Low dielectric constant nanoporous poly(methyl silsesquioxane) using poly(styrene-block-2-vinylpyridine) as a template

Low dielectric constant nanoporous poly(methyl silsesquioxane) (PMSSQ) was prepared through the templating of an amphiphilic block copolymer, poly(styrene-b-2-vinylpyridine) (PS-b-P2VP). The experimental and theoretical studies suggest that the intermolecular hydrogen bonding interaction is existed between the PMSSQ precursor and PS-b-P2VP. The result of modulated differential scanning calorimeter (MDSC) indicates the miscible hybrid of the PMSSQ precursor/PS-b-P2VP. The miscible hybrid and the narrow thermal decomposition of the PS-b-P2VP lead to nanopores in the prepared films from the results of transmission electronic microscopy (TEM), atomic force microscopy (AFM), and small angle X-ray scattering (SAXS). The effects of the loading ratio and the PS block volume ratio (f_PS: 0.74, 0.46 and 0.35) on the morphology and properties of the prepared nanoporous PMSSQ films were investigated. The AFM and TEM studies suggest that the uniform pore morphology should be prepared from a modest porogen loading level for the optimum intermolecular hydrogen bonding. The PS-b-P2VP with a smaller f_PS requires a higher loading level to obtain the uniform pores. The refractive index and dielectric constant of the prepared nanoporous films could be tuned by the loading ratio in the range of 1.361-1.139 and 2.359-1.509, respectively. However, both properties are independent of the f_PS. The prepared study demonstrates the control of the morphology and properties of the nanoporous films through the polymer structure.     

Reversible morphology control of three-dimensional block copolymer nanostructures by the solvent-annealing-induced wetting in anodic aluminum oxide templates

In this work, the authors study the fabrication of three-dimensional block copolymer nanostructures in which the morphologies can be reversibly controlled. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS), a promising candidate for nanolithography, is introduced into cylindrical nanopores of anodic aluminum oxide (AAO) templates using a solvent annealing–induced nanowetting in templates (SAINT) method. Not only the morphologies of the infiltrated PS-b-PDMS nanostructures can be tuned by the annealing solvents, but also the solvent-vapor-controlled morphologies can be altered reversibly by annealing the samples repeatedly between different solvent vapors.     

Surface morphology evolution of poly(styrene-block-4-vinylpyridine) (PS-b-P4VP)(H) and poly(methyl methacrylate)-dibenzo-18-crown-6-poly(methyl methacrylate) (PMCMA) supramolecular film

Well-ordered nanostructured polymeric supramolecular thin films were fabricated from the supramolecular assembly of poly(styrene-block-4-vinylpyridine) (PS-b-P4VP)(H⁺) and poly(methyl methacrylate)-dibenzo-18-crown-6-poly(methyl methacrylate) (PMCMA). A depression of cylindrical nanodomains was formed by the block of P4VP(H⁺) and PMCMA associates surrounded by PS. The repulsive force aroused from the incompatibility between the block of P4VP(H⁺) and PMCMA was varied through changing the molecule weight (M_w) of PMCMA, the volume fraction of the block of P4VP(H⁺), and annealing the film at high temperature. Increasing the repulsive force led to a change of overall morphology from ordered nanoporous to featureless structures. The effects of solvent nature and evaporation rate on the film morphology were also investigated. Further evolution of surface morphologies from nanoporous to featureless to nanoporous structures was observed upon exposure to carbon bisulfide vapors for different treatment periods. The wettability of the film surface was changed from hydrophilicity to hydrophobicity due to the changes of the film surface microscopic composition.     

Dynamic study of polystyrene-block-poly(4-vinylpyridine) copolymer in bulk and confined in cylindrical nanopores

AAO template is highly recommended to nanostructure polymers and to study polymer properties under confinement. The dynamic properties of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) under confinement using broadband dielectric spectroscopy are investigated in this work and the results compared to those of the bulk. Anodized aluminum oxide (AAO) membranes, having pore diameters from tens to hundreds of nanometers in size, were used to confine PS-b-P4VP. Moreover, the influence of gold nanoparticles (AuNPs) in the copolymer matrix was also studied. The morphology and structure of the bulk copolymer and the copolymer confined in the AAO templates were characterized by transmission electron microscopy, scanning electron microscopy and Small Angle X-Ray Scattering. For PS-b-P4VP in bulk, dielectric relaxation techniques allowed studying selectively the P4VP segmental dynamics within the diblock. At high temperature this copolymer presents a dominant peak (MWS relaxation), most likely originated by the relatively high conductivity combined with the presence of interfaces emerging in the nanostructured samples. Moreover, a pronounced β-relaxation is observed for the copolymer compared with that of pure P4VP. This is likely due to a non-negligible contribution from the α-relaxation of the PS component. The γ-relaxation is markedly different in the copolymer, which is evidenced by a distinct temperature dependence of the resulting relaxation times. When the copolymer is embedded in alumina nanopores with small pore diameters (25 and 35 nm) there are significant changes, where the tendency is going to a faster dynamics when the pore diameter decreases more likely related to the relevance of surface effects. The presence of the AuNPs in the system enhances this effect. These results are in agreement with segregated structures found in the block copolymer by TEM and SAXS.     

Hexagonally ordered arrays of metallic nanodots from thin films of functional block copolymers

We demonstrate a new and simple route to fabricate highly dense arrays of hexagonally close packed inorganic nanodots using functional diblock copolymer (PS-b-P4VP) thin films. The deposition of pre-synthesized inorganic nanoparticles selectively into the P4VP domains of PS-b-P4VP thin films, followed by removal of the polymer, led to highly ordered metallic patterns identical to the order of the starting thin film. Examples of Au, Pt and Pd nanodot arrays are presented. The affinity of the different metal nanoparticles towards P4VP chains is also understood by extending this approach to PS-b-P4VP micellar thin films. The procedure used here is simple, eco-friendly, and compatible with the existing silicon-based technology. Also the method could be applied to various other block copolymer morphologies for generating 1-dimensional (1D) and 2-dimensional (2D) structures.     

Effects of additives on the morphologies of thin titania films from self-assembly of a block copolymer

The effects of additives of poly(methyl methacrylate) (PMMA) and HAuCl₄ on the morphologies of hybrid titania films formed via co-assembly of polystyrene-block-poly(ethylene oxide) (PS-b-PEO) copolymers, titania sol-gel precursor in a selective solvent were investigated. The results show that addition of PMMA or HAuCl₄ has an important influence on the morphologies of hybrid titania films. Addition of PMMA or HAuCl₄ can induce the morphology transition of the PS-b-PEO/titania sol-gel mixture from spherical micelles to vesicles. Therefore, the morphologies of the hybrid films formed on silicon substrate surfaces by spin-coating can be controlled by the addition of homopolymer (PMMA) or inorganic precursor (HAuCl₄) into the PS-b-PEO/titania sol-gel mixtures, allowing access to nanoparticles or nanoporous films. After removing the polymer matrix, nanoparticle aggregates or nanobowl-like structures are left behind on the substrate surfaces.     

Study of the time evolution of the surface morphology of thin asymmetric diblock copolymer films under solvent vapor

The time development of the surface morphology of asymmetric polystyrene-b-poly(4-vinylpyridine) (PS-b-P4VP) thin films ‘annealing’ in methanol vapor, a selective solvent for minority P4VP block, was investigated by atomic force microscopy(AFM). For PS-b-P4VP with cylindrical structure in bulk, as annealing time progressed, the surface morphology underwent structural transitions from featureless topography to hybrid morphology of cylindrical and spherical pits, to cylinders, to nanoscale depressions, back to cylinders again. The different film thickness made the number of the transitions observed, at any given annealing time, different. The thicker the film is the more transitions at a given annealing time can be observed. If the film was not thick enough, depressions appeared. For PS-b-P4VP with spherical structure in bulk, it displayed nanoscale depressions with the annealing time increasing. A possible mechanism of the transition of morphologies during solvent annealing was proposed.     

Effects of substrate roughness on the orientation of cylindrical domains in thin films of a polystyrene-poly(methylmethacrylate) diblock copolymer studied using atomic force microscopy and cyclic voltammetry

This paper describes the orientation of cylindrical domains in thin films of a polystyrene-poly(methylmethacrylate) diblock copolymer (PS-b-PMMA; 0.3 as the PMMA volume fraction) on gold and oxide-coated Si substrates having different surface roughness. Atomic force microscopy images of PS-b-PMMA films having thickness similar to the domain periodicity permitted us to study the effects of substrate roughness and block affinity on domain orientation. PS-b-PMMA films on gold substrates showed metastable vertical domain orientation that was attained more slowly on rougher substrates. In contrast, the domains were horizontally oriented on oxide-coated Si regardless of surface roughness and the annealing conditions examined. In addition, cyclic voltammetry data for PS-b-PMMA films on gold substrates whose PMMA domains were etched suggested that the metastable vertically oriented domains reached the underlying substrates. These results indicate that PS-b-PMMA films containing vertically oriented cylindrical domains can be obtained by using rough gold substrates upon annealing under controlled conditions.     

The fabrication of graphitic thin films with highly dispersed noble metal nanoparticles by direct carbonization of block copolymer inverse micelle templates

Ordered arrays of Au or Ag nanoparticles supported on two-dimensional graphitic carbon films were prepared by direct carbonization of stabilized asymmetric polystyrene-block-poly(4-vinyl pyridine) (PS-b-P4VP) inverse micellar films loaded with metal precursors. Crosslinked PS-b-P4VP thin film templates with metal precursors selectively distributed in P4VP domains were converted to carbonaceous thin films having well-defined, highly dispersed metal nanoparticle (NP) arrays by ultraviolet (UV) irradiation under vacuum and subsequent carbonization. Mesoporous carbon films were also obtained after extracting the metal NPs by sonication in selected solvents. PS-b-P4VP was employed not only as carbon source, but also as template for introducing metal NPs in a nanopatterned configuration. The characteristic features and properties of thus generated hybrid carbon nanostructures were investigated by microscopy, UV–visible spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction measurement, and Raman spectroscopy.     

Ordering and microdomain orientation in block copolymer films by thermal deprotection

Ordering and microdomain orientation for the films of symmetric polystyrene-b-poly(tert-butyl methacrylate)s (PS-b-PtBMAs) was investigated by in-situ grazing incidence small-angle X-ray scattering (GISAXS) and the electron microscopy. During thermal deprotection at higher temperature (200 °C), functional tert-butyl ester units in the PtBMA block component are integrated into inter- or intra-molecular anhydride linkages. It was observed that this process causes an increase in the Flory-Huggins interaction parameter (χ) between the two block components for disordered PS-b-PtBMA film, leading to a modulated nonequilibrium structure. Interestingly, for lamella-forming PS-b-PtBMA film, a significant chain stretching in lateral direction during thermal deprotection resulted in a characteristic strain-induced perpendicular orientation in the middle of the film confined between two parallel orientations of lamellar microdomains.     

Morphology change of asymmetric diblock copolymer micellar films during solvent annealing

The morphology change of an asymmetric polystyrene-block-poly(2-vinyl pyridine) (PS-b-PVP) diblock copolymer micellar film was investigated during solvent vapor annealing in chloroform. Initially, smaller islands in nanometer-length scale form at the film surface. Further annealing results in the growth of the islands composed of the PS-b-PVP cylinders above the bottom brush layer. For comparison, a film of the block copolymer prepared from THF solution (without micellar structure) was also studied. The surface morphology of the film from THF evolves via spinodal dewetting mechanism during solvent vapor annealing. At a long time solvent vapor annealing, the two kinds of the films display the same surface morphologies, which are determined by the interplay between the surface field and autodewetting.     

Asymmetric morphology from an organic/organometallic block copolymer

Block copolymer self-assembly is a burgeoning subject in polymer and materials science driven by both fundamental and applied inspirations. Whereas the vast majority of block copolymer studies have focused on highly symmetric morphologies, here we report the first observation of an unusual asymmetric cylindrical phase in thick films of an organic/organometallic block copolymer, poly(styrene-block-ferrocenyldimethylsilane) (PS-b-PFS). Microscopy and X-ray scattering data establish the lack of symmetry in this structure and reveal an unusual 3-D network organization. Following selective removal of the PS matrix, the remaining nanoporous film has characteristics of potential value in separation applications such as substantial interconnection (mechanical strength), uniform pore size, and chemical and physical stability.     

Selective distribution of interacting magnetic nanoparticles into block copolymer domains based on the facile inversion of micelles

We demonstrate a simple methodology to incorporate interacting magnetic nanoparticles (mNPs) into cylinder forming block copolymer templates. Poly(styrene-block-isoprene) (PS-b-PI) with PI cylinders and poly(styrene-block-4vinylpyridine) (PS-b-P4VP) with PS cylinders were used as the block copolymer templates and γ-Fe₂O₃ NPs coated with oleic acids were pre-synthesized for the interacting mNPs. Regardless of the template block copolymers, the selective location of mNPs and the size of mNP aggregates are clearly altered by changing casting solvents. When good solvents for both blocks were used as casting solvents, mNPs are readily aggregated during the solvent evaporation. In contrast, under selective casting solvents for the minor blocks, the mNPs were selectively trapped into the cylinder domains through the facile inversion of micelles during solvent evaporation. The interplay between mNPs and block copolymers was also tested with different molecular weights of block copolymers.     

Formation of conductive polyaniline nanoarrays from block copolymer template via electroplating

Nanostructured thin films have drawn extensive attention because of their unique properties resulting from nanoscale features. One of the convenient ways to generate nanostructured thin films is to use pattern with nanoscale texture as a template for the reactions carrying out within the template. In this study, nanoporous thin film template was obtained from the self-assembly of degradable block copolymer, polystyrene-b-poly(l-lactide) (PS-PLLA) with PLLA cylinder nanostructure, at which the PLLA block can be hydrolyzed to form the nanopatterns with cylinder nanopores on conductive substrate (i.e., ITO substrate). The nanoporous PS thin film template was stabilized by modification of substrate using hydroxyl terminated PS so as to enhance the adhesion with substrate for following electroplating process. Combining a pulse electroplating method with the control of micro current, polyanilines can be successfully synthesized within the template to fabricate well-defined of conductive polymer nanoarrays.     

Deposition of silver nanoparticles on single wall carbon nanotubes via a self assembled block copolymer micelles

We demonstrate a facile route to decorate the surface of networked single walled carbon nanotubes (SWNTs) with silver nanoparticles (Ag NPs). The method is based on utilization of either spherical poly(styrene-b-4vinylpyridine) (PS-b-P4VP) or cylindrical poly(styrene-b-acrylic acid) (PS-b-PAA) copolymer micelles capable of stabilizing nanotubes in solution and subsequently forming a thin and uniform block copolymer/SWNTs composite film upon spin coating. The selective doping of silver acetate into either P4VP or PAA domains in a thin composite film, followed by thermal treatment, results in the formation of Ag NPs in the cores of micelles. Further heat treatment at 500 °C sufficiently high for degrading both block copolymers allows us to fabricate a thin SWNTs network in which Ag NPs are efficiently deposited on the surface of nanotubes. A sharp surface plasmon absorption band around 400 nm of the networked SWNTs with Ag NPs confirms the presence of Ag NPs with narrow distribution in their size.     

Morphology of polystyrene/polystyrene-block-poly(methyl methacrylate)/poly(methyl methacrylate) composite particles

Polystyrene/polystyrene-block-poly(methyl methacrylate)/poly(methyl methacrylate) (PS/PS-b-PMMA/PMMA) composite particles were prepared by releasing toluene from PS/PS-b-PMMA/PMMA/toluene droplets dispersed in a sodium dodecyl sulfate aqueous solution. The morphology of the composite particles was affected by release rate of toluene, the molecular weight of PS-b-PMMA, droplet size, and polymer composition. ‘Onion-like’ multilayered composite particles were prepared from toluene droplets of PS-b-PMMA and of PS/PS-b-PMMA/PMMA, in which the weights of PS and PMMA were the same. The layer thicknesses of the latter multilayered composite particles increased with an increase in the amount of the homopolymers. PS-b-PMMA/PS composite particles had a sea-islands structure, in which PMMA domains were dispersed in a PS matrix. On the other hand, PS-b-PMMA/PMMA composite particles had a cylinder-like structure consisting of a PMMA matrix and PS domains.     

The use of PEEK nanorod arrays for the fabrication of nanoporous surfaces under high temperature: SiN(x) example

Large area silicon nitride (SiN(x)) nanoporous surfaces are fabricated using poly(ether-ether-ketone) (PEEK) nanorod arrays as a template. The procedure involves manipulation of nanoporous anodic aluminum oxide (AAO) templates in order to form an ordered array of PEEK nanopillars with high temperature resistant characteristics. In this context, self-ordered AAO templates are infiltrated with PEEK melts via the "precursor film" method. Once the melts have been crystallized in the porous structure of AAO, the basis alumina layer is removed, yielding an ordered array of PEEK nanopillars. The resulting structure is a high temperature and chemical resistant polymeric nanomold, which can be utilized in the synthesis of nanoporous materials under aggressive conditions. Such conditions are high temperatures (up to 320 °C), vacuum, or extreme pH. For example, SiN(x) nanopore arrays have been grown by plasma enhanced chemical vapor deposition at 300 °C, which can be of interest as mold for nanoimprint lithography, due to its hardness and low surface energy. The SiN(x) nanopore array portrays the same characteristics as the original AAO template: 120 nm diameter pores and an interpore distance of 430 nm. Furthermore, the aspect ratio of the SiN(x) nanopores can be tuned by selecting an AAO template with appropriate conditions. The use of PEEK as a nanotemplate extends the applicability of polymeric nanopatterns into a temperature regime up to now not accessible and opens up the simple fabrication of novel nanoporous inorganic surfaces.     

Tuned phase behavior of weakly interacting polystyrene-block-poly(n-pentyl methacrylate) by selective solvent

We investigated, via small angle X-ray scattering, depolarized light scattering, rheometry, and transmission electron microscopy, the phase behavior of the mixture of a symmetric polystyrene-block-poly(n-pentyl methacrylate) copolymer (PS-b-PnPMA) showing the closed-loop phase behavior and excellent baroplasticity, and dodecanol, a PnPMA-selective solvent. We found that the addition of a selective solvent is simple, but very effective to obtain various microdomains including hexagonally packed cylinders and gyroids. Also, with increasing temperature, the mixtures showed multiple ordered-to-ordered transitions (OOTs) in addition to upper ordered-to-disordered transition (UODT). The first observation of gyroid microdomains in PS-b-PnPMA is very important, although they have been widely reported in many block copolymers, for instance, PS-block-polyisoprene copolymer (PS-b-PI) and PS-block-poly(d,l-lactide) copolymer (PS-b-PLA). Since the gyroid microdomains of PS-b-PnPMA show excellent baroplasticity, external pressure instead of temperature could easily change the microdomains.     

Property of diblock copolymer having extremely narrow molecular weight distribution

Molecular weight distribution effect on the morphological behavior of polystyrene-block-polyisoprene (PS-b-PI) diblock copolymers was investigated. PS-b-PI samples were prepared by anionic polymerization and further fractionated by HPLC to obtain the fractions of similar average molecular weight and composition but of narrower distributions in both molecular weight and composition. The strategy is to use reversed-phase LC to fractionate the PI block and normal phase LC to fractionate the PS block with a minimal effect on the other blocks. The interfacial thickness, grain size and the phase transition behavior of the unfractionated and fractionated PS-b-PI were compared by X-ray reflectivity, small angle X-ray scattering, transmission electron microscopy and rheological measurements. The fractionated PS-b-PI with more homogeneous molecular weight and composition exhibits a narrower interface, larger grain size and a sharper morphological transition compared to the unfractionated PS-b-PI.     

Nanoporous hard etch masks using silicon-containing block copolymer thin films

Nanoporous hard etch masks with various pore sizes were fabricated using a new type of silicon-containing block copolymers, polystyrene-block-poly(4-(tert-butyldimethylsilyl)oxystyrene) with different molecular weights. Since organic-inorganic block copolymers have a large difference in etch resistance between the organic and inorganic blocks, a hard etch mask of silicon oxide can be directly produced upon oxygen plasma treatment. Orientation and hexagonal arrays of cylindrical nanodomains were manipulated simply by adjusting the relative composition of selective and non-selective solvents in the annealing solvent. When the cylindrical nanostructures aligned perpendicular to the substrate surface were exposed to an oxygen plasma, hexagonally arranged nanopore arrays of silicon oxide with controlled pore sizes were fabricated. These nanoporous hard etch masks can be applied to the nanopatterning processes that require high aspect ratio structures.