酸蚀处理时间对种植体表面特性的影响规律

利用酸蚀处理技术对Al2O3喷砂处理后的种植体表面进行改性处理。采用扫描电镜(SEM)、表面接触角分析仪、表面轮廓仪等研究酸蚀处理后种植体的表面形貌、粗糙度和亲水性等表面特性。结果表明:酸蚀处理可促使种植体表面形成了多孔洞结构,进而改变其表面特性;当酸蚀处理20min时,种植体表面形成了蜂窝状多级孔洞结构,其表面粗糙度Ra为(1.77±0.064)μm、表面接触角为(47.7±3.022)°,有利于种植体与骨组织形成骨性结合。     

一种用电火花结合离子束增强沉积复合改性钛合金表面的方法

本发明公开了一种用电火花结合离子束增强沉积复合改性钛合金表面的方法，包括下述步骤：在超声波作用下用有机溶剂清洗钛合金表面，清洗时间为5～10min；将经过时效处理后的钛合金用电火花表面强化器强化处理（电极材料为硅青铜或者YG-8型硬质合金），处理过程中用Ar气保护，Ar气流量为8L／min；用离子束增强沉积磁控溅射和多弧设备，在经过电火花强化处理过的钛合金表面用氩离子轰击清洗8～12min，沉积过程中也要用氩离子不断轰击已沉积的膜层，沉积用靶材为硅青铜。由于采用了电火花表面强化与离子束沉积结合方法，     

纳米Ce/CuO的改性及室温脱硫性能

采用直接沉淀法制备出铁、钴和锌元素改性的纳米Ce/CuO脱硫剂,在室温常压条件下吸附含H2S恶臭气体,研究其脱硫活性。通过X射线衍射(XRD)仪、透射电子显微镜(TEM)、X射线光电子能谱(XPS)等技术分析了改性元素对纳米Ce/CuO脱硫剂结构的影响,探讨脱硫剂结构变化与脱硫性能的关系。结果表明,改性元素钴添加到纳米Ce/CuO脱硫剂中具有最好的脱硫活性,钴的添加使纳米Ce/CuO脱硫剂的粒径明显变小,材料中存在Cu~(3+),且Cu~(3+)/Cu~(2+)的摩尔比值要高于纳米CuO和Ce/CuO样品,说明Co/Ce/CuO表面对脱硫反应有利的氧空位增加;当Co添加量为4.9%时,Co/Ce/CuO脱硫剂的穿透时间可达525 min,比Ce/CuO脱硫剂的穿透时间延长了近300 min。     

纳米Ce/CuO的改性及室温脱硫性能研究

本文采用直接沉淀法制备出铁、钴和锌元素改性的纳米Ce/CuO脱硫剂,在室温常压条件下吸附含H2S恶臭气体,研究其脱硫活性。通过X射线衍射(XRD),透射电子显微镜(TEM),X射线光电子能谱(XPS)等技术分析了改性元素对纳米Ce/CuO脱硫剂结构的影响,探讨脱硫剂结构变化与脱硫性能的关系。结果表明,改性元素钴添加到纳米Ce/CuO脱硫剂中具有最好的脱硫活性,钴的添加使纳米Ce/CuO脱硫剂的粒径明显变小,材料中存在Cu3 ,且Cu3 /Cu2 的摩尔比值要高于纳米CuO和Ce/CuO样品,说明Co/Ce/CuO表面对脱硫反应有利的氧空位增加;当Co添加量为4.9%时,Co/Ce/CuO脱硫剂的穿透时间可达525min,比Ce/CuO脱硫剂的穿透时间延长了近300min。     

钛铸件表面离子氮化/涂层复合处理及其性能研究

为提高口腔医学领域用纯钛铸件的表面性能,改善其美观效果,用辉光等离子氮化、脉冲电弧离子镀涂层复合处理纯钛铸件,使用扫描电镜、接触角测量系统及X射线衍射分析仪评价其表面性能及晶相结构组成,再用分光测色计分析其色彩学特征。结果表明,纯钛铸件等离子氮化、镀氮化钛涂层复合处理后表面形成均匀稳定的TiN复合梯度涂层;人工唾液在复合处理试件表面的接触角(60.29±2.00)°明显小于纯钛(73.12±3.29)°;颜色均匀美观,在CIE表色系中L*:61.22±0.455、a*:1.84±0.055、b*:25.66±0.219,呈金黄色,表面晶相结构以耐磨性较好的TiN、Ti2N为主。     

离子束活化对GF/PEEK金属化涂层结合强度的影响

为了解决玻纤/聚醚醚酮复合材料(GF/PEEK)因界面惰性导致的金属化涂层结合强度弱的问题,采用低能离子束对基材进行表面活化处理,再以磁控溅射和电镀技术制备Cu膜,从而实现复合材料表面大厚度、高性能金属化层的制备。分别采用Ar、H₂、O₂和H₂+N₂混合气体进行离子束活化,通过对比活化前后基材的润湿性能、微观形貌和表面特性变化,对离子束活化的作用机理展开研究,制备Cu膜并对Cu膜的结合强度进行判定,探讨不同气体活化对结合强度的影响规律。结果表明,经离子束活化后,复合材料的表面润湿性得到显著改善,极性官能团的相对含量明显提高,表面和浅表面玻纤的结构完整性受到破坏,采用Ar、H₂、O₂和H₂+N₂离子束活化处理后,Cu膜的结合强度由未经活化的0.1MPa逐渐提高至0.4 MPa、1.49 MPa、7.97 MPa和11.51MPa。离子束活化技术能够有效改善复合材料的表面活性,显著提高金属化涂层的结合强度,延长金属化...     

特殊浸润性表面构建及其抑制酸奶黏附的研究

目的 构建一种能够抑制酸奶黏附现象的特殊浸润性表面,探索特殊浸润表面的结构、组成及性能。方法 以棕榈蜡、二氧化硅和羧甲基纤维素钠为原料,通过喷涂法在聚苯乙烯片材上构建特殊浸润性表面。结果 棕榈蜡添加量为3 g,二氧化硅为0.9 g,两者共溶于100 mL无水乙醇,将0.6 g羧甲基纤维素钠溶于100 mL去离子水时,2种溶液共混(V_乙醇溶液∶V_水溶液=2∶1)在聚苯乙烯片材表面进行喷涂,并于75℃烘干30min,得到特殊浸润性表面。所构建的特殊浸润性表面具有典型的微纳结构,酸奶在其表面的接触角为(141.32±5.43)°,滚动角为(7.51±2.86)°。耐碱、耐盐试验表明,特殊浸润性涂层在浸泡24 h后,酸奶在其表面的接触角分别为(132.00±5.75)°和(130.18±6.09)°,与原始特殊浸润性表面相比未发生显著性下降(P>0.05)。此外,甲基蓝和邻苯二酚紫粉末的残留结果表明所构建的表面自清洁性能良好。酸奶在具有特殊浸润性表面的聚苯乙烯片材上的残留量为(3.77±1.99)%,显著低于无特殊浸润性表面的聚苯乙烯片材(15...     

离子束表面工程技术的进展*

综述了离子束表面工程技术近期研究进展,重点讨论了等离子体浸没离子注入(PIII)、强流脉冲离子束技术(HIPIB)、等离子体喷涂物理气相沉积(PS-PVD)、电子回旋共振(ECR)等离子体和磁过滤阴极真空弧沉积等表面工程技术;介绍了离子束表面工程在替代传统电镀技术、航空航天材料表面改性、太阳能利用中材料的表面改性、生物医学材料的表面改性等领域的应用。指出了离子束表面工程技术的未来研究方向,即深入研究离子束与材料表面的作用机理,开发高性能结构涂层和功能涂层,发展新的离子束复合表面技术。     

Al-Si合金表面疏水膜层的制备及耐腐蚀性能的研究

以Al-Si合金为基体材料,通过调整盐酸刻蚀时间(0 min、15 min、20 min、25 min、30 min和35 min)及硬脂酸浸泡时间(10 h、12 h、14 h和16 h)对该合金进行表面处理。通过扫描电子显微镜(SEM)、接触角测量仪、电化学工作站等分别对样品的表面形貌、表面润湿性、耐腐蚀性能等进行检测。结果表明：随着酸刻蚀时间的增加,Al-Si合金与水的接触角呈先增加后减小的趋势,在30 min时达到最高126.87°,较未处理合金的接触角提高了157%。此时合金表面出现了微纳米珊瑚状的凸凹结构;随着浸泡时间的增加,接触角呈现相同的变化趋势,浸泡时间为14 h时,接触角达到最高为149.32°。所得样品的自腐蚀电位提高了66.7%,而腐蚀电流密度降低了一个数量级,耐腐蚀性能显著增强。     

用高能束流进行钛合金表面改性

概述了利用高能束流进行材料表面改性的技术及其对钛合金表面改性的应用。这些技术包括激光固态相变强化处理,激光表面熔凝处理、激光表面合金化、离子注入、离子束混合和离子束辅助气相沉积。钛合金经高能束流表面改性处理可以提高其表面硬度、耐磨性和耐腐蚀性能。     

Structure, composition, and physicomechanical characteristics of HfB2 and Hf-B-N films

The paper deals with the study of the effect of the deposition conditions (the bias potential and substrate temperature) on the structure, composition, and physicomechanical characteristics of nanocrystalline films of hafnium diboride and boridonitride formed by the method of nonreactive (in Ar) and reactive (in Ar + N₂) HF magnetron sputtering, respectively. The optimal conditions for the deposition of the hafnium diboride coatings with growth texture in plane (00.1) and the best physicomechanical characteristics are deter-mined. It is shown that at a bias potential of ±50 V and a substrate temperature of ～500°C superstoichiometric highly textured films are formed with a nanohardness of 44 GPa and an elastic modulus of 396 ± 11 GPa. A relation between the composition, structure, and physicomechanical characteristics of the films is found. Reactive sputtering in (Ar + N₂) makes it possible to produce amorphous-crystalline films of the composite (HfB₂ + BN) that consists of grains of the HfB₂ nanocrystalline phase, the spaces between which are filled with the amorphous phase of graphite-like BN.     

The effects of ion beam treatment on the interfacial adhesion of Cu/polyimide system

In microelectronics packaging, the reliability of the metal/polymer interface is an important issue, as the adhesion strength between dissimilar materials is often inherently poor. The modification of polymer surfaces using Ar ion beam irradiation and RF plasma deposition has been commonly used to enhance the adhesion strength of the interface. In this study, the treatment of polyimide surfaces with Ar or O₂ ion beam irradiation and the DC magnetron sputtering of Cu films were adopted to prepare the specimens of Cu/polyimide systems. The results indicate that the peel strength increases as the Ar or O₂ ion beam irradiation energy increases at a fixed metal-layer thickness. Additionally, the treatment of polyimide surfaces using O₂ ion beam irradiation showed a higher peel strength than if Ar ion beam irradiation was utilized. This increase in peel strength mainly results from an increase in the surface roughness as well as an increase in the functional group on the polyimide film, both caused by ion beam irradiation.     

The effect of preliminary ion treatment on structure and chemical properties of polytetrafluoroethylene with a bioactive nanostructured coating

A comparative study of the effect of low-energy treatment with Ar ions, high-energy implantation with Ti ions, and subsequent deposition of bioactive nanostructured Ti-Ca-P-C-O-N coating on structure and properties of the polytetrafluoroethylene (PTFE) surface was carried out. The fcc phase based on titanium carbonitride with crystallite size of ～20 nm was found to be the major structural component of the Ti-Ca-P-C-O-N coating deposited onto the PTFE support. The ionic treatment of the PTFE surface increases the edge angle of wetting from 100 to 128°. The deposition of the Ti-Ca-P-C-O-N coating onto smooth PTFE surface results in a significant decrease of the edge angle of wetting to 20°; whereas the deposition of the coating onto high-porosity PTFE surface after ion implantation results in complete spreading and absorption of a drop. The differences in electrochemical behavior of the PTFE samples coated with Ti-Ca-P-C-O-N were shown to be determined by different roughnesses and wettabilities.     

Low temperature growth of rutile TiO2 films in modified rf magnetron sputtering

Low temperature (≤300°C) growth of rutile TiO₂ films with high refractive index which is equal to bulk TiO₂ crystal was achieved by using a modified sputtering method. Depositions were carried out in rf magnetron sputtering apparatus equipped with an auxiliary permanent magnet just under the grounded electrode. The as-deposited films showed rutile polycrystalline structure and fine surface morphology indicating higher densification. Remarkable changes in composition, total current and energy of incident ions were presented at a Ar–O₂ total pressure of 2.7 Pa. The rutile phase grows in a modified sputtering method in contrast with anatase phase growth in conventional sputtering apparatus.     

Effects of solution heat treatment on the microstructure, oxidation, and mechanical properties of a cast Ni3Al-based intermetallic alloy

Solution heat treatment is employed in an attempt to improve oxidation and mechanical properties of an as-cast Ni₃Al alloy (IC221M) at operation temperature, 900 °C. Solution heat treatment was hypothesized to have beneficial effects through dissolving γ Ni₅Zr eutectic into the matrix. The microstructures, oxidation behavior in air at 900 °C, and mechanical properties with aging times at 900 °C were examined after solution heat treatment of as-cast Ni₃Al alloy in Ar for up to 100 h at 1100 °C. The oxide penetration depth into the matrix was dramatically decreased and more homogeneous surface oxides were obtained relative to the no solution, treatment case. Hardness was improved by solution heat treatment due to a solid solution strengthening effect by Zr, but the tensile properties after solution heat treatment were not significantly different from those prior to treatment.     

Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering

Modulated pulse power (MPP) sputtering is a variation of high power pulsed magnetron sputtering (HPPMS) that overcomes the rate loss issue and achieves enhanced plasma ionization through modulation of the pulse shape, intensity, and duration. In this study, the principle and characteristics of MPP/HPPMS technique are first introduced. An electrostatic quadrupole plasma mass spectrometer installed parallel to the target surface has been used to examine the plasma properties, including time averaged ion energy and mass distributions of the positive ions, generated during sputtering a metal Cr target in pure Ar and Ar/N₂ atmospheres using MPP and continuous dc power sources in a closed field unbalanced magnetron sputtering system. It was found that the MPP plasma exhibits a low ion energy peak at 1-2 eV and a short ion energy tail with the maximum ion energy affected by the peak current and power utilized on the cathode. A significantly increased numbers of single and double charged Cr and Ar ions were identified in the MPP plasma as compared to the dc plasma in pure Ar. The number of ions (ion flux) increased when the peak target power and current were increased. Besides single and double charged Cr, Ar and N ions, N₃⁺, N₄⁺, CrN⁺ and CrN₂⁺ ion species were also identified in the MPP discharge with the introduction of N₂ into the system. The ion energy distributions of ion species for the MPP plasma in Ar/N₂ atmosphere exhibit similar peak values and tail distributions to those of the MPP plasma in pure Ar atmosphere. However, the energy tail extended toward higher energies due to the increased peak current and power on the cathode as the N₂ flow rate percentage was increased in the system.     

The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering

The time averaged ion energy distributions and ion fluxes of continuous dc magnetron sputtering (dcMS), middle frequency pulsed dc magnetron sputtering (PMS), and modulated pulse power (MPP) magnetron sputtering plasmas were compared during sputtering of a Cr target in an Ar/N₂ atmosphere in a closed field unbalanced magnetron sputtering system. The results showed that the dcMS plasma exhibited a low ion energy and ion flux; the PMS plasma generated a moderate ion flux of multiple high ion energy regions; while the MPP plasma exhibited a significantly increased number of target Cr⁺ and gas ions with a low ion energy as compared to the dcMS and PMS plasmas. Cubic CrN coatings were deposited using these three techniques with a floating substrate bias. The structure and properties of the coatings were characterized using X-ray diffraction, scanning electron microscopy, transmission electron microscopy, nanoindentation, microscratch and ball-on-disk wear tests. It was found that the deposition rate of the MPP CrN depositions was slightly lower than those of the dcMS depositions, but higher than in the PMS depositions at similar average target powers. The coatings deposited in the dcMS and PMS conditions without the aid of the substrate bias exhibited large columnar grains with clear grain boundaries. On the other hand, the interruption of the large columnar grain growth accompanied with the renucleation and growth of the grains was revealed in the MPP CrN coatings. The MPP CrN coatings exhibited a dense microstructure, fine grain size and smooth surface with high hardness (24.5 and 26 GPa), improved wear resistance (COF = 0.33 and 0.36) and adhesion, which are the results of the low ion energy and high ion flux bombardment from the MPP plasma.     

Nanomechanical Properties of Amorphous and Polycrystalline SrTiO3 Transparent Thin Films Prepared by Ion Beam Sputtering

Transparent SrTiO₃ thin films were deposited on glass substrates by ion beam sputtering at various substrate temperatures. The structural characteristic of the deposited films shows the transition from amorphous phase to polycrystalline phase at 600 °C. The films exhibit a good transparency in the visible region (~80-85%) and a relatively smooth surface. The calculated band gaps for amorphous and polycrystalline films were ~4.20 and ~3.84 eV, respectively. The refractive index of the films increases with increasing the substrate temperature, and the extinction coefficient of the films in the visible region is in the order of 10^?3, indicating low optical loss. The nanomechanical properties of the films were investigated using nanoindentation technique. Young’s modulus and hardness for all films are found to be increased with the increase of substrate temperature.     

Chemical erosion and sputtering of solid surfaces with liquid cluster ions

The sputtering phenomena of solid surfaces such as Si(111) and SiO₂ surfaces were investigated using ethanol and water cluster ion beams. To be compared with Ar monomer ion irradiation, the sputtering yield of Si surfaces was approximately 100 times higher for ethanol cluster ion irradiation and approximately 10 times higher for water cluster ion irradiation. Furthermore, for the ethanol cluster ion irradiation, chemical erosion such as silicon hydride and hydro-carbide reaction occurred on the Si surface, which resulted in the high-rate sputtering of the surface. On the other hand, for the water cluster ion irradiation, oxidation occurred on the Si surface, and physical sputtering was performed on the surface. Based on these results, chemical reaction at a nano-scale area on the Si(111) surfaces was discussed from the thermodynamic approach, and the impact of cluster ions on the surface exhibited high temperature such as a few tens of thousands degrees, which resulted in the enhancement of the chemical reaction. Thus, liquid cluster ion irradiation exhibited unique erosion and sputtering even at room temperature, which were not obtained by a conventional wet process.