GaN reactive ion etching using SiCl<Subscript>4</Subscript>:Ar:SF<Subscript>6</Subscript> chemistry

Reactive ion etching with SiCl₄:Ar:SF₆ mixtures of gallium nitride epitaxial layers grown by metal organic chemical vapour deposition (MOCVD) has been studied. The effects of several factors such as gas mixture, chamber pressure, and drive power on the etch rate and etched profile have been investigated. A strong dependence of both properties with the amount of SF₆ present in the mixture has been found. High etch rates (> 50 nm/min) and controllable sidewall angles and smoothness have been achieved.     

Influence of C<Subscript>4</Subscript>F<Subscript>8</Subscript>/Ar/O<Subscript>2</Subscript> plasma etching on SiO<Subscript>2</Subscript> surface chemistry

The plasma assisted etching of SiO₂ in a commercial RF reactor with a variety of C₄F₈/Ar/O₂ chemistries has been studied by XPS, SIMS and FTIR. A simple model of surface reactions is proposed. In particular, the role of oxygen in the etch process has been investigated. According to our experiments, oxygen inhibits the formation of CFH based polymeric films on the surface. As the etching process is due to an exchange reaction between the oxygen in the SiO₂ and the gaseous fluorine species in the plasma, the presence of oxygen in the etch hinders this process by occupying adsorption sites on the surface. The results would confirm that argon does not participate in chemical reactions with the SiO₂ substrate but provides energy for reactions in which F, C and O are involved. The results also indicate that a thick fluorocarbon layer only forms on the surface in the absence of oxygen, regardless of the oxygen source. Consequently, only when the SiO₂ layer has been substantially removed does this film form.     

Passivation and antireflection AZO:H layer in AZO:H/p-Si heterojunction solar cells

In this work, aluminum-doped zinc oxide (AZO)/p-Si heterojunction solar cells were prepared by sputtering of ~120 nm AZO thin films in Ar or Ar–H₂ atmosphere on textured p-Si wafers, and the effects of hydrogen incorporation on the solar cell performance were investigated. Results showed that the performance of AZO/p-Si heterojunction solar cells was improved with the increase of hydrogen volume concentration from 0 to 23 %. The AZO:H/p-Si heterojunction solar cells prepared in Ar–23 % H₂ exhibited a short-circuit current density of 29 mA/cm² and a conversion efficiency of 2.84 %. The reflectance measurement indicated that the reflectance of p-Si surface in the range of 400–1,100 nm decreased from 13 to 4 % after AZO:H films coating; and the capacitance–voltage measurement indicated that the density of defect states at AZO/p-Si interface was decreased after hydrogen incorporation. Passivation and antireflection functions can be realized in AZO:H films deposited in Ar–H₂, which opens a novel route to prepare cost-effective AZO/p-Si heterojunction solar cells.     

Growth and magnetic properties of spin coated Co<Subscript>0.6</Subscript>Zn<Subscript>0.4</Subscript>Mn<Subscript>0.3</Subscript>Fe<Subscript>1.7</Subscript>O<Subscript>4</Subscript> ultrathin films on silicon (100), (110) and (111) substrates

This paper reports growth of Co_0.6Zn_0.4Mn_0.3Fe_1.7O₄ (CZFMO) ultrathin films (thickness: 23–30 nm) by spin coating technique on silicon (100), (110) and (111) substrates. The deposited films were annealed at 700 °C for 1 h in the oxygen environment. All the films were found to be polycrystalline in nature. The CZFMO films were found to have minimal residual stress (13–50 MPa), which could be an encouraging feature for novel microwave miniaturized device applications. Room temperature magnetic measurements demonstrated completely saturated hysteresis loop with the highest squareness ratio (M _R /M _S )?~?60% for the film grown on Si (110) substrate. On the other hand CZFMO films on Si (100) and Si (111) substrates showed unsaturated hysteresis loops with M _R /M _S ~ 10 and 5%, respectively. The reason for the better magnetic properties of the ultrathin CZFMO film on Si (110) substrate seems to be its better crystalline quality and larger grain size compared to those of other films.     

Rietveld analysis of CaCu<Subscript>3</Subscript>Ti<Subscript>4</Subscript>O<Subscript>12</Subscript> thin films obtained by RF-sputtering

Calcium copper titanate, CaCu₃Ti₄O₁₂, CCTO, thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO₂/Si (100) substrates at a room temperature followed by annealing at 600 °C for 2 h in a conventional furnace. The crystalline structure and the surface morphology of the films were markedly affected by the growth conditions. Rietveld analysis reveal a CCTO film with 100 % pure perovskite belonging to a space group Im3 and pseudo-cubic structure. The XPS spectroscopy reveal that the in a reducing N₂ atmosphere a lower Cu/Ca and Ti/Ca ratio were detected, while the O₂ treatment led to an excess of Cu, due to Cu segregation of the surface forming copper oxide crystals. The film present frequency -independent dielectric properties in the temperature range evaluated, which is similar to those properties obtained in single-crystal or epitaxial thin films. The room temperature dielectric constant of the 600-nm-thick CCTO films annealed at 600 °C at 1 kHz was found to be 70. The leakage current of the MFS capacitor structure was governed by the Schottky barrier conduction mechanism and the leakage current density was lower than 10^?7 A/cm² at a 1.0 V. The current–voltage measurements on MFS capacitors established good switching characteristics.     

Orientation controlling of Pb(Zr<Subscript>0.53</Subscript>Ti<Subscript>0.47</Subscript>)O<Subscript>3</Subscript> thin films prepared on silicon substrates with the thickness of La<Subscript>0.5</Subscript>Sr<Subscript>0.5</Subscript>CoO<Subscript>3</Subscript> electrodes

Pb(Zr_0.53Ti_0.47)O₃ (PZT) thin films were prepared on La_0.5Sr_0.5CoO₃ (LSCO) coated Si substrates by a sol–gel route. The thickness of LSCO electrode was found to modify the preferential orientation of PZT thin films, which consequently affected the dielectric and ferroelectric properties. (100) textured PZT films with dense columnar structure could be obtained on the top of (110) textured LSCO with thickness of 230 nm. PZT thin films prepared on the optimized LSCO films exhibit the enhanced dielectric constant and remnant polarization of 980 and 20 μC/cm², respectively.     

Fabrication of Cu<Subscript>2</Subscript>SnS<Subscript>3</Subscript> thin-film solar cells with oxide precursor by pulsed laser deposition

In this paper, Cu₂SnS₃ (CTS) thin film is fabricated through sulfurization of oxide precursor which is deposited by pulsed laser deposition with a mixed CuO/SnO₂ target. XRD and Raman analyses indicate a pure monoclinic Cu₂SnS₃ phase has been obtained by sulfurization at temperature from 500 to 600 °C. A compact and smooth film with polycrystalline structure is observed through SEM result. In addition, the CTS films show excellent absorbance with the band gap around 0.91 eV estimated by UV–Vis, which is suitable for the absorption layer of solar cells. Final devices were fabricated with a SLG/Mo/CTS/CdS/i-ZnO/AZO/Al structure. Device performance is improved with the temperature increasing. The best efficiency of CTS-based solar cells is 0.69% with an open-circuit voltage of 144 mV and a short-circuit current density of 18.30 mA/cm^?2.     

Mixed Nb<Subscript>2</Subscript>O<Subscript>5</Subscript>:MoO<Subscript>3</Subscript> (95:5 and 85:15) thin films and their properties for electrochromic device applications

Nb₂O₅:MoO₃ (95:5 and 85:15) thin films were deposited onto glass and fluorine doped tin oxide coated glass substrates at 100 and 300 °C by RF magnetron sputtering technique. The physical and electrochromic properties of the films were studied. XRD result reveals that deposited films were amorphous. The XPS study confirms the compositional purity and the presence of Nb⁵⁺ and Mo⁶⁺ in the deposited film. Surface morphological study shows platelet like features of deposited film. The average transmittance of the film is varied between 91 and 85 %. Photoluminescence study exhibits three characteristic emission peaks and confirms the better optical quality of deposited film. Raman spectra show the LO–TO splitting of Nb–O stretching of the deposited film. Electrochromic behavior of the deposited films characterized by cyclic voltammetry using 0.5 M LiClO₄·PC and 0.5 M H₂SO₄ electrolyte solutions show all the films are having better reversibility and reproducibility in their electrochemical analysis.     

Properties of nickel doped In<Subscript>2</Subscript>S<Subscript>3</Subscript> thin films deposited by spray pyrolysis technique

In this work, nickel (Ni) doped indium sulfide (In₂S₃) films have been prepared by the spray pyrolysis (CSP) technique on glass substrates at 350 °C. The Ni doping level was changed with Ni:In (0, 2 and 4% in solution). The structural studies reveal that the deposited films are polycrystalline in nature exhibiting cubic structure. The crystallite size decreases from 27.5 to 23 nm and the root mean square roughness values increase from 13 to 18 nm. The transmission coefficient is about 70–55% in the visible region and 85–75% in near-infrared region. The band gap energy increases with nickel content from 2.74 to 2.82 eV for direct transitions. The refractive index values of In₂S₃:Ni thin films decrease from 2.43 to 2.40 and the extinction coefficient values are in the range 0.01–0.20. Besides, the AC conductivity contribution is interpreted using the universal Jonscher’s power law and it is found thermally activated and it can be described by the correlated barrier-hopping models. These studies help to form significant correlation between temperature and activation energy. Nyquist plots show that the electrical response is accurately fitted by the Cole–Cole model and represented by an equivalent electrical circuit which consists of a parallel combination of a resistance and a constant phase element. From this analysis, the evidence of grain boundary conduction has been observed.     

Substrate dependent morphological and electrochemical properties of V<Subscript>2</Subscript>O<Subscript>5</Subscript> thin films prepared by spray pyrolysis

A scheme of substrate dependent self-organization of vanadium oxide has been used to create unique supercapacitor electrodes. In present work, thin films of V₂O₅ were prepared on different substrates by using well known spray pyrolysis technique.The sample depositions were carried out at 673 K, by spraying 0.05 M, 40 ml solution of ammonium metavanadate at the spray rate 10 ml/min. V₂O₅ thin films grown on aluminum (Al), copper (Cu) and stainless steel (SS) substrates shows porous valley and mountains, rough and dense morphology with overgrown agglomeration of nano grains. In electrochemical characterizations, by using standard electrode configurations, specific capacitance values were evaluated from cyclic voltammetry in 1 M KCl, these are 18.43, 1500.0, 439.60 and 250.58 F/g at 5 mV/s for the electrodes deposited on Al, Cu, SS substrates and two electrode cell respectively. Charge discharge behavior of the SS electrode and two electrode cell was observed using chronopotentiometry. This exhibits specific energy, specific power, and coulombic efficiency (η) 84.91 Wh/kg, 120.00 kW/kg and 89.51 % for SS electrode and 19.92 Wh/kg, 65.00 kW/kg and 99.90 % for two electrode cell respectively. Impedance study was carried out in the frequency range 1 mHz–1 MHz depicts less internal resistance of SS electrode ~2.69 Ω and two electrode cell ~3.04 Ω.     

Etch characteristics of indium zinc oxide thin films using inductively coupled plasma of a Cl2/Ar gas

Inductively coupled plasma reactive ion etching of indium zinc oxide (IZO) thin films masked with a photoresist was performed using a Cl₂/Ar gas. The etch rate of the IZO thin films increased as Cl₂ gas was added to Ar gas, reaching a maximum at 60% Cl₂ and decreasing thereafter. The degree of anisotropy in the etch profile improved with increasing coil rf power and dc-bias voltage. Changes in pressure had little effect on the etch profile. X-ray photoelectron spectroscopy confirmed the formation of InCl₃ and ZnCl₂ on the etched surface. The surface morphology of the films etched at high Cl₂ concentrations was smoother than that of the films etched at low Cl₂ concentrations. These results suggest that the dry etching of IZO thin films in a Cl₂/Ar gas occurs according to a reactive ion etching mechanism involving ion sputtering and a surface reaction.     

Ultraviolet-assisted cold poling of Pb(Zr<Subscript>0.52</Subscript>Ti<Subscript>0.48</Subscript>)O<Subscript>3</Subscript> films

This paper discusses the advantages of a room-temperature poling procedure during exposure to ultraviolet light for Pb(Zr_0.52Ti_0.48)O₃ (PZT) films. The results of these experiments include the following: for 1.7-µm-thick chemical solution-deposited PZT films, the saturation photocurrent density after a 10 min white light exposure (190–1900 nm) (no DC bias field applied) increased up to 0.066 µA/cm² with increasing Cr thickness of top electrode in Cr/Pt bilayer electrodes. Furthermore, the d_33,f piezoelectric coefficients for UV-poled samples were 40 and 20% higher than those achieved from field-only poling at either room temperature or 150 °C. Additionally, the development of an internal bias field and pinching were investigated in major and minor polarization–electric field loops. It was found that ultraviolet illumination during the poling process produced photoinduced charge carriers that became trapped by local defects and/or grain boundaries in the films.     

Dry etching of AlN films using the plasma generated by fluoride

The plasma produced by the mixture of fluoride and argon (SF₆/Ar) was applied for the dry etching of AlN films. Very high etching rate up to 140 nm/min have been observed. The effects of the bias voltage and the plasma component on the etching results were investigated. It shows that AlN can be effectively etched by the plasma with the moderate SF₆ concentration and the etching rate varies linearly with the bias voltage. The FTIR spectra confirm that AlF₃ is formed due to the chemical reaction of Al and F atoms. The mechanism of AlN etching in F-based plasma is probably a combination between physical sputtering and chemical etching and can be briefly outlined: (i) F⁻ ions reacts with Al atoms to form low volatile product AlF₃ and passivate the surface, and (ii) at the same time the Ar⁺ ions sputter the reaction product from the surface and keep it fluoride free to initiate further reaction. AlF₃ formed on the patterned sidewall play a passivation role during the etching process. The etching process is highly anisotropic with quite smooth surface and vertical sidewalls.     

Growth of Y<Subscript>3</Subscript>Fe<Subscript>5</Subscript>O<Subscript>12</Subscript> films on Si with AlO<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> and SiO<Subscript>2</Subscript> buffer layers by ion beam sputtering

Amorphous yttrium iron garnet films ranging in thickness from 100 to 600 nm have been produced on single-crystal silicon substrates by sputtering a polycrystalline target with the composition Y₃Fe₅O₁₂ (yttrium iron garnet) by a mixture of argon and oxygen ions. Before film growth, AlO _x or SiO₂ buffer layers up to 0.8 μm in thickness were grown on the Si surface. The heterostructures were crystallized by annealing in air at a temperature of 950°C for 30 min. The properties of the films were studied by magneto-optical techniques, using Kerr effect and ferromagnetic resonance measurements. The Gilbert damping parameter reached 2.8 × 10^–3 and the effective planar magnetic anisotropy field was independent of the nature of the buffer layer. This suggests that the thin-film heterostructures obtained in this study are potentially attractive for use in spin-wave semiconductor devices.     

Effects of Al content on the properties of ZnO:Al films prepared by Al<Subscript>2</Subscript>O<Subscript>3</Subscript> and ZnO co-sputtering

Aluminum doped zinc oxide (AZO) films were deposited on quartz substrates by radio-frequency magnetron co-sputtering method with ZnO and Al₂O₃ ceramic targets. The structural, optical and electrical properties of these films as a function of the Al content were investigated. XRD results reveal that the AZO films are wurtzite structure with (002) preferred orientation. The average transmittance of all the films is higher than 80% in a wide wavelength range from 400 to 1,500 nm. The band gap energy, calculated from their optical absorption spectra, is in the range of 3.50–3.66 eV depending on the Al content. Doping of Al³⁺ in the ZnO makes the film surface roughness decrease. The dopant Al³⁺ acts as electron donor by which the electrical conductivity and carrier concentration of the films are obviously increased until the Al³⁺ reaches its saturation content of about 4.50 at.%.     

Study of Ar + O2 deposition pressures on properties of pulsed laser deposited CdTe thin films at high substrate temperature

Cadmium telluride (CdTe) thin films deposited by pulsed laser deposition (PLD) on fluorine–tin–oxide substrates under different pressures of argon (Ar) + oxygen (O₂) at high substrate temperature (T_s = 500 °C) was reported in this paper. In our work, the CdTe thin films were prepared successfully at high T_s by inputting Ar + O₂. As reported, PLD-CdTe thin films were almost prepared at low substrate temperatures (<300 °C) under vacuum conditions. The deposition of CdTe thin films at high T_s by PLD is rarely reported. The influence of the Ar + O₂ gas pressure on thickness, structural performance, surface morphology, optical property and band gap (E_g) had been investigated respectively by Ambios probe level meter, X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–Vis spectrometer. Strong dependence of properties on the deposition pressures was revealed. In the range of Ar + O₂ gas pressure from 5 to 12 Torr, the deposition rate and the E_g of CdTe films vary in the range of 41.9–57.66 nm/min then to 35.26 nm/min and 1.51–1.54 eV then to 1.47 eV, respectively. The XRD diagrams showed that the as-deposited films were polycrystalline, and the main phase was cubic phase. However, the preferred orientation peak disappeared when the deposition pressure was higher. SEM images indicated that the CdTe film deposited at a higher deposition pressure was more uniform and had a higher compactness and a lower pinhole density. Furthermore, based on this thorough study, FTO/PLD-CdS (100 nm)/PLD-CdTe (~1.5 μm)/HgTe:Cu/Ag solar cells with an efficiency of 6.68 % and an area of 0.64 mm² were prepared successfully.     

Highly textured La<Subscript>2</Subscript>Zr<Subscript>2</Subscript>O<Subscript>7</Subscript> and CeO<Subscript>2</Subscript> buffer layers by ink jet printing for coated conductors

The objective of this paper is to prove the possibility to produce single side buffered substrates for coated conductors. We report for the first time the production of highly textured NiW/La₂Zr₂O₇/CeO₂ system by all-chemical solution deposition means using an in-house built drop-on-demand ink-jet printer. Lanthanum zirconate precursor ink was produced using lanthanum acetate and zirconium n-propoxide modified with propionic and acetic acid, respectively, and diluted with methanol. Cerium oxide precursor ink was prepared using cerium acetylacetonate dissolved in acetylacetone and diluted in methanol. Optimized ink jet control parameters (inter-droplet distance, nozzle opening time and pressure in the chamber) allowed the deposition of homogeneous highly textured films with a thickness of approximately 150–200 nm at speeds as high as 27 cm/min. La₂Zr₂O₇ film showed in plane and out of plane misalignment of 6.6° and 7.4°, respectively, whereas values obtained for CeO₂ were 7.8° and 8.1°, respectively. This study represents a step forward in the production of reel-to-reel coated conductors in an efficient and economic way.     

Rutile TiO<Subscript>2</Subscript> films as electron transport layer in inverted organic solar cell

Titanium dioxide (TiO₂) thin films were prepared by sol–gel spin coating method and deposited on ITO-coated glass substrates. The effects of different heat treatment annealing temperatures on the phase composition of TiO₂ films and its effect on the optical band gap, morphological, structural as well as using these layers in P3HT:PCBM-based organic solar cell were examined. The results show the presence of rutile phases in the TiO₂ films which were heat-treated for 2 h at different temperatures (200, 300, 400, 500 and 600 °C). The optical properties of the TiO₂ films have altered by temperature with a slight decrease in the transmittance intensity in the visible region with increasing the temperature. The optical band gap values were found to be in the range of 3.28–3.59 eV for the forbidden direct electronic transition and 3.40–3.79 eV for the allowed direct transition. TiO₂ layers were used as electron transport layer in inverted organic solar cells and resulted in a power conversion efficiency of 1.59% with short circuit current density of 6.64 mA cm^?2 for TiO₂ layer heat-treated at 600 °C.     

Structural and plasmonic characteristics of sputtered SnO<Subscript>2</Subscript>:Sb and ZnO:Al thin films as a function of their thickness

Heavily doped metal oxide semiconductors are being developed as thin film transparent electrodes for many applications and their deposition at low substrate temperature can extend the use on heat sensitive devices. The structural and electro-optical characteristics of such metal oxide coatings are tightly related and depend on the specific deposition parameters apart from the material composition. In this work, SnO₂:Sb (ATO) and ZnO:Al (AZO) thin films have been prepared by sputtering at room temperature on glass substrates, changing the deposition time to obtain various layer thicknesses from 0.2 to 0.9 μm; and they have been analyzed by X-ray diffraction, spectrophotometry, and Hall-effect measurements. ATO samples crystallize in the tetragonal structure with mean crystallite size increasing from 8 to 20 nm when the film thickness grows. The comparison of Hall mobility and optical mobility values indicates a significant contribution of grain boundary scattering for these ATO layers. Otherwise, AZO films show larger crystallites (21–27 nm) and a strong preferential orientation for analogous thickness increment, resulting in a lower contribution of the grain boundary scattering to the overall Hall mobility. The in-grain mobility for each sample is also related to the respective crystallite size and carrier concentration values.     

Study of surface morphology and optical properties of Nb<Subscript>2</Subscript>O<Subscript>5</Subscript> thin films with annealing

Nb₂O₅ films have been deposited on variety of substrates using the sol-gel dip coating technique. As-deposited films on all substrates are amorphous. Films were annealed under controlled ambience at 300, 400 and 600°C for 5 h. As-deposited films on glass substrate show uniform surface structure. The crystal structure and surface topography are found to depend strongly on the annealing temperature and nature of the substrates. The average grain size of 40 nm is observed in films annealed at 300°C. On annealing at 400°C increasing grain size and resulting fusing of them, enhanced surface roughness. Films deposited on NaCl substrates crystallized into a stable monoclinic phase and those deposited on single crystal Si substrates crystallized into hexagonal phase after annealing at 600°C. The as-deposited films show very high transmittance (>90%) in the visible region. The optical band gap is observed to increase from 4.35 eV when the films are in amorphous state to 4.87 eV on crystallization.