共查询到19条相似文献,搜索用时 78 毫秒
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用紫外可见吸收光谱(UV-vis)、X光电子能谱(XPS)和原子力显微镜(AFM)对C60/AA混合LB膜中C60分子在LB膜中的排列作了观察,进一步证明了我产在第一报中确认在混合LB膜中C60分子不是顶在花生酸疏水部分的端头,而是嵌埋在花生酸分子之间。 相似文献
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C60—AALB膜光学累识和记录效应的研究 总被引:2,自引:0,他引:2
C60是碳的第三种同素异构体。本文将C60和花生酸混合制得高质量的C60-花生酸复合LB多层膜,在对其光学非线性特性的研究中首次发现这种LB膜具有光学累记和记录效应,采用布居光栅模型,分析了这种LB膜中的光学累积和记录效应的机制。 相似文献
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合成端闯劲基聚苯乙烯和聚环烷嵌段共聚物,并拉制LB膜,用原子力/摩擦力显微镜表征其表面微观形貌,研究其在极轻载荷下的摩擦性能。 相似文献
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C60/花生酸混合LB膜I.LB膜的X射线衍射和分子排列模型 总被引:3,自引:1,他引:2
制备了纯C60和C60/AA的混合LB膜。用X-射线衍射详细研究了它们的周期结构,表明C60分子在C60/AA混合LB膜中不是顶在花生酸疏水端头,而是包埋在花生酸分子之间,由此提出了一个新的分子排列模型。 相似文献
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扫描隧道显微镜(STM)被用来表征聚酰亚胺LB膜的形貌及分子排列结构。本文介绍了单层聚酰亚胺LB膜样品制备过程,所用的STM系统及STM实验。给出了该LB膜亚胺化前后的STM图象。结果表明,所制备的LB膜的聚合链排列有序,测得链间距即横向周期~7(?),纵向上所谓的“之”字型结构的周期为11(?)。这些数值与根据分子面积在理论上所预估的结果相符。 相似文献
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P(VDF-TrFE)铁电膜微观铁电压电特性研究 总被引:2,自引:2,他引:0
借助原子力显微镜优异的空间分辨能力和微观压电铁电测定技术,研究了不同结晶P(VDF-TrFE)铁电膜的微观铁电压电特性.研究表明,非晶态微观蝴蝶洄线的铁电开关过程平缓,矫顽场分布较广且场值较高;与之相比高结晶度薄膜微观蝴蝶洄线呈现陡峭而迅速的铁电开关现象,矫顽场单值且较低.微观压电性的实验表明非晶态压电系数约为-0.15(A)/V,低于晶态的压电系数-0.30(A)/V. 相似文献
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C_(60)与高聚物复合膜的光电导性能(英文) 总被引:1,自引:0,他引:1
在 ITO导电玻璃上制备了聚乙烯基咔唑( PVK) \C_(60)复合膜与分散红 I(PDRO)\C_(60)复合膜。 在 250W的红外灯照射下,发现 PDRO\C_(60)复合膜的光电导性能明显优于 PVK\C_(60)复合膜,并对 该现象作了初步解释。 相似文献
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Langmuir-Blodgett (LB) films of poly(N,N-diallyl-N-octadecylamine-alt-maleic acid) as well as mixed films consisting of polyampholyte and two amphiphilic fluorophores - alkyl substituted rhodamine dyes - were prepared and investigated. The π-A isotherm of the polyampholyte at air-water interface is typical for monolayer in the liquid state. Mixed monolayers of polyampholyte and rhodamine amphiphiles show improved packing of the hydrophobic chains. Absorption and fluorescence spectroscopic studies of the mixed LB films reveal the aggregation of dyes in the densely packed multilayer films. 相似文献
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Murat Soylu 《Optical Materials》2012,34(5):878-883
n-GaN/MEH-PPV thin film heterojunction diode was fabricated by depositing MEH-PPV thin film using spin-coating process on n-GaN (0 0 0 1). The junction properties were evaluated by measuring I-V characteristics. I-V characteristics exhibited well defined rectifying behavior with a barrier height of 0.89 eV and ideality factor of 1.7. The optical band gap of the MEH-PPV film using optical absorption method was found to be 2.2 eV and the fundamental absorption edge in the film is formed by the direct allowed transitions. At higher electric fields, the conductivity mechanism of the film shows a trap charge limited current mechanism. The obtained results indicate that the electronic parameters of the heterojunction diode are affected by properties of MEH-PPV organic film. 相似文献
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Bhagwati Bishnoi P.K. Mehta C.J. Panchal M.S. Desai Ravi Kumar V. Ganesan 《Materials Chemistry and Physics》2011
We present the preliminary results of temperature and frequency dependent dielectric measurements on Ba(Co1/3Nb2/3)O3 (BCN) thin films. These films were prepared on indium tin oxide (ITO) coated glass substrates by the pulse laser deposition (PLD) technique. It exhibits single-phase hexagonal symmetry. These films were irradiated with Ag15+ (200 MeV) and O7+ (100 MeV) beams at the fluence 1 × 1011, 1 × 1012, and 1 × 1013 ions/cm2. On irradiating these films, its dielectric constant (?′) and dielectric loss (tan δ) parameters improve compared to un-irradiated film. Compared to O7+ irradiation induced point/cluster defects Ag15+ induced columnar defects are more effective in reducing/pinning trapped charges within grains. The present paper highlights the role of swift heavy ion irradiation in engineering the dielectric properties of conductive samples to enable them to be useful for microwave device applications. 相似文献
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将纳米C60/C70与丙烯酸(酯)单体在引发剂作用下共聚,合成得到C60/C70-丙烯酸(酯)共聚物。对该共聚物的结构进行了红外光谱和荧光光谱分析,探讨了有富勒烯参与的聚合反应机理和共聚物结构。将该共聚物用有机胺中和成盐,使其水性化,制得水溶性纳米C60/C70-丙烯酸(酯)高分子成膜材料,对其成膜性能进行了分析测试。发现C60/C70对丙烯酸(酯)聚合物具有独特的成膜改性功能。 相似文献
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M.T. Escote F.M. PontesE.R. Leite J.A. VarelaR.F. Jardim E. Longo 《Thin solid films》2003,445(1):54-58
Electrically conductive LaNiO3−δ (LNO) thin films with typical thickness of 200 nm were deposited on Si (111) substrates by a chemical solution deposition method and heat-treated in air at 700 °C. Structural, morphological, and electrical properties of the LNO thin films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field-emission scanning electron microscopy (FEG-SEM), and electrical resistivity ρ(T). The thin films have a very flat surface and no droplet was found on their surfaces. The average grain size observed by AFM and FEG-SEM was approximately 100 nm in excellent agreement with XRD data. The ρ(T) data showed that these thin films display a good metallic character in a large range of temperature. These results suggest the use of this conductive layer as electrode in the integration of microelectronic devices. 相似文献