共查询到20条相似文献,搜索用时 390 毫秒
1.
Ren F. Kuo J.M. Hong M. Hobson W.S. Lothian J.R. Lin J. Tsai H.S. Mannaerts J.P. Kwo J. Chu S.N.G. Chen Y.K. Cho A.Y. 《Electron Device Letters, IEEE》1998,19(8):309-311
We have demonstrated the first Ga2O3(Gd2O3) insulated gate n-channel enhancement-mode In0.53Ga0.47As MOSFET's on InP semi-insulating substrate. Ga2O3(Gd2 O3) was electron beam deposited from a high purity single crystal Ga5Gd3O12 source. The source and drain regions of the device were selectively implanted with Si to produce low resistance ohmic contacts. A 0.75-μm gate length device exhibits an extrinsic transconductance of 190 mS/mm, which is an order of magnitude improvement over previously reported enhancement-mode InGaAs MISFETs. The current gain cutoff frequency, ft, and the maximum frequency of oscillation, fmax, of 7 and 10 GHz were obtained, respectively, for a 0.75×100 μm2 gate dimension device at a gate voltage of 3 V and drain voltage of 2 V 相似文献
2.
F Ren C.R Abernathy J.D MacKenzie B.P Gila S.J Pearton M Hong M.A Marcus M.J Schurman A.G Baca R.J Shul 《Solid-state electronics》1998,42(12):2177-2181
GaN MIS diodes were demonstrated utilizing AlN and Ga2O3(Gd2O3) as insulators. A 345 Å of AlN was grown on the MOCVD grown n-GaN in a MOMBE system using trimethylamine alane as Al precursor and nitrogen generated from a SVT RF N2 plasma. For the Ga2O3(Gd2O3) growth, a multi-MBE chamber was used and a 195 Å oxide was E-beam evaporated from a single crystal source of Ga5Gd3O12. The forward breakdown voltage of AlN and Ga2O3(Gd2O3) diodes are 5 and 6 V, respectively, which are significantly improved over 1.2 V from that of a Schottky contact. From the C–V measurements, both kinds of diodes showed good charge modulation from accumulation to depletion at different frequencies. The insulator/GaN interface roughness and the thickness of the insulator were measured with X-ray reflectivity. 相似文献
3.
Beta-type gallium oxide (β-Ga2O3) is a new attractive material for optoelectronic devices. Different methods had been tried to grow high quality β-Ga2O3 crystals. In this work, crystal growth of Ga2O3 has been carried out by chemical vapor transport (CVT) method in a closed quartz tube using C as transport agent and sapphire wafer as seed. The CVT mass flux has been analyzed by theoretical calculations based on equilibrium thermodynamics and 1D diffusional mass transport. The crystal growth experimental results are in agreement with the theoretical predictions. Influence factors of Ga2O3 crystal growth, such as temperature distribution, amount of C as transport agent used, have also been discussed. Structural (XRD) and optical (Raman spectroscopy, photoluminescence spectrum) properties of the CVT-Ga2O3 crystal are presented. 相似文献
4.
Gallium oxide(Ga2O3) based flexible heterojunction type deep ultraviolet(UV) photodetectors show excellent solarblind photoelectric performance, even when not powered, which makes them ideal for use in intelligent wearable devices. However, traditional flexible photodetectors are prone to damage during use due to poor toughness, which reduces the service life of these devices. Self-healing hydrogels have been demonstrated to have the ability to repair damage and their combi... 相似文献
5.
Beta gallium oxide(β-Ga2O3) has attracted significant attention for applications in power electronics due to its ultrawide bandgap of ~ 4.8 eV and the large critical electric field of 8 MV/cm. These properties yield a high Baliga’s figures of merit(BFOM) of more than 3000. Though β-Ga2O3 possesses superior material properties, the lack of p-type doping is the main obstacle that hinders the development of β-Ga2O3-based power device... 相似文献
6.
Ze-Yu Fan Min-Ji Yang Bo-Yu Fan Andra? Mavri? Nadiia Pastukhova Matjaz Valant Bo-Lin Li Kuang Feng Dong-Liang Liu Guang-Wei Deng Qiang Zhou Yan-Bo Li 《电子科技学刊:英文版》2022,20(4):331-344
Wide-bandgap gallium oxide(Ga2O3) is one of the most promising semiconductor materials for solar-blind(200 nm to 280 nm) photodetection. In its amorphous form, amorphous gallium oxide(a-Ga2O3) maintains its intrinsic optoelectronic properties while can be prepared at a low growth temperature, thus it is compatible with Si integrated circuits(ICs) technology. Herein, the a-Ga2O3 film is directly deposited on pre-fabricated Au inter... 相似文献
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8.
近年来,氧化镓(Ga2O3)日盲光电探测器因其高灵敏度和低虚警率及广泛的应用前景,受到了科学家们的高度关注.为了满足现代社会对低损耗、环保、高集成、轻便和柔性器件的需求,可自供电的柔性器件备受关注.然而,到目前为止,Ga2O3基柔性自供电光电探测器鲜有报道.本文通过原位生长技术在耐高温的柔性衬底玻璃纤维布上生长了β-Ga2O3纳米线,并构筑Ag/β-Ga2O3肖特基结.在肖特基结的作用下,光生载流子可在无外加偏压下分离和传输,并展现出超低的暗电流(0.2 pA)、高光暗比(~500)、快响应时间(0.46/0.41 s)和高探测率(6.8×109 Jones).该探测器也表现出良好的机械性能.结果表明,Ag/β-Ga2O3肖特基结探测器在深紫外探测器领域具有广阔的应用前景,为柔性自供电探测技术的发展提供了新的思路. 相似文献
9.
<正>The more severe phonon-phonon scattering in gallium oxide(Ga2O3) crystals leads to lower thermal conductivity compared to most other semiconductor materials. To address this issue and enhance the heat dissipation in Ga2O3 devices, one practical solution is to integrate Ga2O3 with a highly thermally conductive substrate, such as SiC and Si. Currently,there are three methods employed for the heterogeneous integration of Ga<... 相似文献
10.
Sn doping is an effective way to improve the response rate of Ga2O3 film based solar-blind detectors. In this paper,Sn-doped Ga2O3 films were prepared on a sapphire substrate by radio frequency magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and ultraviolet visible spectroscopy, and the effect of annealing atmosphere on the properties of films was studied. The Ga 相似文献
11.
The impact of various rapid thermal annealing used during the integration on the La2O3/HfO2 and HfO2/La2O3 stacks deposited by Atomic Layer deposition was analyzed. The consequences of lanthanum localization in such stacks on the evolution of the films during the rapid thermal annealing are investigated in term of morphology, crystalline structure, silicate formation and film homogeneity as a function of the depth. It appeared that the La2O3 location has an impact on the temperature of the quadratic phase formation which could be linked to the formation of SiOHfLa silicate and the resistance of the films to dissolution in HF 0.05 wt%. 相似文献
12.
用第一性原理计算了Sn 替位Ga1.375In0.625O3化合物的Ga 原子(Ga1.25In0.625Sn0.125O3)和Sn 替位Ga1.375In0.625O3化合物的In原子(Ga1.375In0.5Sn0.125O3)的结构、电子能带和态密度。Ga1.25In0.625Sn0.125O3半导体材料比Ga1.375In0.5Sn0.125O3材料具有大的晶格参数和强的Sn–O离子键。在Sn掺杂 Ga1.375In0.625O3化合物中,Sn 原子优先取代In 原子。Sn掺杂 Ga1.375In0.625O3化合物显示n型导电性, 杂质能带主要由Sn 5s 态组成。Ga1.375In0.5Sn0.125O3化合物的光学带隙大于Ga1.25In0.625Sn0.125O3化合物的光学带隙。 Ga1.25In0.625Sn0.125O3 具有小的电子有效质量和大的电子迁移率,Ga1.375In0.5Sn0.125O3 具有多的相对电子数和好的导电性。 相似文献
13.
正ITO/Ga_2O_3 bi-layer films were deposited on quartz glass substrates by magnetron sputtering.The effect of substrate temperature on the structure,surface morphology,optical and electrical properties of ITO/Ga_2O_3 films was investigated by an X-ray diffractometer,a scanning electron microscope,a double beam spectrophotometer and the Hall system,respectively.The structural characteristics showed a dependence on substrate temperature. The resistivity of the films varied from 6.71×10~(-3) to 1.91×10~3Ω·cm as the substrate temperature increased from 100 to 350℃.ITO(22 nm)/Ga_2O_3(50 nm) films deposited at 300℃exhibited a low sheet resistance of 373.3Ω/□and high deep ultraviolet transmittance of 78.97%at the wavelength of 300 nm. 相似文献
14.
磁控溅射制备Ga2O3/ITO深紫外透明导电膜的光电性能 总被引:2,自引:2,他引:0
采用磁控溅射方法在石英玻璃基底上制备了Ga2O3/ITO膜,用紫外-可见分光光度计、四探针测试仪对ITO膜和 Ga2O3/ITO膜的光学透过率和面电阻进行了表征,详细研究了ITO层和Ga2O3层的厚度对Ga2O3/ITO双层膜光电性能的影响。研究表明,Ga2O3(50nm) /ITO(23nm)膜在280nm处的深紫外光学透过率高达77.6%,面电阻为323Ω/sq;ITO层控制Ga2O3/ITO膜的面电阻,影响Ga2O3/ITO膜的紫外透过率;Ga2O3层厚度调控Ga2O3/ITO膜的紫外区域的光谱形状。 相似文献
15.
Low Dit, thermodynamically stable Ga2O3-GaAs interfaces: fabrication, characterization, and modeling
Passlack M. Hong M. Mannaerts J.P. Opila R.L. Chu S.N.G. Moriya N. Ren F. Kwo J.R. 《Electron Devices, IEEE Transactions on》1997,44(2):214-225
Thermodynamically stable, low Dit amorphous Ga2 O3-(100) GaAs interfaces have been fabricated by extending molecular beam epitaxy (MBE) related techniques. We have investigated both in situ and ex situ Ga2O3 deposition schemes utilizing molecular beams of gallium oxide. The in situ technique employs Ga2O3 deposition on freshly grown, atomically ordered (100) GaAs epitaxial films in ultrahigh vacuum (UHV); the ex situ approach is based on thermal desorption of native GaAs oxides in UHV prior to Ga2O3 deposition. Unique electronic interface properties have been demonstrated for in situ fabricated Ga2O3-GaAs interfaces including a midgap interface state density Dit in the low 1010 cm-2 eV-1 range and an interface recombination velocity S of 4000 cm/s. The existence of strong inversion in both n- and p-type GaAs has been clearly established. We will also discuss the excellent thermodynamic and photochemical interface stability. Ex situ fabricated Ga2O3-GaAs interfaces are inferior but still of a high quality with S=9000 cm/s and a corresponding Dit in the upper 1010 cm-2 eV-1 range. We also developed a new numerical heterostructure model for the evaluation of capacitance-voltage (C-V), conductance-voltage (G-V), and photoluminescence (PL) data. The model involves selfconsistent interface analysis of electrical and optoelectronic measurement data and is tailored to the specifics of GaAs such as band-to-band luminescence and long minority carrier response time τR. We will further discuss equivalent circuits in strong inversion considering minority carrier generation using low-intensity light illumination 相似文献
16.
采用射频磁控溅射法在石英衬底上制备了氧化镓(Ga2O3)薄膜.利用X射线衍射仪和紫外-可见-红外分光光度计分别对Ga2O3薄膜的晶体结构和光学带隙进行了表征,并在室温下测量了 Ga2O3薄膜的光致发光(PL)谱.结果表明:制备的Ga2O3薄膜呈非晶态.吸收边随着溅射气压的增加先蓝移后红移,光学带隙值范围为5.06~5.37 eV,溅射气压为1 Pa时,制备的Ga2O3薄膜具有最大的光学带隙.在325 nm激光激发下,400 nm附近和525 nm附近处出现与缺陷能级相关的发光峰. 相似文献
17.
以高纯的硫酸铝氨分解的无定形Al2O3为原料,MgO-Y2O3为烧结助剂,在N2气氛下热压烧结制备Al2O3陶瓷。研究了烧结助剂掺量对Al2O3材料的相组成、显微结构、烧结性能、力学性能、热导率和介电性能的影响。结果表明:所制Al2O3陶瓷具有细晶的显微结构特征和超高的抗弯强度。随着MgO-Y2O3掺量的增加,晶粒尺寸、抗弯强度和热导率先增大后减小,而介电损耗则呈现先减小后增大的变化规律。当MgO和Y2O3掺量均为质量分数2%时,Al2O3陶瓷呈现为较佳的综合性能:抗弯强度达最大值为603 MPa,热导率为36.47 W.m–1.K–1,介电损耗低至6.32×10–4。 相似文献
18.
Aluminium oxide displays a very low tanδ at microwave frequencies. It also possesses a remarkably high thermal conductivity, ideal for heat dissipation in high power satellite filters. However, its temperature coefficient of the resonant frequency (τf) is approximately 60 ppm/K. It is shown that the application of a film of titanium oxide which has a Tf of opposite sign (45O ppm/K) produces a composite in which the τf can be tuned to be zero over a wide temperature range. The tanδ of the composite at zero Tf is 3.3×105 (Q=30000) at room temperature and at 10 GHz 相似文献
19.
采用固相法对Bi2O3和Sb2O3进行了预复合,并研究了不同比例的Bi2O3与Sb2O3预复合对ZnO压敏电阻致密度,晶粒结构和电学性能的影响。结果表明:当Bi2O3与Sb2O3的摩尔比为0.7:1.0时,ZnO压敏电阻的综合性能最优,其晶粒生长得最为均匀致密,电位梯度达到361V/mm,非线性系数为86,漏电流密度为7×10–8A/cm2;另外,在耐受5kA电流下的8/20μs脉冲电流波后,其残压比和压敏电压变化率分别为2.6和2.5%。 相似文献
20.
In2O3-Fe2O3 nanotubes are synthesized by an electrospinning method. The as-synthesized materials are characterized by scanning electron microscope and X-ray powder diffraction. The gas sensing results show that In2O3-Fe2O3 nanotubes exhibit excellent sensing properties to acetone and formaldehyde at different operating temperatures. The responses of gas sensors based on In2O3-Fe2O3 nanotubes to 100 ppm acetone and 100 ppm formaldehyde are 25 (240℃) and 15 (260℃), and the response/recovery times are 3/7 s and 4/7 s, respectively. The responses of In2O3-Fe2O3 nanotubes to 1 ppm acetone (240℃) and formaldehyde (260℃) are 3.5 and 1.8, respectively. Moreover, the gas sensor based on In2O3-Fe2O3 nanotubes also possesses an excellent selectivity to acetone and formaldehyde. 相似文献