银离子注入表面改性涤纶材料的抗菌性能研究

采用银视线离子注（beam ion implantation，BⅡ）对医用涤纶（polyethylene terephthalate，PET）材料进行表面改性，X射线衍射（X—Ray diffraction，XRD）和X射线光电子能谱（X—ray photoelectron spectroscopy，XPS）分析结果表明，在涤纶材料表面有效地形成了银离子注入层。细菌粘附实验结果证明，经过银离子注入的表面改性PET薄膜对表皮葡萄球菌（staphvlococus epidermis，SE）的粘附有明显抑制作用，比较培养时间为24h的细菌粘附可以看出，改性后的PET表面与未改性样品相比，表皮葡萄球菌的粘附率降低了76％。原子吸收光谱（Atomic absorption spectroscopy，AAS）的分析结果表明，注入银离子的薄膜在水中两小时的银离子释放浓度为0．22μg／mL。接触角测量结果表明，改性后材料表面的亲水性提高，且表皮葡萄球菌对改性涤纶的表面粘附自由能（△Fadh）为正值，因此不利于表皮葡萄球菌的粘附。     

医用涤纶表面壳聚糖化学接枝法制备及细菌粘附研究

通过化学方法构建了壳聚糖长链分子接枝的涤纶表面,并研究了其细菌粘附性质.XPS全谱显示接枝表面出现氮元素峰,表明壳聚糖分子已成功接枝于材料表面.表皮葡萄球菌对材料进行细菌粘附比较,平板菌落计数法的实验结果表明表面接枝了壳聚糖的PET具有一定的抗细菌粘附能力.计算细菌与材料之间的粘附自由能△Fadh表明细菌对PET表面的粘附自由能为负值,而细菌对壳聚糖分子接枝PET表面的AFadh＞0,因此细菌对其表面的粘附过程难于发生,即使粘附也是可逆的.     

基片温度对强流脉冲离子束烧蚀等离子体沉积类金刚石薄膜结构和性能的影响

利用强流脉冲离子柬(High-intensity pulsed ion beam-HIPIB)烧蚀等离子体技术在Si(100)基体上沉积类金刚石(Diamond-like carbon-DLC)薄膜，基片温度的变化范围从25℃(室温)到400℃。利用Raman谱、X射线光电子谱(XPS)、X射线衍射(XRD)和原子力显微镜(AFM)研究基片温度对DLC薄膜的化学结合状态、表面粗糙度、薄膜显微硬度和薄膜内应力的影响。根据XPS和Raman谱分析得出，基片温度低于300℃时，sp3C杂化键的含量大约在40％左右；从300℃开始发生sp3C向sp2C的石墨化转变。随着沉积薄膜时基片温度的提高，DLC薄膜中sp3C的含量降低，由25℃时42．5％降到400℃时8．1％，XRD和AFM分析得出，随着基片温度的增加，DLC薄膜的表面粗糙度增大，薄膜的纳米显微硬度降低，摩擦系数提高，内应力降低。基片温度为100℃时沉积的DLC薄膜的综合性能最好，纳米显微硬度22GPa，表面粗糙度为0．75nm，摩擦系数为0．110。     

射频功率对FN-DLC薄膜粘附性的影响

利用射频等离子体增强化学气相沉积法,在单晶硅(100)晶面上制备了掺氮氟化类金刚石(FN-DLC)薄膜样品.用傅立叶变换吸收红外光谱(FTIR)、扫描电镜和金相显微镜分析了薄膜的组分和结构及表面形貌.红外分析表明,FN-DLC薄膜中主要有C-Fx(x=1,2,3)、C-C、C-H2、C-H3和C=C化学键等.功率增加时,薄膜内C-C、C=C键含量相对增加,F浓度的相对含量降低,薄膜的粘附性增强.     

直流负偏压对类金刚石薄膜结构和性能的影响

利用直流-射频-等离子体增强化学气相沉积技术在单晶硅表面制备了类金刚石薄膜，采用原子力显微镜、Raman光谱、X射线光电子能谱、红外光谱、表面轮廓仪和纳米压痕仪考察了直流负偏压对类金刚石薄膜表面形貌、微观结构、沉积速率和硬度等性能的影响。结果表明：无直流负偏压条件下，薄膜呈现有机类聚合结构，具有较低的SP3含量和硬度；叠加上直流负偏压后，薄膜具有典型的类金刚石结构特征，SP3含量和硬度得到了显著的提高；但随着直流负偏压的升高，薄膜的沉积速率和H含量逐渐降低，而SP3含量和硬度在直流负偏压为200V时出现最大值，此后逐渐降低。     

PECVD法制备类金刚石薄膜的结构和摩擦学性能研究

采用射频一直流等离子体增强化学气相沉积技术在单晶硅衬底上沉积了类金刚石薄膜。用激光拉曼光谱仪和原子力显微镜对薄膜的结构和表面形貌进行了表征，并用纳米压痕仪测定了薄膜的硬度。用UMT微摩擦磨损试验机考察了薄膜在不同的滑行速度下薄膜的摩擦学性能。结果表明：所沉积的薄膜具有典型类金刚石薄膜的结构特征，薄膜表面光滑致密，硬度较高；薄膜与氧化铝陶瓷球对磨显示出良好的摩擦学性能，随着滑行速度的增加，薄膜的摩擦系数单调降低，但磨损寿命先增加后降低。     

等离子体刻蚀处理对金刚石膜粘附性能的影响

采用直流等离子体射流ＣＶＤ法在ＹＧ８质合金基体上成功地合成了多晶金刚薄膜。通常基体表面经金刚石磨盘研磨、稀硝酸化学侵蚀脱钴预处理后，沉积的金刚石薄膜的的粘附性能仍不理想。本文首次采用原位的Ａｒ－Ｈ２等离子体射流对基体表面进行适当的轰击、刻蚀处理，显著粗化了基体表面，并使基体表面显微组织和化学成分发生重大变化，并且在合适的沉积工艺条件下，沉积的金刚石膜的粘附性能显著提高。借助ＸＲＤ、ＳＥＥＭ、ＴＥＭ     

液相电沉积金刚石薄膜的研究进展

评述了液相沉积(类)金刚石薄膜的研究现状,介绍了液相合成(类)金刚石薄膜的装置、液态源及薄膜的性能,分析了如何更好地提高(类)金刚石薄膜质量,并在此基础上提出了一种可能制备出高质量金刚石薄膜的脉冲电弧放电沉积装置.     

SiC/DLC过渡层对类金刚石薄膜力学性能的影响

采用等离子体浸没离子注入及沉积技术在钛合金(Ti6Al4V)表面制备了类金刚石薄膜和含有SiC/DLC过渡层的类金刚石薄膜。采用拉曼光谱及扫描电子显微镜分析了薄膜的成分和结构,并利用超显微硬度计、薄膜结合力测试仪和往复式摩擦实验机研究了薄膜的硬度、韧性、膜/基结合力和耐磨性。研究结果表明,SiC/DLC过渡层可以提高钛合金(Ti6Al4V)表面类金刚石薄膜的韧性及膜/基结合力,与未制备过渡层的类金刚石薄膜相比,含有SiC/DLC过渡层的类金刚石薄膜的耐磨性明显提高。     

AISI 316L不锈钢表面沉积Ti掺杂类金刚石薄膜及其性能

为了进一步评价医用材料AISI 316L不锈钢表面沉积掺杂Ti类金刚石薄膜的应用性能,采用离子束辅助沉积技术在AISI 316L不锈钢表面沉积了掺杂Ti类金刚石(DLC-Ti)薄膜。分别利用X射线衍射仪、扫描电子显微镜、摩擦磨损试验机、电化学工作站及纳米压痕仪对DLC-Ti薄膜的晶体结构,表面与截面形貌,摩擦磨损性能,电化学性能,硬度和弹性模量进行了表征。结果表明:DLC-Ti薄膜的摩擦系数超低(0.017~0.029)且未出现磨损,自腐蚀电位和点蚀电位相对于基体向正电位方向移动。DLC-Ti薄膜综合性能较好,在整形外科及刀具等应用方面具有很好的前景。     

不同等离子源形成的DLC涂层对NiTi合金腐蚀行为的影响

采用等离子浸没离子注入和沉积(PIIID)法分别以C2H2和石墨为等离子源在NiTi合金表面形成DLC涂层来提高该合金的耐腐蚀性.利用Raman光谱和扫描电镜分析膜层结构.利用电化学测试和原子吸收光谱测试涂层前后基体的耐腐蚀性和Ni离子析出.结果表明:采用等离子浸没离子注入和沉积法以乙炔和石墨为等离子源在NiTi合金表面形成均匀致密、结合力良好的DLC涂层.两种涂层都明显地提高了NiTi合金的耐腐蚀性能和有效地抑制了Ni离子的溶出.     

Surface modification of poly(ethylene terephthalate) by plasma polymerization of poly(ethylene glycol)

Poly(ethylene glycol) (PEG) was ‘polymerized’ onto poly(ethylene terephthalate) (PET) surface by radio frequency (RF) plasma polymerization of PEG (average molecular weight 200 Da) at a monomer vapour partial pressure of 10 Pa. Thin films strongly adherent onto PET could be produced by this method. The modified surface was characterized by infra red (IR) spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), cross-cut test, contact angle measurements and static platelet adhesion studies. The modified surface, believed to be extensively cross-linked, however showed all the chemical characteristics of PEG. The surface was found to be highly hydrophilic as evidenced by an interfacial free energy of about 0.7 dynes/cm. AFM studies showed that the surface of the modified PET became smooth by the plasma polymerized deposition. Static platelet adhesion studies using platelet rich plasma (PRP) showed considerably reduced adhesion of platelets onto the modified surface by SEM. Plasma ‘polymerization’ of a polymer such as PEG onto substrates may be a novel and interesting strategy to prepare PEG-like surfaces on a variety of substrates since the technique allows the formation of thin, pin-hole free, strongly adherent films on a variety of substrates.     

Characterization and tribological application of diamond-like carbon (DLC) films prepared by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) technique

Diamond-like carbon (DLC) films were successfully prepared on glass substrates and surfaces of selenium drums via radio frequency plasma enhanced chemical vapor deposition method. The microstructure, surface morphology, hardness, film adhesion, and tribological properties of the films were characterized and evaluated by X-ray photoelectron spectroscopy, atomic force microscopy, and micro-sclerometer and friction-wear spectrometer. The results showed that DLC films have smooth surfaces, homogeneous particle sizes, and excellent tribological properties, which can be used to improve the surface quality of the selenium drums and prolong their service life.     

介质阻挡放电化学气相沉积法制备DLC薄膜研究

采用介质阻挡化学气相沉积法(DBD CVD)在Si及石英衬底上、室温下成功的沉积出光滑、致密、均匀、膜基结合较好的类金刚石(DLC)薄膜,并考察了电源电压对类金刚石薄膜结构及性能的影响。拉曼光谱(Raman)、扫描电子显微镜(SEM)、原子力显微镜(AFM)、紫外可见光谱(UV Vis)、高阻仪等测试及分析结果显示DBD CVD 法适于制备高质量硬质DLC薄膜。对DBD放电做了理论分析,结果与工艺研究的结论相符合。     

Microstructure of interface for high-adhesion DLC film on metal substrates by plasma-based ion implantation

The diamond-like carbon (DLC) film was prepared on various metal substrates with a plasma-based ion implantation and deposition using superimposed RF and negative high-voltage pulses. The adhesion strength of DLC film was enhanced above the epoxy resin strength by implantation of carbon ions or mixed ions of carbon and silicon to the substrate surface before DLC deposition. In order to clarify the mechanism for improvement in adhesive strength, the microstructure of an interface between DLC film and substrate was examined in detail by transmission electron microscopy (TEM) observations in combination with EDS analysis. As a result, the enhancement in adhesion strength of DLC film by C ion implantation resulted from the formation of amorphous-like phase in the ion-implanted region of substrate, the production of carbon-component graded interface, the destruction of the oxide layer on the top surface of substrate, and the reduction of residual stress in DLC film by ion implantation during the deposition. The production of stress-free DLC film allowed us to demonstrate a supra-thick DLC film of more than 400 μm in thickness.     

等离子体源离子注入法制备类金刚石薄膜

用等离子体源注入(PSII)在Si(100)上制备类金刚石膜，放电气体采用CH4，用微波电子回旋共振(ECR)产生等离子体。将-20～-30kV的高压加在衬底上，来提高离子的能量。通过Raman光谱和FT-IR光谱检测了类金刚石膜的化学组成及状态，并对其机械性能和表面形貌进行了检测。结果显示，硅片硬度和摩擦因数得到了改善，用PSII能够制备出性能优良的膜，可以将其应用到微电子器件(MEMS)上去。     

The influence of surface chemistry and topography on the contact guidance of MG63 osteoblast cells

The purpose of the present study was to determine in vitro the effects of different surface topographies and chemistries of commercially pure titanium (cpTi) and diamond-like carbon (DLC) surfaces on osteoblast growth and attachment. Microgrooves (widths of 2, 4, 8 and 10 μm and a depth of 1.5–2 μm) were patterned onto silicon (Si) substrates using microlithography and reactive ion etching. The Si substrates were subsequently vapor coated with either cpTi or DLC coatings. All surfaces were characterized using atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and contact angle measurements. Using the MG63 Osteoblast-Like cell line, we determined cell viability, adhesion, and morphology on different substrates over a 3 day culture period. The results showed cpTi surfaces to be significantly more hydrophilic than DLC for groove sizes larger than 2 μm. Cell contact guidance was observed for all grooved samples in comparison to the unpatterned controls. The cell viability tests indicated a significantly greater cell number for 8 and 10 μm grooves on cpTi surfaces compared to other groove sizes. The cell adhesion study showed that the smaller groove sizes, as well as the unpatterned control groups, displayed better cell adhesion to the substrate.     

Metal-doped diamond-like carbon films synthesized by filter-arc deposition

Diamond-like carbon (DLC) thin films are extensively utilized in the semiconductor, electric and cutting machine industries owing to their high hardness, high elastic modulus, low friction coefficients and high chemical stability. DLC films are prepared by ion beam-assisted deposition (BAD), sputter deposition, plasma-enhanced chemical vapor deposition (PECVD), cathodic arc evaporation (CAE), and filter arc deposition (FAD). The major drawbacks of these methods are the degraded hardness associated with the low sp³/sp² bonding ratio, the rough surface and poor adhesion caused by the presence of particles. In this study, a self-developed filter arc deposition (FAD) system was employed to prepare metal-containing DLC films with a low particle density. The relationships between the DLC film properties, such as film structure, surface morphology and mechanical behavior, with variation of substrate bias and target current, are examined. Experimental results demonstrate that FAD-DLC films have a lower ratio, suggesting that FAD-DLC films have a greater sp³ bonding than the CAE-DLC films. FAD-DLC films also exhibit a low friction coefficient of 0.14 and half of the number of surface particles as in the CAE-DLC films. Introducing a CrN interfacial layer between the substrate and the DLC films enables the magnetic field strength of the filter to be controlled to improve the adhesion and effectively eliminate the contaminating particles. Accordingly, the FAD system improves the tribological properties of the DLC films.     

氟表面活性剂C_8F_(17)SO_2N(C_2H_5)C_2H_4(OC_2H_4)的合成与性能

以全氟辛基磺酰氟为原料,与乙胺在异丙醚中加热反应制得N 乙基全氟辛基磺酰胺,再与2 氯乙醇在加热回流下反应得到N 乙基N 乙醇全氟辛基磺酰胺,随后在碱性条件,加热和带压下与环氧乙烷进行聚合反应,得到表面活性剂C8F17SO2N(C2H5)C2H4(OC2H4)nOH,n=8～9。该活性剂在质量浓度为0.05%时就可将表面张力降至19.2mN/m以下,具有良好的表面活性。运用IR,NMR,DSC,TG等技术对该表面活性剂进行了表征和研究。     

Adhesion studies of diamond-like carbon films deposited on Ti6Al4V substrate with a silicon interlayer

Diamond-like carbon (DLC) films have proven quite advantageous in many tribological applications due to their low friction coefficient, their extreme hardness, and more recently their high adherence on different substrate materials. However, for many applications, DLC films as thick as 2 μm are required, which cause high residual stress. In order to overcome this problem, this study observed the behavior of different thicknesses of silicon interlayer between DLC films and Ti6Al4V substrates. The study also analyzed the relation of growth parameters to the mechanical properties of DLC films. Silicon and DLC films were grown by using a rf-PECVD at 13.56 MHz with silane and methane atmospheres, respectively. The contribution of an interlayer thickness to the adhesion between the DLC films and Ti6Al4V substrate was evaluated by using a micro-scratch technique. The hardness and friction coefficient were evaluated by using microindentation and lateral force microscopy (LFM), respectively. Raman scattering spectroscopy was used to characterize the film quality. A correlation was found between the intrinsic stress and adhesion of DLC film and the parameters of the silicon interlayer growth. The addition of a silicon interlayer successfully reduced intrinsic stress of the films, even as measured by using a perfilometry technique.