InAs/GaAs量子点材料和激光器

介绍了近年来长波长InAsG/aAs量子点材料的生长、结构性质和量子点激光器的研究进展。     

Self‐Assembled InAs Quantum Dots on InP(001) for Long‐Wavelength Laser Applications

Self‐assembled InAs quantum dots (QDs) embedded in an InAlGaAs matrix were grown on an InP (001) using a solid‐source molecular beam epitaxy and investigated using transmission electron microscopy (TEM) and photoluminescence (PL) spectroscopy. TEM images indicated that the QD formation was strongly dependent on the growth behaviors of group III elements during the deposition of InAlGaAs barriers. We achieved a lasing operation of around 1.5 µm at room temperature from uncoated QD lasers based on the InAlGaAs‐InAlAs material system on the InP (001). The lasing wavelengths of the ridge‐waveguide QD lasers were also dependent upon the cavity lengths due mainly to the gain required for the lasing operation.     

InAs/GaAs自组装量子点结构的能带不连续量

为确定异质结界面带阶,结合光致发光(PL)谱和深能级瞬态谱(DLTS)测量结果,利用有效质量近似理论,计算得到了InAs/GaAs自组装量子点结构的能带不连续量,其中导带不连续量ΔEc＝0.97 eV,价带不连续量ΔEv＝0.14 eV.     

多层InAs量子点的光致发光研究

采用MBE设备生长了多层InAs/GaAs量子点结构,测量了其变温光致发光谱和时间分辨光致发光谱.结果表明多层量子点结构有利于减小发光峰的半高宽,并且可以提高发光峰半高宽和发光寿命的温度稳定性.实验发现,加InGaAs盖层后,量子点发光峰的半高宽进一步减小,最小达到23.6 meV,并且发光峰出现红移.原因可能在于InGaAs盖层减小了InAs岛所受的应力,阻止了In组分的偏析,提高了InAs量子点尺寸分布的均匀性和质量,导致载流子在不同量子点中的迁移效应减弱.     

InGaAs/GaAs量子阱中自组装InAs量子点的光学性质

在InGaAs/GaAs量子阱中生长了两组InAs量子点样品,用扫描电子显微镜(SEM)测量发现,量子点呈棱状结构,而不是通常的金字塔结构,这是由多层结构的应力传递及InGaAs应变层的各向异性引起的.采用变温光致发光谱(TDPL)和时间分辨谱(TRPL)研究了其光致发光稳态和瞬态特性.研究发现,InGaAs量子阱层可以有效地缓冲InAs量子点中的应变,提高量子点的生长质量,可以在室温下探测到较强的发光峰.在量子阱中生长量子点可以获得室温下1 318 nm的发光,并且使其PL谱的半高宽减小到25 meV.     

室温全电可操作的InAs/GaAs量子点存储器

报道基于高电子迁移率晶体管(HEMT)结构的InAs/GaAs量子点存储器,它既可以在室温下工作,又可以完全由栅极电压来控制其存储状态.在室温下通过对InAs/GaAs量子点存储器的延滞回线、偏压降温C-V等特性的实时测试,证明了其存储机理是由量子点层的深能级引起的,而并非是由量子点本征能级的充、放电所造成的.     

室温全电可操作的InAs/GaAs量子点存储器

报道基于高电子迁移率晶体管(HEMT)结构的InAs/GaAs量子点存储器,它既可以在室温下工作,又可以完全由栅极电压来控制其存储状态.在室温下通过对InAs/GaAs量子点存储器的延滞回线、偏压降温C-V等特性的实时测试,证明了其存储机理是由量子点层的深能级引起的,而并非是由量子点本征能级的充、放电所造成的.     

Stable Temperature Characteristics of InAs／GaAs Quantum Dots at Long Wavelength Emission

The time-resolved photoluminescence and steady photoluminescence (TRPL and PL) spectra on self-assembled InAs/GaAs quantum dots (QDs) are investigated. By depositing GaAs/InAs short period superlattices (SLs), 1. 48μm emission is obtained at room temperature. Temperature dependent PL measurements show that the PL intensity of the emission is very steady. It decays only to half as the temperature increases from 15 K to room temperature, while at the same time, the intensity of the other emission decreases by a factor of 5 orders of magnitude. These two emissions are attributed to large-size QDs and short period superlattices (SLs), respectively. Large-size QDs are easier to capture and confine carriers, which benefits the lifetime of PL, and therefore makes the emission intensity insensitive to the temperature.     

Effects of growth interruption on the evolution of InAs/InP self-assembled quantum dots

We investigated the change in the structural and optical properties of InAs/InP quantum structures during growth interruption (GI) for various times and under various atmospheres in metalorganic chemical vapor deposition. Under AsH₃ + H₂ atmosphere, the mass transport for the 2D-to-3D transition was observed during the GI. Photoluminescence peaks from both quantum dots (QDs) and quantum wells were observed from the premature QD samples. The fully developed QDs showed the two distinct temperature regimes in the PL peak position, full width at half maximum (FWHM) and wavelength-integrated peak intensity. The two characteristic activation energies were obtained from the InAs/InP QDs: ∼10 meV for intra-dot excitation and 90 ∼ 110 meV for the excitation out of the dots, respectively. It was also observed that the QD evolution kinetics could be suppressed in PH₃ + H₂ and H₂ atmospheres. The proper control of GI time and atmosphere might be a useful tool to further improve the properties of QDs.     

InP胶体量子点的合成及光谱性质

以三辛基氧化膦(TOPO)作为溶剂,利用无水InCl3和P(Si(CH3)3)3之间的脱卤硅烷基反应合成了InP胶体量子点.其中,TOPO既作为反应溶剂又作为量子点的包覆剂和稳定剂,在反应后期加入十二胺作为表面活性剂.利用粉末X射线衍射仪及透射电子显微镜测量了量子点的结晶性、晶格结构、晶粒尺寸、表面形貌以及晶粒尺寸分布,利用光致发光(PL)光谱仪和紫外可见分光光度计分析了其光学性质.测试结果显示,量子点具有较好的结晶性及一定的尺寸分布,平均直径为2.5nm,标准偏差为7.4%,表现出明显的量子限制效应.     

InP胶体量子点的合成及光谱性质

以三辛基氧化膦(TOPO)作为溶剂,利用无水InCl3和P(Si(CH3)3)3之间的脱卤硅烷基反应合成了InP胶体量子点.其中,TOPO既作为反应溶剂又作为量子点的包覆剂和稳定剂,在反应后期加入十二胺作为表面活性剂.利用粉末X射线衍射仪及透射电子显微镜测量了量子点的结晶性、晶格结构、晶粒尺寸、表面形貌以及晶粒尺寸分布,利用光致发光(PL)光谱仪和紫外可见分光光度计分析了其光学性质.测试结果显示,量子点具有较好的结晶性及一定的尺寸分布,平均直径为2.5nm,标准偏差为7.4%,表现出明显的量子限制效应.     

InAs/GaAs量子点中间带太阳电池的理论研究与优化

从荧光粉散射机理分析了LED器件色角向分布不均匀的形成原因,提出了一种利用逐点步进光学设计方法,实现了不同入射角度内蓝光光程相等的远荧光粉层结构。应用该方法设计了使用不同折射率载体的LED远荧光粉层光学结构。模拟结果显示,应用所设计的光学形状的远荧光粉层结构,相比传统平面荧光粉层结构,75°方向光斑边缘与中心法线方向色差du′v′从0.05降低到0.01左右,色温偏移降低了43%~98%不等,有效改善了白光LED远程荧光粉封装结构的色度均匀性。该设计不需要增加或改变封装工艺手段,工业生产实现简单,额外成本很少,具有较强的实际应用价值。 更多还原     

InAs/GaAs量子点中间带太阳电池的理论研究与优化

基于InAs/GaAs量子点中间带太阳电池(QD-IBSC)结构和载流子漂移扩散理论建立了计算电流密度与静电势的数学模型,从理论上分析了量子点中间带太阳电池的电压电流特性,定量讨论了量子点层厚度、温度以及n型掺杂对电压电流特性的影响.模拟结果表明:在i层厚度取400 nm时转化效率达到最大值14.01％;温度会对量子点中间带太阳电池的电压电流特性产生影响,温度在300～350 K范围内,开路电压Voc随温度的升高而明显减小,短路电流Jsc几乎不变;对i区进行n型掺杂会抑制量子点层发挥作用.     

Growth of Space Ordered 1.3μm InAs Quantum Dots on GaAs(100) Vicinal Substrates by MOCVD

用MOCVD技术在偏(1100)GaAs衬底上生长了发光波长在1.3μm的线状空间规则排列InAs量子点.光致发光实验表明,相对于正(100)衬底,偏(100)GaAs衬底上生长的InAs量子点具有更好的材料质量,光谱有更大的强度和更窄的线宽.为了得到发光波长为1.3μm的量子点,对比研究了不同In含量的InGaAs应力缓冲层(SBL)和应力盖层(SCL)的应力缓冲作用.结果表明,增加SCL中In含量能有效延伸量子点发光波长到1. 3μm,但是随着SBL中In的增加,发光波长变化不明显,并且材料质量明显下降.     

InP基多周期InAs/InAlGaAs量子点阵列的结构和光学性质

在InP（001）衬底上使用分子束外延技术自组织生长了多周期InAs/InAlGaAs量子点阵列结构。根据对透射电镜和光致发光谱结果的分析，认为引入与InP衬底晶格匹配的InAlGaAs缓冲层可以获得较大的InAs量子点结构，而InAlGaAs层的表面特性对InAs量子点的结构及光学性质有很大影响。对InP基InAlGaAs缓冲层上自组织量子点的形核和演化机制进行了探讨，提出量子点的演化过程表现为量子点的合并长大并伴随着自身的徙动，以获得能量最优的分布状态。     

GaAs基上的InAs量子环制备

在分子束外延系统中,利用3nmGaAs薄盖层将InAs自组装量子点部分覆盖,然后在500°C以及As2气氛中退火一分钟,制成纳米尺度的InAs量子环。这一形成敏感地依赖于退火时的生长条件和生长InAs自组装量子点时的淀积量。InAs在GaAs表面的扩散以及同时发生的In-Ga互混控制着InAs量子环的形成。     

锗硅双层量子点的光电流特性

在分子束外延 (MBE)系统上用自组织方式生长了硅基双层锗量子点结构 ,并对样品进行光电流谱的测试。通过调节不同外加偏压来改变量子点中的费米能级位置 ,量子点中载流子所处束缚能级将随之发生变化 ,所得到的光电流谱的峰位也将因此而改变。由光电流谱得到的实验结果与常规的光致发光谱的结果相吻合。与单层锗量子点结构相比 ,双层结构的样品在光电特性上有着明显不同 :光电流谱中 ,在 0 .767e V及 0 .869e V处出现了两个峰 ,分别对应于载流子在不同的量子点层中的吸收。用这种结构的样品制成的红外光探测器能够同时对两种不同波长的光进行探测响应     

Metallic Nanowire Coupled CsPbBr3 Quantum Dots Plasmonic Nanolaser

Plasmonic nanolasers provide a valuable opportunity for expanding sub-wavelength applications. Due to the potential of on-chip integration, semiconductor nanowire (NW)-based plasmonic nanolasers that support the waveguide mode attract a high level of interest. To date, perovskite quantum dots (QDs) based plasmonic lasers, especially nanolasers that support plasmonic-waveguide mode, are still a challenge and remain unexplored. Here, metallic NW coupled CsPbBr₃ QDs plasmonic-waveguide lasers are reported. By embedding Ag NWs in QDs film, an evolution from amplified spontaneous emission with a full width at half maximum (FWHM) of 6.6 nm to localized surface plasmon resonance (LSPR) supported random lasing is observed. When the pump light is focused on a single Ag NW, a QD-NW coupled plasmonic-waveguide laser with a much narrower emission peak (FWHM = 0.4 nm) is realized on a single Ag NW with the uniform polyvinylpyrrolidone layer. The QDs serve as the gain medium while the Ag NW serves as a resonant cavity and propagating plasmonic lasing modes. Furthermore, by pumping two Ag NWs with different directions, a dual-wavelength lasing switch is realized. The demonstration of metallic NW coupled QDs plasmonic nanolaser would provide an alternative approach for ultrasmall light sources as well as fundamental studies of light matter interactions.     

Electron beam pre-patterning for site-control of self-assembled InAs quantum dots on Inp surfaces

A site control technique for individual InAs quantum dots (QDs) formed by self-assembling has been developed, using scanning electron microscope (SEM) assisted nano-deposition and metal organic vapor phase epitaxy (MOVPE). In a first step we characterize a device with randomly distributed InAs QDs on InP, using resonant tunneling and transmission electron microscopy (TEM). Secondly, we use nano-scale deposits, created at the focal point of the electron beam on an InP based heterostructure, as “nano growth masks”. Growth of a thin InP layer produces nano-holes above the deposits. The deposits are removed by oxygen plasma etching. When InAs is supplied on this surface, QDs are self-assembled at the hole sites, while no InAs dots are observed in the flat surface region. A vertical single electron tunneling device is proposed, using the developed technique.     

Green InP/ZnSeS/ZnS Core Multi-Shelled Quantum Dots Synthesized with Aminophosphine for Effective Display Applications

InP quantum dots (QDs) are emerging as promising materials for replacing cadmium-based QDs in view of their heavy metal-free and tunable luminescence. However, the development of InP QD materials still lags due to the expensive and flammable phosphorus precursors, and also the unsatisfactory repeatability caused by the fast nucleation rate. Adopting lowly reactive P precursor aminophosphine can overcome this issue, but their low photoluminescence quantum yield (PLQY) and widening line widths do not apply to the practical application. Through engineering, the core-shell structure of QD, significantly promoted green emissions of QDs were obtained with PLQY of 95% and full width and half maximum (FWHM) of 45 nm, which demonstrated the highest PLQY record obtained from the aminophosphine system. Moreover, due to the residue halogen atoms on the QD surface as inorganic ligands to prevent further oxidization, these InP QDs demonstrated the ultra-long operational lifetime (over 1000 h) for QDs based color enhancement film. By optimizing the device structure, an inverted green InP quantum dot light-emitting diode (QLED) with external quantum efficiency (EQE) of 7.06% was also demonstrated, which showed a significant promise of these InP QDs in highly effective optoelectronic devices.