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1.
为研究Ti掺杂的NbN薄膜的机械和摩擦学特性,采用射频和直流磁控共溅射技术制备了Ti掺杂的NbN(Ti:NbN)薄膜.利用X射线衍射仪(XRD)、能量色散X射线光谱仪(EDX)、扫描电子显微镜(SEM)、纳米压痕仪、高温摩擦磨损实验机分别对Ti掺杂的NbN薄膜的微观结构、组成成分、表面形貌、机械和摩擦学性能进行了研究.XRD测试结果显示,薄膜的结晶性随着Ti靶掺杂功率的增加(从0 W逐渐升高到40 W)而呈明显增强趋势,晶粒尺寸也由18.010 nm增加到21.227 nm.当Ti靶的掺杂功率为30 W时,NbN薄膜的硬度由4.5 GPa(未掺杂)增加到20.4 GPa,弹性模量由145.8 GPa(未掺杂)增加到224.5 GPa; 当Ti靶的掺杂功率为40 W时,NbN薄膜的摩擦系数由0.73(未掺杂)下降到0.51,磨损率由3.3×10-6 mm3/(N·mm)(未掺杂)下降到2.1×10-6 mm3/(N·mm).这表明,掺杂Ti可使NbN薄膜的机械性能和摩擦学性能得到很大的改善.  相似文献   

2.
采用磁控溅射法,通过改变氩氮比率,在Si(100)衬底上成功制备了W2N薄膜,当氩氮比率为20:6时薄膜的结晶性最好.为了改善W2N薄膜的力学和摩擦学性能,采用射频和直流磁控共溅射方法分别在Si(100)和A304不锈钢衬底上制备了软质金属Y和硬质金属Cr共掺杂的W2N(Y-Cr:W2N)薄膜.在掺杂功率20~50 W范围内,当掺杂功率为30 W时,薄膜具有最大硬度,为23.71 GPa,此时样品的弹性模量为256.34 GPa; 当掺杂功率为20 W时,薄膜的平均磨擦系数最小,为0.37.这表明,金属Y和Cr的掺入使W2N薄膜的力学和摩擦学性能有了很大的改善.  相似文献   

3.
为了研究薄膜的生长过程对薄膜结构和性能的影响并促进该类薄膜的商业应用,利用电弧离子镀在不同脉冲负偏压下沉积了TiN-Cu复合膜,并对其表面形貌、晶体结构、能谱、硬度、结合强度和耐磨性进行研究.结果表明,在50~300 V范围内,随脉冲负偏压值增加,沉积薄膜中Cu原子分数逐渐减少;薄膜中最大的Cu原子分数低于Cu-Ti合金靶中Cu原子分数.沉积膜中TiN相存在明显的(111)晶面织构,并且脉冲负偏压值增大,薄膜的织构程度增加.脉冲负偏压值增加,沉积的TiN-Cu复合膜的硬度和耐磨性降低,但结合强度增加.沉积膜结构与性能的变化与脉冲偏压引起薄膜中Cu原子分数的变化有一定关系.  相似文献   

4.
The effect of annealing on microstructure, adhesive and frictional properties of GeSb2Te4 films were experimentally studied. The GeSb2Te4 films were prepared by radio frequency (RF) magnetron sputtering, and annealed at 200℃ and 340℃ under vacuum circumstance, respectively. The adhesion and friction experiments were mainly conducted with a lateral force microscope (LFM) for the GeSb2Te4 thin films before and after annealing. Their morphology and phase structure were analyzed by using atomic force microscopy (AFM) and X-ray Diffraction (XRD) techniques, and the nanoindention was employed to evaluate their hardness values. Moreover, an electric force microscope (EFM) was used to measure the surface potential. It is found that the deposited GeSb2Te4 thin film undergoes an amorphous-to-fcc and fcc-to-hex structure transition; the adhesion has a weaker dependence on the surface roughness, but a certain correlation with the surface potential of GeSb2Te4 thin films. And the friction behavior of GeSb2Te4 thin films follows their adhesion behavior under a lower applied load. However, such a relation is replaced by the mechanical behavior when the load is relatively higher. Moreover, the GeSb2Te4 thin film annealed at 340℃ presents a lubricative property.  相似文献   

5.
Iridium thin films have been deposited on Si3N4(100 nm)/Si(100) substrates by magnetron sputtering. And then iridium film micro-patterns were fabricated by ion milling technique. The atomic force microscopy (AFM) measurements reveal that there is a very fiat and smooth surface with an average roughness of 0.64 nm for the iridium films. The X-ray diffraction also reveals that the deposited iridium films have a polycrystalline microstructure with (111) plane preferential orientation. The electrical resistivity of the iridium films was also measured and discussed.  相似文献   

6.
Three series of Al2O3/Al laminated ceramic matrix composites,named SPA,SPV and HP,were fabricated by different methods.SPA and SPV were prepared using Al2O3 slices and Al slurry via screen printing and subsequent heat treatment in air or vacuum.HP samples were made by hot pressing the layered stack of Al foils and Al2O3 slices.SEM and XRD were applied to analyze the microstructure and the interlayer crystal phase.The bending strength,fracture toughness and fracture work of the samples made by the three methods were measured and compared.The results show that the composites have much better toughness and higher fracture work than the Al2O3 slice.Among the samples made by the three methods,the samples made by hot pressing have the optimum mechanical performance.The displacement-load curves and fracture mechanism were analyzed.  相似文献   

7.
用非平衡磁控溅射离子镀法沉积了钛含量不同的MOS2-Ti复合薄膜,电子探针分析表明共沉积钛可以降低MOS2薄膜中氧杂质的含量,XRD分析显示薄膜具有类似非晶的结构.划痕试验结果显示薄膜的临界栽荷都大于100N,球盘磨损试验结果显示MOS2-Ti复合薄膜比MOS2薄膜耐磨性好,并且摩擦系数低于0.07。  相似文献   

8.
TiO2 fims have been deposited on glass substrates using DC reactive magnetron sputtering at different oxygen partial pressures from 0. 10 Pa.to 0.65 Pa. The transmittance (UV-vis) and photoluminescence (PL) spectra of the films were recorded. The results of the UV-vis spectra show that the deposition rate of the films decreased at oxygen partial pressure P(O2)≥0.15 Pa, the band gap increased from 3.48 eV to 3.68eV for direct transition and from 3.27 eV to 3.34 eV for indirect transition with increasing the oxygen partial pressure. The PL spectra show convincingly that the transition for films was indirect, and there were some oxygen defect energy levels at the band gap of the films. With increasing the O2 partial pressure, the defect energy levels decreased. For the films sputtered at 0.35 and 0.65 Pa there were two defect energy levels at 2.63 eV and 2.41 eV, corresponding to 0.72 eV and 0.94 eV below the conduction band for a band gap of 3.35 eV, respectively. For the films sputtered at 0.10 Pa and 0.15 Pa, there was an energy band formed between 3.12 eV and 2.06 eV, corresponding to 0.23 eV and 1.29 eV below the conduction band. ZHAO Qing-nan : Born in 1963 Funded by Natural Science Foundation of Hubei Province, China.  相似文献   

9.
Since their discovery by Iijima[1], carbon nanotubes (CNTs) have been the focus in novel materials research. Theoretical and experimental studies show[2-9] that CNTs have extraordinary mechanical and electrical properties. Krishnan et al.[2] have reported that the mean value of Young’s modulus of single-wall nanotubes (SWNTs) is 1.25 TPa. Yu et al.[3] measured Yang’s modulus of multi-wall nanotubes (MWNTs) between 270 and 950 GPa and breaking strength between 11 and 63 GPa. The ele…  相似文献   

10.
Effects of Al2O3 and Ni as the additives on the sinterability, microstructure and mechanical properties were systematic studied. The experimental results show that only a relative density about 96.2% of hot-pressing TiB2-30%Al2O3 can be attained due to the plate-like TiB2 particle and its random orientation and excessive Al2O3 grain growth. When sintering temperature is higher than 1 700 ℃, TiB2 grain growth can be found, which obvious improves flexural strength of TiB2 matrix but decreases toughness. It seems that mechanical properties of TiB2-Al2O3 composites are mainly depended on relative density besides grain growth. otherwise, they will be determined by relative density and TiB2 matrix strength together. Anyway, Al2O3 addition can weaken the grain boundary and thus improve the toughness of the materials. A flexural strength of 529 MPa, Vickers hardness of 24.8 GPa and indentation toughness of 4.56 MPa·m1/2 can be achieved inTiB2-30vol% Al2O3.  相似文献   

11.
为改善TiN硬质薄膜的硬度和耐摩擦磨损性能,采用多弧离子镀技术,在硬质合金基底上制备了单层TiN-Cu薄膜和调制周期Λ=5.9~62.1 nm的5组TiCu/TiN-Cu纳米多层复合膜.使用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪、划痕仪和摩擦磨损试验机等测试仪器,表征了薄膜...  相似文献   

12.
Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spectroscopy, UV-Vis spectrophotometer, the photoluminescence (PL) and ellipse polarization apparatus. The results indicate that TiO2-Cr film exists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for 5 h under UV light, exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5% for methylene blue. Consequently, the thickness threshold on these films is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness is over 114 nm, the rate of photodegradation becomes stable. This result is completely different from that of crystalloid TiO2 thin film.  相似文献   

13.
The influence of Mo on the microstructure, bending strength and HV of Ti/Al2O3 composite was studied, and the influence mechanism was analyzed. The results indicate that after the addition of Mo, the composite organization is finer and phases distribution is better-proportioned which make the microstructure denser, the bending strength and HV of composite are also increased to a degree. But the bending strength increases first then decreases with the increasing of Mo content, so the appropriate Mo content for the Ti/Al2O3 composite is to be further confirmed. WANG Zhi: Born in 1962 Funded by Natural Science Foundation of China (No. 50232020) and Natural Science Foundation of Shandong Province (No. 2002F21)  相似文献   

14.
The effect of unbalanced coefficient of magnetron (UCM) on the structure and tribological properties of CrNx hard coatings was studied.The CrNx coatings were deposited on both Si wafer and hardened tool steel substrates using a closed-field unbalanced magnetron sputtering ion plating technique in a gas mixture of Ar+N2 under different unbalanced magnetron conditions.The coatings were characterized by means of XRD,XPS,SEM,microhardness tester and pin-on-disc tribometer to study respectively their structure,chemical bonding state,microstructure,hardness and tribological properties.The experimental results show that the UCM has a profound effect on the structure,hardness and tribological properties of the CrNx coatings.With increasing the values of UCM,the dominant phases in the deposited coatings evolved from Cr+Cr2N to Cr2N+CrN,the microstructure became denser and the hardness increased;in addition,reduced coefficient of friction and improved wear resistance of CrNx coatings were also observed under a larger UCM.  相似文献   

15.
使用射频磁控溅射技术,以原子百分比为4:1和1:4的SnO2和CdO制备了SnO2- CdO复合薄膜.XRD分析表明, SnO2- CdO(4:1)复合薄膜为SnO2(310)和Cd2SnO4(011)的混合相多晶结构,且结晶性能良好.随着氧流量的增加,薄膜的择优生长方向由SnO2(310)转变为Cd2SnO4(011).薄膜在可见光和近红外光范围内的最高透过率达到95%和91%, 最高平均透过率达到87%和85%, 光学带隙在3.80~3.90 eV范围内变化.电阻率随着薄氧流量的增加而下降,最低为0.133 Ω·cm.薄膜的厚度约为330 nm, 其表面由大量分布均匀的球形颗粒组成.原子百分比为4:1的SnO2- CdO复合薄膜的光电性能优于原子百分比为1:4的SnO2- CdO复合薄膜.  相似文献   

16.
采用M-200型摩擦磨损试验机,对比研究了几种填充PTFE复合材料与石英玻璃对磨时,在水润滑、低速、较高载荷条件下的摩擦学特性。结果表明:在水润滑条件下,MoS2/PTFE复合材料与石英玻璃对磨时的摩擦系数可低于0.005,表现出超润滑摩擦特性,而且具有稳定的摩擦系数和很低的磨损率。石英玻璃所具有的优良表面特性和优异的亲水性是实现超润滑的关键。当添加高硬添料时,石英玻璃表面容易受到破坏,导致摩擦学性能下降。  相似文献   

17.
Nano-SiO2/polypropylene composite was prepared by melt-blending process. The nano-SiO2 particles were organized by wet process surface treatment with silane coupling agent KH-570. The effect of mass fraction of nano-SiO2 particles and dosage of KH-570 on the toughening and strengthening of PP matrix were investigated based on the fractography of impact notch and the analysis of crystal structure by X-ray and dispersive structure of nano-SiO2 by TEM. Results show that the impact and flexural strength and modulus of the composite are improved obviously with low loading of nano-SiO2 (3 wt%-5 wt%), and the izod impact strength of PP increases twice with 4 wt% nano-SiO2. The nano-SiO2 particles treated can disperse into the matrix resin, which has evident heterogeneous nucleation effects on the crystallization of PP. The optimal toughening and strengthening effects of PP matrix can be obtained when the content of nano-SiO2 and KH-570 are 4 wt% and 3 wt%, respectively.  相似文献   

18.
采用磁控溅射技术制备了不同原子百分比的CdO - ZnO复合薄膜,并利用X射线衍射仪、扫描电子显微镜、紫外可见近红外分光光度计、四探针电阻测试仪研究了薄膜的结构和光电学特性.研究表明:适量增加CdO掺杂量可提高薄膜在近红外区域的透射率; CdO - ZnO复合薄膜的光学带隙和电阻率随CdO含量的增加而减小,且当CdO和ZnO的原子百分比为4:1时薄膜的带隙和电阻率分别为2.09 eV和10.79×10-3 Ω·cm.该研究结果可为制备高导电性和高透过率的薄膜提供参考.  相似文献   

19.
The Bi4Zr0.5Ti2.5O12 (BZT) thin films were fabricated on the LaNiO3 bottom electrode using sol-gel method. The structure and morphology of the films were characterized using X-ray diffraction, AFM and SEM. The results show that the films have a perovskite phase and dense microstructure. The 2Pr and 2Vc of the Pt/BZT/LaNiO3 capacitor are 28.2 μC/cm2 and 14.7 V respectively at an applied voltage of 25 V. After the switching of 1×1010 cycles, the Pr value decreases to 87% of its pre-fatigue values. The dielectric constant (ε) and the dissipation factor (tanδ) of the BZT thin films are about 204 and 0.029 at 1 kHz, respectively. The films show good insulating behavior according to the test of leakage current. The clockwise C-V hysteresis curve observed shows that the Pt/BZT/LaNiO3 structure has a memory effect because of the BZT film's ferroelectric polarization.  相似文献   

20.
The Ni/ZrO2 was used as raw materials to fabricate the surface infiltrated composite layer with 1-4 mm thickness on cast steel substrate through vacuum infiltrated casting technology. The microstructure indicated that the infiltrated composite layer included surface composite layer and transition layer. Wear property was investigated under room temperature and 450 ℃. The results indicated that the abrasion volume of substrate was 8 times that of the infiltrated composite layer at room temperature. The friction coefficient of infiltrated composite layer decreased with the increasing load. The wear resistance of infiltrated composite layer with different ZrO2 contents had been improved obviously under high temperature. The friction coefficient of infiltrated composite layer was decreased comparing with that at room temperature. The oxidation, abrasive and fatigue abrasion was the main wear mechanism at room temperature. Oxidation abrasion, fatigue wear and adhesive wear dominated the wearing process under elevated temperature.  相似文献   

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