添加Ne,Ar对N2激光器的影响

本文描述了在汤逊脉冲实验中,添加Ne或Ar气对N2分子激光器的影响。研究结果表明,激光在阴极所释放的初始电子数n0增加约3～6倍。但添加Ne气将使激光脉宽延长10%～25%,而添加Ar气激光脉宽变化甚微。     

提高毛细管放电类氖氩46.9 nm软X射线激光强度的研究

为了提高毛细管放电类氖氩46.9 nm软X射线激光的强度,研究了工作介质中气体的掺杂对激光强度的影响。研究表明,在纯Ar中掺入适量的He显著地提高了激光的输出强度。通过对比在Ar中掺入Ne、N2以及Kr等其他气体的实验,系统地分析了He的掺入对等离子温度的影响,找到了在特定工作气压下最佳的掺杂比,有利于进一步提高毛细管放电46.9 nm软X射线激光的强度。在放电等离子体极紫外光刻（EUVL）光源研究过程中,也采用了在Xe中掺入适量He的方式以提高13.5 nm的输出强度。     

Nd:GdVO4晶体的生长与性能

报道了在N2+He(30%～50%Vol)气氛中用提拉法成功地生长了Nd:GdVO4晶体.激光实验中,LD泵浦功率为350mW,采用端泵方式获得波长为1060nm的激光输出,TEM00基模方式运行,阈值泵浦功率为95mW,输出功率为13mW,斜效率为5%.     

小功率连续波放电DF/HF化学激光器的功率

将SF6、O2、He3种可调气体预混合,喷入带有8个高压放电极的放电管,解离F离子,沿气流方向以亚音速喷入喉道,H2/D2由喉道上下喷入,光轴在H2/D2喷入下游1mm处。研究了连续波DF/HF激光器的多谱线输出功率与SF6、He和H2/D2的流量关系,以及混合气体中加入O2对激光器性能的影响。实现了HF最大输出功率12W,DF最大输出功率11W,连续可调,功率稳定,持续时间20min。     

波长和气氛对激光诱导硅表面微结构的影响

为了研究特定气氛下激光辐照对单晶硅表面微结构的影响,采用红外(基频波长1064nm)和紫外(3次谐波波长355nm)YAG纳秒激光脉冲连续辐照方法,分别在SF6、空气、N2和真空环境下对硅表面微结构进行了实验研究。得到红外纳秒激光在SF6和空气中形成的微结构较真空和N2下有更高的纵横比;紫外纳秒激光在SF6和真空中产生的锥形结构比N2和空气中要更为显著,但SF6中形成的微结构上有絮状物的结果。结果表明,激光波长和环境气氛对微结构的形成起着决定性作用,且激光辅助化学刻蚀的效率不同。该结果对深入研究纳秒激光在特定气氛下诱导硅表面微结构是有帮助的。     

稀释气体对XeCl激光的影响

紫外预电离快放电XeCl准分子激光器使用的稀释气体通常是He气,但是He的电离电位高(大于19电子伏)以及由于弹性碰撞引起的能量损耗大,所以,用Ne或Ar来代替He作稀释气体是值得研究的。用Ne代替He提高了激光输出能量30％,用Ar代替He得到相同的输出功率,但总气压可降底。     

扁平放电管He-Ne激光器

为了获得短腔大功率的He-Ne激光输出,本文提出了一种新型He-Ne激光器,采用扁平形放电管,以便增加横向尺寸提高功率。文中讨论了该激光器的设计原理以及实验结果,包括工作总气压、He与Ne的气压比、放电电流等对激光输出功率的影响,还介绍了该种放电管结     

医用氦氖激光装置

我们研制的医用 He—Ne 激光综合装置具有下列特点:激光器的输出功率在2～30mW范围内连续可调;输出功率稳定度<5%;在工作过程中对输出功率随时可进行监测;激光束的输出方式可以分挡调节,十分方便.基本原理应用于医疗方面的 He—Ne 激光装置基本上都采用最简单的电源,一般均以出厂时所测定的激光管最佳输出功率作为该装置的输出功率.然而,对某些质量差的激光器输出稳定度的变化可大到20～40%.另外,激光管在使     

脉冲TEA CO2激光器输出模拟

为了研究气体配比、抽运电子密度、腔长对脉冲横向激励大气压CO2激光器输出功率的影响,采用了六温度模型的方法,对工作气体中不同分子振动模式间的能量转移和激光输出功率进行了理论分析和模拟。当CO2,N2,He的体积比由4:30:65上升到6:30:65时,脉冲功率增加,输出延迟时间变短;当CO2,N2,He的体积比由5:15:65上升到5:35:65时,脉冲功率按先增加后减小的趋势变化,在N2比例约为25时达到最大;当CO2,N2,He的体积比为5:30:65、最大抽运电子密度由41012/cm3增加到61012/cm3、腔长由2m增加到4m时,脉冲功率都会逐渐增加;脉冲功率越大时,输出延迟时间越短,但有更长的拖尾现象。结果表明,气体配比、抽运电子密度、腔长对脉冲输出功率有影响,该研究为设计和优化激光器提供了参考。     

室温电激励CO激光器

本文报导我们研制的室温内腔封闭式电激励CO激光器,在5～6微米波段内输出相干辐射,连续多线输出功率2～3瓦(放电管长约120厘米)。实验研究了影响激光输出功率的一些因素。简单讨论了有关激光器运转机理的某些问题。     

高峰值功率脉冲氟化氢激光器

报道了大体积火花预电离横向放电的脉冲HF激光器。通过采用紧凑的结构安排,在放电体积为4cm×5cm×90cm的SF6和C2H6混合气中获得了均匀稳定的放电。在总气压为12.6kPa、最高充电电压45kV时,激光输出脉冲能量为3J,激光脉冲峰值功率约18MW。     

Optimization and Maximum Output Power of CW DCN Laser

A high power CW 195 μm DCN laser has been developed for fusion plasma diagnostics. Optimization of various parameters (such as the rate of N₂:CD₄:He gas mixture, the gas pressure and the discharge current, the wall temperature and the output couple) for maximum output power at the DCN laser were performed and reported in this paper. Output power of about 220 mW on the 195 μm line has been obtained with 3.4 m long and 54 mm inner diameter discharge-pumped wave-guide laser. A new mixture gas of N₂:CD₄:D₂ was used in producing a stable high-power discharge and preventing the deposition of brown polymer with lower wall temperature and discharge current.     

短腔长室温封离式CO激光器

描述了一短腔长室温封离式CO激光器。该激光器的有效增益长度为80cm,混合气体的比例为He:N2:CO=73:35:1.利用流动的自来水进行冷却,水温为10℃的情况下,获得了10个振转谱带的激光跃迁,波长范围为5.0～6.0μm,输出功率为0.2W,在关闭一半放电,有效增益长度仅为40cm时,仍获得30mW的激光输出。     

Effects of Buffer Gas on Spectra of Optically Pumped Far-Infrared Cavity Laser

By developing a mechanism model of buffer gas, the comprehensive relaxation time of laser operation substance was calculated. By means of solving the density matrix equations, the effects of buffer gas N₂ on the spectrum characteristics of NH₃ FIR laser line with buffer gas N₂ were studied. It was found that by adding proper buffer gas, FIR laser output power could be increased, and spectra widened because of the molecular collision. This work made it possible to develop high output and wide range tunable FIRL.     

Isotropic Plasma Etching of SiO2 Films

The isotropic etching of SiO₂ with an SF₆–O₂ plasma is studied experimentally. It is shown that the key factors in the process are the total and partial pressures of SF₆ and O₂ and the RF power. A smoothed-down edge profile of contact windows is obtained if SF₆ and O₂ are mixed in a ratio of 1 : 10 to 1 : 5. The maximum etch rate is achieved at total pressures of 250 to 450 Pa.     

2.5kW横流CO2(无氦)激光器研究

在高功率横流CO2(无氦)激光器中,本文就镇流电阻对激光器输出特性的影响作了实验研究,并获得了镇流电阻的最佳数值.当总压力为60Torr,CO2:Ar:N2=1.5:10:10时,激光器的输出功率为2.5kW,光电转换效率为16.9%.在12h的运行中,输出功率漂移仅为±3%.     

Effects of Buffer Gas N2 on Miniature Optically Pumped NH3 Submillimeter Wave Cavity Laser Emission at 67.2 μm

The effect of buffer gas N₂ on miniature optically pumped NH₃ submillimeter wave (SMMW) cavity laser emission at 67.2μm was studied theoretically and experimentally. It has been found that: 1. N₂ had a positive effect on laser output of 67.2μm, 2. sharp absorption in laser spectrum under certain gases mixture pressure corresponded to the threshold of 'bottleneck effect”.     

Design of CW High-Power Discharge-Pumped DCN Laser

This paper describes a CW sub-millimeter waveguide dischargepumped DCN laser operating on 190 and 195 mu m lines. The laser discharge length is 3 m, and the resonator length is 3.4 m. The resonator cavity consists of a pyrex tube of 54 mm diameter and two plane reflectors against its ends, one is a plane mirror, the other is a metal mesh. After optimization of various parameters, such as the N₂:CD₄:He gas mixture, the pressure and the discharge current, the wall temperature and the output couple, this laser delivers 200 and 220mW on the 190 and 195 mu m lines, respectively, for EH₁₁ mode.