are inexpensive and easy to fabricate. Using the CMF-mold, both complex letters with 100 nm linewidth and dense lines with 80 nm linewidth /space can be reproduced into the ultraviolet resist conveniently. Moreover, in our experiment, the modified fluoropolymer mold has shown its replicating competence for fabricating high-aspect-ratio sub-30 nm structures.     

Highly parallel fabrication of nanopatterned surfaces with nanoscale orthogonal biofunctionalization imprint lithography

Large areas of nanopatterns of specific chemical functionality are needed for biological experiments and biotechnological applications. We present nanoscale orthogonal biofunctionalization imprint lithography (NOBIL), a parallel top-down imprinting and lift-off technique based on step-and-flash imprint lithography (SFIL) that is able to create centimetre-scale areas of nanopatterns of two biochemical functionalities. A photoresist precursor is polymerized with a template in place, and the thin resist layer is etched to create an undercut for lift-off. Gold nano-areas on a silicon dioxide background are then independently functionalized using self-assembly that translates the nanopattern into a cell-adhesive/cell-rejective functionality pattern. We demonstrate the technique by creating fibronectin areas down to a pattern size of 60?nm against a polyethylene glycol (PEG) background, and show initial results of cells stably seeded over an array of 1?mm(2) areas of controlled size and pitch.