Effect of substrate temperature on ac conduction properties of amorphous and polycrystalline GaSe thin films

X-ray diffraction analysis of GaSe thin films used in the present investigation showed that the as-deposited and the one deposited at higher substrate temperature are in amorphous and polycrystalline state, respectively. The alternating current (ac) conduction properties of thermally evaporated films of GaSe were studied ex situ employing symmetric aluminium ohmic electrodes in the frequency range of 120-10⁵ Hz at various temperature regimes. For the film deposited at elevated substrate temperature (573 K) the ac conductivity was found to increase with improvement of its crystalline structure. The ac conductivity (σ_ac) is found to be proportional to (ω^s) where s < 1. The temperature dependence of ac conductivity and the parameter, s, is reasonably well interpreted by the correlated barrier-hopping (CBH) model. The maximum barrier heights W_m calculated from ac conductivity measurements are compared with optical studies of our previous reported work for a-GaSe and poly-GaSe thin films. The distance between the localized centres (R), activation energy (ΔE_σ) and the number of sites per unit energy per unit volume N(E_F) at the Fermi level were evaluated for both a-GaSe and poly-GaSe thin films. Goswami and Goswami model has been invoked to explain the dependence of capacitance on frequency and temperature.     

AC conductivity and dielectric properties of Sb2Te3 thin films

Sb₂Te₃ films of different thicknesses, in the thickness range 300-620 nm, were prepared by thermal evaporation. X-ray analysis showed that the as-deposited Sb₂Te₃ films are amorphous while the source powder and annealed films showed a polycrystalline nature. The AC conductivity and dielectric properties of Sb₂Te₃ films have been investigated in the frequency range 0.4-100 kHz and temperature range 303-373 K. The AC conductivity σ_AC(ω) was found to obey the power law ω^s where s?1 independent of film thickness. The temperature dependence of both AC conductivity and the exponent s can be reasonably well interpreted by the correlated barrier hopping (CBH) model. The experimental results of the dielectric constant ε₁ and the dielectric loss ε₂ are frequency and temperature dependent and thickness independent. The maximum barrier height W_M calculated from dielectric measurements according to the Guintini equation agrees with that proposed by the theory of hopping of charge carriers over a potential barrier as suggested by Elliott for chalcogenide glasses. The effect of annealing at different temperatures on the AC conductivity and dielectric properties was also investigated. Values of σ_AC, ε₁ and ε₂ were found to increase with annealing treatment due to the increase of the degree of ordering of the investigated films. The Cole-Cole plots for the as-deposited and annealed Sb₂Te₃ films have been used to determined the molecular relaxation time τ. The temperature dependence of τ indicates a thermally activated process.     

Ac conductivity and dielectric properties of Ge20Se75In5 films

Amorphous films of Ge₂₀Se₇₅In₅ chalcogenide glass were prepared using a thermal evaporation technique. The chemical composition of the deposited films was examined using energy dispersive X-ray spectroscopy (EDX). The ac conductivity and dielectric properties of the prepared films have been studied as a function of temperature in the range from 300 to 423 K and frequency in the range from 10² to 10⁵ Hz. The experimental results indicate that ac conductivity σ_ac(ω) is proportional to ω^s where s equals 0.902 at room temperature and decreases with increasing temperature. The results obtained are discussed in terms of the correlated barrier hopping (CBH) model. The density of localized states N(E_F) at the Fermi level is found to have values of the order 10¹⁹ eV⁻¹ cm⁻³, which increase with temperature. The dielectric constant ?₁ and dielectric loss ?₂ were found to decrease with increasing frequency and to increase with increasing temperature over the ranges studied. The maximum barrier height W_m was estimated from an analysis of the dielectric loss ?₂ according to Giuntini equation. Its value for the deposited films (0.43 eV) agrees with that proposed by the theory of hopping of charge carrier over a potential barrier as suggested by Elliott for chalcogenide glasses.     

Frequency dependence of the conductivity of amorphous germanium films between 20 Hz and 26 GHz

Conductivity measurements on amorphous Ge films in the frequency range 20 Hz–26 GHz are described. Above 100 MHz the frequency dependence of the conductivity at room temperature satisfied the power law σ∝ω^s with s=0.45-0.7. No saturation of the conductivity was observed. When the Ge films were doped with 0.1–1 at. % Sb the conductivity was frequency independent up to 26 GHz. A.c. hopping conduction seems to be compatible with the experimental results.     

Electrical transport mechanisms in a-Se95M5 films (M = Ga, Sb, Bi)

The temperature dependence of direct current (dc) conductivity has been reported in thin films of a-Se₉₅M₅ (where M = Ga, Sb, Bi), in the temperature range 219-375 K, in order to identify the conduction mechanism and to observe the doping effect of different metals on amorphous selenium. It is found that the conduction in high temperature range (314-375 K) is due to thermally activated tunneling of charge carriers in the band tails of localized states; and in the low temperature range (219-314 K) conduction takes place through variable range hopping in the localized states near the Fermi level. Current-voltage (I-V) measurements at high electric fields (the field dependence of dc conductivity) have also been carried out for the samples of present system. The analysis of data shows the existence of space charge limited conduction (SCLC) in these glassy alloys. The density of localized states near the Fermi level is calculated for these alloys using dc conductivity (Mott parameters) and SCLC measurements data. The properties have been found to be highly composition dependent.     

Similar admittance behavior of amorphous silicon carbide and nitride dielectrics within the MIS structure

PECVD grown a-SiNx:H and a-SiCx:H films were investigated as dielectric films in the form of metal/insulator/p-silicon (MIS) structures. AC admittance of MIS structures was measured as a function of dc gate bias voltages and frequencies (1-1000 kHz) of the superimposed ac bias voltage (10 mV). For each applied bias voltage (from accumulating to inverting bias regimes), temperature (T) dependence of both capacitance (C) and conductance (G/ω) were measured to investigate majority/minority carrier behavior under various frequencies ω (kHz-MHz) as parameters. C and G/ω-T-ω measurements reveal that observed pairs of capacitance steps and conductance peaks are related to traps lying on the same energy value, residing in the insulator and at the interface of insulator/semiconductor structure and differing only through capture cross-sections. On the other hand, surface band bending (ψ_s) of silicon and activation energy (E_A) deduced from the Arrhenius plot of the frequency vs. reciprocal temperature as a function of gate bias (V_G) seem linearly dependent, implying that E_A reflects the ψ_s variation.     

Frequency and temperature dependence of dielectric and electrical properties of radio-frequency sputtered lead-free K0.48Na0.52NbO3 thin films

Lead-free K_0.48Na_0.52NbO₃ (KNN) ferroelectric thin films were prepared using the radio-frequency magnetron sputtering method. The crystallized KNN phase was confirmed using X-ray diffraction. The KNN thin film exhibited a well-saturated ferroelectric polarization-electric field hysteresis loop with high remanent polarization. The dielectric and electrical properties of the KNN thin film were investigated over a wide range of frequencies from 10 Hz to 1 MHz, and over a wide range of temperatures from 25 °C to 500 °C. The complex impedance relaxations are shown in an impedance Cole-Cole plot. With increasing temperature, the AC conductivity increased, which obeys the power law, σ(ω) = σ₀ + Aω^s. The activation energy for the conduction process is calculated to be 0.57 eV from the slope of the AC conductivity at the low frequency.     

Effect of deposition distance and temperature on electrical, optical and structural properties of radio-frequency magnetron-sputtered gallium-doped zinc oxide

Films of gallium-doped zinc oxide (GZO) were deposited on glass substrates by radio-frequency magnetron sputtering using a ceramic target of Ga:ZnO (4 at.% Ga vs. Zn). Both the substrate temperature (T_s) and the target-substrate distance (d_ts) were varied and the effect on electrical, optical and structural properties of the resulting films were measured. The highest conductivity of 3200 S/cm was obtained at a deposition temperature of 250 °C, at a d_ts of 51 mm. This sample had the highest carrier concentration in this study, 9.6 × 10²⁰/cm³. Optical transmittance of all films was <90% in the visible range. The grain size of the film grown at d_ts = 51 mm was smaller than the grain size for films grown with a shorter d_ts; moreover, the films with d_ts = 51 mm exhibited the smoothest surface, with a root mean square surface roughness of 2.7 nm. Changes in T_s have a more pronounced effect on conductivity compared to changes in d_ts; however, variations in structure do not appear to be well-correlated with conductivity for samples in the 2000-3200 S/cm range. These results suggest that incorporation and activation of Ga is of key importance when attempting to obtain GZO films with conductivities greater than 2000 S/cm.     

Anomalous electrical transport properties of nonstoichiometric nickel ferrite below room temperature

The transport properties of nonstoichiometric nickel ferrite nanoparticles synthesised by the co-precipitation method followed by mechanical milling is reported here. The particle size of ferrite phase in the ball milled samples is found to be ranging from ∼3.5 nm to ∼14 nm but in the un-milled sample it becomes ∼75 nm. A minimum in the conductivity has been observed in dc conductivity versus temperature variation while the activation energies of all the samples show an increasing trend with increasing milling time. The alternating current conductivity has been described by power law σ′(f,T) ∝ f^sTⁿ. The frequency exponent ‘s’ shows anomalous behavior, while the magnitude of the temperature exponent ‘n’ strongly depends on frequency. The dc and ac magnetoresistivities have been observed to be negative. Although the grain boundary contribution is predominated over grain contribution, the magnitude of both grain and grain boundary resistances reduce to lower value under the application of magnetic field.     

Microwave characterization of laser ablated Y1Ba2Cu3O7−x thin films

In the present study we report the measurements of microwave surface resistance (R_s) of YBCO thin films on LaAlO₃ substrate as a function of temperature, thickness and magnetic field by microstrip resonator technique. The T_c(R = 0) of the films is 90 K and J_c > 10⁶ A/cm² at 77 K. The microwave surface resistance has been measured for films of various thicknesses. The value of R_s has been found to be initially decreased with increasing film thickness due to increase in number of defects. A minimum microwave surface resistance has been obtained for film thickness of about 300 nm. The increase of R_s with film thickness above 300 nm is possibly due to degradation of the film microstructure as observed with Atomic Force Microscopy. Temperature dependence of surface resistance has been studied for best quality films. The field induced variations of surface resistance are also investigated by applying dc magnetic field perpendicular to stripline structure and surface of the film. A general linear and square field dependence of R_s at low and high value of fields has been observed with critical field value of 0.4 T which confirms the microwave dissipation induced by flux flow in these resonators at 10 GHz frequency. The hysteresis of R_s in dc field observed for field value above critical field shows the higher value of surface resistance in decreasing field than in increasing field which is in agreement with one state critical model and is a characteristic of homogeneous superconductors.     

Influence of substrate temperature and bias voltage on the optical transmittance of TiN films

Titanium nitride (TiN) thin films were prepared by means of reactive DC sputtering on quartz and sapphire substrates. Structural, electrical and optical effects of deposition parameters such as thickness, substrate temperature, substrate bias voltage were studied. The effect of substrate temperature variations in the 100-300°C range and substrate bias voltage variations in the 0-200 V DC range for 45-180 nm thick TiN films were investigated. Temperature-dependent electrical resistivity in the 100-350 K range and optical transmission in the 300-1500 nm range were measured for the samples. In addition, structural and morphological properties were studied by means of XRD and STM techniques.The smoothest surface and the lowest electrical resistivity was recorded for the optimal samples that were biased at about V_s=−120 V DC. Unbiased films exhibited a narrow optical transmission window between 300 and 600 nm. However, the transmission became much greater with increasing bias voltage for the same substrate temperature. Furthermore, it was found that lower substrate temperatures produced optically more transparent films.Application of single layers of MgF₂ antireflecting coating on optimally prepared TiN films helped increase the optical transmission in the visible region to more than 40% for 45 nm thick samples.     

Structure, morphology and optical properties of nanocrystalline yttrium oxide (Y2O3) thin films

Yttrium oxide (Y₂O₃) thin films were grown onto Si(1 0 0) substrates using reactive magnetron sputter-deposition at temperatures ranging from room temperature (RT) to 500 °C. The effect of growth temperature (T_s) on the growth behavior, microstructure and optical properties of Y₂O₃ films was investigated. The structural studies employing reflection high-energy electron diffraction RHEED indicate that the films grown at room temperature (RT) are amorphous while the films grown at T_s = 300-500 °C are nanocrystalline and crystallize in cubic structure. Grain-size (L) increases from ∼15 to 40 nm with increasing T_s. Spectroscopic ellipsometry measurements indicate that the size-effects and ultra-microstructure were significant on the optical constants and their dispersion profiles of Y₂O₃ films. A significant enhancement in the index of refraction (n) (from 2.03 to 2.25) is observed in well-defined Y₂O₃ nanocrystalline films compared to that of amorphous Y₂O₃. The observed changes in the optical constants were explained on the basis of increased packing density and crystallinity of the films with increasing T_s. The spectrophotometry analysis indicates the direct nature of the band gap (E_g) in Y₂O₃ films. E_g values vary in the range of 5.91-6.15 eV for Y₂O₃ films grown in the range of RT-500 °C, where the lower E_g values for films grown at lower temperature is attributed to incomplete oxidation and formation of chemical defects. A direct, linear relationship between microstructure and optical parameters found for Y₂O₃ films suggest that tuning optical properties for desired applications can be achieved by controlling the size and structure at the nanoscale dimensions.     

Structure and AC conductivity of nanocrystalline Yttrium oxide thin films

Yttrium oxide (Y₂O₃) thin films were grown at substrate temperatures (T_s) ranging from room temperature (RT) to 500 °C and their structural and electrical properties were evaluated. The results indicate that Y₂O₃ films grown at RT-100 °C were amorphous (a-Y₂O₃). Y₂O₃ films began to show cubic phase (c-Y₂O₃) at T_s = 200 °C. The average grain size varies from 5 to 40 nm as a function of T_s. Room temperature ac electrical conductivity increases from 0.4 (Ω-m)^− 1 to 1.2 (Ω-m)^− 1 with increasing T_s from RT to 500 °C. The frequency dispersion of the electrical resistivity reveals the hopping conduction mechanism. Frequency dispersion of the electrical resistivity fits to the modified Debye's function, which considers more than one ion contributing to the relaxation process. The mean relaxation time decreases from 2.8 to 1.4 μs with increasing T_s indicating that the effect of microstructure of the Y₂O₃ films is significant on the electrical properties.     

Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering

Highly conducting and transparent thin films of tungsten-doped ZnO (ZnO:W) were prepared on glass substrates by direct current (DC) magnetron sputtering at low temperature. The effect of film thickness on the structural, electrical and optical properties of ZnO:W films was investigated. All the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. The electrical resistivity first decreases with film thickness, and then increases with further increase in film thickness. The lowest resistivity achieved was 6.97 × 10⁻⁴ Ω cm for a thickness of 332 nm with a Hall mobility of 6.7 cm² V⁻¹ s⁻¹ and a carrier concentration of 1.35 × 10²¹ cm⁻³. However, the average transmittance of the films does not change much with an increase in film thickness, and all the deposited films show a high transmittance of approximately 90% in the visible range.     

Spectroscopic ellipsometry studies on hydrogenated amorphous silicon thin films deposited using DC saddle field plasma enhanced chemical vapor deposition system

Hydrogenated amorphous silicon (a-Si H) films deposited on crystalline silicon substrates using the DC saddle field (DCSF) plasma enhanced chemical vapor deposition (PECVD) system have been investigated. We have determined the complex dielectric function, ε(E) = ε₁(E) + iε₂(E) for hydrogenated amorphous silicon (a-Si:H) thin films by spectroscopic ellipsometry (SE) in the 1.5-4.5 eV energy range at room temperature. The results indicate that there is a change in the structure of the a-Si:H films as the thickness is increased above 4 nm. This is attributed to either an increase in the bonded hydrogen content and, or a decrease of voids during the growth of a-Si:H films. The film thickness and deposition temperature are two important parameters that lead to both hydrogen content variation and silicon bonding change as well as significant variations in the optical band gap. The influence of substrate temperature during deposition on film and interface properties is also included.     

Influence of NiCr/Au electrodes and multilayer thickness on the electrical properties of PANI/PVS ultrathin film grown by Lbl deposition

In the present work, we concentrate on the study of effects of metallic electrodes, multilayer thickness and temperature in ac and dc electrical conductivity of polyaniline/poly(vinyl sulfonic acid) (PANI/PVS) ultrathin films. The polymer system was obtained from layer-by-layer (Lbl) self-assembly technique on a glass substrate with an electrode array of adhesion layer of NiCr (20 nm) covered with Au (180 nm). We observed a significant and abrupt increase in the value of dc conductivity and a change of ac conductivity behavior of NiCr/Au-PANI/PVS-NiCr/Au structure when the thickness of PANI/PVS system reaches the Au layer. These effects were ascribed to the ideal contact of Au-PANI/PVS and the relative high interfacial contact resistance between PANI/PVS and NiCr, thus reducing the parallel resistance of NiCr/Au-PANI/PVS interfacial layer in an ideal parallel plate capacitor structure. Atomic Force Microscopy images confirm this assumption. Furthermore, the ac conductivity of Au-PANI/PVS-Au structure was typical of solid disordered materials. A model based on carrier hopping in a medium with randomly varying energy barriers was presented for the ac conductivity of the polymer system, which also encompasses the high dielectric constant of PANI/PVS blended films, the neutral contact Au-PANI/PVS, and the electrical resistance of NiCr-PANI/PVS interfacial layer. The model allowed separating the interface and the bulk effects in the electrical response of NiCr/Au-PANI/PVS-NiCr/Au structure and in addition the highest activation energy (35 MeV) correlated with an optimization of hopping distance (30 nm) for carriers jumps in PANI/PVS system.     

On the annealing temperature, penetration depth of oxygen and film thickness on the DC and AC electrical properties and nano-structure of Ti thin films

Ti films of different thickness ranging from 12.3 to 246.2 nm were deposited, using resistive heat method and post-annealed at different temperatures with a flow of 5 cm³ s⁻¹ oxygen. The nano-structures of the films were obtained using X-ray diffraction (XRD) and atomic force microscopy (AFM). The results showed an initial reduction of the grain size at 373 K annealing temperature and increase of the grain size at higher temperatures. The cause of this was due to the reaction of oxygen with Ti atoms which breaks up the Ti grains and hence needle-like features form. The enhancement of activation processes at higher temperatures results in larger grains. The analysis of XRD in conjunction with AFM images showed that those films containing (004) line of anatase phase and sub-oxide phases of titanium oxide also show two types of grains in the AFM images. The resistivity of the film increased with annealing temperature, which is due to competition between increased diffusion rate and the increased reaction rate of oxygen with Ti atoms. The Hall coefficient R_H and the mobility μ decreased with increasing film thickness at all annealing temperatures, while R_H increases and μ decreases with increasing the annealing temperature. The carrier concentration increased with film thickness and decreased with annealing temperature. The impedance spectroscopy showed that all films have a pure RC behaviour, where the magnitude of R depends on the annealing temperature and film thickness. The apparent activation energies E_a, obtained from three different methods, namely σ, R_H and grain size showed good agreement within 0.30-0.46 eV for the range of film thickness examined in this work. It was found that films with thickness less than 70 nm can be recognized as Ti-oxide films while thicker films are only surface-oxidised Ti films.     

Sputter deposition of semicrystalline tin dioxide films

Tin dioxide is emerging as an important material for use in copper indium gallium diselenide based solar cells. Amorphous tin dioxide may be used as a glass overlayer for covering the entire device and protecting it against water permeation. Tin dioxide is also a viable semiconductor candidate to replace the wide band gap zinc oxide window layer to improve the long-term device reliability. The film properties required by these two applications are different. Amorphous films have superior water permeation resistance while polycrystalline films generally have better charge carrier transport properties. Thus, it is important to understand how to tune the structure of tin dioxide films between amorphous and polycrystalline. Using X-ray diffraction (XRD) and Hall-effect measurements, we have studied the structure and electrical properties of tin dioxide films deposited by magnetron sputtering as a function of deposition temperature, sputtering power, feed gas composition and film thickness. Films deposited at room temperature are semicrystalline with nanometer size SnO₂ crystals embedded in an amorphous matrix. Film crystallinity increases with deposition temperature. When the films are crystalline, the X-ray diffraction intensity pattern is different than that of the powder diffraction pattern indicating that the films are textured with (101) and (211) directions oriented parallel to the surface normal. This texturing is observed on a variety of substrates including soda-lime glass (SLG), Mo-coated soda-lime glass and (100) silicon. Addition of oxygen to the sputtering gas, argon, increases the crystallinity and changes the orientation of the tin dioxide grains: (110) XRD intensity increases relative to the (101) and (211) diffraction peaks and this effect is observed both on Mo-coated SLG and (100) silicon wafers. Films with resistivities ranging between 8 mΩ cm and 800 mΩ cm could be deposited. The films are n-type with carrier concentrations in the 3 × 10¹⁸ cm^− 3 to 3 × 10²⁰ cm^− 3 range. Carrier concentration decreases when the oxygen concentration in the feed gas is above 5%. Electron mobilities range from 1 to 7 cm²/V s and increase with increasing film thickness, oxygen addition to the feed gas and film crystallinity. Electron mobilities in the 1-3 cm²/V s range can be obtained even in semicrystalline films. Initial deposition rates range from 4 nm/min at low sputtering power to 11 nm/min at higher powers. However, deposition rate decreases with deposition time by as much as 30%.     

Structural properties of low-temperature grown ZnO thin films determined by X-ray diffraction and X-ray absorption spectroscopy

The epitaxial growth of ZnO thin films on Al₂O₃ (0001) substrates have been achieved at a low-substrate temperature of 150 °C using a dc reactive sputtering technique. The structures and crystallographic orientations of ZnO films varying thicknesses on sapphire (0001) were investigated using X-ray diffraction (XRD). We used angle-dependent X-ray absorption near-edge structure (XANES) and extended X-ray absorption fine structure (EXAFS) spectroscopy to examine the variation of local structure. The XRD data showed that the crystallinity of the film is improved as the film thickness increases and the strain is fully released as the film thickness reached about 800 Å. The Zn K-edge XANES spectra of the ZnO films have a strong angle-dependent spectral feature resulting from the preferred c-axis orientation. The wurtzite structure of the ZnO films was explicitly shown by the XRD and EXAFS analysis. The carrier concentration, Hall mobility and resistivity of the 800 Å-thick ZnO film were 1.84 × 10¹⁹ cm^− 3, 24.62 cm²V^− 1s^− 1, and 1.38 × 10^− 2 Ω cm, respectively.     

Study of non-isothermal kinetics, electrical and optical properties of (GaSeTe) films

Ternary Ga_xSe_86−xTe₁₄ amorphous films (x=15 and 36) were prepared by thermal evaporation. The results of differential scanning calorimetry (DSC) at different heating rates are reported and discussed. The glass transition activation energy, E_t, and the crystallization activation energy, E_c, were evaluated by measuring the heating rate dependence of the glass transition, crystallization onset and peak crystallization temperatures. The average calculated values of E_t and E_c are 140.29 and 97.89 kJ/mol, respectively. The electrical conductivity of amorphous Ga_xSe_86−xTe₁₄ thin films with different thickness has been measured in the temperature range (263.2-333.3 K) and this allows the effect of introducing a metallic impurity to be observed. It was observed that conductivity increases with increasing activation energy and with a lowering of the pre-exponential factor, which suggests the results can be explained in terms of hopping conduction. The optical constants of these films were determined by transmission and reflection measurements at normal incidence in the spectral range of 500-800 nm. The refractive index has anomalous behavior in the spectral range 400-500 nm. The refractive index dispersion can be fitted to a single oscillator model.