A source of broad homogeneous beams of low-energy (∼0.5 keV) gas ions

A source of gas ions (argon, oxygen, nitrogen, etc.), the operating principle of which is based on the use of a glow discharge in an electrode system of a wide-aperture hollow cathode and anode in a magnetic field, is described. The exit aperture diameter of the hollow cathode, increased up to a size close to the ion beam diameter (10 cm), ensures the uniform ion emission of the plasma generated in the discharge region near the anode. A decreased angular divergence or increased ultimate ion-beam current density is achieved by a change in the potential drop in the space charge sheath between the plasma and the ion optics. The source generates broad (50 cm²) slightly diverging (ω/2∼3°–5°) ion beams with energies of 300–1000 eV at a beam current density of ∼0.5 mA/cm².     

Calculation of the variable-profile electron beam for electron coolers

Interaction of an electron beam with a cooled ion beam makes it possible to reduce its phase volume, perform accumulation of particles, and suppress various “heating” effects. The electron beam can also be used as a target for an electron-ion recombination reaction, which offers a chance to carry out atomic physics experiments and ensure slow uniform extraction of the ion beam from the storage ring. A high-perveance electron beam with a variable profile is required for effective cooling, while a high current density and a low energy of transverse motion of electrons in the beam is needed for extraction by means of recombination. It is shown that a convex cathode placed in a magnetic field can be used to form such a beam. A high current density can be attained with this shape of the cathode, but additional efforts must be focused on optimizing the gun’s optics in order to obtain a low energy of transverse motion of particles. Since ions repeatedly pass through the cooling section during their lifetime at different values of the betatron oscillation phase, the rates of recombination and cooling are dependent on the rms electron velocity averaged over the volume in which the beam interaction occurs. The proposed design of the gun with a convex cathode 10.2 mm in diameter ensures formation of a variable-profile electron beam with a nominal current of 1 A and a current density of 1.2 A/cm². The rms energy of Larmor gyration of electrons at the exit from the gun, averaged over the beam cross section (the “transverse” temperature) is 1 eV. A focusing electrode that forms the Pierce optics near the edge of the cathode, an electrode controlling the beam profile, and an anode are included in the optics of the electron gun.     

An Ion Source with an Open-End Small-Sized Anode

A small-sized gas-discharge ion source is described. The source contains a cylindrical hollow cathode made of a ferromagnetic material with longitudinal magnetization of up to 16 mT; a cone-shaped anode and a cathode-reflector in the form of a tube situated in axial symmetry inside the hollow cathode; and an external thermionic cathode. The overall dimensions of the ion source without the thermionic cathode are 45 × 44 mm. The source ensures an argon ion beam current of up to 80 mA at a discharge current and voltage of 1 A and 115 V, respectively, and a pressure of 1.5 × 10⁻² Pa in the chamber. The minimum operating pressure is 0.8 × 10⁻² Pa.__________Translated from Pribory i Tekhnika Eksperimenta, No. 3, 2005, pp. 147–149.Original Russian Text Copyright © 2005 by Stognij, Zavadskaya, Koryakin, Lobko, Yurchenko.     

A compact vapor source of conductive target material sputtered by 3-keV ions at 0.05-Pa pressure

A vapor source is developed its 80-mm-diameter and 15-mm-thick flat target being positioned on the bottom of a 120-mm-diameter and 70-mm-deep hollow cathode, isolated from the cathode and sputtered by 1–4-keV argon ions. A permanent magnet induces an axially symmetric heterogeneous magnetic field, the field induction on the target surface reaching 20 mT and the field lines of force being diverging from the target surface and crossing the cathode surface. The cathode bombardment by 1–3-keV secondary electrons emitted by the target results in an increase of the electron emission current in the cathode circuit and enables to reduce the argon pressure down to 0.05 Pa. It allows a collisionless transport of the sputtered metal atoms to a substrate thus keeping their initial energy amounting to tens of electronvolts. A higher energy of deposited atoms improves quality of coatings, for instance of Ti₃SiB₂ films, their deposition rate on a substrate distanced at 0.1–0.2 m from the target amounting to 10–20 μm/h at 1-A current in the target circuit and 3-keV energy of sputtering ions. This value is one order of magnitude higher in comparison with the target sputtering in a planar magnetron discharge by 300–500-eV argon ions at the same 1-A current in the target circuit.     

A gas-ion source with a grid-stabilized plasma cathode

A two-stage source of a broad beam of gas ions is described. The source contains a grid-stabilized plasma cathode and an anode stage with a multicusp magnetic field. The emission current of the plasma cathode (which is based on a glow discharge with a hollow cathode) is controlled between 0.1 and 1 A. The voltage that is applied to a bipolar diode between its cathode grid and anode plasma and determines the energy of fast electrons ranges from 50 to 200 V. The operating pressure of the argon in the anode stage is 4 × 10^–3–1 × 10^–1 Pa. A beam of argon ions having an energy of up to 5 keV and a current of >100 mA is formed by a two-electrode ion-optical system with a working area of 50 cm².__________Translated from Pribory i Tekhnika Eksperimenta, No. 2, 2005, pp. 107–111.Original Russian Text Copyright © 2005 by Gavrilov, Kamenetskikh.     

Plasma sources of ions of solids

Three variants of the design of ion sources are described: (1) with a hollow cathode and an anode-evaporator system in the rear part of the source, (2) with a cylindrical anode, and (3) with a hollow cathode and an anode in the front part. It is shown that these sources are most suitable for obtaining ion beams of solid-state elements and provide ion currents of ∼70–100 μA (for Al, Bi, As, Sb), 25 μA (Eu), and 15–30 μA (Fe, V, Cr, and doubly charged and molecular ions). Such sources are characterized by a relatively long operation time (tens of hours) and a low energy consumption level (300–400 W). The operational principle of ion sources is described with consideration for the differences in their designs. The experimental results are presented: the dependences of the ion currents on the discharge current, cathode current, and induction of the magnetic field of the source’s electromagnet, as well as the results of the computer simulations that are based on a numerical model of the ionization of atoms in the source.     

A high-current nanosecond electron accelerator with a semiconductor opening switch

A compact nanosecond electron accelerator with an output energy of up to 4000 keV, a pulsed power of 100–180 MW, a beam current of 0.25–1.1 kA, and a pulse energy of 5–7 J is described. The accelerator operates with a pulse repetition rate of 200 Hz and ensures an average beam power of up to 1 kW. A nanosecond generator with a solid-state switching system, which is based on magnetic stages of pulse compression and a semiconductor opening switch, is used as a supplying device. The design and electric circuit of the accelerator are described, and test results are presented.     

A Plasma-Cathode Electron Source for Ribbon-Beam Generation at Forevacuum Pressures

A plasma electron source producing a ribbon beam at pressures of up to 60 mTorr is described. The discharge with an extended rectangular-section hollow cathode is used as a plasma generator. Electrons are extracted through the emission slit in the anode covered by a metal mesh. The maximum electron-beam current is 1 A, and the energy is 2–6 keV. The beam characteristics are presented, and the conditions for attaining the maximum operating pressure are analyzed.     

Characteristics of low-energy ion beams extracted from a wire electrode geometry

Beams of argon ions with energies less than 50 eV were extracted from an ion source through a wire electrode extractor geometry. A retarding potential energy analyzer (RPEA) was constructed in order to characterize the extracted ion beams. The single aperture RPEA was used to determine the ion energy distribution function, the mean ion energy and the ion beam energy spread. The multi-cusp hot cathode ion source was capable of producing a low electron temperature gas discharge to form quiescent plasmas from which ion beam energy as low as 5 eV was realized. At 50 V extraction potential and 0.1 A discharge current, the ion beam current density was around 0.37 mA/cm(2) with an energy spread of 3.6 V or 6.5% of the mean ion energy. The maximum ion beam current density extracted from the source was 0.57 mA/cm(2) for a 50 eV ion beam and 1.78 mA/cm(2) for a 100 eV ion beam.     

Generation of an ion beam in a glow-discharge source

A mechanism of ion extraction from a glow-discharge ion source based on a hollow cathode and used for elemental analysis of solids, is considered Experiments have shown that two oppositely directed ion flows are formed from ions produced in the region of negative glow-discharge fluorescence. One flow has an ion energy ≥ 100 eV, is directed to the cathode, and bombards and sputters the analyzed sample. The sputtered atoms diffuse into the negative-glow region and are ionized. The second flow (low-energy ions) is extracted from the same negative-glow region and transported from the cathode to the surface of the anode chamber owing to an ambipolar diffusion. These ions are extracted from a hole in the anode chamber of a standard ion source by an electric field and are used for mass-spectrum analysis. The energy-distribution width for these ions is ∼5 eV. The intensity of the ion beam extracted from the anode hole is an order of magnitude higher than the intensity of the ion beam extracted from the cathode region. Original Russian Text ? G.G. Sikharulidze, 2009, published in Pribory i Tekhnika Eksperimenta, 2009, No. 2, pp. 105–109.     

An arc generator of a broad plasma stream

The design and basic parameters of an arc plasma generator based on a combined cathode are described. The cathode consists of a hot tungsten filament located in the hollow cathode. A plasma stream with a cross section of 150×10 cm² and a density of ∼10¹⁰ cm⁻³ at a pressure of 0.1–1 Pa is generated at a discharge current of up to 60 A without a cathode spot. The plasma generator can be utilized for final cleaning and activation of surfaces of materials and articles before depositing functional coatings on them and in plasma-assisted deposition by using either vacuum arc or magnetron discharges.     

Modernization of the Element 2 mass spectrometer

To perform direct elemental analysis of solids, it is proposed to complement an Element 2 ICP mass spectrometer commercially produced by Thermo Electron Corp. with a glow-discharge ion source based on a hollow cathode. The analyzed sample, in the form of a rod 1.0–2.5 mm in diameter and 15–20 mm in length, is set along the axis of the cathode cavity with an inner diameter of 15–16 mm and a depth of 15 mm. The cathode is placed in a discharge chamber, which, using a viton seal, is substituted for the ICP-source sampler. The use of a plasma mirror and getter evacuation of the source chamber allows a decrease in the source’s hydrocarbon background by a factor of 10³–10⁴. The ion source is evacuated by a mechanical pump of the mass spectrometer and an additional turbomolecular pump. Ion sources in a mass spectrometer are replaced (a change from one analytical method to another) within 5 min. The ion current extracted from the IS allows analysis of conducting solids with a sensitivity at a level of several ppb (10⁻⁷%) at a resolution of the mass spectrometer of 4000. Combining two easily replaceable ICP and GD ion sources in a single high-resolution analyzer significantly extends the analytical capabilities of the Element 2 mass spectrometer. Original Russian Text ? G.G. Sikharulidze, 2009, published in Pribory i Tekhnika Eksperimenta, 2009, No. 2, pp. 98–100.     

A Plasma-Cathode Electron Source for Focused-Beam Generation in the Fore-Pump Pressure Range

A plasma electron source is described that forms a focused beam in the range of fore-pump pressures. Plasma is generated in a hollow-cathode discharge. Electrons are extracted through a single emission hole in the anode. The source provides an electron-beam current of up to 0.1 A and an energy of up to 20 keV. The beam diameter at the half-height of the current-density distribution is ≤1.4 mm, and the beam-power density is as high as 1.5 kW/mm².     

A low-pressure gas-discharge ion source with a hollow cathode and an output-aperture diameter of 420 mm

A gas-discharge ion source with a hollow cathode 700 mm in diameter and 500 mm in length is described. Two small-area anodes are positioned at the ends of the hollow cathode opposite to each other. A 420-mm-diameter extracting electrode is placed along the lateral wall of the hollow cathode at a distance of 250 mm from its center symmetrically relative to the anodes. A hot cathode is placed opposite to the extracting electrode. A beam of oxygen ions with a current density of up to 0.2 mA/cm² and a nonuniformity <12% over a 420-mm-diameter area at a distance of 200 mm from the extracting electrode was obtained. The optimal operating parameters of the ion source working with oxygen are as follows: a discharge current of 0.8–1.2 A, an operating pressure of (0.6–0.8) × 10^?4 Torr, and an extracting voltage of up to 400 V.     

A Wide-Aperture Source of Oxygen Ions with a Hollow Cold Cathode and Magnetic Multicast

A gas-discharge source of oxygen ions is described. The source contains an anode and a hollow cold cathode with one extracting grid (extractor) placed at the opposite end to the anode. The hollow cathode has three multicast magnetic systems of permanent polarity. The first system is placed inside the cathode near the anode, the second system is situated outside the cathode opposite to the first one, and the third system is placed below the second one near the extractor surface. Like poles of the first and second magnetic systems are directed towards each other. The second and third systems have poles of similar orientations. Using this source, a beam of oxygen ions with a current density of up to 0.5 mA/cm² and nonuniformity of <5% was obtained across a 200-mm-diameter area at a distance of 120 mm from the face of the ion source. The source offers the following optimum performance characteristics: a discharge current of 0.4–1.2 A, oxygen flow rate of 9–12 cm³/min, and extracting voltage of 400–600 V. No limitations were revealed on the service life of a source operating in optimal modes.     

A forevacuum plasma source of pulsed electron beams

A plasma electron source designed for generation of a pulsed wide-aperture electron beam in the forevacuum pressure range (5–20 Pa) is described. The source is based on the use of a hollow-cathode glow discharge. At an accelerating voltage of 20 kV, a current pulse length of 100 μs, and a pulse repetition rate of 10 Hz, the electron beam current is 100 A, and the maximum density of the beam pulse power is 10 J/cm². The obtained parameters of the electron beam and the features of the source functioning in the forevacuum pressure range show that this source can be used to good effect to modify the surface properties of nonconducting materials.     

Applications of focused ion beams

A finely focused ion beam system is described. Beams of Ga, In, and Au ions emitted from a liquid metal ion source are routinely focused to spot diameters of ∼0.1 to 3.0 μm at a current density of ∼0.5 A/cm² and a beam energy of 20 keV. Focused beams with energies of 1 to 30 keV have also been produced. Three applications are discussed: (1) scanning ion microscopy, (2) mask repair, and (3) ion beam lithography. Scanning ion images illustrating topographic and chemical contrast are presented. The repair of opaque and clear defects in optical masks, and opaque defects in X-ray masks is shown.Defects are imaged with the ion beam and removed by sputter erosion. Edge reconstruction of 0.5 μm features is demonstrated. Most repairs take less than 10 s/μm². The advantages and limitations of ion beams for lithography are discussed.     

Broad beam source of fast atoms produced as a result of charge exchange collisions of ions accelerated between two plasmas

Experimental study of a fast argon atom beam source is carried out and the study results are presented. The source comprises a 90-mm deep and 210-mm in diameter hollow cathode as well as a flat emission grid, both electrodes made of titanium. The study revealed main factors, which influence the zone diameter of homogeneous substrate etching by a broad beam of fast argon atoms, produced as a result of charge exchange collisions of ions, accelerated between a plasma emitter inside the hollow cathode and a secondary plasma in the working vacuum chamber, the plasmas being separated from each other with the grid. It is shown that at a distance from the grid, exceeding the resonant charge exchange length up to 4 times, elastic collisions have no appreciable impact on the spatial distribution of the etching rate in the vacuum chamber. The homogeneous etching zone diameter is mainly influenced by angular characteristics of accelerated particles in the grid plane. At a constant beam power up to 3–5 kW the diameter is rising with a decrease of their energy and with a corresponding increase of the beam current. Original Russian Text ? S.N. Grigoriev, Yu.A. Melnik, A.S. Metel, V.V. Panin, 2009, published in Pribory i Tekhnika Eksperimenta, 2009, No. 4, pp. 166–172.     

Ultraviolet stimulated electron source for use with low energy plasma instrument calibration

We have developed and demonstrated a versatile, compact electron source that can produce a mono-energetic electron beam up to 50 mm in diameter from 0.1 to 30 keV with an energy spread of <10 eV. By illuminating a metal cathode plate with a single near ultraviolet light emitting diode, a spatially uniform electron beam with 15% variation over 1 cm(2) can be generated. A uniform electric field in front of the cathode surface accelerates the electrons into a beam with an angular divergence of <1° at 1 keV. The beam intensity can be controlled from 10 to 10(9) electrons cm(-2) s(-1).     

Decrease in the operating gas pressure in an ion source

The results of use of a cold hollow cathode with a multipole magnetic field in a duoplasmatron-type ion source are described. The operating parameters of a duoplasmatron with the developed cathode and a duoplasmatron with a cold hollow two-cylinder cathode are compared. It is shown that the use of a cathode with a multipole magnetic field offers additional possibilities of reducing the operating gas pressure in an ion source and contributes to an increase in both the current and the phase density of the ion-beam current at the output of a charged-particle source and to a decrease in the phase volume of this beam.