共查询到20条相似文献,搜索用时 31 毫秒
1.
Zheng X.G. Hsu J.S. Hurst J.B. Li X. Wang S. Sun X. Holmes A.L. Jr. Campbell J.C. Huntington A.S. Coldren L.A. 《Quantum Electronics, IEEE Journal of》2004,40(8):1068-1073
Large-area (500-/spl mu/m diameter) mesa-structure In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiodes (APDs) are reported. The dark current density was /spl sim/2.5/spl times/10/sup -2/ nA//spl mu/m/sup 2/ at 90% of breakdown; low surface leakage current density (/spl sim/4.2 pA//spl mu/m) was achieved with wet chemical etching and SiO/sub 2/ passivation. An 18 /spl times/ 18 APD array with uniform distributions of breakdown voltage, dark current, and multiplication gain has also been demonstrated. The APDs in the array achieved 3-dB bandwidth of /spl sim/8 GHz at low gain and a gain-bandwidth product of /spl sim/120 GHz. 相似文献
2.
Operation of type-II interband cascade lasers in the 4.3-4.7-/spl mu/m wavelength region has been demonstrated at temperatures up to 240 K in pulsed mode. These lasers fabricated with 150-/spl mu/m-wide mesa stripes operated in continuous-wave (CW) mode up to a maximum temperature of 110 K, with an output power exceeding 30 mW/f and a threshold current density of about 41 A/cm/sup 2/ at 90 K. The maximum CW operation temperature of 110 K is largely limited by the high specific thermal resistance of the 150-/spl mu/m-wide broad area lasers. A 20-/spl mu/m-wide mesa stripe laser was able to operate in CW mode at higher temperatures up to 125 K as a result of the reduced specific thermal resistance of a smaller device. 相似文献
3.
A.N. Al-Omari G.P. Carey S. Hallstein J.P. Watson G. Dang K.L. Lear 《Photonics Technology Letters, IEEE》2006,18(11):1225-1227
Increasing copper plated heatsink radii from 0 to 4 /spl mu/m greater than the mesa in vertical-cavity surface-emitting lasers (VCSELs) reduced the measured thermal resistance for a range of device sizes to values 50% lower than previously reported over a range of device sizes. For a 9-/spl mu/m diameter oxide aperture, the larger heatsink increases output power and bandwidth by 131% and 40%, respectively. The lasers exhibit a 3-dB modulation frequency bandwidth up to 9.8 GHz at 10.5 kA/cm/sup 2/. The functional dependence of thermal resistance on oxide aperture diameter indicates the importance of lateral heat flow to mesa sidewalls. 相似文献
4.
A. Salhi L. Martiradonna G. Visimberga V. Tasco L. Fortunato M.T. Todaro R. Cingolani A. Passaseo M. De Vittorio 《Photonics Technology Letters, IEEE》2006,18(16):1735-1737
A semiconductor laser containing seven InAs-InGaAs stacked quantum-dot (QD) layers was grown by molecular beam epitaxy. Shallow mesa ridge-waveguide lasers with stripe width of 120 /spl mu/m were fabricated and tested. A high modal gain of 41 cm/sup -1/ was obtained at room temperature corresponding to a modal gain of /spl sim/6 cm/sup -1/ per QD layer, which is very promising to enable the realization of 1.3-/spl mu/m ultrashort cavity devices such as vertical-cavity surface-emitting lasers. Ground state laser action was achieved for a 360-/spl mu/m-cavity length with as-cleaved facets. The transparency current density per QD layer and internal quantum efficiency were 13 A/cm/sup 2/ and 67%, respectively. 相似文献
5.
A. Salhi Y. Rouillard J. Angellier M. Garcia 《Photonics Technology Letters, IEEE》2004,16(11):2424-2426
A GaInAsSb-AlGaAsSb large optical cavity triple-quantum-well structure was grown by molecular-beam epitaxy. Shallow mesa ridge-waveguide lasers with stripe width of 100 /spl mu/m were fabricated and tested. An internal losses coefficient as low as 4 cm/sup -1/ and a high internal quantum efficiency of 70% were obtained. In the pulsed regime at room temperature, the extrapolated threshold current densities for infinite cavity length is 78 A/cm/sup 2/. The threshold current density per quantum well is as low as 34 A/cm/sup 2/ for a 3-mm-long cavity. 相似文献
6.
A resonant tunneling quantum-dot infrared photodetector 总被引:3,自引:0,他引:3
Xiaohua Su Chakrabarti S. Bhattacharya P. Ariyawansa G. Perera A.G.U. 《Quantum Electronics, IEEE Journal of》2005,41(7):974-979
A novel device-resonant tunneling quantum-dot infrared photodetector-has been investigated theoretically and experimentally. In this device, the transport of dark current and photocurrent are separated by the incorporation of a double barrier resonant tunnel heterostructure with each quantum-dot layer of the device. The devices with In/sub 0.4/Ga/sub 0.6/As-GaAs quantum dots are grown by molecular beam epitaxy. We have characterized devices designed for /spl sim/6 /spl mu/m response, and the devices also exhibit a strong photoresponse peak at /spl sim/17 /spl mu/m at 300 K due to transitions from the dot excited states. The dark currents in the tunnel devices are almost two orders of magnitude smaller than those in conventional devices. Measured values of J/sub dark/ are 1.6/spl times/10/sup -8/ A/cm/sup 2/ at 80 K and 1.55 A/cm/sup 2/ at 300 K for 1-V applied bias. Measured values of peak responsivity and specific detectivity D/sup */ are 0.063 A/W and 2.4/spl times/10/sup 10/ cm/spl middot/Hz/sup 1/2//W, respectively, under a bias of 2 V, at 80 K for the 6-/spl mu/m response. For the 17-/spl mu/m response, the measured values of peak responsivity and detectivity at 300 K are 0.032 A/W and 8.6/spl times/10/sup 6/ cm/spl middot/Hz/sup 1/2//W under 1 V bias. 相似文献
7.
Chyi-Da Yang Po-Hsun Lei Der-Jin Pong Ming-Yuan Wu Ho C.-L. Wen-Jeng Ho Meng-Chyi Wu Keh-Yung Cheng 《Quantum Electronics, IEEE Journal of》2004,40(11):1607-1613
We have successfully fabricated InGaAs edge-coupled photodiodes (EC-PDs) with a light funnel integrated (LIFI) in front of the coupling aperture, called LIFI EC-PD, based on the self-terminated oxide polish (STOP), the crystallographic slope etching of InP, and the self-aligned diffusion (SAD) techniques. The LIFI EC-PD presents not only a lower dark current density (/spl sim/ 4.4 mA/cm/sup 2/) but also a higher responsivity (/spl sim/ 0.4 A/W) than that of the mesa EC-PD (27 mA/cm/sup 2/ and 0.26 A/W, respectively). Furthermore, the thick oxide film serves as the funnel in front of active-region aperture to enhance the coupling efficiency and to lower the bonding pad capacitance down to 50 fF. The lowered bonding pad capacitance can be beneficial in designing a device with a higher transit-time-limited frequency response of beyond 30 GHz. The LIFI EC-PD with a 1-/spl mu/m thick absorption layer exhibits a 3-dB bandwidth of 20 GHz and a responsivity of /spl sim/ 0.4 A/W. 相似文献
8.
A vertical cavity GaInAsP/InP surface-emitting laser at 1.3 mu m wavelength is demonstrated with a hemispherical cavity structure. The laser consists of a circular mesa buried (passivated) in polyimide and is made on a semi-insulating InP substrate. CW operation was obtained at 77 K with a threshold current density of 90 kA/cm/sup 2/.<> 相似文献
9.
Tournie E. Lazzari J.L. Villemain E. Joullie A. Gouskov L. Karim M. Salesse I. 《Electronics letters》1991,27(14):1237-1239
Ga/sub 0.77/In/sub 0.23/As/sub 0.20/Sb/sub 0.80//GaSb pn heterojunction photodiodes have been prepared by liquid phase epitaxy. They exhibit a long-wavelength threshold of 2.4 mu m. The room-temperature dark current at V=-0.5 V is 3 mu A (10 mA/cm/sup 2/) and the external quantum efficiency is around 40% in the wavelength range 1.75-2.25 mu m. The estimated detectivity D* at 2.2 mu m is 8.8*10/sup 9/ cm Hz/sup 1/2/ W/sup -1/.<> 相似文献
10.
M. Yamada T. Anan H. Hatakeyama K. Tokutome N. Suzuki T. Nakamura K. Nishi 《Photonics Technology Letters, IEEE》2005,17(5):950-952
Low-threshold operation was demonstrated for a 1.34-/spl mu/m vertical-cavity surface-emitting laser (VCSEL) with GaInNAs quantum wells (QWs) grown by metal-organic vapor-phase epitaxy. Optimizing the growth conditions and QW structure of the GaInNAs active layers resulted in edge-emitting lasers that oscillated with low threshold current densities of 0.87 kA/cm/sup 2/ at 1.34 /spl mu/m and 1.1 kA/cm/sup 2/ at 1.38 /spl mu/m, respectively. The VCSEL had a low threshold current of 2.8 mA and a lasing wavelength of 1.342 /spl mu/m at room temperature and operated up to 60/spl deg/C. 相似文献
11.
A. Hierro J.M. Ulloa E. Calleja B. Damilano J. Barjon J.-Y. Duboz J. Massies 《Photonics Technology Letters, IEEE》2005,17(6):1142-1144
Room temperature lasing emission at 1.338 and 1.435 /spl mu/m with threshold current densities of 1518 and 1755 A/cm/sup 2/, respectively, is obtained in broad area GaInNAs-GaAs laser diodes (LDs) grown by molecular beam epitaxy. The 1.338-/spl mu/m LDs show a power output per facet up to 0.20 W/A, a characteristic temperature (T/sub 0/) of 78 K, and an external transparency current density (J/sub tr/) of 0.77 kA/cm/sup 2/. Increasing the lasing wavelength to 1.435 /spl mu/m results in a larger J/sub tr/ of 1.16 kA/cm/sup 2/ and a lower T/sub 0/ of 62 K, due to larger nonradiative recombination. However, the 1.435-/spl mu/m LDs still display a power output per facet up to 0.15 W/A, and a high internal quantum efficiency of 52%. These improved performances are achieved without the need to use strain compensation layers, Sb as a surfactant during the quantum-well growth, or a postgrowth thermal anneal cycle. 相似文献
12.
Low-loss, high-voltage 6H-SiC epitaxial p-i-n diode 总被引:1,自引:0,他引:1
Fujihira K. Tamura S. Kimoto T. Matsunami H. 《Electron Devices, IEEE Transactions on》2002,49(1):150-154
The p-i-n diodes were fabricated using 31 /spl mu/m thick n/sup -/- and p-type 6H-SiC epilayers grown by horizontal cold-wall chemical vapor deposition (CVD) with nitrogen and aluminum doping, respectively. The diode exhibited a very high breakdown voltage of 4.2 kV with a low on-resistance of 4.6 m/spl Omega/cm/sup 2/. This on-resistance is lower (by a factor of five) than that of a Si p-i-n diode with a similar breakdown voltage. The leakage current density was substantially lower even at high temperatures. The fabricated SiC p-i-n diode showed fast switching with a turn-off time of 0.18 /spl mu/s at 300 K. The carrier lifetime was estimated to be 0.64 /spl mu/s at 300 K, and more than 5.20 /spl mu/s at 500 K. Various characteristics of SiC p-i-n diodes which have an advantage of lower power dissipation owing to conductivity modulation were investigated. 相似文献
13.
Dahlstrom M. Fang X.-M. Lubyshev D. Urteaga M. Krishnan S. Parthasarathy N. Kim Y.M. Wu Y. Fastenau J.M. Liu W.K. Rodwell M.J.W. 《Electron Device Letters, IEEE》2003,24(7):433-435
We report an InP/InGaAs/InP double heterojunction bipolar transistor (DHBT), fabricated using a mesa structure, exhibiting 282 GHz f/sub /spl tau// and 400 GHz f/sub max/. The DHBT employs a 30 nm InGaAs base with carbon doping graded from 8/spl middot/10/sup 19//cm/sup 3/ to 5/spl middot/10/sup 19//cm/sup 3/, an InP collector, and an InGaAs/InAlAs base-collector superlattice grade, with a total 217 nm collector depletion layer thickness. The low base sheet (580 /spl Omega/) and contact (<10 /spl Omega/-/spl mu/m/sup 2/) resistivities are in part responsible for the high f/sub max/ observed. 相似文献
14.
Top-gate thin-film transistors (TFTs) with microcrystalline silicon (/spl mu/c-Si) channel layers deposited using standard 13.56 MHz plasma-enhanced chemical vapor deposition were fabricated at a maximum processing temperature of 250/spl deg/C. The TFTs employ amorphous silicon nitride (a-SiN) as the gate dielectric layer. The 80-nm-thick /spl mu/c-Si channel layer showed a dark conductivity of the order of 10/sup -7/ S/cm and a crystalline volume fraction of over 80%. The /spl mu/c-Si TFTs showed a field effect mobility of 0.85 cm/sup 2//V/spl middot/s, a threshold voltage of 4.8 V, a subthreshold slope of 1 V/dec, and an ON/OFF current ratio of /spl sim/10/sup 7/. More importantly, the TFTs were very stable under gate bias stress, offering promise for organic light-emitting display (OLED) applications. 相似文献
15.
Interdigitated Ge p-i-n photodetectors fabricated on a Si substrate using graded SiGe buffer layers 总被引:2,自引:0,他引:2
Jungwoo Oh Campbell J.C. Thomas S.G. Bharatan S. Thoma R. Jasper C. Jones R.E. Zirkle T.E. 《Quantum Electronics, IEEE Journal of》2002,38(9):1238-1241
We report an interdigitated p-i-n photodetector fabricated on a 1-/spl mu/m-thick Ge epitaxial layer grown on a Si substrate using a 10-/spl mu/m-thick graded SiGe buffer layer. A growth rate of 45 /spl Aring//s/spl sim/60 /spl Aring//s was achieved using low-energy plasma enhanced chemical vapor deposition. The Ge epitaxial layer had a threading dislocation density of 10/sup 5/ cm/sup -2/ and a rms surface roughness of 3.28 nm. The 3-dB bandwidth and the external quantum efficiency were measured on a photodetector having 1-/spl mu/m finger width and 2-/spl mu/m spacing with a 25/spl times/28 /spl mu/m/sup 2/ active area. At a wavelength of 1.3 /spl mu/m, the bandwidth was 2.2, 3.5, and 3.8 GHz at bias voltages of -1, -3, and -5 V, respectively. The dark current was 3.2 and 5.0 /spl mu/A at -3 and -5 V, respectively. This photodetector exhibited an external quantum efficiency of 49% at a wavelength of 1.3 /spl mu/m. 相似文献
16.
Zhengmao Ye Campbell J.C. Zhonghui Chen Eui-Tae Kim Madhukar A. 《Quantum Electronics, IEEE Journal of》2002,38(9):1234-1237
An InAs/AlGaAs quantum-dot infrared photodetector based on bound-to-bound intraband transitions in undoped InAs quantum dots is reported. AlGaAs blocking layers were employed to achieve low dark current. The photoresponse peaked at 6.2 /spl mu/m. At 77 K and -0.7 V bias, the responsivity was 14 mA/W and the detectivity, D*, was 10/sup 10/ cm/spl middot/Hz/sup 1/2//W. 相似文献
17.
C.Y. Liu S.F. Yoon S.Z. Wang W.J. Fan Y. Qu S. Yuan 《Photonics Technology Letters, IEEE》2004,16(11):2409-2411
We have demonstrated high-performance InGaAsN triple-quantum-well ridge waveguide (RWG) lasers fabricated using pulsed anodic oxidation. The lowest threshold current density of 675 A/cm/sup 2/ was obtained from a P-side-down bonded InGaAsN laser, with cavity length of 1600 /spl mu/m and contact ridge width of 10 /spl mu/m. The emission wavelength is 1295.1 nm. The transparency current density from a batch of unbonded InGaAsN RWG lasers was 397 A/cm/sup 2/ (equivalent to 132 A/cm/sup 2/ per well). High characteristic temperature of 138 K was also achieved from the bonded 10/spl times/1600-/spl mu/m/sup 2/ InGaAsN laser. 相似文献
18.
A novel technique for fabricating high reliable trench DMOSFETs using self-align technique and hydrogen annealing 总被引:1,自引:0,他引:1
Jongdae Kim Tae Moon Roh Sang-Gi Kim Il-Yong Park Bun Lee 《Electron Devices, IEEE Transactions on》2003,50(2):378-383
A novel technique for fabricating high reliability trench DMOSFETs using three mask layers is realized to obtain cost-effective production capability, higher cell density and current driving capability, and higher reliability. This technique provides a unit cell with 2.3/spl sim/2.4 /spl mu/m pitch and a channel density of 100 Mcell/in/sup 2/. Specific on-resistance is 0.36 m/spl Omega//spl middot/cm/sup 2/ with a blocking voltage of 43 V at a gate voltage of 10 V and 5 A source-to-drain current. The time to breakdown of gate oxide grown on the hydrogen annealed trench surface is much longer than that of oxide grown on a nonhydrogen annealed trench surface. 相似文献
19.
《Electron Devices, IEEE Transactions on》2006,53(7):1657-1668
The authors demonstrate high-performing n-channel transistors with a HfO/sub 2//TaN gate stack and a low thermal-budget process using solid-phase epitaxial regrowth of the source and drain junctions. The thinnest devices have an equivalent oxide thickness (EOT) of 8 /spl Aring/, a leakage current of 1.5 A/cm/sup 2/ at V/sub G/=1 V, a peak mobility of 190 cm/sup 2//V/spl middot/s, and a drive-current of 815 /spl mu/A//spl mu/m at an off-state current of 0.1 /spl mu/A//spl mu/m for V/sub DD/=1.2 V. Identical gate stacks processed with a 1000-/spl deg/C spike anneal have a higher peak mobility at 275 cm/sup 2//V/spl middot/s, but a 5-/spl Aring/ higher EOT and a reduced drive current at 610 /spl mu/A//spl mu/m. The observed performance improvement for the low thermal-budget devices is shown to be mostly related to the lower EOT. The time-to-breakdown measurements indicate a maximum operating voltage of 1.6 V (1.2 V at 125 /spl deg/C) for a ten-year lifetime, whereas positive-bias temperature-instability measurements indicate a sufficient lifetime for operating voltages below 0.75 V. 相似文献
20.
This letter reports a metal-insulator-semiconductor structure based on Al/sub 2/O/sub 3//TiO/sub 2/ nanolaminates and AlTiO films evaporated on an unheated p-Si substrate. The structure exhibits a low hysteresis in the capacitance-voltage characteristics, a larger dielectric constant leading to a quantum mechanically corrected effective oxide thickness of 1.35-2.1 nm, good stability of the electrical characteristics to thermal processes, a large breakdown electric field of 7.5 MV/cm, and a leakage current density below 5/spl times/10/sup -7/ A/cm/sup 2/ at an electric field of 2 MV/cm. 相似文献